器件参量对栅极调制碳纳米管冷阴极的影响(英文)

基于电场叠加原理,利用悬浮球模型给出了带栅极纳米管顶端电场与电场增强因子,分析了碳纳米管与衬底之间的接触电阻、器件几何参量以及阴栅极之间的电介质对器件场发射性能的影响.结果表明:接触电阻大大降低了碳纳米管阴极的场发射电流,当接触电阻超过100kΩ时,发射电流密度非常小,此时需要更高的阳极开启电压;当阴栅极之间的电介质为真空时,阴极电子发射性能最佳;除了碳纳米管的长径比之外,栅孔半径、阴栅极间距以及阳极距离等的优化设计,也能提高器件发射性能;通过栅极偏压的调制,可以降低阳极驱动电压.     

一种平行背栅极碳纳米管阵列的场增强因子计算

建立一种平行背栅极碳纳米管阵列阴极,基于电场叠加原理,利用镜像电荷法对其进行计算,给出碳纳米管顶端表面电场增强因子。在此基础上,进一步分析器件各类参数对电场增强因子的影响。分析表明,碳纳米管阵列阴极具有最佳阵列密度,其对应碳纳米管间距大约为碳纳米管高度的两倍,靠阴极阵列边缘部位的碳纳米管发射电子能力比其中心部位的大。除了碳纳米管的长径比之外,栅极宽度、栅极厚度和栅极间距等也对电场增强因子有一定的影响:栅极越宽,场增强因子越大;而栅极厚度、栅极间距越大,场增强因子就越小。     

一种平行背栅极碳纳米管阵列的场增强因子计算

建立一种平行背栅极碳纳米管阵列阴极,基于电场叠加原理,利用镜像电荷法对其进行计算,给出碳纳米管顶端表面电场增强因子。在此基础上,进一步分析器件各类参数对电场增强因子的影响。分析表明,碳纳米管阵列阴极具有最佳阵列密度,其对应碳纳米管间距大约为碳纳米管高度的两倍,靠阴极阵列边缘部位的碳纳米管发射电子能力比其中心部位的大。除了碳纳米管的长径比之外,栅极宽度、栅极厚度和栅极间距等也对电场增强因子有一定的影响:栅极越宽,场增强因子越大;而栅极厚度、栅极间距越大,场增强因子就越小。     

栅极调制纳米线的场增强因子计算

利用悬浮球模型和镜像电荷法计算了栅极调制纳米线的顶端表面电场,给出了场发射增强因子表达式β=1/2（3.5+L/r₀+W）,式中L与r₀分别是纳米线长度与顶端表面曲率半径,W是由栅孔半径R、阴极与栅极间距d以及纳米线自身几何参数所决定的函数．结果表明,纳米线长径比对场增强因子的影响很显著;当阴极与栅极间距较近时,场增强因子随d的增加而减小 关键词： 栅极调制纳米线 场增强因子 悬浮球     

接触电阻对碳纳米管场发射的影响

基于改进的悬浮球模型,计算了碳纳米管和衬底间的接触电阻存在时碳纳米管顶端的局域电场, 并结合Fowler-Nordheim (F-N)场发射规律研究了接触电阻对碳纳米管场发射的影响.研究表明,接触电阻的存在,在高电场区域接触电阻抑制了碳纳米管的电子场发射,导致在高电场区域出现电流饱和及FN直线偏折现象.其原因可归结为接触电阻使得在碳纳米管顶端的局域电场相对于没有接触电阻时相对地减少. 关键词： 碳纳米管 场发射 接触电阻 电流饱和     

碳纳米管和天鹅绒阴极强流发射特性的对比研究

采用电泳沉积法、碳纳米管纸和化学气相沉积直接生长法制备了三种碳纳米管阴极. 从强流发射性能、阴极等离子体膨胀、阴极起动、发射均匀性、工作稳定性以及脉冲放气特性等多个方面, 对比研究了碳纳米管阴极和化纤天鹅绒阴极的强流发射特性, 研究表明碳纳米管阵列和碳纳米管纸阴极发射性能明显优于普通化纤天鹅绒, 碳纳米管阴极发射性能与碳纳米管取向无关, 管壁的缺陷发射对无序碳纳米管阴极强流发射具有重要贡献. 碳纳米管阴极的起动场强约为普通化纤天鹅绒的2/3, 电场上升率相同时碳纳米管阴极比化纤天鹅绒阴极起动时间短12–17 ns. 碳纳米管阴极发射均匀性优于化纤天鹅绒, 尤其是碳纳米管阵列, 整个阴极表面等离子体光斑致密且均匀. 在二极管本底气压为6×10^-3 Pa时, 碳纳米管纸阴极对应的二极管峰值气压不到0.3 Pa, 约为普通化纤天鹅绒阴极的1/5, 碳纳米管阵列阴极放气量在三种阴极中最少, 仅为0.042 Pa. 结果表明, 碳纳米管阴极在强流电子束源和相关高功率微波器件领域具有潜在的应用价值.     

对碳纳米管阵列的场发射电场增强因子以及最佳阵列密度的研究

研究了外电场、碳纳米管自身线度、尤其管的阵列密度对碳纳米管的场发射性能的影响,从理论上深入探索碳纳米管阵列的电场增强因子并提出改善其场发射电子性能的有效途径.研究结果表明,碳纳米管阵列的电场增强因子的数量级一般为102—103,并对任何长径比的碳纳米管阵列,都对应着一个最佳阵列密度,当碳纳米管阵列密度取此最佳密度值时,其电场增强因子明显提高.这里的理论研究对弄清碳纳米管的场发射机理及实验合成高发射性能的碳纳米管阵列有一定的意义 关键词： 碳纳米管阵列 最佳阵列密度 电场增强因子 长径比     

印刷制作的双半导体底层碳纳米管薄膜阴极的稳定电子发射

应用带保护气进行烧结的方法,制作了一种双半导体底层碳纳米管薄膜阴极.利用烧结的银浆形成条形银电极,在条形银电极表面制作了具有相同宽度且平行排列的ZnO掺杂底层和TiO2掺杂底层,在掺杂底层上面制备了碳纳米管膜层.由于保护气的防氧化屏蔽,碳纳米管膜层中的碳纳米管未受损害,ZnO粒子和TiO2粒子也在烧结过程中得到了很好地保护,双半导体底层碳纳米管薄膜阴极获得更优的电子发射特性,且电子发射稳定性也得到有效增强.与普通条形银电极碳纳米管阴极相比,双半导体底层碳纳米管薄膜阴极能够将开启电场从2.09V/μm降低到1.91V/μm,将最大电子发射电流从1 653.5μA提高到2 672.9μA.在2.69V/μm电场作用下,普通条形银电极碳纳米管阴极的电子发射电流仅为421.1μA,而双半导体底层碳纳米管薄膜阴极的电子发射电流能够达到723.5μA.从发射电流稳定性实验曲线可以看出,双半导体底层碳纳米管薄膜阴极实现了稳定的电子发射,表明ZnO掺杂底层和TiO2掺杂底层能够应用于真空环境.利用数码相机获得了具有良好质量的发射图像,验证了双半导体底层碳纳米管薄膜阴极制作的可行性和适用性.     

基于碳纳米管场发射三电极显示器的设计和实验

提出了一种基于碳纳米管场发射三电极大面积全彩色平板显示器模型,其特点是栅极和阴极在同一个平面上,驱动电压低,而电子传输比可以高达29.3%(达到阳极的电子与从阴极碳管上发射出来的电子之比),实验结果和理论模拟的结果符合得很好.阴极和栅极之间的沟槽可以用激光打标机刻蚀形成,用做阴极发射体的碳纳米管浆料用水浴法形成,显示器制作工艺简单.     

锥顶碳纳米管的结构稳定性与场致发射性能

运用密度泛函理论研究了锥顶碳纳米管的结构稳定性与电子场致发射性能.结果表明:在外电场作用下,该体系的结构稳定性明显优于碳纳米锥体、C₃₀半球封口的碳纳米管,且电子发射性能与锥角大小、锥顶构型密切相关,特别是锥角38.9°及棱脊型顶部的cone₁@(6,6)综合性能最优,用其作为场致发射源的阴极时可显著提高发射电流密度并延长器件的使用寿命. 关键词： 锥顶碳纳米管 电子场致发射 结构稳定性 密度泛函理论     

纳米碳管阵列场发射电流密度的理论数值优化

以纳米碳管阵列为研究对象,利用镜像悬浮球模型及Fowler-Nordheim电流密度公式,对纳米碳管阵列的场发射电流密度进行计算,进而综合考虑场发射增强因子及场发射电流密度对纳米碳管阵列场发射性能进行定量优化.参考碳管阵列场发射电流密度最大值及场发射增强因子,表明当纳米碳管阵列间距为碳管高度十分之一时,纳米碳管阵列的场发射性能得到优化.与以前的理论估算结果相比,优化的阵列间距进一步减小.当纳米碳管间距过大,场发射增强因子增加,而场发射电流密度会在更大程度上减小;当纳米碳管密度较大时,场发射增强因子受到静电 关键词： 纳米碳管 场发射 增强因子 电流密度     

Numerical study on the field emission properties of aligned carbon nanotubes using the hybrid field enhancement scheme

The magnitude of the local electric field and the electron emission current density for an array of aligned carbon nanotubes is estimated. For describing in detail the properties of the local electric field in the vicinity of the nanotube tips, a hybrid method allowing for the local determination of the field enhancement factor is introduced. The field factor consists of two parts: an internal factor which describes the structure of the carbon nanotubes and an external factor which represents the field screening effect due to neighboring nanotubes. The current density is obtained using the Fowler–Nordheim equation with the hybrid field enhancement scheme. As a result, the emission properties for an array of nanotubes with a given length are described satisfactorily, and an optimum value for the nanotube spacing is determined. PACS 85.45.Fd; 85.45.Db     

Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system

A microelectronic parallel electron-beam lithography system using an array of field emitting microguns is currently being developed. This paper investigates the suitability of various carbon based materials for the electron source in this device, namely tetrahedrally bonded amorphous carbon (ta-C), nanoclustered carbon and carbon nanotubes.Ta-C was most easily integrated into a gated field emitter structure and various methods, such as plasma and heavy ion irradiation, were used to induce emission sites in the ta-C. However, the creation of such emission sites at desired locations appeared to be difficult/random in nature and thus the material was unsuitable for this application. In contrast, nanoclustered carbon material readily field emits with a high site density but the by-products from the deposition process create integration issues when using the material in a microelectronic gated structure.Carbon nanotubes are currently the most promising candidate for use as the emission source. We have developed a high yield and clean (amorphous carbon by-product free) PECVD process to deposit single free standing nanotubes at desired locations with exceptional uniformity in terms of nanotube height and diameter. Field emission from an array of nanotubes was also obtained.     

Electric field enhancement in field-emission cathodes based on carbon nanotubes

The problem of determining the field enhancement factor in field-emission cathodes based on carbon nanotubes (CNTs) is considered. The electrostatic problem of finding the field enhancement factor for nanotubes with different shapes of the tip as a function of the angle the nanotube makes with the cathode surface and of the interelectrode spacing is solved. The dependence of the electric field enhancement factor on the spacing between vertically oriented nanotubes constituting an array is derived. Making allowance for this dependence gives an optimal value of the surface density of nanotubes in the array at which the emission current density is maximal. The I—V characteristic of CNT-based cathodes is studied with regard to the statistical straggling of their orientation angles. This I—V characteristic is compared with the characteristic obtained with regard to the statistical straggling of the CNT geometrical parameters.     

Optimization for field emission from carbon nanotubes array by Fowler–Nordheim equation

In order to optimize the field emission from carbon nanotubes (CNTs) array by the emission current density, the calculation of the field emission was extended with the floating sphere model and the Fowler–Nordheim equation, and the trend of the emission current density versus the intertube distance (the distance between the nearest CNTs) was mainly discussed in this paper. Only considering the field enhancement factor in the previous works, the field emission from CNTs array was optimized only by possibly decreasing the intertube distance with the maximal field enhancement factor. Herein, both the field enhancement factor and the emission current density were taken into account, the field emission from CNTs array could be optimized analytically with the intertube distance of 10th of the tube height, which was much smaller than the estimated value and the experiment result.     

A thin film triode type carbon nanotube field emission cathode

The field electron emission of carbon nanotubes has been heavily studied over the past two decades for various applications, such as in display technologies, microwave amplifiers, and spacecraft propulsion. However, a commercializable lightweight and internally gated electron source has yet to be realized. This work presents the fabrication and testing of a novel internally gated carbon nanotube field electron emitter. Several specific methods are used to prevent electrical shorting of the gate layer, a common failure for internally gated devices. A unique design is explored where the etch pits extend into the silicon substrate and isotropic etching is used to create a lateral buffer zone between the gate and carbon nanotubes. Carbon nanotubes are self-aligned to and within 10 microns from the gate, which creates large electric fields at low potential inputs. Initial tests confirm high field emission performance with an anode current density (based on total area of the device) of 293 μA?cm^?2 and a gate current density of 1.68 mA?cm^?2 at 250 V.     

Field emission of carbon nanotube array with normal-gate cold cathode

A hexagon pitch carbon nanotube (CNT) array vertical to the normal gate of cold cathode field emission displayer (FED) is simulated by solving the Laplace equation. The calculated results show that the normal gate causes the electric field around the CNT tops to be concentrated and emission electron beam become a column. The field enhancement factor and the emission current intensity step up greatly compared with those of diode structure. Emission current density increases rapidly with the decrease of normal-gate aperture. The gate voltage exerts a critical influence on the emission current.