Influence of various activation temperatures on the optical degradation of Mg doped InGaN/GaN MQW blue LEDs

GaN-based InGaN/GaN multi-quantum-well light emitting diode (MQW LED) structures were grown by metal organic chemical vapor deposition method. The optical properties of the LED structure have been investigated by using the photoluminescence and electroluminescence measurement. Both photoluminescence and electroluminescence results indicate that near pure InN clusters exist within the InGaN layers, which are responsible for the light emission in the LED. With increasing the Mg activation temperature of p-GaN layer, the optical properties of the LED structure tended to significantly degrade. This degradation was found to be deeply related to the variation of InN clusters in the active region. By the current–voltage measurement, a large forward voltage variation was observed. The voltage variation is caused to the conductivity variation of the p-GaN layer due to the different activation temperature. The turn-on voltage obtained from the best LED was 2.56 V and the forward voltage measured at 20 mA was 3.5 V. On the basis of these results, activation of the Mg-doped p-GaN layer must be carried out at the lowest possible value so as to obtain the better performance of LEDs.     

Luminescence of GaN single crystals prepared by heating a Ga melt in Na–N2 atmosphere

Colorless transparent prismatic crystals (0.5‐2.0 mm long) and hopper crystals (1.0‐2.5 mm long) of GaN were prepared by heating a Ga melt at 800°C in Na vapor under N₂ pressures of 7.0 MPa for 300 h. The photoluminescence (PL) spectrum of a prismatic crystal at 4 K showed the emission peaks of neutral donor‐bound exciton (D⁰‐X) and free exciton (X_A) at 3.472 eV and 3.478 eV, respectively, in the near band edge region. The full‐width at half‐maximum (FWHM) of (D⁰‐X) peak was 1.9 meV. The emission peaks of a donor–acceptor pair transition (D⁰‐A⁰) and its phonon replicas were observed in a lower energy range (2.9‐3.3 eV). The emission peaks of the D⁰‐A⁰ and phonon replicas were also observed in the cathodoluminescence (CL) spectrum at 20 K. The (D⁰‐X) PL peak of a hopper crystal at 4 K was at 3.474 eV (2.1 meV higher), having a FWHM of 6.1 meV which was over 3 times larger than that of the prismatic crystal. A strong broad band with a maximum intensity around 1.96 eV was observed for the hopper crystals in the CL spectrum at room temperature. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

(Ga, Gd, As) film growth on GaAs substrate by low-energy ion-beam deposit

(Ga, Gd, As) film was fabricated by the mass-analyzed dual ion-beam epitaxy system with the energy of 1000 eV at room temperature. There was no new peak found except GaAs substrate peaks (0 0 2) and (0 0 4) by X-ray diffraction. Rocking curves were measured for symmetric (0 0 4) reflections to further yield the lattice mismatch information by employing double-crystal X-ray diffraction. The element distributions vary so much due to the ion dose difference from AES depth profiles. The sample surface morphology indicates oxidizing layer roughness is also relative to the Gd ion dose, which leads to islandlike feature appearing on the high-dose sample. One sample shows ferromagnetic behavior at room temperature.     

High intense UV-luminescence of nanocrystalline ZnO thin films prepared by thermal oxidation of ZnS thin films

High quality zinc oxide (ZnO) films were obtained by thermal oxidation of high quality ZnS films. The ZnS films were deposited on a Si substrate by a low-pressure metalorganic chemical vapor deposition technique. X-ray diffraction spectra indicate that high quality ZnO films possessing a polycrystalline hexagonal wurtzite structure with preferred orientation of (0 0 2) were obtained. A fourth order LO Raman scattering was observed in the films. In photoluminescence (PL) measurements, a strong PL with a full-width at half-maximum of 10 nm around 380 nm was obtained for the samples annealed at 900°C at room temperature. The maximum PL intensity ratio of the UV emission to the deep-level emission is 28 at room temperature, providing evidence of the high quality of the nanocrystalline ZnO films.     

Experimental and theoretical investigations of the electrical properties of undoped and magnesium-doped GaN layers

The ac characteristics of GaN : Mg and undoped GaN layers, grown by MOVPE on sapphire substrates, are measured for a wide range of temperature and bias conditions, in order to investigate the effect of the magnesium-related level on the transport properties. Two peaks, whose height and position depend on the measurement temperature, are observed in the admittance curves (G/ω versus frequency) of the Mg-doped samples, whereas only one peak appears in undoped samples. The study of the frequency dependence of the impedance, with a model including the two metallic Au/GaN junctions, the GaN layer itself, shows that, besides the effect of the differential resistance of the layer which plays a role in both sample types, the presence of a Mg-related deep level contributes to the observed variations of the peaks in the admittance curves of the p-doped samples. Results of a theoretical steady-state and small-signal analysis based on numerical modelling of the Au/GaN/Au heterostructure complete our analysis.     

The photoluminescence of ZnO thin films grown on Si (1 0 0) substrate by plasma-enhanced chemical vapor deposition

High-quality ZnO thin films have been grown on a Si(1 0 0) substrate by plasma-enhanced chemical vapor deposition (PECVD) using a zinc organic source (Zn(C₂H₅)₂) and carbon dioxide (CO₂) gas mixtures at a temperature of 180°C. A strong free exciton emission with a weak defect-band emission in the visible region is observed. The characteristics of photoluminescence (PL) of ZnO, as well as the exciton absorption peak in the absorption spectra, are closely related to the gas flow rate ratio of Zn(C₂H₅)₂ to CO₂. Full-widths at half-maximum of the free exciton emission as narrow as 93.4 meV have been achieved. Based on the temperature dependence of the PL spectra from 83 to 383 K, the exciton binding energy and the transition energy of free excitons at 0 K were estimated to be 59.4 meV and 3.36 eV, respectively.     

Characterization of polycrystalline GaN grown on silica glass substrates

The structural, optical, and electrical properties of GaN films grown on silica glass substrate by metalorganic chemical vapor deposition were studied. X-ray diffraction showed that the films were grown in hexagonal structure with a predominant (0 0 0 2) peak. A broad and strong band-edge emission and very weak yellow luminescence in photoluminescence (PL) spectra were observed. And the temperature dependence of the PL spectra was extensively studied. The thermal quenching activation energy was found to be very close to the donor activation energy determined from the temperature dependence of the carrier concentration. Longitudinal optical phonons were found to be responsible for the PL broadening above 100 K.     

X-ray and cathodoluminescence study on the effect of intentional long time annealing of the InGaN/GaN multiple quantum wells grown by MOCVD

GaN-based InGaN/GaN multiple quantum wells (MQWs) structure having a high-quality epilayer and coherent periodicity was grown by metalorganic chemical vapor deposition. After thermal annealing of InGaN/GaN MQWs, the increase in temperature and annealing time caused the intermixing between the barrier and the wells, which in turn caused a decrease in periodicity on the high-resolution X-ray diffraction patterns. Thereby, we confirmed that the structural performance of InGaN MQWs is successively degrading with increasing thermal annealing temperature. Especially, InGaN MQWs of the sample annealed at 950 °C were profoundly damaged. The cathodoluminescence (CL) measurement indicated that MQWs emission intensity decreases with increasing thermal annealing temperature. Thus, the integrated CL intensity ratio of InGaN MQWs to GaN dramatically decreased while thermal annealing temperatures increased. This result caused the intermixing in MQWs to deteriorate the active layer performance. Furthermore, the peak position of MQWs showed a tendency of the red shift after high thermal annealing. It is suggested that the annealing-induced red shift in MQWs is attributed to the reduction of the inhomogeneity of the In content in the MQWs leading to the reduction of the quantized energies. Consequently, it indicates that the high temperature and the long-time thermal annealing would be inevitably followed by the structural destruction of InGaN MQWs.     

High-quality ZnO thin films prepared by two-step thermal oxidation of the metallic Zn

In this paper, we report the preparation of nanocrystalline ZnO thin films on Si (1 0 0) substrates using a simple method, in which a resistive thermal evaporation of Zn and a two-step annealing process were employed. The aim of the first annealing step in an oxygen ambient at 300°C for 2 h is to form ZnO layers on the surface of the Zn films to prevent the diffusion of the metallic Zn from the films during the high-temperature annealing process. To obtain high-quality ZnO films, a high-temperature annealing step was performed at temperature in the range of 600–900°C. The effects of the annealing temperature on the photoluminescence (PL) and orientation of ZnO nanocrystalline thin films were studied. A very strong near-band-edge emission around 375 nm with a full-width at half-maximum of 105 meV and a relatively weak emission around 510 nm related to deep-level defects were observed, which indicated that high-quality ZnO films have been obtained.     

Growth of Eu-doped GaN by gas source molecular beam epitaxy and its optical properties

Eu-doped GaN with various Eu concentrations were grown by gas source molecular beam epitaxy, and their structural and optical properties were investigated. With increasing Eu concentration from 0.1 to 2.2 at%, deterioration of the structural quality was observed by reflection high-energy electron diffraction, atomic force microscopy and X-ray diffraction. Such a deterioration may be caused by an enhancement of island growth and formation of dislocations. On the other hand, room temperature photoluminescence spectra showed red emission at 622 nm due to an intra-atomic f–f transition of Eu³⁺ ion and Fourier transform infrared spectra indicated an absorption peak at about 0.37 eV, which may be due to a deep defect level. The intensity of the red luminescence and the defect-related absorption peak increased with increasing Eu concentration, and a close correlation in the increasing behavior was observed between them. These results suggest that the deep defect level plays an important role in the radiative transition of Eu³⁺ ion in GaN and the optical process for the luminescence at 622 nm was discussed with relation to the defect.     

Surface analysis of different oriented GaAs substrates annealed under bismuth flow

Several orientations of GaAs substrates, including (1 0 0), (4 1 1), (1 1 1) and (5 1 1) have been annealed in a metalorganic vapour phase epitaxy (MOVPE) horizontal reactor at different annealing temperatures and under different trimethyl-bismuth (TMBi) flux. Surface morphology of the annealed GaAs substrates was investigated by means of scanning electron microscopy (SEM) and atomic force microscopy (AFM). The results show islands formation on all the studied samples. The density and size of Bi islands vary greatly with annealing temperature and TMBi flow. For different substrate orientations, the activation energies were deduced from Arrhenius plot of island density. Except for (5 1 1) oriented GaAs, all the studied orientations show the same activation energy of 1.8 eV. For low annealing temperature 420 °C, and under different Bi flux, each oriented substrate shows a specific behaviour. For higher temperatures 700 °C and above Bi islands are totally removed and the substrates are smooth. Surface change of (1 0 0) oriented GaAs substrate was in situ monitored by laser reflectometry.     

Excitation intensity and temperature‐dependent photoluminescence and optical absorption in Tl4Ga3InSe8 layered crystals

Photoluminescence (PL) spectra of Tl₄Ga₃InSe₈ layered crystals grown by Bridgman method have been studied in the wavelength region of 600‐750 nm and in the temperature range of 17‐68 K. A broad PL band centered at 652 nm (1.90 eV) was observed at T = 17 K. Variations of emission band has been studied as a function of excitation laser intensity in the 0.13 to 55.73 mW cm^‐2 range. Radiative transitions from donor level located at 0.19 eV below the bottom of conduction band to shallow acceptor level located at 0.03 eV above the top of the valence band were suggested to be responsible for the observed PL band. From X‐ray powder diffraction and optical absorption study, the parameters of monoclinic unit cell and the energy of indirect band gap were determined, respectively. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Optical probing of low-pressure solution grown GaN crystal properties

The structural and optical properties of self-nucleated crystals grown by a near atmospheric pressure solution growth method are presented. High-resolution room temperature Raman scattering studies demonstrate that stress-free crystals with low free-electron background have been produced. Low and room temperature photoluminescence experiments confirm the presence of shallow donors and an unknown shallow acceptor. Large relative intensity variations of the emission bands assigned to recombination process involving donors and acceptor, resulting from significant changes in the incorporation and/or activation of defect associated with each recombination channel, reflect major changes in the intrinsic material properties.     

MgO相分离对MgxZn1-xO纳米粉体结构和光学性能的影响

采用溶胶-凝胶法制备了MgxZn1-xO(x=0,0.1,0.2,0.3,0.4,0.5)纳米粉体。X射线衍射谱表明:在较高的温度(850℃以上)下退火,MgxZn1-xO纳米粉体从单一的纤锌矿结构相中分离出MgO相的掺杂浓度x约为0.13,且随着x的增加,MgO相含量呈指数型增长。室温光致发光谱显示:MgO相分离对紫外与绿光发射的相对强度有直接的影响,随着MgO相分离的出现,紫外发光峰蓝移,并随着MgO相的增加,紫外发光峰的强度受抑,绿光发光峰变强。样品的室温透过率显示:MgxZn1-xO的禁带宽度在x=0.1时达到最大值并受MgO相分离的影响而减小。     

Distribution of oxidation states of Cr ions in Ca or Ca/Mg co-doped Cr:Y3Al5O12 single-crystal fibers with nitrogen or oxygen annealing environments

The valence states of Cr ions in Ca or Ca/Mg co-doped Cr:Y₃Al₅O₁₂ (YAG) single-crystal fibers are studied. The fibers were grown using the laser-heated pedestal growth method, followed by annealing treatments up to 1500 °C. The concentrations of the Cr³⁺ and Cr⁴⁺ ions in octahedral and tetrahedral sites in oxygen or nitrogen environments were characterized. Above 700 °C, migration of Cr⁴⁺ between octahedral and tetrahedral sites takes place; its relative stabilization energy was estimated. For Ca,Cr:YAG annealed in an oxygen or nitrogen environment, it was 0.25 and 0.3 eV, respectively. For Mg,Ca,Cr:YAG annealed in oxygen or nitrogen, it was 0.47 and 0.49 eV, respectively. For the Ca,Cr:YAG crystal fiber (Ca/Cr=113.1%) with oxygen annealing, about 35% and 2.5% of Ca ions took part in charge compensation for Cr⁴⁺ in the octahedral and tetrahedral sites, respectively. The density of oxygen vacancies depends on the concentration of Ca ions. The estimated ratios of the unreacted oxygen vacancies to total oxygen vacancies were about 63% and 88% for oxygen and nitrogen annealing, respectively. The main limitation on the concentration of Cr⁴⁺ in the tetrahedral site of YAG is the presence of unreacted oxygen vacancies.     

Growth and optical properties of high-density InN nanodots

High density InN/GaN nanodots were grown by pulsed mode (PM) metal–organic chemical vapor deposition (MOCVD). InN nanodots density of up to ∼5×10¹⁰ cm⁻² at a growth temperature of 550 °C was achieved. The high diffusion activation energy of 2.65 eV due to high NH₃ flow rate generated more reactive nitrogen adatoms on the growth surface, and is believed to be the main reason for the growth of high density InN nanodots. In addition, an anomalous temperature dependence of the PL peak energy was observed for high density InN nanodots. The high carrier concentration, due to high In vacancy (V_In) in the InN nanodots, thermally agitated to the conduction band. As the measurement temperature increased, the increase of Fermi energy resulted in blue-shifted PL peak energy. From the Arrhenius plot of integrated PL intensity, the thermal activation energy for the PM grown InN nanodots was estimated to be E_a∼51 meV, indicating strong localization of carriers in the high density InN nanodots.     

Synthesis and characterization of PbSe and PbSe/PbS core–shell colloidal nanocrystals

A new colloidal procedure, for the synthesis of PbSe and PbSe/PbS core–shell semiconductor nanocrystals (NCs), is reported. The synthesis includes the reaction between tributyl-phosphine selenium and lead 2-ethyl-hexanoate, under inert gas at room temperature. High-resolution transmission electron microscopy (HRTEM), X-ray energy dispersive spectroscopy (EDS), absorption and photoluminescence (PL) spectroscopy were used to characterize the samples. The EDS and HRTEM confirmed the existence of rock-salt cubic structures of the PbSe. Furthermore, the HRTEM showed the formation of PbSe/PbS core–shell structures, with epitaxial shell layer with thickness varying between 1 and 4 ML. The absorption spectra of these materials exhibited distinct transitions, related to the e1–h1, e2–h2 and e2–h3 and e2–h1 transitions. These bands are blue shifted with decrease in the NCs diameter. However, the e1–h1 is slightly red shifted with increase in the PbS shell thickness. The last effect can be due to an electronic mixing of the PbSe and PbS conduction states. The PL measurements showed a substantial increase of the exciton emission in the core–shell structures, arising by an efficient chemical passivation of the PbSe core.     

New dopant precursors for n-type and p-type GaN

Tetraethylsilane (TeESi) and bis(ethylcyclopentadienyl)Mg (ECp₂Mg) were employed as Si and Mg dopant precursors for MOVPE growth of n-type and p-type GaN films, respectively. In Si doping, the electron concentration was observed to increase with the increase of the TeESi flow rate. The temperature dependence of the Hall mobility showed good agreement with n-type GaN films grown using different dopant precursors (SiH₄, GeH₄, Si₂H₆). The donor activation energy was estimated to be 27 meV, which is almost the same as the literature values. In Mg doping, we also found that the Mg concentration increases as the ECp₂Mg flow rate increases. All of Mg-doped samples in this study showed p-type conduction after annealing. The acceptor activation energy was estimated to be 170 meV, which was close to the reported values.     

Multiple-step annealing for 50% enhanced p-conductivity of GaN

In this article, multiple-step rapid thermal annealing (RTA) processes for the activation of Mg doped GaN are compared with conventional single-step RTA processes. The investigated multiple-step processes consist of a low temperature annealing step at temperatures between 350°C and 700°C with dwell times up to 5 min and a short time high temperature step. With optimized process parameters, and multiple-step processes, we achieved p-type free carrier concentrations up to 1–2×10¹⁸ cm⁻³. The best achieved conductivity, so far, lies at 1.2 Ω⁻¹ cm⁻¹. This is a 50% improvement compared to conventional single-step process at 800°C, 10 min.     

Crystal growth of PbFCl by modified Bridgman method

Lead fluoride chloride (PbFCl) crystal was grown by modified Bridgman method. The result of X-ray powder diffraction pattern (XRD) was well accordant with the data of JCPDS card. The transmittance spectrum was first reported without absorption band from 270 to 800 nm. Three emission bands were first observed at room temperature when excited by ultraviolet light.