容性耦合射频氩等离子体放电诊断研究及仿真模拟

针对中等气压、中等功率下射频容性耦合(CCRF)等离子体的放电特性,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar为工作气体,研究同一气压时不同射频输入功率下等离子体电子温度和电子密度的分布规律。同时依据仿真模型设计制作相同尺寸的密闭玻璃腔体和平板电极,实验测量了不同射频输入功率时放电等离子体的有效电流电压及发射光谱,进而计算等离子体的电子温度及电子密度;利用玻耳兹曼双线测温法,得到光谱法下等离子体的电子温度及电子密度。结果表明:当气体压强为250 Pa、输入功率为100~450 W时,等离子体电压电流呈线性关系,电子密度随功率的增大而增大,而电子温度并未随功率的变化而有明显变化,其与功率无关。运用仿真模拟验证了实验的准确性,通过比较,三种方法所得的结果相近。通过结合等效回路法、光谱法和数值模拟仿真法初步诊断出中等气压下等离子体的放电参数,提出了结合三种方法作为实验研究的方法,使实验结果更具说服力,证明其方法的可靠性,也为进一步的等离子体特性研究提供依据。     

射频容性耦合等离子体放电特性的光谱诊断

利用流体模型模拟和发射光谱实验诊断相结合的方法,研究了中等气压、中等功率下射频容性耦合等离子体的放电特性。理论上,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar气为工作气体,研究了不同气压以及不同射频输入功率下等离子体电子温度和电子密度的分布规律。实验上,依据仿真模型设计制作了相同尺寸的密闭玻璃腔体和平板电极,采用13.56 MHz射频放电技术电离腔体内的工作气体Ar气,测量了不同气压、不同射频输入功率时放电等离子体的发射光谱。通过分析和选择适当的Ar Ⅰ和Ar Ⅱ的特征谱线,分别利用玻尔兹曼斜率法以及沙哈-玻尔兹曼方程计算了等离子体的电子温度与电子密度,并结合模拟仿真结果对光谱诊断结果进行了修正。结果表明：当气体压强为300~400 Pa、输入功率为600~800 W时,等离子体近似服从玻尔兹曼分布,此时利用光谱法得到的等离子体参数与仿真结果相符合。仿真模拟与光谱实验诊断相结合的方法可初步诊断出中等气压下等离子体的放电参数,增加了玻尔兹曼斜率法和沙哈-玻尔兹曼方程在等离子体放电中的使用范围,扩大了光谱法在低电子密度容性耦合等离子体参数诊断的应用场合,为中等气压容性耦合等离子体在工业与军事上的应用研究提供了重要物理状态的分析手段。     

氩气/空气ICP放电现象研究和基于H_β光谱展宽的微波干涉电子密度诊断方法

闭式腔体ICP是解决飞行器等离子体局部隐身的可行方案,其电子密度Ne在电磁波入射方向上的分布是影响其电磁波衰减效果的关键因素。对此,开展了在30.8cm×30.8cm×5.8cm石英腔体内的ICP放电实验,通过实验研究了空气/氩气ICP的E-H模式跳变的物理现象,通过测量得到了空气/氩气环状ICP的宽度和覆盖面积比例随电源功率变化的规律,并给出了上述实验现象的理论解释。为了得到平面型ICP的电子密度在微波入射方向的分布,提出基于Hβ光谱展宽的微波干涉分布诊断法,分别对平面真空腔室内空气/氩气ICP的电子密度在电磁波入射方向上的分布进行了诊断,通过H_β(486.13nm)Stark展宽拟合和微波干涉过程分别获取电子密度分布函数的两项参数,得到了电子密度分布随放电功率变化的曲线。实验可得到电子密度范围为0.5×10~(11)~3.2×10~(11) cm~(-3)的环状ICP源,实验结果表明,ICP的电子密度受气体种类,射频功率影响较大,峰值电子密度接近ICP的中心位置,通过比较发现,氩气的电子密度较高,有效拟合区域较窄,空气的有效拟合区域较宽,覆盖面积较大。     

电负性气体的掺入对容性耦合Ar等离子体的影响

本文利用朗缪尔静电探针对掺入了电负性气体O₂, Cl₂, SF₆的由4068 MHz激发的单射频容性耦合Ar等离子体进行了诊断测量. 测量结果表明: 随着电负性气体流量的增加, 电子能量概率分布函数出现了高能峰, 高能峰且有向高能侧漂移的现象; 电负性气体掺入Ar等离子体后显著降低了等离子体的电子密度; 电子温度随着电负性气体流量比的增加而升高. 另外, 本文还测量了掺入三种电负性气体后在不同流量比下的混合气体等离子体的电负度α . 对实验现象进行了初步的解释. 关键词： 电负性等离子体 电子密度 电子温度 电负度     

13.56 MHz 低频功率对60 MHz射频容性耦合等离子体的电特性的影响

使用补偿朗缪尔探针诊断技术,研究了60MHz/13.56MHz双频激发容性耦合等离子体的空间电子行为,得到了电子能量概率函数(EEPF)随径向位置和低频输入功率的演变行为. 实验结果表明,13.56MHz射频输入功率的变化主要影响低能电子的布居,其影响随气压升高而加大. 在等离子体放电中心以外,EEPF呈现出双峰分布的特性,同时发现从放电中心到极板边缘,次能峰有逐渐向高能区漂移的现象,次能峰的出现显示了中能电子的增强的加热效应. 通过EEPF方法,计算了等离子体的电子温度、电子密度. 讨论了等离子体中的电 关键词： 双频激发容性耦合等离子体 朗缪尔探针诊断 电子加热模式     

低压氩气电感耦合等离子体特性分析及光谱诊断

电感耦合等离子体具有电子密度高、放电面积大、工作气压宽、结构简单等特点,在等离子体隐身领域具有突出的潜在优势。相对于开放式等离子体,闭式等离子体更适应于飞行器表面空气流速高、气压变化大的特殊环境。研究着眼于飞行器关键部件的局部隐身应用,设计了一种镶嵌于不锈钢壁中的圆柱形石英腔体结构,利用电感耦合放电的方式在腔体中产生均匀的平板状等离子体。由于增加了接地金属,降低了腔体内的钳制电位,同之前的纯石英腔体相比,该结构显著改善了等离子体的均匀性。研究了该闭式腔体内氩气电感耦合等离子体（ICP）的放电特性和发射光谱,实验中放电功率达到150 W时,可以明显观察到ICP的E-H模式转换,此时发射光谱和电子密度都呈现阶跃式增长。氩气发射光谱强度随放电功率升高显著增加,但是不同谱线强度增加幅度并不一致,分析认为是受不同的跃迁概率和激发能的影响。根据等离子体的发射光谱,利用玻尔兹曼斜率法对电子激发温度进行诊断,得到电子激发温度在2 000 K以上,并且随功率升高而降低,因为功率增大使电子热运动增强,粒子间的碰撞加剧,碰撞导致的能量消耗也更大。电子激发温度沿腔体径向呈近似均匀分布,分布趋势受功率影响不大。针对利用发射光谱诊断电子密度误差较大、计算繁琐的问题,引入Voigt卷积函数,经过拟合滤除多余展宽项的影响,得到准确的Stark展宽半高宽。最终利用发射光谱Stark展宽法计算了电子密度,腔体中心处的峰值密度可以达到7.5×1017 m-3。随着放电功率增大,线圈中容性分量降低,耦合效率增大,电子密度随之增大,但空间分布趋势基本不受功率影响。     

射频感应耦合Ar-N2等离子体物理特性的Langmuir探针测量及理论研究

分别通过Langmuir探针测量和动力学模型模拟方法研究了射频感应耦合Ar-N2等离子体中电子能量分布、电子温度、电子密度等物理量随N2含量的变化规律.实验研究结果表明:电子能量分布呈现出非Maxwell型分布,并由双温分布向三温分布过渡;电子温度在不同的气压下随N2含量的增加呈现出不同的变化规律.在放电气压小于1.3 Pa时,电子温度随N2含量的增加而下降;当气压大于1.3 Pa时,电子温度随N2含量的增加先迅速上升而后缓慢下降.在不同的放电气压下,电子密度随N2含量的增加迅速下降.数值模拟结果与Langmuir探针测量结果趋势一致.     

氦氩射频容性放电发射光谱分析

光抽运亚稳态稀有气体激光器利用放电等离子体作为激光的增益介质.为掌握容性射频放电的放电参数对等离子体各项参数的影响的基本规律,利用等离子体发射光谱法研究了氦氩混合气体在不同装置、不同Ar组分、不同气压和不同射频注入功率下的等离子体参数.利用残留水蒸气产生的OH自由基A~2Σ~+→X~2Π的转动光谱分析获得气体温度;利用电子态光谱的玻尔兹曼做图法获得电子激发温度,利用Ar原子696.5 nm谱线的斯塔克展宽获得电子密度.结果表明:气体温度随气压增加略微上升,在一个大气压下改变组分和放电功率,气体温度变化不大;电子激发温度随总气压的下降而上升,且随着Ar组分的增加而略微下降;目前放电条件下的电子密度均在10~(15)cm~(-3)量级;长时间放电监测表明,残留的水蒸气会导致电子温度的下降,从而降低Ar亚稳态的产率.     

气压对大面积等离子体片电子密度分布的影响

利用脉冲磁约束线形空心阴极放电装置,在15mT磁场约束下,产生了持续时间为200μs、峰值放电电流为3A、面积为60cm×60cm的大面积等离子体片。采用快帧法和旋转空心阴极法,在90~210Pa内,利用朗缪尔探针首次获得了不同气压的等离子体片的厚度向电子密度分布及其演化构成的二维分布图;研究了在同等峰值放电电流条件下,等离子体片达到最大厚度向峰值电子密度时,气压对所需放电时间、最大厚度向峰值电子密度及电子密度半高宽的影响。结果表明:在相同的峰值放电电流条件下,等离子体片达到最大厚度向峰值电子密度的时间随气压的降低而减小;气压越低,最大厚度向峰值电子密度越大,电子密度半高宽越小。     

13.56 MHz/2 MHz柱状感性耦合等离子体参数的对比研究

通过Langmuir双探针和发射光谱诊断方法,对比研究了驱动频率为13.56 MHz和2 MHz柱状感性耦合等离子体中电子密度和电子温度的径向分布规律.结果表明:在高频和低频放电中,输入功率的增加对等离子体参数产生了不同的影响,高频放电中主要提升了电子密度,低频放电中则主要提升了电子温度.固定气压为10 Pa,分别由高频和低频驱动时,电子密度的径向分布均为"凸型".而电子温度的分布差异比较明显,高频驱动时,电子温度在腔室中心较为平坦,在边缘略有上升;低频驱动时,电子温度随径向距离的增加而逐渐下降.为了进一步分析造成这种差异的原因,在相同放电条件下采集了氩等离子体的发射光谱图,利用分支比法计算了亚稳态粒子的数密度,发现电子温度的径向分布始终与亚稳态粒子的径向分布相反.继续升高气压到100 Pa,发现不论高频还是低频放电,电子密度的径向分布均从"凸型"转变为"马鞍形",较低气压时电子密度的均匀性有了一定的提升,但低频的均匀性更好.     

电磁波在非磁化等离子体中衰减效应的实验研究

针对等离子体隐身技术在航空航天领域的良好应用前景, 开展垂直入射到具有金属衬底的非磁化等离子体中电磁波衰减特性的理论与实验研究. 利用WKB方法对电磁波衰减随等离子体参数的变化规律进行了理论分析. 利用射频电感耦合放电方式产生稳定的大面积等离子体层, 搭建了等离子体反射率弓形测试系统, 进行了电磁波在非磁化等离子体中衰减效应的实验研究. 利用微波相位法和光谱诊断法, 得到不同放电功率下的等离子体电子密度, 其范围为8.17×10⁹–7.61× 10¹⁰ cm^-3. 本实验获得的等离子体可以使2.7 GHz 和10.1 GHz电磁波分别得到一定的衰减, 且电磁波衰减的理论与实验结果符合较好. 结果表明, 提高等离子体电子密度和覆盖均匀性有利于增强等离子体对电磁波的衰减效果.     

Measurement of electronegativity during the E to H mode transition in a radio frequency inductively coupled Ar/O_2 plasma

This paper presents the evolution of the electronegativity with the applied power during the E to H mode transition in a radio frequency(rf)inductively coupled plasma(ICP)in a mixture of Ar and O2.The densities of the negative ion and the electron,as well as their ratio,i.e.,the electronegativity,are measured as a function of the applied power by laser photo-detachment combined with a microwave resonance probe,under different pressures and O2 contents.Meanwhile,the optical emission intensities at Ar 750.4 nm and O 844.6 nm are monitored via a spectrograph.It was found that by increasing the applied power,the electron density and the optical emission intensity show a similar trench,i.e.,they increase abruptly at a threshold power,suggesting that the E to H mode transition occurs.With the increase of the pressure,the negative ion density presents opposite trends in the E-mode and the H-mode,which is related to the difference of the electron density and energy for the two modes.The emission intensities of Ar 750.4 nm and O 844.6 nm monotonously decrease with increasing the pressure or the O2 content,indicating that the density of high-energy electrons,which can excite atoms,is monotonically decreased.This leads to an increase of the negative ion density in the H-mode with increasing the pressure.Besides,as the applied power is increased,the electronegativity shows an abrupt drop during the E-to H-mode transition.     

Time-resolved radial uniformity of pulse-modulated inductively coupled O_2/Ar plasmas

Time-resolved radial uniformity of pulse-modulated inductively coupled O_2/Ar plasma has been investigated by means of a Langmuir probe as well as an optical probe in this paper. The radial uniformity of plasma has been discussed through analyzing the nonuniformity factor β(calculated by the measured n_e, lower β means higher plasma radial uniformity). The results show that during the active-glow period, the radial distribution of ne exhibits an almost flat profile at the beginning phase, but it converts into a parabola-like profile during the steady state. The consequent evolution for β is that when the power is turned on, it declines to a minimum at first, and then it increases to a maximum, after that, it decays until it keeps constant. This phenomenon can be explained by the fact that the ionization gradually becomes stronger at the plasma center and meanwhile the rebuilt electric field(plasma potential and ambipolar potential) will confine the electrons at the plasma center as well. Besides, the mean electron energy( ε_(on)) at the pulse beginning decreases with the increasing duty cycle. This will postpone the plasma ignition after the power is turned on. This phenomenon has been verified by the emission intensity of Ar(λ = 750.4 nm). During the after-glow period, it is interesting to find that the electrons have a large depletion rate at the plasma center. Consequently, ne forms a hollow distribution in the radial direction at the late stage of after-glow. Therefore, β exhibits a maximum at the same time. This can be attributed to the formation of negative oxygen ion(O~-) at the plasma center when the power has been turned off.     

Measurement of neutral gas temperature in inductively coupled plasmas

Dependence of the neutral gas temperature on the gas pressure and discharge power in an inductively coupled plasma source has been investigated using optical emission spectroscopy. Both nitrogen and argon plasmas have been studied separately. In the case of argon plasma, about 5% nitrogen was added to the total gas flow as an actinometer. The maximum temperature was found to be as high as 1850 K at 1 Torr working pressure and 600 W radiofrequency power. The temperature increases almost linearly with the logarithm of the gas pressure, but changes only slightly with the discharge power in the range of 100–600 W. In a nitrogen plasma, a sudden increase in the neutral gas temperature occurs when the gas pressure is increased at a given discharge power. This suggests a discharge-mode transition from the H-mode (high plasma density) to the E-mode (low plasma density). In the H-mode, the gas temperature is proportional to the logarithm of the gas pressure, as in the argon plasma. However, the gas temperature increases almost linearly with the discharge power, which is in contrast to the case of argon plasma. The electron density in the nitrogen plasma is about 10% of that in the argon plasma. This may explain the observation that the nitrogen neutral temperature is always lower than the argon neutral temperature under the same discharge power and gas pressure.     

感应耦合等离子体的1维流体力学模拟

 采用双极扩散近似的流体力学模型，通过数值模拟方法研究了射频感应耦合等离子体(ICP)中等离子体密度和电子温度等物理量的空间分布，其中射频源的功率沉积由动力学理论给出。分析了不同的射频线圈的驱动电流和放电气压对等离子体密度和电子温度空间分布的影响。在低气压下，等离子体密度基本上保持空间均匀分布。随着放电压强的增加，等离子体密度的分布呈现出明显的空间不均匀性。当线圈电流增大时，等离子体密度和电子温度都随着增大。     

Electric and plasma characteristics of RF discharge plasma actuation under varying pressures

The electric and plasma characteristics of RF discharge plasma actuation under varying pressure have been investigated experimentally. As the pressure increases, the shapes of charge–voltage Lissajous curves vary, and the discharge energy increases. The emission spectra show significant difference as the pressure varies. When the pressure is 1000 Pa,the electron temperature is estimated to be 4.139 e V, the electron density and the vibrational temperature of plasma are peak4.71×10~(11)cm~(-3) and 1.27 e V, respectively. The ratio of spectral lines I391.4/peak I380.5which describes the electron temperature hardly changes when the pressure varies between 5000–30000 Pa, while it increases remarkably with the pressure below 5000 Pa, indicating a transition from filamentary discharge to glow discharge. The characteristics of emission spectrum are obviously influenced by the loading power. With more loading power, both of the illumination and emission spectrum intensity increase at 10000 Pa. The pin–pin electrode RF discharge is arc-like at power higher than 33 W, which results in a macroscopic air temperature increase.     

Modeling plasma equipment using neural networks

Equipment plasma has been modeled semi-empirically using neural networks in conjunction with statistical experimental design. A 3³ factorial design was employed to characterize the plasma, in which the variables that were varied include a source power, pressure, and Ar flow rate. As a test data for model validation, 16 experiments were additionally conducted. A total of six plasma attributes were modeled, which include electron density, electron temperature, and plasma potential as well as their spatial uniformities. A planar, inductively coupled plasma was generated in a multipole plasma etch equipment and Langmuir probe was utilized for data collection. Root mean-squared prediction errors measured on the test data are 0.323 (10 ¹¹/cm³), 0.267 (eV) and 1.141 (V) for electron density, electron temperature, and plasma potential, respectively. Comparisons with a statistical response surface model (RSM) revealed that neural network models are more accurate by an improvement of more than 25% in prediction performance. A similar level of prediction accuracy was also achieved in modeling spatial uniformity data. Consequently, neural networks demonstrated much better prediction capabilities over RSM in modeling complex equipment plasma     

Review of relaxation oscillations in plasma processing discharges

Relaxation oscillations due to plasma instabilities at frequencies ranging from a few Hz to tens of kHz have been observed in various types of plasma processing discharges. Relaxation oscillations have been observed in electropositive capacitive discharges between a powered anode and a metallic chamber whose periphery is grounded through a slot with dielectric spacers. The oscillations of time-varying optical emission from the main discharge chamber show, for example, a high-frequency (\sim 40~kHz) relaxation oscillation at 13.33Pa, with an absorbed power being nearly the peripheral breakdown power, and a low-frequency ( \sim 3 Hz) oscillation, with an even higher absorbed power. The high-frequency oscillation is found to ignite plasma in the slot, but usually not in the peripheral chamber. The kilohertz oscillations are modelled using an electromagnetic model of the slot impedance, coupled to a circuit analysis of the system including the matching network. The model results are in general agreement with the experimental observations, and indicate a variety of behaviours dependent on the matching conditions. In low-pressure inductive discharges, oscillations appear in the transition between low-density capacitively driven and high-density inductively driven discharges when attaching gases such as SF₆ and Ar/SF₆ mixtures are used. Oscillations of charged particles, plasma potential, and light, at frequencies ranging from a few Hz to tens of kHz, are seen for gas pressures between 0.133 Pa and 13.33 Pa and discharge powers in a range of 75--1200 W. The region of instability increases as the plasma becomes more electronegative, and the frequency of plasma oscillation increases as the power, pressure, and gas flow rate increase. A volume-averaged (global) model of the kilohertz instability has been developed; the results obtained from the model agree well with the experimental observations.     

Numerical investigation of radio-frequency negative hydrogen ion sources by a three-dimensional fluid model

A three-dimensional fluid model is developed to investigate the radio-frequency inductively coupled H2 plasma in a reactor with a rectangular expansion chamber and a cylindrical driver chamber, for neutral beam injection system in CFETR. In this model, the electron effective collision frequency and the ion mobility at high E-fields are employed, for accurate simulation of discharges at low pressures(0.3 Pa–2 Pa) and high powers(40 k W–100 k W). The results indicate that when the high E-field ion mobility is taken into account, the electron density is about four times higher than the value in the low E-field case. In addition, the influences of the magnetic field, pressure and power on the electron density and electron temperature are demonstrated. It is found that the electron density and electron temperature in the xz-plane along permanent magnet side become much more asymmetric when magnetic field enhances. However, the plasma parameters in the yz-plane without permanent magnet side are symmetric no matter the magnetic field is applied or not. Besides, the maximum of the electron density first increases and then decreases with magnetic field, while the electron temperature at the bottom of the expansion region first decreases and then almost keeps constant. As the pressure increases from 0.3 Pa to 2 Pa, the electron density becomes higher, with the maximum moving upwards to the driver region, and the symmetry of the electron temperature in the xz-plane becomes much better. As power increases, the electron density rises, whereas the spatial distribution is similar. It can be summarized that the magnetic field and gas pressure have great influence on the symmetry of the plasma parameters, while the power only has little effect.