Simple Physical Model of Generation of the Low-Pressure Radio Frequency Supersonic Plasma Jet

The paper presents a simple theoretical model of the breakdown of the supersonic plasma jet generated by the hollow cathode discharge inside the nozzle in the low pressure RF plasma-chemical reactor. Through the nozzle which is drilled in the RF electrode the working gas flows to the reactor chamber. If at the outlet of the nozzle the gas flow is supersonic the well defined plasma jet is created inside the reactor chamber. The results of our model are in qualitative agreement with experimental data.     

用直流中空阴极放电方法 (DC HCD)生长的纳米级碳的氮化物薄膜研究(英文)

There is growing interest in the underlying physical processes in optoelectronic devices based on thin-film multilayer structures.Recently, many investigators have made great efforts on synthesizing the ultra-hard nanoscale carbon nitride thin films.Consi…     

RF generation of the plasma jet channel for the jet PCVD

Breakdown conditions for creation of the hollow cathode discharge in the nozzle passed through the rf powered electrode and creation of the plasma jet channel in PCVD reactor are studied. Pure nitrogen is used for measurements. The creation of jet channel is easier for smaller rf electrodes. The breakdown depends on the pressure and on the gas inflow rate. The plasma potential and the self-bias potential is influenced by the covering of reactor walls and the rf electrode by a dielectric layer.     

Transition of Discharge Mode of a Local Hollow Cathode Discharge

The discharge characteristics of hollow cathode discharge in argon in a cylindrical cavity are investigated experi- mentally. The voltage-current （V - I） characteristics and the light emission are measured. It is found that the discharge plasma is localized inside the hollow cavity, with an extensive Faraday dark space between the cathode and the anode. The discharge develops from predischarge to abnormal glow discharge, the hollow cathode effect （HCE） and a hybrid mode as the discharge current increases. The onset of the HCE is found for the first time by the transition from abnormal glow discharge together with a significant decrease in the slope of the V - I curve which shows a positive differential resistivity. The voltage increases proportionally with the current when the HCE is reached.     

Thin-film deposition by combining plasma jet with spark discharge source at atmospheric pressure

This study demonstrates a method for the deposition of CuO_x thin films by combining atmospheric pressure plasma jet with spark discharge. In this type of discharge source, the bulk copper material of spark discharge electrodes plays the role of a precursor. Copper atoms and particles go through the physical processes of sputtering, evaporation, and further agglomeration and condensation in the plasma jet and on the substrate. The experiments were carried out with and without a combination of discharges. The material coated on the substrate was studied using a scanning electron microscope, Raman spectroscopy, and energy-dispersive X-ray spectroscopy. The characteristics of the set-up and plasma, such as I-V curves, optical emission spectra, and substrate temperature, were also measured. Copper electrodes were examined for erosion by a scanning electron microscope. The results demonstrate that deposits coated by combined discharge show denser and thicker films.     

Characteristics of an atmospheric‐pressure radio frequency‐driven Ar/H2 plasma discharge with copper wire in tube

This paper investigates a plasma discharge driven by a 13.56 MHz radio frequency (RF) power supply at atmospheric pressure, in which a copper wire is inserted in the discharge tube for the deposition of Cu films. The results show that the jet plasma formation originates from the discharge between the copper wire and induction coil because of its electrostatic field. The axial distribution of the plasma parameters in the RF plasma jet, namely the gas temperature, excitation temperature, and electron number density, is determined by diatomic molecule OH fitting, Boltzmann slope, and H_β Stark broadening, respectively. The discharge current significantly declines when a small amount of hydrogen is added to the argon as the plasma‐forming gas, and the gas temperature of discharge plasma increases considerably.     

Effect of annealing on structural and electrical properties of the Li–Mn–O thin films, prepared by high frequency RF magnetron sputtering

Li–Mn–O thin film cathode materials are prepared by high frequency (27.12 MHz) RF magnetron sputtering. The high RF frequency gives higher deposition rates without compromising on the quality of the films. This investigation focuses on the effects of post-annealing on the micro-structural, morphological and electrical properties of Li–Mn–O films. It is observed that with the increase of annealing temperature the crystallinity as well as the electrical conductivity of the films increases. The films annealed at 600–700 °C are found to have high structural perfection and good electrical properties.     

磁控溅射沉积薄膜实验参数优化光谱诊断

采用磁控溅射仪、Omni-λ300系列光栅光谱仪、CCD数据采集系统和光纤导光系统等构成的等离子体光谱分析系统,采集了以Cu和Al为靶材、氩气为工作气体,射频磁控溅射法沉积硅基薄膜时的等离子体发射光谱。以CuⅠ324.754 nm,CuⅠ327.396 nm,CuⅠ333.784 nm,CuⅠ353.039 nm,AlⅠ394.403 nm和AlⅠ396.153 nm为分析线,研究了Cu和Al等离子体发射光谱强度随溅射时间、溅射功率、靶基距和气体压强等实验参数的变化。并与射频磁控溅射沉积薄膜实验参数的选择进行对比,表明发射光谱法对射频磁控溅射薄膜生长条件的优化有着很好的指导作用。     

Gas flow sputtering: Versatile process for the growth of nanopillars, nanoparticles, and epitaxial thin films

Gas flow sputtering is a sputter-deposition method that enables soft and high-rate deposition even for oxides or nitrides. It involves sputtering at a high pressure of around 100 Pa and hollow cathode discharge in a tubular or parallel plate target with forced Ar flow. Depending on the sputtering conditions, various structures of magnetic materials are obtained, and some examples are shown in this paper. Co-Pt and Fe nanopillars are fabricated using a tubular target with a large inner diameter (6-40 mm). Fe nanoparticles with diameters ranging from a few nanometers to 150 nm are fabricated using a tubular target with a small inner diameter (5 mm). Magnetite epitaxial thin films are fabricated on MgO and GaAs substrates by substrate heating.     

Characterization of a RF/dc-magnetron discharge for the sputter deposition of transparent and highly conductive ITO films

A RF-superimposed dc-magnetron sputter process for coating color filter materials with transparent and conducting ITO films was investigated. In this process, the sputtering cathode is excited simultaneously by dc- and RF-power (at 13.56 MHz). This work summarises the measured properties of the gas discharge. Some basic data of the deposited ITO films are given, also. The dependence of the RF portion of the total sputtering power on the discharge voltage has been monitored for different values of total power and process pressure. The ion energy distribution function of the positively charged ions approaching the substrate surface has been measured using a retarding field plasma analyser probe. It was shown that the mean energy of the ions increases with increasing RF portion of the total power. The electron temperature in the body region of the gas discharge has been derived from measurements of the optical emission of the excited species. Received: 3 November 1998 / Accepted: 8 March 1999 / Published online: 14 July 1999     

Formation of Films of Tungsten and its Oxides in a High-Frequency Capacitive Discharge in a D<Subscript>2</Subscript>-O<Subscript>2</Subscript> Mixture

A technique for tungsten-film deposition on different substrates in asymmetrical high-frequency (1.76 MHz) capacitive discharge in a D₂?6.5 mol % O₂ mixture under a total pressure of 15 Pa and at 60–130°C is considered. A circular W strip near the upper inner edge of a cylindrical hollow cathode with a radius of 4.2 cm and a height of 10 cm is the source of W particles. The smooth transition from sputtering of the inner surface to deposition occurs at a distance of about 4 cm from the upper boundary of the open part of the cathode. W, Mo, ZrO₂, Si, and Cu substrates are placed in the lower closed end (bottom) and on the inner lateral cathode surface. At the upper cathode edge the sputtering yield is (4–5) × 10^?2 at/ion. The mass rate of W deposition on the cathode bottom does not depend on the substrate type and is 40 μg/(cm² h). The peculiarities of the composition, morphology, and structure of W films obtained on the lateral surface and bottom of the hollow cathode are discussed.     

N2交流辉光放电等离子体喷束的光谱测量及特性研究

建立了一套交流放电产生N2等离子体喷束的装置,该装置可对氮气进行高达15 kV连续放电.采用浓度调制光谱技术对放电辉光光谱进行探测,并对实验中放电电流和光谱信号的关系进行了讨论.沿着束流的轴向探测了不同位置N2等离子体的发射光谱,发现其激发态振动温度随着束流的下降先降低继而升高,并根据实验条件分析了其变化规律和产生机理.研究了束流中N2 /N2比例变化过程,发现随着束流向下两者比例逐渐升高,并结合实验装置进行讨论.     

Microstructure and Deuterium Retention of Tungsten Deposited by Hollow Cathode Discharge in Deuterium Plasma

Tungsten has been chosen as one of the most promising candidates as the plasma-facing material in future fusion reactors. Although tungsten has numerous advantages compared with other materials, issues including dust are rather difficult to deal with. Dust is produced in fusion devices by energetic plasma-surface interaction. The re-deposition of dust particles could cause the retention of fuel atoms. In this work, tungsten is deposited with deuterium plasma by hollow cathode discharge to simulate the dust production in a tokamak. The morphology of the deposited tungsten can be described as a film with spherical particles on it. Thermal desorption spectra of the deposited tungsten show extremely high desorption of the peak positions. It is also found that there is a maximum retention of deuterium in the deposited tungsten samples due to the dynamic equilibrium of the deposition and sputtering process on the substrates.     

Influence of the Discharge Burning Conditions on Distributions of the Parameters of Plasma Generated in a Non-Self-Sustaining Glow Discharge Inside a Hollow Cathode

Russian Physics Journal - The parameters of the plasma of a non-self-sustaining glow discharge generated inside a metal hollow cathode 300 mm long and 25 mm in inner diameter are investigated. A...     

Physikalisch-chemische Vorgänge beim Plasmaätzen mit fluorhaltigen Ätzgasen

Examples are given for three main processes determining the reactions in plasma etching:

• i The interaction between plasma particles and the surfaces of solids;
• ii The conversion of the gas composition in the plasma;
• iii The transport phenomena of reaction products in the reactor and the vacuum system.

In the glow discharge the behaviour of saturated and unsaturated perfluorocarbon gases is very similar. Both classes of compounds are converted in a few seconds in the homologous series of perfluoroalcanes up to products of high molecular weight. The main products are CF₄, C₂F₆, C₃F₈. Unsaturated compounds lead to the deposition of thin polymer films on the walls and the electrodes, whereas saturated ones are only capable of producing films on the surface of the reaction vessel. The deposition results from the recombination of free radicals arising from the plasma interactions in the gas and at the surfaces. Vice versa sputtering of polymer fragments acts on the gas composition in the plasma. Conversion processes are controled by current density and gas pressure. The cathode fall region of the discharge is found to be the zone of the highest reaction activity.     

Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films

Physical vapor processes using glow plasma discharge are widely employed in microelectronic industry. In particular magnetron sputtering is a major technique employed for the coating of thin films. This paper addresses the influence of direct current (DC) plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper (Cu) thin films coated on silicon substrates. The influence of the sputtering parameters including DC plasma power and argon working gas pressure on the electrical and structural properties of the thin Cu films was investigated by means of surface profilometer, four-point probe and atomic force microscopy.     

Investigation on RF styrene plasma by emission spectroscopy

In order to gain an insight into the processes in an RF styrene plasma, gas phase plasmas were investigated by emission spectroscopy. The plasma reactor was a bell-jar-type chamber with two parallel plate electrodes. The measurement of plasma emission spectra was made with axial resolution. The correlations among the emission intensities of CH and C₄H₂⁺ species, the polymer deposition rate and the polymeric structure of the deposited films were studied. The proposed analysis showed that the gas flow pattern in the plasma reactor, and the difference in collisions between styrene monomer molecules and energetic free electrons occurring in the plasma region and RF sheath, made the fragments and ions produced change in the different regions, resulting in a change in polymeric structure and deposition rate of the polymer films. With increasing distance between the substrate position and the lower electrode, the deposition rate and the concentration of phenyl groups both at the polymer surface and in the bulk decreased     

RF discharges at atmospheric pressure

The described plasma source is based on the RF torch discharge. The powered RF electrode of the torch discharge plasma source is made from the thin metal pipe with an inner diameter of 1–2 mm and with a length of several cm. The working gas (argon pure or with an admixture of reactive components) flows through the RF electrode as the nozzle. The electrode is connected through the matching unit to the RF generator of the frequency of 13.56 MHz.The advantage of this described plasma source consists in the fact that the torch discharge remains stable up to the atmospherical pressure of the working gas even in the liquid environments. Up to now the torch discharge has been used only for treatment in liquid environment only for archaeological artefacts. For further applications it is necessary to additional study of this phenomenon. While in previous papers we presented a measurement of different temperatures from spectra emitted by plasma, there is drawn attention to equiintensity maps inside the nozzle.     

具有空心阴极放电特征的射频放电的两电子组模型

 运用两电子组模型，考虑了射频放电中的α过程和γ过程两种电离机制，并结合流体模型，研究了中等气压下窄电极间隙容性耦合射频放电在运行模式转变区的等离子体密度以及电离速率分布等特性。理论研究表明，γ电离过程在高电流模式运行中起主要作用，并证实了此类放电中存在显著的电子摆钟效应，具有类似于空心阴极放电的特征。     

新型的覆纳米粒子薄膜阴极的研究

采用直流磁控溅射的方法制备出Ir金属纳米粒子薄膜.利用扫描电子显微镜分析了纳米粒子的形态和分布以及不同工艺条件对粒子粒径及形貌的影响,表明纳米粒子的大小可通过调节溅射气体压强来控制.在25%孔度的W海绵基体内浸入6∶1∶2铝酸盐发射物质,然后在其表面沉积上厚度为200—500 nm的纳米粒子薄膜层,最后在H₂气中1200℃烧结,即制成了新型纳米粒子薄膜阴极.利用阴极发射微观均匀性测试仪对纳米粒子薄膜阴极和传统覆膜阴极的热电子发射的均匀性进行了对比研究.采用飞行时间质谱仪测试了真空本底、纳米粒子薄膜阴极、传统覆膜阴极等各种阴极蒸发物的成分,研究了阴极蒸发速率与阴极温度的关系,比较了不同阴极蒸发速率的大小.研究了Ba-W阴极覆上纳米粒子薄膜后的发射特性. 关键词： 纳米粒子薄膜 热阴极 发射均匀性 蒸发