Substrate effects on the oxygen gas sensing properties of SnO2/TiO2 thin films

In this study, SnO₂/TiO₂ thin films are fabricated on SiO₂/Si and Corning glass 1737 substrates using a R.F. magnetron sputtering process. The gas sensing properties of these films under an oxygen atmosphere with and without UV irradiation are carefully examined. The surface structure, morphology, optical transmission characteristics, and chemical compositions of the films are analyzed by atomic force microscopy, scanning electron microscopy and PL spectrometry. It is found that the oxygen sensitivity of the films deposited on Corning glass 1737 substrates is significantly lower than that of the films grown on SiO₂/Si substrates. Therefore, the results suggest that SiO₂/Si is an appropriate substrate material for oxygen gas sensors fabricated using thin SnO₂/TiO₂ films.     

Development of gel polymer electrolytes for application in quantum dot-sensitized solar cells

A methylcellulose–polysulfide gel polymer electrolyte has been prepared for application in quantum dot-sensitized solar cells (QDSSCs) having the configuration FTO/TiO₂/CdS/ZnS/SiO₂/electrolyte/Pt(cathode). The electrolyte with the composition of 30.66 wt.% methylcellulose, 67.44 wt.% Na₂S, and 1.90 wt.% sulfur exhibits the highest conductivity of 0.183 S cm^?1 with the lowest activation energy of 6.14 kJ mol^?1. CdS quantum dot sensitizers have been deposited on TiO₂ film via the successive ionic layer absorption and reaction (SILAR) method. The QDSSC fabricated using the highest conducting electrolyte and CdS QD prepared with five SILAR cycles exhibits a power conversion efficiency (PCE) of 0.78%. After deposition of zinc sulfide (ZnS) and silicon dioxide SiO₂ passivation layers, the PCE of the QDSSC with photoanode arrangement of TiO₂/CdS(5)/ZnS(2)/SiO₂ increased to 1.42%, an improvement in performance by 82%.     

Au/(SiO2/Si/SiO2)纳米双势垒/n+-Si结构的电致发光研究

利用射频磁控溅射方法,在n⁺-Si衬底上淀积SiO₂/Si/SiO_{2纳米双势垒单势阱结构,其中Si层厚度为2至4nm,间隔为0.2nm,邻近n⁺-S i衬底的SiO2层厚度固定为1.5nm,另一SiO2层厚度固定为3nm.为了 对比研究,还制备了Si层厚度为零的结构,即SiO2(4.5nm)/n⁺-Si 结构.在经过600℃氮气下退火30min,正面蒸上半透明Au膜,背面也蒸Au作欧姆接触后,所 有样品都在反向偏置(n^＋-Si的电压高于Au电极的电压)下发光,而在正向偏压 下不发光.在一定的反向偏置下,电流和电致发光强度都随Si层厚度的增加而同步振荡,位 相相同.所有样品的电致发光谱都可分解为相对高度不等的中心位于2.26eV(550nm)和1.85eV (670nm)两个高斯型发光峰.分析指出该结构电致发光的机制是：反向偏压下的强电场使Au/( SiO2/Si/SiO2)纳米双势垒/n⁺-Si结构发生了雪崩击穿 ,产生大量的电子-空穴对,它们在纳米SiO2层中的发光中心(缺陷或杂质)上复 合而发光. 关键词： 电致发光 纳米双势垒 高斯型发光峰 雪崩击穿}     

Structural and optical properties of Si/SiO2 multi-quantum wells

Structural and optical properties of Si/SiO₂ multi-quantum wells (MQW) were investigated by means of Raman scattering and photoluminescence (PL) spectroscopy. The MQW structures were fabricated on a quartz substrate by remote plasma enhanced chemical vapour deposition (RPECVD) of alternating amorphous Si and SiO₂ layers. After layer deposition the samples were subjected to heat treatments, i.e. rapid thermal annealing (RTA) and furnace annealing. Distinct PL signatures of confined carriers evidenced formation of Si-nanocrystals (nc-Si) in annealed samples. Analyses of Raman spectra also show presence of nc-Si phase along with amorphous-Si (a-Si) phase in the samples. The strong influence of the annealing parameters on the formation of nc-Si phase suggests broad possibilities in engineering MQW with various optical properties. Interestingly, conversion of the a-Si phase to the nc-Si phase saturates after certain time of furnace annealing. On the other hand, thinner Si layers showed a disproportionately lower crystalline volume fraction. From the obtained results we could assume that an interface strain prevents full crystallization of the Si layers and that the strain is larger for thinner Si layers. The anomalous dependence of nc-Si Raman scattering peak position on deposited layer thickness observed in our experiments also supports the above assumption.     

Omni-directional reflectors for deep blue LED using symmetric autocloning method

Omni-directional reflectors (ODRs) for deep blue LED were designed and fabricated using symmetric autocloning method. The symmetric stack multi-layers for the reflectors were designed by finite-difference time-domain simulation. The fabricating process of ODR is combined with the techniques of anodic aluminum oxide (AAO) process and autocloning method. The two-dimensional structure template of nano-channel array was grown using AAO with the period of 150 nm. Then the shaping layer was deposited on the AAO template by evaporation deposition. Besides, the ion etching was applied to modify the apex angle to the triangle shape at 100°. Finally, the sub/(0.5TiO₂ SiO₂ 0.5TiO₂)⁸ multi-layer stack was deposited on the shaping layer using autocloning method to achieve the ODR. The results show the reflective spectra of ODR at the incident angles of 0, 30, 45, and 60° had high values within the range 400–450 nm. Besides, the central wavelength shifting is not obvious which is very good for keeping the color of LED stable.     

Luminescent silicon nanocrystal dots fabricated by SiCl4/H2 RF plasma-enhanced chemical vapor deposition

Luminescent nanocrystalline Si dots were fabricated directly on thermally grown SiO₂ at 120°C by conventional RF plasma-enhanced chemical vapor deposition using tetrachlorosilane, SiCl₄ and H₂. As-deposited Si dot exhibits photoluminescence (PL) in the visible region, consisting of two broad bands corresponding to photon energies of 1.38 and 1.48 eV. Storage in air enhances PL and shifts the PL peak energy to higher wavelengths for dots of diameter less than 10 nm. Fourier transform attenuated total reflection absorption spectroscopy (FTIR-ATR) study reveals that the spontaneous oxidation proceeds until saturation after 70 h at dot sizes of 3–5 nm. The relationship between PL intensity, blueshift of PL peak energy, and surface termination species during oxidation indicates that these changes are attributed to the increased density of radiative centers at the Si nanocrystal dot/SiO₂ interface and enhancement of the quantum confinement effect.     

Laser induced formation of periodic nanostructures in silicon covered by SiO2

Three-dimensional (3D) and two-dimensional (2D) periodic silicon nanostructures formed by polarized focused Nd:YAG laser irradiation (532 nm) with spot size less than 3 μm on Si covered by SiO₂ are presented in this paper. We observed that at a low laser intensity I range, from I=0.9 to 1.08 W, 2D periodic coexisting of liquid and solid exists, while for 1.08<I<1.44 W, 3D periodic ripples were formed. However, when the light intensity is out of those ranges, either no melting was created (I<0.9 W) or the periodicity was destroyed (I>1.44 W). The periodicity of these periodic structures is 359 nm related to the wavelength of frequency doubledNd:YAG laser and the index of refraction of SiO₂. We propose a model based on the fact that as the oxygen is diffusing locally from SiO₂ into the melted Si, thus forming SiO_β with a lower melting point, successive pulses melt preferentially these regions giving rise to a positive feedback. This dynamic nanoscale modeling, based on variations of melting points of Si and dielectric and reflection coefficient, confirms the experimental results. PACS 81.07.–b; 81.10.Fq; 61.80.Ba; 66.10.Cb     

Investigation on preparation and physical properties of nanocrystalline Si/SiO2 superlattices for Si-based light-emitting devices

Structures containing silicon nanocrystals (nc-Si) are very promising for Si-based light-emitting devices. Using a technology compatible with that of silicon, a broader wavelength range of the emitted photoluminescence (PL) was obtained with nc-Si/SiO₂ multilayer structures. The main characteristic of these structures is that both layers are light emitters. In this study we report results on a series of nc-Si/SiO₂ multilayer periods deposited on 200 nm thermal oxide SiO₂/Si substrate. Each period contains around 10 nm silicon thin films obtained by low-pressure chemical vapour deposition at T=625°C and 100 nmSiO₂ obtained by atmospheric pressure chemical vapour deposition T=400°C. Optical and microstructural properties of the multilayer structures have been studied by spectroscopic ellipsometry (using the Bruggemann effective medium approximation model for multilayer and multicomponent films), FTIR and UV–visible reflectance spectroscopy. IR spectroscopy revealed the presence of SiO_x structural entities in each nc-Si/SiO₂ interface. Investigation of the PL spectra (using continuous wave-CW 325 nm and pulsed 266 nm laser excitation) has shown several peaks at 1.7, 2, 2.3, 2.7, 3.2 and 3.7 eV, associated with the PL centres in SiO₂, nc-Si and Si–SiO₂ interface. Their contribution to the PL spectra depends on the number of layers in the stack.     

Photoluminescence in amorphous (PbLa)TiO3 thin films deposited on different substrates

Pb_1−XLa_XTiO₃ thin films, (X=0.0; 13 and 0.27 mol%) were prepared by the polymeric precursor method. Thin films were deposited on Pt/Ti/SiO₂/Si (1 1 1), Si (1 0 0) and glass substrates by spin coating, and annealed in the 200-300°C range in an O₂ atmosphere. X-ray diffraction, scanning electron microscopy and atomic force microscopy were used for the microstructural characterization of the thin films. Photoluminescence (PL) at room temperature has been observed in thin films of (PbLa)TiO₃. The films deposited on Pt/Ti/SiO₂/Si substrates present PL intensity greater than those deposited on glass and silicon substrates. The intensity of PL in these thin films was found to be dependent on the thermal treatment and lanthanum molar concentration.     

Effects of LaNiO<Subscript>3</Subscript> on the structures and properties of SrBi<Subscript>2</Subscript>Ta<Subscript>2</Subscript>O<Subscript>9</Subscript> thin films

SrBi₂Ta₂O₉(SBT)/LaNiO₃(LNO)/Si and SBT/Pt/TiO₂/SiO₂/Si multilayers were fabricated by pulsed laser deposition. With Pt top electrodes, the measured remanent polarization (2P_r) of Pt/SBT/LNO/Si and Pt/SBT/Pt/TiO₂/SiO₂/Si capacitors was 6.5 C/cm² and 5.2 C/cm², respectively. Using LNO as both bottom electrodes and buffer layers, enhanced non-c-axis crystalline SBT films were induced, which resulted in a 2P_r greater than that of the Pt/SBT/Pt/TiO₂/SiO₂/Si capacitor. The hysteresis loop of the Pt/SBT/LNO/Si capacitor showed a great external-field-dependent horizontal shift. Using an electron-injection model, this dependence was addressed. The fatigue-free property of the Pt/SBT/LNO/Si capacitor was experimentally established, in that the non-volatile polarization decreased by less than 5% of the initial value after 1.44×10⁹ switching cycles . PACS 77.84.Dy; 68.65.+g     

Woodpile photonic crystals composed of air columns

Silicon-based woodpile photonic crystals (PhCs) composed of air columns have a large gap/midgap ratio exceeding 20% over a wide dimensional range of the cross section of the air column when the cross section is deformed to a rectangular shape extended normal to the stacking direction. Such a PhC structure can be formed using a simple technique based on 45° dry etching. Furthermore, introducing twin air columns with small cross sections instead of corresponding mother air columns yields a defect state at the region where the columns cross. Since the fabrication process is a planar-type Si wafer process, fabricated PhCs can be easily combined with conventional electronic circuits and optical elements, such as Si waveguides and switches.     

Optical properties investigation of [nc-Si:SiO2/SiO2]30 periodic multilayer films

The optical properties of 30-layer [nc-Si:SiO₂/SiO₂]₃₀ periodic films have been studied. The films were prepared by alternately evaporating SiO and SiO₂ onto Si(100) substrates, followed by annealing at 1100?^°C. Spectroscopic ellipsometry spectrum analysis was used to determine the optical constants of the samples via the Forouhi?CBloomer model. The optical bandgap of a single periodic film is calculated. The photoluminescence (PL) spectra of three samples with different thicknesses clearly show that there are two physical origins of the PL process.     

Growth of one-dimensional Ag/Si/SiOx capsule nanostructures by self-assembled SiOx template

One-dimensional Ag/Si/SiO_x capsule nanostructures have been synthesized by thermal evaporation of the mixture of SiO and Ag₂O. Products were analyzed by using SEM, TEM, HREM and element map. Two kinds of morphologies were observed. Inside the amorphous SiO_x shell, Ag nanowires interspersed by short segments of Si were formed when Ag content was higher than Si. Ag and Si contacted well and nanosize MS (metal-semiconductor) structures were obtained. One-dimensional periodic nanostructures that Ag particles embedded in the nanowire were synthesized when Si content was higher than Ag. SiO_x nanotubes were also observed. Structure analysis shows that Ag/Si/SiO_x nanostructures are grown by a self-assembled SiO_x template mechanism. And the growth of SiO_x nanotubes is tightly related to the adding of Ag. PACS 81.07.Bc; 81.10.Bk; 61.14.-x     

Light Trapping and Down‐Shifting Effect of Periodically Nanopatterned Si‐Quantum‐Dot‐Based Structures for Enhanced Photovoltaic Properties

Periodically nanopatterned Si structures have been prepared by using a nanosphere lithography technique. The formed nanopatterned structures exhibit good anti‐reflection and enhanced optical absorption characteristics. The mean surface reflectance weighted by AM1.5 solar spectrum (300–1200 nm) is as low as 5%. By depositing Si quantum dot/SiO₂ multilayers (MLs) on the nanopatterned Si substrate, the optical absorption is higher than 90%, which is significantly improved compared with the same multilayers deposited on flat Si substrate. Furthermore, the prototype n‐Si/Si quantum dot/SiO₂ MLs/p‐Si heterojunction solar cells has been fabricated, and it is found that the external quantum efficiency is obviously enhanced for nanopatterned cell in a wide spectral range compared with the flat cell. The corresponding short‐circuit current density is increased from 25.5 mA cm^?2 for flat cell to 29.0 mA cm^?2 for nano‐patterned one. The improvement of cell performance can be attributed both to the reduced light loss and the down‐shifting effect of Si quantum dots/SiO₂ MLs by forming periodically nanopatterned structures.     

Design,fabrication and optical characterization of GaAs photonic crystal nanocavity lasers with InAs quantum dots gain wafer-bonded onto Si substrates

We designed and fabricated III–V compound semiconductor two-dimensional photonic crystal (PhC) thin film slabs with quantum dots (QDs) inside formed on Si substrates for highly integrated silicon photonic circuits with built-in nanolasers. Defect-shifted L3 type PhC nanocavities formed in GaAs thin films embedding 1.3 μm-emitting InAs QDs layer-transferred onto Si substrates were investigated. Quality factors <1000 for the PhC nanocavities on SiO₂ were enhanced up to ∼8000 by removing SiO₂ to form air-bridge structures, resulting in room temperature, continuous wave lasing.     

Hydrogenation effect on enhancement of photoluminescence of Er and Si nanocrystallites in Er-doped SiO2 synthesized by laser ablation

Significant enhancement of photoluminescence (PL) was attained for Er ions and Si nanocrystallites (nc-Si) in SiO₂ films by two kinds of hydrogenation, using H₂ molecules or H atoms. Er-doped SiO₂ films containing Er impurities and a high density of nc-Si were fabricated by laser ablation of Er films deposited on Si substrate in an O₂ gas atmosphere, followed by annealing at high temperatures in flowing Ar gas. Hydrogenation at 300–500 °C was found to effectively increase the PL intensity of Er ions as well as that of nc-Si. In particular, the hydrogen atom treatment dramatically shortens the hydrogenation time for the enhancement of Er PL compared to the hydrogen molecule treatment. Spectra of electron spin resonance showed a decrease in residual defects, namely, P_b-type defects located at the interfaces between nc-Si and SiO₂ by hydrogenation. These results clearly show the effectiveness of hydrogen passivation for Si nanostructures; i.e., the increase in the Er PL and nc-Si PL due to hydrogen passivation of the nonradiative recombination centers located at the interfaces between nc-Si and SiO₂. PACS 78.67.Bf; 71.20.Eh; 76.30.Mi; 81.15.Fg     

Size control of Si nanocrystals by two-step rapid thermal annealing of sputtered Si-rich oxide/SiO2 superlattice

Controllable size of silicon (Si) nanocrystals can be achieved by a two-step rapid thermal annealing technique consisting of rapid annealing at 1000°C in nitrogen ambient and rapid oxidation at 600–800°C of a radio frequency magnetron co-sputtered Si-rich oxide/SiO₂ superlattice structure. The photoluminescence (PL) spectra related to Si nanocrystals were observed in the visible range (600–900 nm). After rapid oxidation, the size of the nanocrystals was reduced and the quality of the Si nanocrystal/SiO₂ interface was improved, resulting in a blue shift and an increase of the PL peak intensity. Finally, annealing in air increases the PL intensity further.     

非晶Si/SiO2超晶格结构的交流电致发光

设计并用磁控溅射方法制备了非晶Si/SiO     

溶胶-凝胶法Er2O3薄膜的结构和光学特性

针对稀土Er掺杂Si光源中Er离子掺杂浓度低的问题,采用溶胶-凝胶（Sol-gel）法在Si(100)和SiO2/Si(100)基片上旋涂法制备Er₂O₃光学薄膜,Er离子浓度与以前掺杂方法相比提高了2个数量级.900 ℃热处理获得单一立方结构的Er₂O₃薄膜材料.光致发光（PL）特性研究表明在654 nm波长的激光泵浦下,Er₂O₃薄膜材料获得了1.535 μm的发光峰,并具有较小的温度猝灭1/5.在SiO₂/Si(100)基体上制备的Er2O3薄膜材料的光致发光强度比Si(100)基体上制备的薄膜提高2-3倍.研究结果表明具有强光致发光特性的Er₂O₃薄膜是一种有前景的硅基光源和放大器材料.     

One-dimensional comparison of Tio2/SiO2 and Si/SiO2 photonic crystals filters for thermophotovoltaic applications in visible and infrared

In this paper, two photonic crystal structures composed of Si/SiO₂ and TiO₂/SiO₂are optimized and compared for potential use as thermophotovoltaic (TPV) optical filters. The performance of the proposed one-dimensional structures comprises eight periods each. The infrared radiation included is in the wavelength range of 300 nm to 900 nm for the visible and from 800 nm to 2000 nm for the infrared. The limiting temperature of the system is 2000 K. The transfer matrix method is used to analyze the behavior of the frequency for a structure comprising a layer of defects. This method permitted to observe the behavior of the peak of light transmission when the period and angle of incidence change. We have subsequently found that the band gaps of the Si/SiO₂structure were wider than those of the TiO₂/SiO₂structure.