近场扫描光电显微镜中一种新的切向力检测系统

在近场扫描光学显微镜（ＮＳＯＭ）＾［１］中,近场距离控制一般要用切向力控制法。检测切向力有两种方法：光学检测法和非光学检测法。目前普遍采用非光学检测法,基本上是采用压电陶瓷管控制探针和样品的距离。本文提出一种新的切向力检测系统,利用双压电片实现近场距离控制。实验结果表明,检测灵敏度大大提高,扫描力显微（ＳＦＭ）像的分辨率可达纳米量级。     

采用DDS的近场扫描光学显微镜探针-样品的纳米距离检测

近场扫描光学显微术中, 近场距离的检测和控制是需要解决的核心技术之一. 本文研究了基于DDS驱动的压电传感器, 在一个压电陶瓷片上, 电极被分成相同的两部分, 分别用于振动驱动和振幅检测. 近场扫描的光纤探针固定于此压电陶瓷片上. 振动驱动信号采用DDS, 在样品的远场时, 可以通过频率扫描得到误差在0.006 Hz以内的压电陶瓷片谐振频率驱动信号, 而当光纤探针处于样品的近场距离之内时, 压电陶瓷片的谐振频率偏离驱动信号频率, 振幅明显减小, 从而检测出近场距离. 高精度振动驱动源DDS和高灵敏度压电传感器的采用提高了检测灵敏度和工作稳定性.     

近场光学显微镜中利用剪切力原理进行样品/探针间距测控的非光学方法

扫描近场光学显微镜（ＳｃａｎｎｉｎｇＮｅａｒ－ｆｉｅｌｄＯｐｔｉｃａｌＭｉｃｒｏｓｃｏｐｅ：ＳＮＯＭ）自８０年代中期以来获得了迅速的发展并得到了具有纳米（亚纳米）尺度分辨率的光学图像。作为ＳＮＯＭ的关键技术之一，样品与探针间距的控制尤为重要，而实现起来比较困难。人们提出了多种方法，其中基于剪切力原理的控制方法最常用而且实验证明是可靠的。本文综述了扫描近场光学显微镜发展以来所出现的基于剪切力原理进行样品／探针间距的探测的一些主要的非光学方法。包括利用ＰＭＴ直接探测样品辐射，利用音叉、电容、阻抗以及压电效应的探没方法等，并对各种方法的优缺点进行了分析比较。     

扫描显微探针

 随着１９８２年世界上第一台原子分辨的隧道扫描显微镜（ＳＴＭ）问世,掀起了对物质表面微结构研究的热潮,而且蔓延到表面化学以及生物大分子等领域．同时对ＳＴＭ原理及检测技术的推广,促使了原子力显微镜（ＡＦＭ）、近场光学显微镜（ＳＮＯＭ）的发明．现在,以ＳＴＭ、ＡＦＭ、ＳＮＯＭ为代表的高分辨显微镜已经形成了一类新的显微成像技术──扫描探针显微术（ＳＰＭ）．ＳＰＭ最显著的特点就是采用一个极微小的探针（针尖一般在纳米尺度）,在样品表面极小的距离内移动,同时获得样品表面信息．当这极小的探针与样品表面的相互作用强烈依赖于极小的距离（大约是指数关系）,仪器的稳定性则是获得理想图像的关键.     

近场光学虚拟光探针的数值分析

虚拟光探针是基于近场光学隐失场干涉原理产生的一种非实体探针，可以应用于近场光学超高密度存储、纳米光刻、近场光学成像、光谱探测、纳米样品的近场光学操作等领域。本研究采用三维时间域有限差分（FDTD）方法对近场光学虚拟光探针的光场分布特性进行了数值模拟计算和比较，分析了孔的形状、大小及偏振态等因素对虚拟光探针光场分布的影响，研究结果表明虚拟光探针的通光效率较普通的纳米孔径光纤探针提高10^2-10^4倍；其光场分布的中间峰的半峰全宽（即虚拟光探针的尺寸）在一定距离范围内基本保持不变，从而可以解决近场光学系统中纳米间距控制的难题，避免光学头与介质的磁撞。优化虚拟光探针的设计参量能有效的抑制虚拟光探针中的旁瓣。文章还给出了应用虚拟探针实现高密度光存储的原理方案。     

“禁戒光”近场光学显微镜原理与系统

扫描近场光学显微术是８０年代后期发展起来的一种分辨率超过衍射极限的新型光学显微镜技术。本文介绍了国外最近出现的“禁戒光”近场光学显微镜系统的工作原理及结构。透射式ＳＮＯＭ中部分光沿着光轴向前传播；部分光沿着大于全内反射临界角的方向传播。前者称为允许光；后者称为禁戒光。应用“禁戒光”近场光学显微镜可同时获得三幅图像，即允许光像、禁戒光像和反映样品表面形貌的剪切力图像。禁戒光图像能够提供很好的对比度和分辨率。     

用扫描近场光学显微镜观察铁电畴

本文利用电畴的双折射随电畴的自发极化的取向而异的特性，采用反射式扫描近场光学显微镜，观察了铁电单晶的畴结构。横向分辨率约为50nm。对原有的Topometrix Aurora NSOM系统作了较大的改进。采用音叉（tunning fork）检测光纤探针与样品间的剪切力，取代了原有的光学法振动检测。对硫酸三甘氨酸[NH3CH2COOH）3．H2SO4）]（简称TGS）的观察说明，反工扫描近场光学显微镜，适合研究垂直b轴切割的TGS（010）面的自发极化。对这种180极化的多畴，可获得光学衬度较好电畴分布图像。与形貌图像相比，发现电畴与形貌无关。无论是新鲜解理的原子级光滑表面和表面水解的较为粗糙表面均可观察到分布较为均匀的电畴分布。     

纳米尺度的光学成像与纳米光谱———近场光学与近场光学显微镜的进展

近场光学是指当光探测器及探测器－样品间距均小于辐射波长条件下的光学现象．利用近场光学扫描显微镜和近场光谱仪，不但能够以突破衍射极限的超高分辨率在纳米尺度实现光学成像，而且还可获得纳米微区的光谱信息．文章介绍近场光学的原理及其在凝聚态物理领域中的应用与进展，并给出了我们的初步结果     

纳变尺度的光学成像与纳米光谱：近场光学与近场光学显微镜的进展

近场光学是指当光探测器及探测器一样品间距均小于辐射波长条件下的光学现象，利用近场光学扫描显微镜和近场光谱仪，不但能够以突破衍射极限的超高分辨率在纳米尺度实现光学成像，而且还可获得纳米微区的光谱信息，文章介绍近场光学的原理及其在凝聚态物理领域中的应用与进展，并给出了我们的初步结果。     

扫描近场红外显微镜近场距离控制系统的改进

针尖 样品的距离控制系统是扫描近场红外显微镜的重要组成部分。切变力探测作为一种重要的近场距离控制手段而得到了广泛的应用。介绍了一种对切变力探测系统的改进方法 ,它可以有效地提高石英晶振音叉的品质因数 ,进而提高探测系统对切变力感应的灵敏度。给出了理论分析和实验验证结果     

Near-Field Scanning Optical Microscopy Combined with a Tapping Mode Atomic Force Microscope

Tapping mode atomic force microscopy is used to control the tip-sample distance in near field scanning optical microscopy (NSOM), which gives both topographic and near-field images simultaneously. The evanescent waves are scattered by a vibrating silicon-nitride tip in the proximity of sample surfaces and are detected through a microscope objective. This NSOM allows the observation of opaque samples with reflection illumination. A glass grating of 1-μm pitch and an InP grating of 0.5-μm pitch are observed with a lateral resolution of 100 nm.Presented at 1996 International Workshop on Interferometry (IWI ‘96), August 27-29, Saitama, Japan     

Shear-Force Detection by Reusable Quartz Tuning Fork without External Vibration

Many studies have reported on the use of quartz tuning forks (a type of crystal oscillator used in wristwatches) in the detection of shear force, employed to control the distance between the probe and the sample in a scanning near-field optical microscope. This study focuses on a newly-devised shear force detection method capable of simultaneous non-external oscillation and detection, which also allows for subsequent reuse of a tuning fork. The optimum configuration and tip length for inserting a probe into the slit of a tuning fork have been elucidated. The shear force was detectable in about 5 nm decay length using such conditions.     

Multifunctional universal SPM nanoprobe fabrication with laser technology

Scanning probe microscopy (SPM) is a high spatial resolution method of surface topography visualization and measurement of its local properties. The detecting of interaction arising between the sharp solid-state probe and the sample surface is the foundation of SPM. In dependence from nature of this interaction the scanning tunneling microscopy (STM), scanning force microscopy (SFM), scanning near field optical microscopy (SNOM), etc. are distinguished. The spatial resolution of all types of probe microscopy determines both sharpness of increasing of interaction between a probe and a sample at their approach, and shape and size of a top of a solid-state probe. So, the progress in SPM information capabilities is highly depends on probe properties and first of all on properly fabricated aperture size. Fabrication procedures are rather complicated because of nanometric scale size of aperture and hard requirements to reproducibility and need to be improved. The way how to do it by laser-assisted drawing-out is involving of feed-back in a processing procedure-results in two types of feedback for the process of drawing-out has been suggested, tested and installed into the technological set-up. Different probes have been fabricated by above mentioned laser-assisted stretching during this work: SNOM types from optical fibers, micropipettes from quartz glass capillaries, micropipettes with microwires inside and with metallic covers outside. Some examples of application of above mentioned combined probes for cell membrane technology are described. Most important from them are topographical studying of cells and bacteria in living condition (in liquid) and studying of the mechanical properties of cell (rigidity of cell membrane) using the nanopipette as a tip of a force sensor. Except for that using the model sample the measurement of ion current that runs through nanopipette which also carries out a role of a tip of a force sensor have been done. Thus it is shown, that using a probe as a nanopipette, it is possible to combine SPM method with well-known patch-clamp method.     

Near-Field Characterization of Optical Micro/Nanofibres

Near-field scanning optical microscopy is used to investigate the waveguiding properties of optical micro/nanofibres （MNFs） by means of detecting optical power carried by evanescent waves. Taper drawn silica and tellurite MNFs, supported on low-index substrates, are used to guide a 532-nm-wavelength light beam for the test. Modification of the single-mode condition of the MNF in the presence of a substrate is observed. Spatial modulation of the longitudinal field intensity （with a 195-nm period） near the output end of a 760-nm-diameter silica MNF is well resolved. Energy exchange through evanescent coupling between two parallel MNFs is also investigated.     

Subdiffraction‐limited chemical imaging of patterned phthalocyanine films using tip‐enhanced near‐field optical microscopy

A tip‐enhanced near‐field optical microscope, based on a shear‐force atomic force microscope with plasmonic tip coupled to an inverted, confocal optical microscope, has been constructed for nanoscale chemical (Raman) imaging of surfaces. The design and validation of the instrument, along with its application to near‐field Raman mapping of patterned organic thin films (coumarin‐6 and Cu(II) phthalocyanine), are described. Lateral resolution of the instrument is estimated at 50 nm (better than λ/10), which is roughly dictated by the size of the plasmonic tip apex. Additional observations, such as the distance scaling of Raman enhancement and the inelastic scattering background generated by the plasmonic tip, are presented. Copyright © 2016 John Wiley & Sons, Ltd.     

Tapping mode atomic force microscope combined with reflection scanning near-field optical microscope (AF/RSNOM)

A new kind of scanning probe microscope is introduced in this paper, which is a combination of atomic force microscope and reflection scanning near field optical microscopy (AF/RSNOM) with equi-amplitude tapping mode. The principle and recent experiment result of AF/RSNOM are reported. Besides convenient operation, the bi-functional probe tip of AF/RSNOM brings an even illumination for every sampling position. Experiment result and analysis show that the signal to noise ratio (SNR) of AF/RSNOM optical image is much better than that of other RSNOM without tapping working mode.     

Near-field and far-field modeling of scattered surface waves. Application to the apertureless scanning near-field optical microscopy

The detection of surface waves through scanning near-field optical microscopy (SNOM) is a promising technique for thermal measurements at very small scales. Recent studies have shown that electromagnetic waves, in the vicinity of a scattering structure such as an atomic force microscopy (AFM) tip, can be scattered from near to far-field and thus detected. In the present work, a model based on the finite difference time domain (FDTD) method and the near-field to far-field (NFTFF) transformation for electromagnetic waves propagation is presented. This model has been validated by studying the electromagnetic field of a dipole in vacuum and close to a dielectric substrate. Then simulations for a tetrahedral tip close to an interface are presented and discussed.