Br掺杂对石墨烯带隙影响的实验研究（英文）

石墨烯独特的结构和性能使其在纳米电子、半导体器件等领域成为研究的热点,但其零带隙的特性严重限制了其应用。采用化学气化沉积法制备了多层石墨烯,并使用溴蒸汽对制备的多层石墨烯进行掺杂,分析研究了溴蒸汽化学掺杂对石墨烯带隙的影响。为了对比溴蒸汽掺杂对石墨烯带隙的影响,使用633nm He-Ne光分别测量了石墨烯掺杂前和掺杂后的拉曼光谱,根据拉曼光谱计算了石墨烯费米能级移动与掺杂溴蒸汽之间的关系。实验结果表明:溴蒸汽掺杂对石墨烯拉曼光谱G带产生影响;随着掺杂溴蒸汽体积的增加,拉曼光谱G带向高频移动并逐渐趋于稳定;G带和2D带强度比也迅速增加,并最终趋于稳定。费米能级的移动与G峰位置成线性关系,利用G峰峰值位置与费米能级实验关系式计算了溴掺杂后石墨烯的费米能级,分析了化学掺杂对石墨烯带隙的影响。     

镍层间掺杂多层石墨烯的电子结构及光吸收特性研究

采用密度泛函理论计算分析镍原子层间掺杂对多层石墨烯电子结构和光吸收性能的影响.计算结果表明,掺杂镍原子后的石墨烯电子结构发生了改变,双层和三层石墨烯的带隙均可打开,最大带隙为0.604 eV;镍原子掺杂后的石墨烯d轨道电子的态密度在费米能级处产生尖峰效应,体系等离子能量增强;介电常数虚部和消光系数均增大,吸光性能提高.相关工作对深入探讨石墨烯的光学特性具有重要参考价值.     

N/B掺杂石墨烯的光学与电学性质

石墨烯因其独特的化学成键结构而拥有出色的化学、热学、机械、电学、光学特性.由于石墨烯为零带隙材料,限制了其在纳电子学领域的发展.因此,为了拓宽石墨烯的应用范围,研究打开石墨烯带隙的方法显得尤为重要.本文构建了本征石墨烯、N掺杂石墨烯、B掺杂石墨烯三种模型,研究了本征石墨烯和不同掺杂浓度下的N/B掺杂石墨烯的能带结构、电子态密度及光学与电学性质,包括吸收谱、反射谱、折射率、电导率和介电函数等.研究结果显示:1)本征石墨烯费米能级附近的电子态主要是由C-2p轨道形成,而N/B掺杂石墨烯费米能级附近的电子态主要是由C-2p和N-2p/B-2p轨道杂化形成;2)N/B掺杂可以引起石墨烯费米能级、光学与电学性质的改变,且使狄拉克锥消失,进而打开石墨烯带隙;3)N/B掺杂可以引起石墨烯光学和电学性质的变化,且对吸收谱、反射谱、折射率、介电函数影响较大,而对电导率影响较小.本文的结论可为石墨烯在光电子器件中的应用提供理论依据.     

石墨烯在强激光作用下改性的拉曼研究

采用化学气相沉积法制备了不同层数的石墨烯样品.根据石墨烯透过率曲线分析石墨烯样品层数与550 nm处透过率关系的同时,利用拉曼光谱法分析了不同层数石墨烯样品在强激光辐照下的损伤特性.结果表明:单层石墨烯样品经强激光辐照后,G带和2D带均向高频移动;多层石墨烯样品经强激光辐照后只有G带发生了略微的频移;石墨烯样品拉曼光谱G带与2D带强度比值表征了石墨烯的层数,此比值随激光辐照时间的增加而减小,这表明强激光对石墨烯样品具有明显的剥离现象.     

Rb吸附石墨烯纳米带电子性质和光学性质的研究

本文基于密度泛函理论的第一性原理方法了计算了Rb、O和H吸附石墨烯纳米带的差分电荷密度、能带结构、分波态密度和介电函数,调制了石墨烯纳米带的电子性质和光学性质,给出了不同杂质影响材料光学特性的规律.结果表明本征石墨烯纳米带为n型直接带隙半导体且带隙值为0.639 eV;Rb原子吸附石墨烯纳米带之后变为n型简并直接带隙半导体,带隙值为0.494eV;Rb和O吸附石墨烯纳米带变为p型简并直接带隙半导体,带隙值增加为0.996eV;增加H吸附石墨烯纳米带后,半导体类型变为n型直接带隙半导体,且带隙变为0.299eV,带隙值相对减小,更有利于半导体发光器件制备.吸附Rb、O和H原子后,石墨烯纳米带中电荷密度发生转移,导致C、Rb、O和H之间成键作用显著.吸附Rb之后,在费米能级附近由C-2p、Rb-5s贡献;增加O原子吸附之后,O-2p在费米能级附近贡献非常活跃,杂化效应使费米能级分裂出一条能带;再增加H原子吸附之后,Rb-4p贡献发生蓝移,O-2p在费米能级附近贡献非常强,费米能级分裂出两条能带.Rb、O和H的吸附后,明显调制了石墨烯纳米带的光学性质.     

La掺杂3C-SiC电子结构和光学性质的第一性原理研究

采用基于密度泛函理论的第一性原理计算方法,对未掺杂及稀土材料La掺杂3C-SiC的电子结构和光学性质进行理论计算.计算结果表明,La掺杂引起3C-SiC晶格体积增大,掺杂体系能量更小,掺杂体系的结构更稳定;未掺杂3C-SiC是直接带隙半导体,其禁带宽度为1.406 eV,La掺杂后带隙宽度下降为1.161 eV,La掺杂3C-SiC引入了3条杂质能级,能量较高的1条杂质能级与费米能级发生交叠,另外2条杂质能级都在费米能级以下价带顶之上,La掺杂引起3C-SiC吸收谱往低能区移动,未掺杂3C-SiC的静态介电常数为2.66,La掺杂引起静态介电常数增加为406.01,La掺杂3C-SiC是负介电半导体材料.     

Ti-O共掺杂石墨烯的电子结构和光学性质的理论研究

本文利用基于密度泛函理论的第一性原理方法研究了本征石墨烯和不同掺杂浓度下Ti-O共掺杂石墨烯的电子结构和光学性质,并讨论了其内部的微观机制.研究结果表明:本征石墨烯是一种零带隙材料,狄拉克点在费米能级面上,其在紫外光区的光吸收强度较强.Ti-O共掺杂石墨烯可以很好的打开石墨烯的带隙和提高石墨烯的光催化强度,Ti18-O18@G模型费米能级附近的态密度主要由C-p轨道、Ti-d轨道和O-p轨道杂化而成.Ti18-O18@G模型在可见光区的吸收谱强度最大,主要归因于其内部晶格畸变、带隙被打开和杂质能带的出现,这些因素可以促进电子空穴对的产生和分离,从而使石墨烯在可见光区的光催化能力得到增强.本研究结果可为开发高催化活性的石墨烯提供理论依据.     

旋转双层石墨烯的电子结构

本文将第一性原理和紧束缚方法结合起来, 研究了层间不同旋转角度对双层石墨烯的电子能带结构和态密度的影响. 分析发现, 旋转双层石墨烯具有线性的电子能量色散关系, 但其费米速度随着旋转角度的减小而降低. 进一步研究其电子能带结构发现, 不同旋转角度的双层石墨烯在M点可能会出现大小不同的的带隙, 而这些能隙会增强双层石墨烯的拉曼模强度, 并由拉曼光谱实验所证实. 通过对比双层石墨烯的晶体结构和电子态密度, 发现M点处带隙来自于晶体结构中的“类AB堆垛区”. 关键词： 旋转双层石墨烯 第一性原理 紧束缚 电子结构     

Y、Zr、Nb掺杂ZnS半导体第一性原理计算

本文采用第一性原理研究了Y,Zr,Nb在Zn位掺杂ZnS半导体的能带结构和态密度.研究结果表明:Y,Zr,Nb掺杂体系的价带顶与导带底都在布里渊区的G点,为直接带隙半导体材料,掺杂对带隙宽度影响不大,掺杂结构的导带向低能区移动;Y,Zr,Nb在Zn位掺杂的Zn S的费米能级从价带顶移至导带底,说明掺杂后ZnS半导体材料从p型转变为n型,同时费米能级处出现数条杂质能级;Y,Zr,Nb掺杂体系的总态密度的贡献主要来源于Zn 4s、Y,Zr,Nb的4d 5s以及S 3p相互作用.     

K-2N双受主共掺杂P型ZnO的第一性原理研究

本文采用基于第一性原理的密度泛函理论(DFT)平面波超软赝势方法,计算了未掺杂ZnO和K,K-2N掺杂ZnO体系的晶体结构、能带、电子态密度与光学性质.研究表明:K掺杂ZnO体系,带隙变宽,在费米能级附近引入了较浅的受主能级,费米能级进入到价带中.而K-2N共掺杂体系中,带隙变窄,形成了浅受主能级,这个对改善ZnO的p...     

Phonon softening in individual metallic carbon nanotubes due to the Kohn Anomaly

We have studied the line shape and frequency of the G band Raman modes in individual metallic single walled carbon nanotubes (M-SWNTs) as a function of Fermi level (epsilonF) position, by tuning a polymer electrolyte gate. Our study focuses on the data from M-SWNTs where explicit assignment of the G- and G+ peaks can be made. The frequency and line shape of the G- peak in the Raman spectrum of M-SWNTs is very sensitive to the position of the Fermi level. Within +/- variant Planck's over 2piomega/2 (where variant Planck's over 2piomega is the phonon energy) around the band crossing point, the G- mode is softened and broadened. In contrast, as the Fermi level is tuned away from the band crossing point, a semiconductinglike G band line shape is recovered both in terms of frequency and linewidth. Our results confirm the predicted softening of the A-symmetry LO phonon mode frequency due to a Kohn anomaly in M-SWNTs.     

Ni-C共掺杂AgSnO2触头材料电性能第一性原理计算

采用基于密度泛函理论的第一性原理分析方法的CASTEP软件,计算了Ni、C单掺杂和共掺杂SnO₂的晶格参数、能带结构、电子态密度和布局,结果表明:单掺杂和共掺杂均使得晶胞体积略微增大,禁带减小,且仍属于直接带隙半导体,在价带顶和导带底产生杂质能级,其中Ni-C共掺杂时禁带最小,杂质能级最多,电子跃迁需要的能量更小,导电性也就最好.共掺杂时费米能级附近的峰值有所减小,局域性降低,原子间的成键结合力更强,使得SnO₂材料也更加稳定.     

太赫兹波段石墨烯等离子体的增益特性

基于麦克斯韦方程组和物质本构方程对石墨烯表面等离子体进行了研究.从理论上探索了石墨烯表面等离子体激元在太赫兹波段的增益特性曲线,并且讨论了石墨烯表面等离子体增益与石墨烯中载流子浓度、石墨烯所处温度以及载流子动量弛豫时间的关系.研究结果表明:在太赫兹波段增益峰值随着石墨烯载流子浓度的增加而发生蓝移,并且在所讨论的温度范围内,由于增益峰所对应的频率都大于1 THz,因此温度的变化对增益峰值以及相应频率的影响不大,即在不同的温度下,相同载流子浓度所对应的增益曲线上峰值的位置和强度几乎相同;增益与石墨烯载流子动量弛豫时间相关,随着载流子动量弛豫时间的增加,使得激发态激励的电子增加,从而导致石墨烯表面等离子体增益变得更大,但这种动量弛豫时间的增加却因弛豫时间对受激辐射频率影响较小而并未对增益峰值位置产生影响.     

AgSnO2触头材料在Ni-S共掺杂下的第一原理性计算

该研究采用掺杂的方式对SnO₂的导电性能进行改良,基于密度泛函理论的第一性原理,运用CASTEP软件对单掺杂Ni-SnO₂、S-SnO₂和共掺杂Ni-S-SnO₂的晶格参数、能带结构、电子态密度进行了计算,并对其电荷布居进行了分析.结果表明：S单掺杂时,晶胞体积略微增大;Ni单掺杂时,晶胞体积略微减小;而Ni-S共掺杂时,晶胞体积略微增大但增大幅度小于S单掺杂时的晶胞体积.与未掺杂相比,掺杂使得晶胞禁带减小、杂质能级增多、电子跃迁能减小,使其导电性增强,同时,掺杂使得费米能级附近峰值减小,局域性下降,原子间成键更强,材料更稳定.     

Raman Spectroscopic Characterization of Graphene

Abstract

The recent progress using Raman spectroscopy and imaging of graphene is reviewed. The intensity of the G band increases with increased graphene layers, and the shape of 2D band evolves into four peaks of bilayer graphene from a single peak of monolayer graphene. The G band will blue shift and become narrow with both electron and hole doping, whereas the 2D band will blue shift with hole doping and red shift with electron doping. Frequencies of the G and 2D band will downshift with increasing temperature. Under compressed strain, the upshift of the G and 2D bands can be found. Moreover, the strong Raman signal of monolayer graphene is explained by interference enhancement effect. As for epitaxial graphene, Raman spectroscopy can be used to identify the superior and inferior carrier mobility. The edge chirality of graphene can be determined by using polarized Raman spectroscopy. All results mentioned here are closely relevant to the basic theory of graphene and application in nanodevices.     

Electronic Raman Scattering in Graphene

Linear dispersion near the Dirac points in the band structure of graphenes can give rise to novel physical properties. We calculate the electronic contribution to the Raman spectra in graphenes, which also shows novel features. In the clean limit, the Raman spectrum in the undoped graphene is linear （with a universal slope against impurity scattering） at low energy due to the linear dispersion near the Dirae points, and it peaks at a position corresponding to the van Hove singularity in the band structure. In a doped graphene, the electronic Raman absorption is forbidden up to a vertical inter-band particle-hole gap. Beyond the gap the spectrum follows the undoped case. In the presence of impurities, absorption within the gap （in the otherwise clean case） is induced, which is identified as the intra-band contribution. The Drude-like intra-band contribution is seen to be comparable to the higher energy inter-band Raman peak. The results are discussed in connection to experiments.     

Raman spectroscopic studies of pulsed laser‐induced defect evolution in graphene

Raman spectra were obtained for graphene after irradiating the samples by pulsed laser (λ = 248 nm). Changes in the spectra were observed as the pulse laser energy density (PLED) was varied from 0.1 to 0.25 J/cm². Changes in bilayer graphene were accompanied by the appearance of the D peak and the broadening of the G peak. Changes in multilayer graphene are more profound as the Raman spectra changes from a multilayer to bilayer and subsequently to monolayer graphene in response to a slow increase in the PLED. The threshold PLED was found to be dependent on the number of graphene layers. We also irradiate graphene with very high PLED (much above the threshold), and the Raman spectra were found to be significantly changed. The G‐band became broader, and red shifted, while the intensity of the 2D‐band was drastically reduced and an intense defect‐related D peak appeared at about 1350 cm⁻¹. The laser ablation of graphene, both with low‐ and high‐energy intensity, is consistent with the reported theoretical predictions. Copyright © 2013 John Wiley & Sons, Ltd.     

Effect of Gold Nanoparticles and Unwanted Residues on Raman Spectra of Graphene Sheets

We report the effect of gold nanoparticles (AuNPs) and unwanted sodium citrate residues (UnR) left after deposition of AuNPs by drop-casting method on the Raman spectra of graphene sheets (GS). The AuNPs solution was deposited on three different substrates: 5.0 wt% Yb³⁺-doped (Q5) phosphate glass, silica glass (S1), and Si/SiO₂-300 nm (S2) substrates. For Q5 substrate, a slight increase in intensity of the G peak was observed, mostly for thinner layers, which can be attributed to a weak SERS effect shielded by UnR. The combination of the following aspects: a blue shift of the G band position, a slight increase in the FWHM (Full Width at Half Maximum), and a slight increase of the Raman intensities of both G and 2D bands in other GS without UnR supports the argument of shielded SERS effect. On the other hand, the effects of UnR on the S1 and S2 substrates produce a decrease on the Raman intensities of G and 2D bands, opposite to the effect produced by the AuNPs; this result was found more intense for the S2 substrate in relation to S1. This is possibly caused by the greater amount of UnR accumulated on the Si/SiO₂ substrate, due to its higher hydrophilicity in relation to other samples. Additional Raman measurements reveal that the Raman intensity of GS in all substrates is unaffected by the presence of a possible humidity on GS, revealing the effect of UnR. Hence, it is vital to understand how residues influence the salient features of GS/AuNPs.