金刚石对顶砧中四点探针法精确测量样品电阻率的电极因素

 为了解金刚石对顶砧上电阻率高压原位测量中的电极效应,使用有限元分析方法,对样品中的稳恒电流场进行了模拟计算,发现电极的几何尺寸以及电极与样品电阻率的差别都会对测量误差产生影响。结果发现：电极的尺寸越大,误差越大;电极与样品电阻率数值差越大,误差越大。由此给出了减小电极效应以及减小测量误差的方法。     

原位高压微米氧化锌电学性质的研究

利用集成有金属薄膜电极的金刚石对顶砧,对微米氧化锌样品进行了原位高压电导率测量.结果表明,在919 GPa时样品电导率达到最小值,在919—1122 GPa时样品电导率急剧增大,说明此时样品从纤锌矿结构向岩盐矿结构转变直至完全相变,1122　GPa为相变点.通过测量不同条件下高温退火处理的样品电导率,明显看到氧空位对电导率的影响. 关键词： 高压 微米氧化锌 电导率 金刚石对顶砧     

利用金属垫片做为电极在金刚石对顶砧上精确测量样品电导率的研究

利用传统的四电极方法在金刚石对顶砧（DAC）上进行原位的样品电导率测量时,如果金属垫片样品孔内壁不能完全绝缘,测量结果将会存在很大的误差.为避免该实验误差的产生,作者提出了用双电极模型进行电导率测量的方法,即在DAC砧面上制备一个圆形测量电极的同时,将金属垫片样品孔的内壁做为第二个测量电极,并利用有限差分方法对电导率进行计算.通过这种方式,由金属垫片不绝缘而产生很大测量误差的问题得以解决.实验结果表明测量相对误差被控制在7％以下.     

DAC垫片孔侧壁绝缘程度对电导率测量结果的影响

通过有限元方法,计算了DAC内垫片孔侧壁与样品发生不同程度短路的情况下,范德堡法测量样品电阻率的相对误差. 发现垫片孔侧壁与样品短路面积小于20％时,相对误差可以控制在10％以内. 而当短路面积超过25％时,相对误差迅速增大. 研究中还发现,电极越靠近样品边缘,相对误差越小.     

一种新的恶二唑衍生物在金刚石对顶砧中的电阻率随压力和温度的变化关系

利用金刚石对顶砧测量了恶二唑衍生物微晶, 1,4-bis[(4-methyloxyphenyl)-1,3,4-oxadiazolyl]- 2,5-bisheptyloxyphenylene (OXD-2), 电阻随压力和温度的变化关系，并利用有限元分析方法计算了样品的电阻率。实验中，测量压力和温度达到了16 GPa和150℃。样品的电阻率随着温度的升高而降低，说明样品表现出半导体传导特性。在90-100 ℃之间，样品的电阻率有一明显的下降，说明这时发生了温度诱导的相变。随着压力的增加，样品的电阻率在6GPa左右达到最大值，此后随着压力的增加而下降。结合原位x光数据，在6GPa左右的电阻突变应该是由于样品在压力的诱导下发生了无序化的相变。     

基于金刚石对顶砧的高压原位阻抗谱测量

借助薄膜集成技术,阻抗谱测量方法被应用到金刚石对顶砧压机上. 通过对电极构型的改进和组装方法的优化,实现了对ZnS样品高压下原位阻抗谱的测量,实验压力达到30 GPa. 实验结果显示,平行板构型的电极能够获得完整的阻抗谱. ZnS在压力作用下发生的结构相变,引起了电输运性质的变化,而这个变化,能够清晰地在阻抗谱测量中反映出来.     

基于金刚石对顶砧的高压下原位阻抗谱测量

借助薄膜集成技术,阻抗谱测量方法被应用到金刚石对顶砧压机上.通过对电极构型的改进和组装方法的优化,实现了对ZnS样品高压下原位阻抗谱的测量,实验压力达到30 GPa.实验结果显示,平行板构型的电极能够获得完整的阻抗谱.ZnS在压力作用下发生的结构相变,引起了电输运性质的变化,而这个变化,能够清晰地在阻抗谱测量中反映出来.     

金刚石对顶砧高压显微光谱系统

一、引 言 金刚石对顶砧高压装置是高压下光学研究的一个有力工具.参照B.Welber等人的装置,我们组装了一套金刚石对顶砧高压显微光谱系统,该系统可用于高压下的吸收和发射光谱测量.由最初的几个实验结果来看,它的性能是可靠的.例如,我们利用该系统测量了非晶态As2S3薄膜样品在0     

基于集成技术的金刚石对顶砧原位电学量测量

 金刚石对顶砧是应用最多的高压装置,能够产生超过400 GPa的超高压力,借助激光加温,还可以加载6 000 K的高温。近20年来,基于金刚石对顶砧的微小测量电路集成技术的突破,带动了高压原位电学量测量技术的发展,使常压下能够测量的电学量大部分都能在金刚石对顶砧中的高压环境下实现。全面回顾了基于集成技术的金刚石对顶砧高压原位电学量测量技术的发展历程,介绍了最新的技术进展。     

金刚石对顶砧原位电导率测量系统

 在金刚石对顶砧中进行原位高温高压电阻测量时,由于受到绝热层的限制,从而达不到理想的温度条件。采用普通的粉末绝热材料,会给电极的引入造成很大困难,而且不规则的电阻丝使电阻测量很难精确量化。利用溅射镀膜方法,在对顶砧的砧面上镀氧化铝膜作绝热层,溅射的金属钼膜作电极材料,成功地完成了高温高压条件下原位电阻的测量。利用此装置,测量了铁镁硅酸盐(Mg_0.875,Fe_0.125)₂SiO₄在高温高压环境下（31~35 GPa,1 500~3 400 K）的电导率,得到了样品的导电粒子激活能,发现其激活能随着压强的升高而增大,与低压低温（小于15 GPa,低于1 200 K）条件相比,其激活体积和激活能都明显减小。     

Van der Pauw Hall Measurement on Intended Doped ZnO Films for p-Type Conductivity

A Van der Pauw Hall measurement is performed on the intended doped ZnO films （Na doped ZnO） grown by using the molecular beam epitaxial method. All as-grown samples show n-type conductivity, whereas the annealed samples （annealing temperature 900℃） show ambiguous carrier conductivity type （n- and p-type） in the automatic Van der Pauw Hall measurement. A similar result has been observed in Li doped ZnO and in as-doped ZnO films by other groups before. However, by tracing the Hall voltage in the Van der Pauw Hall measurement, it is found that this alternative appearance of both n- and p-type conductivity is not intrinsic behavior of the intended doped ZnO films, but is due to the persistent photoconductivity effect in ZnO. The persistent photoconductivity effect would strongly affect the accurate determination of the carrier conductivity type of a highly resistive intended doped ZnO sample.     

用范德保法测量碳化硅的电阻率和霍耳效应

应用范德保法测量了电阻率在10^-3—10²欧姆·厘米范围的n型和p型碳化硅单晶和外延层的电学性质。进行了测定条件的选择,范德保法与普通法的对照等试验。发现接触电阻的大小和稳定程度对测量结果有极大的影响。在铟、紫铜、锡、磷铜等机械接触中,铟电极具有最低的接触电阻,其他电极须经电冶成方能进行测定。在不同的电极材料和样品电流下,电阻率偏离约2%,指出,样品电流应当根据具体样品的电阻率和接触电阻加以选择。与普通法比较,范德保法精确度高,数据重复性好。测量了自室温至1000°K范围内碳化硅单晶的高温电学性质,求得氮施主的电离能为0.056电子伏。讨论了引起实验误差的一些异常现象及其产生原因。     

AlGaN/GaN异质结载流子面密度测量的比较与分析

对MOCVD技术在蓝宝石衬底上生长的不同Al组分AlGaN/GaN异质结进行了范德堡法Hall测量和电容-电压(C-V)测量，发现Hall测量载流子面密度值大于C-V测量值，并且随着AlGaN层Al组分的增加，两种测量值都在增加，同时它们的差值也在增加.认为产生这一结果的原因有两方面.一方面，Ni/Au肖特基金属淀积在AlGaN/GaN异质结上，改变了AlGaN势垒层的表面状态，使得一部分二维电子气(2DEG)电子被抽取到空的施主表面态中，从而减小了AlGaN/GaN异质结界面势阱中的2DEG浓度.随着势垒层Al组分的增加，AlGaN层产生了更多的表面态，从而使得更多的电子被抽取到了空的表面态中.另一方面，由于C-V测量本身精确度受到串联电阻的影响，使得测量电容小于实际电容，从而低估了载流子浓度.     

Effect of annealing on contact performance and electrical properties of p-type high purity germanium single crystal

Van de Pauw Hall measurement is an effective method to characterize the properties of semiconductors, such as bulk concentration, mobility, and resistivity, all of which are used to describe the purity level in the semiconductors. However, the performance of the ohmic contacts has a direct impact on the reliability and accuracy of the results obtained from the Van de Pauw Hall measurement. In the present work, the influences of different annealing techniques on the performance of the InSn ohmic contacts have been investigated using a High Purity Germanium (HPGe) crystal sample. The results show that the preferred annealing condition is at 400 °C for 1 hour, which has provided a significant improvement of the InSn contact quality and microscopic homogenization of the impurities in the HPGe crystal. The carrier concentration, charge mobility, and resistivity of the sample annealed at 400 °C for 1 hour are 5.772×10¹⁰/cm³, 1.883×10⁴× cm²/Vs, and 5.795×10³×Ω?cm at 77 K, respectively.     

Contactless measurement of the conductivity of II–VI epitaxial layers by means of the partially filled waveguide method

We report the contactless determination of the conductivity, the mobility and the carrier concentration of II–VI semiconductors by means of the technique of the partially filled waveguide at a microwave frequency of 9 GHz. The samples are CdHgTe epitaxial layers, grown on CdZnTe substrates by molecular beam epitaxy. The conductivity is determined from the transmission coefficient of the sample in the partially filled waveguide. For the analysis of the experimental data, the complex transmission coefficient is calculated by a rigorous multi-mode matching procedure. By varying the conductivity of the sample, we obtain an optimum fit of the calculated data to the experimental results. Comparison with conductivity data determined by the van der Pauw method shows that our method allows to measure the conductivity with good accuracy. The behaviour of the transmission coefficient of the sample is discussed in dependence on the layer conductivity, the layer thickness and the dielectric constant of the substrate. The calculations require to consider in detail the distribution of the electromagnetic fields in the sample region. The usual assumption of a hardly disturbed TE₁₀ mode cannot be used in our case. By applying a magnetic field in extraordinary Voigt configuration, galvanomagnetic measurements have been carried out which yield the mobility and thus the carrier concentration. These results are also in good agreement with van der Pauw transport measurements.     

ZnSxSe1-x单晶的霍尔迁移率

用Vah der Pauw法在77～300K温度范围内测试了n-ZnSxSe1-x(x=0.15)单晶的霍尔迁移率,共最大值为2150cm2/V·s迁移率随温度变化的实验结果与载流子散射的几种理论模型曲线相比较,得出在120K附近为界,在高温区中极化的光学声子散射限定迁移率;在低温区中光学声子散射和离化本征受主散射的混合模型或离化本征受主散射限定迁移率。认为离化本征受主是一次电离的Zn空位。     

Copper coated nickel foam as current collector for H2S-containing syngas solid oxide fuel cells

Copper coated nickel foam with Cu/Ni ratio of 2.5 was fabricated using electrochemical plating and characterized using XRD, SEM, EDS and Van der Pauw four point conductivity measurements. Copper coated nickel foam exhibited good stability of electronic conductivity and mechanical strength during more than 150 h exposure to 500 ppm H₂S-containing syngas at 750 °C. In contrast, uncoated nickel foam readily underwent severe carbon deposition and brittle fracture resulting in dramatic increase of electronic resistance under the same testing conditions. Copper coated nickel foam is a promising current collector for H₂S-containing syngas solid oxide fuel cells (SOFCs).     

Integer quantum Hall effect in a PbTe quantum well

Transport measurements have been carried out on a 10 nm n-type PbTe/Pb_0.9Eu_0.1Te quantum well at millikelvin temperatures. The Hall and longitudinal resistances are measured in a Van der Pauw geometry under high magnetic fields up to 23 T. A robust signature of the integer quantum Hall effect is observed without any sign of parasitic parallel conduction. The unconventional sequence of filling factors associated with the integer quantum Hall effect is discussed in terms of the occupancy of multiple valleys.     

Effect of Intercalated LiF on Interface Contact Characteristics of MoS2 Field Effect Transistor: A First-Principles Study

Based on the first-principles calculation, the effect of intercalated LiF on the contact characteristics of the interface between Au electrode and MoS₂ layer is studied. It is found that adding LiF film can change the contact type between metal electrode Au and MoS₂ layer from Schottky contact to ohmic contact, which is accompanied by interfacial charge transfer from LiF layer to MoS₂ layer and the downward movement of d (d_xy and d_z2) orbital of Mo atom and p (p_x and p_y) orbital of S atom to Fermi level. And the interlayer spacing between LiF layer and Au electrode has a great impact on the interface contact characteristics. The electric field effect and stress effect of interface contact of Au, LiF and MoS₂ (Au/LiF/MoS₂)is more obvious than that of interface contact of Au and MoS₂ (Au/MoS₂). Au/LiF/MoS₂ shows ohmic contact with the interlayer spacing between Au layer and LiF layer less than 3.05 Å and with the electric field less than 0.15 VÅ⁻¹, respectively, while Au/MoS₂ still shows N-type Schottky contact. These findings are helpful to control the contact resistance and have guiding significance for high performance MoS₂ field effect transistor and other electronic components.