How to determine parameters of soft mode from dielectric spectroscopy performed using cells with ITO electrodes?

Indium tin oxide (ITO) electrodes are widely used for liquid crystal applications as well as for measuring cells. Unfortunately, ITO layer possesses its own non zero resistivity R, which produces (with the cell capacity C₀) the cut-off frequency f₀ of RC₀ circuit. From this reason, dielectric spectroscopy for high frequencies cannot be performed directly. The limits of classical method of extracting high frequency losses are shortly discussed. The new method of extracting high frequency losses is used for the first time for the experimental data. The new method can also evaluate the shrinkage of measuring cell gap after filling with liquid crystal.     

Electro-optical characterization and analysis of CuPc-based solar cells with high photovoltage

Organic solar cells using the CuPc and PTCBI semiconductor layers were studied. A high open circuit voltage of 1.15 V was obtained in a device with ITO/PEDOT:PSS/CuPc (15 nm)/PTCBI (7 nm)/Al structure. Results were interpreted in terms of a modified CuPc-Al Schottky diode for the thin PTCBI case and a CuPc-PTCBI heterojunction for the thick PTCBI case. Also, the formation of a thin aluminum oxide layer under the aluminum electrode was postulated. This layer has a beneficial aspect wherein shunting losses are reduced and a high photovoltage is enabled. However, it adds greatly to the series resistance to a point where the short circuit current density is reduced. CuPc Schottky diodes with an ITO/PEDOT:PSS/CuPc/Al structure yielded a high V _oc of 900 mV for a CuPc layer of thickness 140 nm. The V _oc increased with increase in CuPc layer thickness.     

Dielectric spectroscopy of liquid crystals. Theoretical model of ITO electrodes influence on dielectric measurements

Indium tin oxide (ITO) layers are widely used to make electrodes in measuring cells, because these layers are transparent and electrooptical investigations can be performed using such prepared cells. It was found during the dielectric spectroscopy measurements, performed for smectic liquid crystalline mixture, that it is not possible to detect some important relaxation modes in paraelectric SmA*, ferroelectric SmC*, and antiferroelectric SmC_A* phases for the frequencies higher than 300 kHz. The measuring cell does not allow to measure relaxations, because its own dielectric behaviour covers the dielectric response of a liquid crystalline medium. One can observe the spurious contribution for high frequency part of the dielectric spectrum, due to the finite resistance of ITO layers. The theoretical model was introduced, which shows how to calculate relaxations related to liquid crystals from dielectric response of the empty and filled measuring cell. The proof of strong influence of cell properties on effective (measuring) values of dielectric permittivities was shown.     

ITO: Zr bi-layers deposited by reactive O2 and Ar plasma with high work function for silicon heterojunction solar cells

We report the influence of reactive oxygen (O₂) and argon (Ar) plasma based ITO:Zr bi-layers for silicon heterojunction (SHJ) solar cells. The purpose of reactive O₂ sputtered ITO:Zr was to improve the Hall mobility and work function while the Ar based ITO:Zr films play an important role to maintain good electrical characteristics. The thickness of reactive O₂ based ITO:Zr films was fixed at 15 nm while Ar based films was varied from 65 to 125 nm, respectively. ITO:Zr bi-layers with the thickness of 15/105 nm deposited by O₂ and Ar plasma, respectively, showed lowest resistivity of 2.358 × 10⁻⁴ Ω cm and high Hall mobility of 39.3 cm²/V · s. All ITO:Zr bi-layers showed an average transmittance of above 80% in the visible wavelength (380–800 nm) region. Work function of ITO:Zr bi-layers was calculated from the X-ray photoelectron spectroscopic (XPS) data. The ITO:Zr work function was enhanced from 5.3 eV to 5.16 eV with the variation of ITO:Zr bi-layers from 15/65 to 15/125 nm, respectively. Front barrier height in SHJ solar cells can be modified by using TCO films with high work function. The SHJ solar cells were fabricated by employing the ITO:Zr bi-layer as front anti-reflection coating. The SHJ solar cells fabricated on ITO:Zr bi-layer with the thickness of 15/105 nm showed the best photo-voltage parameters as; V_oc = 739 mV, J_sc = 39.12 mA/cm², FF = 75.97%, η = 21.96%.     

后退火处理对铟锡氧化物表面等离激元共振特性的影响

近年来,表面等离激元光子学发展迅速,并取得了众多新成果.重掺杂半导体材料的表面等离激元共振性质的研究,也得到了人们越来越多的关注.本文通过纳米球刻印技术制备准三维二氧化硅纳米球阵列,在阵列上沉积铟锡氧化物薄膜,通过不同条件下的后退火处理改变铟锡氧化物薄膜的载流子浓度和载流子迁移率,并研究随着材料性质的改变其相应表面等离激元共振特性的变化规律.结果表明：退火处理均使铟锡氧化物薄膜的晶粒长大,光学透过率增加;在空气中退火会导致铟锡氧化物薄膜的载流子浓度减少,其表面等离激元共振峰红移;而真空退火则使铟锡氧化物薄膜的载流子浓度增加,共振峰蓝移.这些研究结果可为后续铟锡氧化物表面等离激元材料及器件的研究提供科学依据和实际指导.     

PEDOT:PSS Schottky contacts on annealed ZnO films

Polycrystalline ZnO and ITO films on SiO₂ substrates are prepared by radio frequency (RF) reactive magnetron sputtering. Schottky contacts are fabricated on ZnO films by spin coating with a high conducting polymer, poly(3, 4-ethylenedioxythiophene): poly(styrenesulfonate) (PEDOT:PSS) as the metal electrodes. The current-voltage measurements for samples on unannealed ZnO films exhibit rectifying behaviours with a barrier height of 0.72 eV (n=1.93). The current for the sample is improved by two orders of magnitude at 1 V after annealing ZnO film at 850 ℃, whose barrier height is 0.75 eV with an ideality factor of 1.12. X-ray diffraction, atomic force microscopy and scanning electron microscopy are used to study the properties of the PEDOT:PSS/ZnO/ITO/SiO₂. The results are useful for applications such as metal-semiconductor field-effect transistors and UV photodetectors.     

Structural and electrical studies on PVDF:PANI composite thin films and their application as buffer layer on hybrid solar cells

Hybrid (organic–inorganic) solar cells were fabricated and tested using buffer layer of polyaniline (PANI)–poly(vinylidene difluoride) (PVDF) composites. The effect of PANI:PVDF composite on the performance of the solar cells was explored and the cells were characterized by current voltage (I?V) measurements under a solar simulator generating AM1.5 light (1000?W/m²) irradiance. It was found that solar cells containing ITO/PANI:PVDF photo-anode are likely to improve photocurrent and power conversion efficiency in a way superior to that containing only ITO as photo-anode. Furthermore, PANI:PVDF composite enhanced the hole extraction at photo-anode/photo-active layer interface via the high electrical conductivity of PANI and the ferroelectricity of PVDF.     

Analysis of defect mode in a dielectric photonic crystal containing ITO defect

In this work, based on the use of ITO as a defect, we study the infrared defect mode in defective photonic crystal made of SiO₂ and InP. Due to the dispersion in the dielectric function of ITO, it is found that the defect mode is sensitive to the ITO thickness. The defect frequency is shown to be blue-shifted as the thickness of ITO decreases. In the angular dependence of defect mode, it is seen that the defect frequency is also blue-shifted when the angle of incidence increases for both TE and TM polarizations. However, the shifting feature is appeared to be nearly polarization-independent. The shift in the defect frequency enables us to employ ITO as a tunable agent in order to design a tunable photonic crystal filter in the infrared region.     

Electrical and optical properties of Si-doped indium tin oxides as transparent electrode and anti-reflection coating for solar cells

We have studied the electrical and optical properties of Si-doped indium tin oxides (ITSOs) as transparent electrodes and anti-reflection coatings for Si-based solar cells. The ITSO thin films were obtained by co-sputtering of ITO and SiO₂ targets under target power control. The resistivity of the ITSO thin films deposited at 0.625 in terms of power ratio (ITO/SiO₂) were 391 Ωcm. In this condition, the ITSO thin films showed very high resistivity compared to sputted pure ITO thin films (1.08 × 10⁻³ Ωcm). However, refractive index of ITSO thin films deposited at the same condition at 500 nm is somewhat lowered to 1.97 compared to ITO thin films (2.06). The fabricated graded refractive index AR coatings using ITO, ITSO, and SiO₂ thin films kept over 80% of transmittance regardless of their thickness varing from 97 nm to 1196 nm because of their low extinction coefficient. As the AR coating with graded refractive indices using ITO, ITSO, and SiO₂ layers was applied to general silicon-based solar cell, the current level increased nearly twice more than that of bare silicon solar cell without AR coating.     

Structural properties of single and multilayer ITO and TiO2 films deposited by reactive pulsed laser ablation deposition technique

Indium tin oxide (ITO) and titanium dioxide (TiO₂) single layer and double layer ITO/TiO₂ films were prepared using reactive pulsed laser ablation deposition (RPLAD) with an ArF excimer laser. The films were deposited on SiO₂ substrates heated at 200 and 400 °C. ITO and TiO₂ films with uniform thicknesses of about 400 and 800 nm, respectively, over large areas were prepared. X-ray diffraction (XRD) analysis revealed that the ITO films are formed of highly orientated nanocrystals with an average particle size of 10-15 nm. Atomic force microscopy (AFM) observations indicate rough ITO films surfaces with average roughness of 26-30 nm. Pores were also observed. TiO₂ films deposited on the prepared ITO films result less crystalline. Annealing at 300 and 500 °C for three consecutive hours promoted formation of TiO₂ anatase phase, with crystal size of ∼6-7 nm. From the scanning transmission electron microscope (STEM) images, it can be seen that the TiO₂ films deposited onto the prepared ITO films present a relatively high pore sizes with an average pore diameter of ∼40 nm and excellent uniformity. In addition, STEM cross-sectional analysis of our films showed a columnar structure but no evidence of voids in the structure. Therefore, films exhibited large surface area, well suited for dye-sensitized solar cells (DSSC) applications.     

The effects of sodium in ITO by pulsed laser deposition on organic light-emitting diodes

The depth profile of ITO on glass was measured by the time-of-flight secondary ion mass spectroscopy (TOFSIMS) which revealed high sodium (Na) ion concentration at the ITO surface as well as at the ITO–glass interface as a result of out diffusion with substrate heating. Effects of Na ions on the performance of organic light-emitting diode (OLED) were studied by etching away a few tens of nanometers off the ITO surface with a dilute aquaregia solution of HNO₃:HCl:H₂O. A single-layer, molecularly doped ITO/(PVK+TPD+Alq₃)/Al OLEDs were fabricated on bare and etched ITO samples. Although the removal of a 10-nm layer of ITO surface increased the voltage range, brightness, and lifetime, it was insufficient to correlate these improvements with solely to the Na ion reduction without considering the surface roughness.     

Fabrication and characterization of CdS-sensitized TiO<Subscript>2</Subscript> nanotube photoelectrode

CdS quantum dot (Qd)-sensitized TiO₂ nanotube array photoelectrode is synthesised via a two-step method on tin-doped In₂O₃-coated (ITO) glass substrate. TiO₂ nanotube arrays are prepared in the ethylene glycol electrolyte solution by anodizing titanium films which are deposited on ITO glass substrate by radio frequency sputtering. Then, the CdS Qds are deposited on the nanotubes by successive ionic layer adsorption and reaction technique. The resulting nanotube arrays are characterized by scanning electron microscopy, X-ray diffraction (XRD) and UV–visible absorption spectroscopy. The length of the obtained nanotubes reaches 1.60 μm and their inner diameter and wall thickness are around 90 and 20 nm, respectively. The XRD results show that the as-prepared TiO₂ nanotubes array is amorphous, which are converted to anatase TiO₂ after annealed at 450 °C for 2 h. The CdS Qds deposited on the TiO₂ nanotubes shift the absorption edge of TiO₂ from 388 to 494 nm. The results show that the CdS-sensitized TiO₂ nanotubes array film can be used as the photoelectrode for solar cells.     

Effect on the reduction of the barrier height in rear-emitter silicon heterojunction solar cells using Ar plasma-treated ITO film

In this study, we investigated the effect of plasma treatment on an indium tin oxide (ITO) film under an ambient Ar atmosphere. The sheet resistance of the plasma-treated ITO film at 250 W (37.6 Ω/sq) was higher than that of the as-deposited ITO film (34 Ω/sq). Plasma treatment was found to decrease the ITO grain size to 21.81 nm, in comparison with the as-deposited ITO (25.49 nm), which resulted in a decrease in the Hall mobility. The work function of the Ar-plasma-treated ITO (WF_ITO=4.17 eV) was lower than that of the as-deposited ITO film (WF_ITO = 5.13 eV). This lower work function was attributed to vacancies that formed in the indium and oxygen vacancies in the bonding structure. Rear-emitter silicon heterojunction (SHJ) solar cells fabricated using the plasma-treated ITO film exhibited an open circuit voltage (V_OC) of 734 mV, compared to SHJ cells fabricated using the as-deposited ITO film, which showed a V_OC of 704 mV. The increase in V_OC could be explained by the decrease in the work function, which is related to the reduction in the barrier height between the ITO and a-Si:H (n) of the rear-emitter SHJ solar cells. Furthermore, the performance of the plasma-treated ITO film was verified, with the front surface field layers, using an AFORS-HET simulation. The current density (J_SC) and V_OC increased to 39.44 mA/cm² and 736.8 mV, respectively, while maintaining a WF_ITO of 3.8 eV. Meanwhile, the efficiency was 22.9% at V_OC = 721.5 mV and J_SC = 38.55 mA/cm² for WF_ITO = 4.4 eV. However, an overall enhancement of 23.75% in the cell efficiency was achieved owing to the low work function value of the ITO film. Ar plasma treatment can be used in transparent conducting oxide applications to improve cell efficiency by controlling the barrier height.     

Numerical simulation of ultra-thin CdTe solar cells with a buffer layer of MoOx in the backwall configuration

The software of Solar Cell Capacitance Simulator (SCAPS) is used to investigate the performance of ultra-thin CdTe solar cells in the backwall configuration (glass/ITO/MoO_x/CdTe/CdS/SnO₂/Ag). The backwall structure utilizes ultra-thin CdTe absorber layer instead of CdS film facing light illumination, which eliminates the absorption of CdS in short-wavelength region and improves the blue response of CdTe. A buffer layer of MoO_x is added to modify the contact between CdTe and ITO, reducing the valence band barrier height and simultaneously forming an electron reflector, which can reduce electron-hole recombination at this contact. When the thickness of MoO_x is 2 nm, the simulation results show that an efficiency can reach up to 25.5% with high ITO work function and ideal interface recombination velocity.     

Advances in stable and flexible perovskite solar cells

Roll-to-roll (R2R) production is an innovative approach and is fast becoming a very popular industrial method for high throughput and mass production of solar cells. Replacement of costly indium tin oxide (ITO), which conventionally has served as the transparent electrode would be a great approach for roll to roll production of flexible cost effective solar cells. Indium tin oxide (ITO) and fluorine-doped tin oxide (FTO) are brittle and ultimately limit the device flexibility. Perovskite solar cells (PSCs) have been the centre of photovoltaic research community during the recent years owing to its exceptional performance and economical prices. The best reported PSCs fabricated by employing mesoporous TiO₂ layers require elevated temperatures in the range of 400–500 °C which limits its applications to solely glass substrates. In such a scenario developing flexible PSCs technology can be considered a suitable and exciting arena from the application point of view, them being flexible, lightweight, portable, and easy to integrate over both small, large and curved surfaces.     

Pockels effect of water in the electric double layer at the interface between water and transparent electrode

We have obtained the first experimental evidence for the Pockels effect of water, which is induced by a high electric field in the electric double layer (EDL) on the water-transparent electrode interface. The electric-field induced energy shift of the visible interference fringes of a 300 nm indium-tin-oxide (ITO) electrode layer is observed, indicating a negative refractive index change at the interface. Numerical calculation reproduces well the experimental observation, showing that the signal mainly originates from water in the EDL. The Pockels constants of water are estimated to be r₃₃ = 5.1 × 100 pm/V and r₁₃ = 1.7 × 100 pm/V. The large anisotropy of the Pockels effect of water is deduced from the incidence angle dependence of the p-polarization signal. At the same time, the ITO shows a blue shift of the band gap in the UV due to the band population effect in the space charge layer. The plasma frequency in the near IR is also expected to increase due to the band population effect, since the ITO has a high doped carrier population close to metal. A negative refractive index change in the ITO space charge layer is induced from both effects, but its effect on the signal is estimated to be much smaller than that of the negative refractive index change of water in the EDL.     

Improving the electrical performance of HfInZnO-TFTs by introducing a thin ITO interlayer

We have fabricated hafnium–indium–zinc-oxide (HfInZnO) thin film transistors (TFT) with indium–tin-oxide (ITO) interlayer. Compared with conventional HfInZnO-TFT, the electrical performance and bias stability of HfInZnO-TFTs with ITO interlayer are improved. HfInZnO-TFT with 4-nm-thick ITO interlayer shows a high mobility of 7.2 cm²/V s, a low threshold voltage of 0.13 V and a better bias stability. The performance enhancement is attributed to a decrease in interface trap state and an increase in carrier concentration. It suggests that introducing ITO interlayer at the ALD Al₂O₃/HfInZnO interface is an effective way to improve the electrical performance and bias stability.     

Highly transparent Zn1−xMgxO/ITO multilayer for window of thin film solar cells

Texture-etched Zn_1−xMg_xO films were fabricated and applied as front transparent electrodes for superstrate type thin film solar cells. The Zn_0.65Mg_0.35O film (x = 0.35) showed optical transparency better than commercially available Asahi VU and double-textured ZnO (WT-ZnO) substrates. To provide pertinent conductivity, ITO film was coated on the texture-etched Zn_0.65Mg_0.35O. By employing the Zn_0.65Mg_0.35O/ITO substrate instead of the SnO₂, we demonstrated an enhancement of quantum efficiency for amorphous silicon thin film solar cell devices, resulted in efficiency improvement from 8.92 to 9.56%. We also examined effectiveness of the Zn_0.65Mg_0.35O/ITO substrate for the microcrystalline silicon solar cells which delivered an efficiency of 9.73% with proper anti-reflection coating. Our experimental results suggest that the Zn_0.65Mg_0.35O/ITO multilayer front contact can be beneficial for reinforcing performances of silicon-based thin film solar cell devices.     

Optical properties of ITO/TiO2 single and double layer thin films deposited by RPLAD

Indium tin oxide (ITO) and titanium dioxide (TiO₂) single layer and double layer ITO/TiO₂ films were prepared using reactive pulsed laser ablation deposition (RPLAD) with an ArF excimer laser for applications in dye-sensitized solar cells (DSSCs). The films were deposited on SiO₂ substrates either at room temperatures (RT) or heated to 200-400 °C. Under optimized conditions, transmission of ITO films in the visible (vis) range was above 89% for films produced at RT and 93% for the ones deposited at higher temperatures. Increasing the substrate temperature from RT to 400 °C enhances the transmission of TiO₂ films in the vis-NIR from about 70% to 92%. High transmission (≈90%) was observed for the double layer ITO/TiO₂ with a transmission cut-off above 900 nm. From the transmission data, the energies gaps (E_g), as well as the refractive indexes (n) for the films were estimated. n ≈ 2.03 and 2.04, respectively for ITO films and TiO₂ film deposited at 400 °C in the visible region. Post-annealing of the TiO₂ films for 3 h at 300 and 500 °C was performed to enhance n. The refractive index of the TiO₂ films increases with the post-annealing temperature. The direct band gap is 3.6, 3.74 and 3.82 eV for ITO films deposited at RT, 200, and 400 °C, respectively. The TiO₂ films present a direct band gap of 3.51 and 3.37 eV for as deposited TiO₂ films and when annealed at 400 °C, respectively. There is a shift of about 0.1 eV between ITO and ITO/TiO₂ films deposited at 200 °C. The shift decreases by half when the TiO₂ film was deposited at 400 °C. Post-annealing was also performed on double layer ITO/TiO₂.     

Highly transparent Ag doped In2O3 electrodes with high work function for organic solar cells

We report highly transparent Ag-doped In₂O₃ (IAO) films with high work function for use as transparent anodes in organic solar cells (OSCs). The electrical, optical, structural, and morphological properties of IAO films and their work function were investigated as a function of the rapid thermal annealing (RTA) temperature. At an RTA temperature of 600 °C, the IAO film showed a sheet resistance of 23.12 Ohm/square, an optical transmittance of 79.28%, and a work function of 5.21 eV, similar to conventional Sn-doped In₂O₃ (ITO) films. The low resistivity of the IAO film was closely related to oxygen vacancies caused by Ag suboxide formation in the In₂O₃ matrix. A bulk-heterojunction OSC with the optimized IAO anode showed performance comparable to that of an OSC with a reference ITO anode, indicating that the IAO films is a promising anode material for use in OSCs.