Determination of Thermal Parameters of Vanadium Oxide Uncooled Microbolometer Infrared Detector

Vanadium oxide thin films are the potential candidates for uncooled microbolometers due to their high temperature coefficient of resistance (TCR) at room temperature. A 2D array of 10-element test microbolometer without air-gap thermal isolation structure was fabricated with pulsed laser deposited vanadium oxide as IR sensing layer for the first time. Infrared responsivity of the uncooled microbolometer was evaluated in the spectral region 8-15 m. The device exhibits responsivity of about 12 V/W at 30 Hz chopper frequency for 20 A bias current. Thermal time constant (), Thermal conductance (G) and thermal capacitance (C) are the thermal parameters characterize the performance of the uncooled microbolometer infrared detectors are determined as 15 ms, 10^-3 W/K and 3.5 × 10^-5 J/K respectively. The influence of the thermal parameters on the performance of the microbolometer is discussed.     

Micromachined Uncooled IR Bolometer Linear Array Using VO2 Thin Films

Mixed vanadium oxide thin films, as VO₂ for the main composition are materials for uncooled microbolometer due to their high temperature coefficient of resistance (TCR) at room temperature. This paper describes the design and fabrication of 8-element linear array IR uncooled microbolometers using the films and micromachining technology. The characteristics of the array is investigated in the spectral region of 8–12 m. The fabricated detectors exhibit responsivity of up to 10 KV/W, typical detectivity of 1.89×10⁸ cmHz^1/2/W, and thermal time constant of 11 ms, at 296 K and at a frequency of 30 Hz. Furthermore, The uncorrected response uniformity of the linear array bolometers is less than 20%.     

The microstructures and electrical properties of Y-doped amorphous vanadium oxide thin films

One of promising approaches for further improving the sensitivity of microbolometer arrays with greatly-reduced pixel size is using the thermal-sensitive materials with higher performance. In this paper, Y-doped vanadium oxide (VO_x) thin films prepared by a reactively sputtering process exhibit enhanced performance for the microbolometer application compared with frequently-applied VO_x thin films. Both undoped and Y-doped VO_x thin films are amorphous due to the relatively low deposition temperature. Y-doped VO_x thin films exhibit smoother surface morphology than VO_x due to the restrained expansion of particles during depositions. Y-doping increases the temperature coefficient of resistivity by over 20% for the doping level of 1.30 at%. The change rate of resistivity, after aging for 72 h, of thin films was reduced from about 15% for undoped VO_x to 2% due to the introduction of Y. Moreover, Y-doped VO_x thin films have a low 1/f noise level as VO_x ones. Y-doping provides an attractive approach for preparing VO_x thermal-sensitive materials with enhanced performance for microbolometers.     

Growth of β-FeSi2 thin film on textured silicon substrate for solar cell application

(2 0 2)/(2 2 0)-oriented epitaxial β-FeSi₂ thin films were deposited on textured Si (1 0 0) substrate by magnetron sputtering. The influences of thickness and annealing temperature on the β-FeSi₂ crystallization were studied to find the optimal condition. The results of surface morphology and optical property measurements showed that the inverted pyramid array in the surface of β-FeSi₂ thin films could reduce the surface reflection of β-FeSi₂. In dark condition, the β-FeSi₂/textured-Si heterojunction showed diode property with rectifying ratio of 2.89 × 10⁵ and built-in potential of 0.58 V. These results indicated the potential application of textured Si substrate in β-FeSi₂ solar cells.     

基于VO2薄膜非致冷红外探测器光电响应研究

VO₂薄膜是非致冷微测辐射热红外探测器热敏电阻材料.研究中应用微电子工艺制备了VO₂溅射薄膜红外探测器,在296K的环境中测试了该探测器在不同的直流偏置、光调制频率下对873K标准黑体源8—12μm红外辐射的光电响应以及器件的噪声电压,在10和30Hz的调制频率下其响应率分别大于17kV/W和接近10kV/W.该探测器实现了探测率D大于1.0×10⁸cm (Hz)^1/2/W,热时间常量为0.011s的8—12μm非致冷 关键词： 非致冷测辐射热探测器 红外探测器 二氧化钒 薄膜     

Electrochemical and structural properties of MoO3–V2O5 nanocomposite thin film electrodes for lithium rechargeable batteries

We have investigated the electrochemical properties of V₂O₅-based thin film electrodes as a function of the amount of MoO₃ by means of X-ray diffraction (XRD), X-ray photoemission spectroscopy (XPS), and transmission electron microscopy (TEM). XRD results show that the V₂O₅-based thin film electrodes give an amorphous characteristic. XPS results reveal the formation of V₂O₅ and MoO₃ phases. TEM results show that MoO₃ dots (5–30 nm in size) are embedded in the amorphous V₂O₅ matrix. It is further shown that cells fabricated with the MoO₃–V₂O₅ nanocomposite thin film electrodes give better cycling performance than those made with the single V₂O₅ thin film electrodes. A possible explanation for the MoO₃ nano-dot dependence on the cycling performance of the V₂O₅-based thin film electrodes is described.     

Development and integration of near atmospheric N2 ambient sputtered Au thin film for enhanced infrared absorption

The exceedingly fragile nature of thermally grown Au-black coating makes handling and patterning a critical issue. Infrared absorption characteristics of near atmospheric, N₂ ambient DC sputtered Au thin films are studied for this purpose. The thin Au films are sputtered at different chamber pressures in Ar and N₂/Ar gas ambient from 4.5 to 8.0 mbar and optimized for enhanced infrared absorption. The absorber film sputtered in N₂/Ar ambient at 8.0 mbar chamber pressure offers significant absorption of medium to long wave infrared radiations. The micro-patterning of sputtered Au thin film is carried out by using conventional photolithography and metal lift off methods on a prefabricated µ-infrared detector array on Si (1 0 0) substrate. The steady state temperature response of sputtered film has been examined using nondestructive thermal imaging method under external heating of the detector array.     

Fabricating Microbolometer Array on Unplanar Readout Integrated Circuit

In this paper, the integration of an experimental 32 × 32 uncooled IR microbolometer array with an unplanar CMOS Readout Integrated Circuit (ROIC) is presented. A vanadium oxide film fabricated by low temperature reactive ion beam sputtering is utilized as thermal-sensitive material in the bolometric detectors Before the integration, the unplanar ROIC for commercial use is first planarized by bisbenzocyclobutene film, then a electroless nickel-plating on ohmic contact areas is accomplished. Finally the bolometer array is fabricated using a micromachining process, which is completely compatible with CMOS technology. Measurements and calculations for the as-fabricated samples show that the responsivity of 1.4 × 10⁴ V/W and the detectivity of 2.1 × 10⁸cmHz^1/2W^–1 and a thermal response time of 10ms are obtained at a pulse bias of IV.     

A DEMONSTRATION OF 1×8 LINEAR ARRAY YBCO TRANSITION EDGE IR BOLOMETER

A high-T_c superconducting array microbolometer has been fabricated by using a YBCO film. Optical measurements gave moderate performance as individual detector, but singnificant improverment appears possible.     

二氧化钒薄膜的低温制备及其性能研究

针对VO₂薄膜在微测辐射热计上的应用，采用射频反应溅射法，在室温下制备氧化钒薄膜；研究了氧分压对薄膜沉积速率、电学性质及成分的影响.通过调节氧分压，先获得成分接近VO₂的非晶化薄膜，再在400℃空气中氧化退火，便可制得高电阻温度系数，低电阻率的VO₂薄膜，电阻温度系数约为-4%/℃，薄膜方块电阻为R_□为100—300kΩ；薄膜在室温下沉积，400℃下退火的制备方法与微机电加工(micro electromechanic 关键词： 二氧化钒 电阻温度系数 氧分压 射频反应溅射法     

Effects of heavy-ion irradiation on the electrical properties of rf-sputtered HfO2 thin films for advanced CMOS devices

HfO₂-based metal-oxide semiconductor (MOS) capacitors were irradiated with high-energy ion beam to study the irradiation effects in these films. HfO₂ thin films deposited by radio frequency (rf)-sputtering were irradiated with 80 MeV O⁶⁺ ions. The samples were irradiated and characterized at room temperature. Devices were characterized via 1 MHz capacitance–voltage (C?V) measurements using the midgap method. The irradiation induced dispersion in accumulation and depletion regions with increasing fluence is observed. After irradiation, the midgap voltage shift (Δ V _mg) of?0.61 to?1.92 V, flat band voltage shift (Δ V _fb) of?0.48 to?2.88 V and threshold voltage shift (Δ V _th) of?0.966 to?1.96 V were observed. The change in interface trap charge and oxide trap charge densities after 80 MeV O⁶⁺ ions irradiation with fluences were determined from the midgap to flat band stretch out of C?V curves. The results are reported and explained in terms of changes in microstructure and dielectric properties of the HfO₂ thin films after irradiation.     

α-SiN:H薄膜的光学声子与VO2基Mott相变场效应晶体管的红外吸收特性

从器件构成材料中α-SiN:H，VO₂，Al薄膜介电常数弥散特性的Lorentz多谐振模型出发，研究了器件在金属表面等离子体与VO₂，特别是α-SiN:H薄膜光学声子共同作用下的红外吸收特性；得到了在不同的光谱范围器件的红外吸收特性随着α-SiN: H钝化层几何厚度的变化关系，与中心工作波长10μm对应的且经过位相修正以后钝化层的几何厚度为λ/4n时的红外吸收光谱、以及VO₂的相变对吸收光谱的影响. 关键词： 红外吸收特性 Mott相变 场效应晶体管 二氧化钒     

A new 1223-type high Tc cuprate (Tl,V) Sr2Ca2Cu3O9

A new 1223-type (Tl, V)-based superconducting layered cuprate (Tl_1–x V _x ) Sr₂Ca₂Cu₃O₉ withx=0.25 and 0.50 has been successfully synthesized in the nearly-pure form and identified by powder X-ray diffration analyses. An excessive quantity of Tl is necessary for the preparation of the (Tl, V)-based 1223-type compound. Resistance and ac susceptibility measurements showed that the new (Tl, V)-based 1223 cuprate exhibits T_c above 110 K.     

Field electron emission from HfNxOy thin films deposited by direct current sputtering

HfN_xO_y thin films were deposited on Si substrates by direct current sputtering at room temperature. The samples were characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM) and X-ray diffraction (XRD). SEM indicates that the film is composed of nanoparticles. AFM indicates that there are no sharp protrusions on the surface of the film. XRD pattern shows that the films are amorphous. The field electron emission properties of the film were also characterized. The turn-on electric field is about 14 V/μm at the current density of 10 μA/cm², and at the electric field of 24 V/μm, the current density is up to 1 mA/cm². The field electron emission mechanism of the HfN_xO_y thin film is also discussed.     

Vanadium-Al2O3 nanostructured thin films prepared by pulsed laser deposition: Optical switching

The formation and optical response of VO_x nanoparticles embedded in amorphous aluminium oxide (Al₂O₃) thin films by pulsed laser deposition is studied. The thin films have been grown by alternate laser ablation of V and Al₂O₃ targets, which has resulted in a multilayer structure with embedded nanoparticles. The V content has been varied by changing the number of pulses on the V target. It is found that VO_x nanoparticles with dimensions around 5 nm have been formed. The structural analysis shows that the vanadium nanoparticles are oxidized, although probably there is not a unique oxide phase for each sample. The films show a different optical response depending on their vanadium content. Optical switching as a function of temperature has been observed for the two films with the highest vanadium content, at transition temperatures of about −20 °C and 315 °C thus suggesting the presence of nanoparticles with compositions V₄O₇ and V₂O₅, respectively.     

Effect of varying mixture ratio of raw material powders on the thermoelectric properties of AlMgB14-based materials prepared by spark plasma sintering

Thermoelectric properties of AlMgB₁₄-based materials prepared by spark plasma sintering were investigated. Al, Mg, and B powders were used as raw material powders. The raw powders were mixed using a V-shaped mixer, and then the mixture was sintered at 1673 K or 1773 K. The mixture ratio of raw powders was varied around stoichiometric ratio of AlMgB₁₄. X-ray diffraction patterns of samples showed that all samples consist of AlMgB₁₄ and MgAl₂O₄. The Seebeck coefficient of the samples exhibited significant change depending on the varying mixture ratio and sintering temperature. One sample exhibited a large negative value for the Seebeck coefficient (approximately −500 μV/K) in the temperature range from 573 K to 1073 K, while others showed positive value (250–450 μV/K). Thus n-type AlMgB₁₄-based material has been realized by varying raw material ratio and sintering temperature.     

Electrochemical behaviour of sputtered c-V2O5 and LiCoO2 thin films for solid state lithium microbatteries

Here are reported for the first time electrochemical data on all-solid-state lithium microbatteries using crystalline sputtered V₂O₅ thin films as cathode materials and LiPON as solid electrolyte. The stable specific capacity of 30 µAh/cm² found with a 2.4 µm thick film competes very well with the best values obtained for solid state microbatteries using amorphous films. With the challenge of decreasing the temperature of heat treatment for sputtered LiCoO₂ thin films, we show that a temperature of 500 °C combined with an optimized bias sputtering (-50 V) allows to get highly crystalline deposits, to minimize the presence of Co₃O₄ and to suppress any trace of the cubic phase. At the same time the theoretical specific capacity is reached in the 4.2 V-3 V range and a good cycling behaviour is achieved with a high capacity of 50 µAh/cm²/µm after 140 cycles at 10 µA.cm².     

Influence of MoS2 deposition time on the photocatalytic activity of MoS2/ V,N co-doped TiO2 heterostructure thin film in the visible light region

Electron-hole separation and a narrow band-gap are essential steps to obtain efficient photocatalysis, towards which the use of co-catalysts or co-doped-TiO₂ photocatalysts has become a widely used strategy. In this article, the combination of MoS₂ and co-doping of V, N is the goal to achieve high performance photocatalysts. We synthesized MoS₂/V, N co-doped TiO₂ heterostructure thin film by sol-gel and chemical bath deposition methods. Herein, we investigated the influence of deposition time of MoS₂ layer on visible-photocatalytic activity of the obtained samples. The thin films were characterized by X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy and UV–vis spectroscopy techniques. Visible-photocatalytic activity of these samples were evaluated on the removal of methylene blue (MB) under visible light irradiation. The results show that the aforementioned heterostructure thin films have better photocatalytic activities than those of TiO₂, MoS₂ and V, N co-doped TiO₂ counterparts in visible light region. The mechanism for increasing visible-photocatalytic property of the heterostructure thin films is discussed in detail. We find that MoS₂/V, N co-doped TiO₂ heterostructure thin film at MoS₂ deposition time of 45-min shows the highest photocatalytic performance in the visible light region with MB photodegradation rate about 99% for 150 min and the degradation rate constant is 2.06 times higher than that of V and N co-doped TiO₂ counterpart.     

Structural and electrical properties of (Na0.85K0.15)0.5Bi0.5TiO3 thin films deposited on LaNiO3 and Pt bottom electrodes

(Na_0.85K_0.15)_0.5Bi_0.5TiO₃ thin films were deposited on LaNiO₃(LNO)/SiO₂/Si(1 0 0) and Pt/Ti/SiO₂/Si(1 0 0) substrates by metal-organic decomposition, and the effects of bottom electrodes LNO and Pt on the ferroelectric, dielectric and piezoelectric properties were investigated by ferroelectric tester, impedance analyzer and scanning probe microscopy, respectively. For the thin films deposited on LNO and Pt electrodes, the remnant polarization 2P_r are about 22.6 and 8.8 μC/cm² under 375 kV/cm, the dielectric constants 238 and 579 at 10 kHz, the dielectric losses 0.06 and 0.30 at 10 kHz, the statistic d_33eff values 95 and 81 pm/V. The improved piezoelectric properties could make (Na_1−xK_x)_0.5Bi_0.5TiO₃ thin film as a promising candidate for piezoelectric thin film devices.     

Annealing effects on the structural and electrical transport properties of n-type Bi2Te2.7Se0.3 thin films deposited by flash evaporation

N-type Bi₂Te_2.7Se_0.3 thermoelectric thin films with thickness 800 nm have been deposited on glass substrates by flash evaporation method at 473 K. Annealing effects on the thermoelectric properties of Bi₂Te_2.7Se_0.3 thin films were examined in the temperature range 373-573 K. The structures, morphology and chemical composition of the thin films were characterized by X-ray diffraction, field emission scanning electron microscope and energy dispersive X-ray spectroscopy, respectively. Thermoelectric properties of the thin films have been evaluated by measurements of the electrical resistivity and Seebeck coefficient at 300 K. The Hall coefficients were measured at room temperature by the Van der Pauw method. The carrier concentration and mobility were calculated from the Hall coefficient. The films thickness of the annealed samples was measured by ellipsometer. When annealed at 473 K, the electrical resistivity and Seebeck coefficient are 2.7 mΩ cm and −180 μV/K, respectively. The maximum of thermoelectric power factor is enhanced to 12 μW/cm K².