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Structural and electrical properties of (Na0.85K0.15)0.5Bi0.5TiO3 thin films deposited on LaNiO3 and Pt bottom electrodes |
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| Authors: | XJ Zheng SH Dai T Zhang YQ Gong L He |
| Institution: | a Key Laboratory of Low Dimensional Materials and Application Technology of the Ministry of Education, Faculty of Materials, Optoelectronics and Physics, Xiangtan University, Xiangtan, Hunan 411105, China b School of Aerospace, Tsinghua University, Beijing, 100084, China c Department of Electronic Engineering, Jilin University, Changchun, Jilin 130012, China |
| Abstract: | (Na0.85K0.15)0.5Bi0.5TiO3 thin films were deposited on LaNiO3(LNO)/SiO2/Si(1 0 0) and Pt/Ti/SiO2/Si(1 0 0) substrates by metal-organic decomposition, and the effects of bottom electrodes LNO and Pt on the ferroelectric, dielectric and piezoelectric properties were investigated by ferroelectric tester, impedance analyzer and scanning probe microscopy, respectively. For the thin films deposited on LNO and Pt electrodes, the remnant polarization 2Pr are about 22.6 and 8.8 μC/cm2 under 375 kV/cm, the dielectric constants 238 and 579 at 10 kHz, the dielectric losses 0.06 and 0.30 at 10 kHz, the statistic d33eff values 95 and 81 pm/V. The improved piezoelectric properties could make (Na1−xKx)0.5Bi0.5TiO3 thin film as a promising candidate for piezoelectric thin film devices. |
| Keywords: | (Na0 85K0 15)0 5Bi0 5TiO3 thin film Metal-organic decomposition Bottom electrode Porosity Dielectric Piezoelectric |
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