Ar环境气压对脉冲激光烧蚀制备纳米Si晶粒平均尺寸的影响

采用XeCl脉冲准分子激光器，烧蚀高阻抗单晶Si靶，在1—500 Pa的Ar气环境下沉积制备了纳米Si薄膜. x射线衍射谱测量证实，纳米Si晶粒已经形成.利用扫描电子显微镜观测了所形成纳米Si薄膜的表面形貌，结果表明，随着环境气压的增加，所形成的纳米Si晶粒的平均尺寸增大，气压为100 Pa时达到最大值20 nm，而后开始减小. 从晶粒形成动力学角度，对实验结果进行了定性分析. 关键词： 纳米Si晶粒 脉冲激光烧蚀 表面形貌     

Ar环境气压对纳米Si晶粒成核区范围的影响

为了研究不同环境气压条件下纳米Si晶粒成核区的范围,采用波长为308 nm的 XeCl脉冲准分子激光器,分别在1-200 Pa的Ar气环境下, 烧蚀高阻抗单晶Si靶,在距离烧蚀点正下方2.0 cm处水平放置一系列单晶Si 或玻璃衬底,沉积制备了纳米Si薄膜. Raman谱和X射线衍射谱测量证实了薄膜中纳米Si晶粒已经形成. 扫描电子显微镜的测量结果表明,环境气压的变化影响了衬底上纳米Si晶粒的平均尺寸及其分布范围. 根据成核区位置的确定方法,计算得出随着环境气压的增加纳米Si晶粒成核区的范围先变宽后变窄的规律. 从烧蚀动力学的角度对实验结果进行了分析.     

脉冲激光烧蚀制备纳米Si晶粒成核区位置的确定

为了确定纳米Si晶粒气相成核的位置，采用XeCl准分子激光器，在10Pa氩气环境下，烧蚀高阻抗单晶Si靶，在距离等离子羽正下方2.0cm处、与其轴线平行放置一系列单晶Si或玻璃衬底，沉积制备了纳米Si薄膜. X射线衍射、Raman散射、扫描电子显微镜和原子力显微镜结果均显示，纳米Si晶粒只在距靶约0.5—2.8cm平行距离范围内的样品上形成，在此范围内，随着离靶平行距离的增大，所形成的纳米Si晶粒的平均尺寸逐渐减小，并且晶粒尺寸的分布也发生变化. 根据成核区起始和终止的突变特征，结合晶粒形成后的平抛运动规律，对晶粒气相成核的位置进行了估算. 关键词： 纳米Si晶粒 脉冲激光烧蚀 成核区     

脉冲激光烧蚀制备纳米Si晶粒成核气压阈值及动力学研究

采用脉冲激光烧蚀技术,在室温、低压Ar气条件下通过改变气体压强及靶与衬底间距,对纳米Si晶粒成核的气压阈值进行了研究.根据扫描电子显微镜图像、拉曼散射谱和X射线衍射谱对制备样品的表征结果,确定了在室温、激光能量密度为4 J/cm²、靶与衬底间距为3 cm条件下形成纳米Si晶粒的阈值气压为0.6 Pa.结合流体力学模型和成核分区模型,对纳米晶粒的成核动力学过程进行了分析.通过Monte Carlo数值模拟,表明在气相成核过程中,烧蚀Si原子的温度和过饱和密度共同影响着纳米晶粒的成核. 关键词： 脉冲激光烧蚀 成核 气压阈值 Monte Carlo数值模拟     

外加气流对脉冲激光烧蚀制备纳米Si晶粒尺寸分布的影响

提出一种控制脉冲激光烧蚀制备纳米Si晶粒尺寸分布的新方法。在10Pa的Ar环境中,采用脉冲激光烧蚀高阻抗单晶硅靶沉积制备了纳米Si晶薄膜。在羽辉正上方2.0cm,距靶0.3～3.0cm范围内的不同位置引入氩气流,在烧蚀点正下方2.0cm处水平放置单晶Si(111)衬底来收集制备的纳米Si晶粒。利用扫描电子显微镜观察样品表面形貌,并对衬底不同位置上纳米Si晶粒进行统计。结果表明:在不引入气流时,晶粒的尺寸随靶衬间距的增加先增大后减小,晶粒尺寸峰值出现在距靶1.7cm处;引入气流后,晶粒尺寸分布发生变化,在距靶1.7cm引入气流时晶粒尺寸峰值最大,在距靶3.0cm引入气流时晶粒尺寸峰值最小,且出现晶粒尺寸峰值的位置随着引入气流位置的增加而增大。     

低压下气流对激光沉积纳米硅晶化及尺寸的影响

纳米硅具有明显的光致发光效应和量子尺寸效应,广泛的应用在现代电子工业和太阳能光伏工业中.尺寸影响着纳米硅的实际用途,因此制备尺寸可控的纳米硅晶粒具有很重要的实际意义.本文采用脉冲激光沉积(PLD)技术,在烧蚀点水平方向、距靶2 cm处引入一束流量为5 sccm的氩(Ar)气流,在0.01-0.5 Pa的Ar气压下烧蚀高阻抗单晶硅(Si)靶.在管口正下方1 cm处水平放置衬底来沉积纳米Si薄膜;并用同一装置,在0.08 Pa的Ar气压下分别引入流量为0,2.5,5,7.5,10 sccm的Ar气流沉积纳米Si薄膜.利用原子力显微镜(AFM)、X射线衍射(XRD)、Raman散射对样品表面形貌和微观结构进行分析表征.结果表明:不引入气流时出现纳米Si晶粒的阈值气压是0.1Pa,引入气流后出现纳米Si晶粒的阈值气压为0.05 Pa.晶粒尺寸随着气流流量的增大而减小.     

衬底加温和后续热退火法形成纳米硅晶粒成核势垒的比较

在真空环境中,采用脉冲激光烧蚀技术,分别在衬底加温和室温条件下沉积制备了纳米Si薄膜.对在室温条件下制备得到的非晶Si薄膜,采用后续热退火实现其晶化.通过扫描电子显微镜、Raman散射仪和X射线衍射仪对制备的薄膜形貌、晶态成分进行表征,得到两种情况下纳米Si晶粒形成的阈值温度分别为700 ℃和850 ℃,通过定量计算比较了两种情况下晶粒成核势垒的大小,并从能量角度对阈值温度的差别进行了理论分析.     

液相激光烧蚀合成ZnO及Zn/ZnO纳米颗粒及其光致发光性能

利用532 nm脉冲激光对沉浸在去离子水及十二烷基硫酸钠(SDS)水溶液中的金属锌靶进行液相激光烧蚀,合成了ZnO纳米颗粒和Zn/ZnO核壳结构的纳米粒子. 应用X射线衍射仪,透射电子显微镜,紫外可见光分光光度计和荧光光度计表征产物的微观结构和光学性能,并探讨其形成机理. 结果表明:在去离子水中分别烧蚀2 h和4 h生成的ZnO纳米粒子的平均粒径分别为43 nm和19 nm. 激光的长时间作用可以使纳米粒子粒径减小. 在0.005 mol/L的SDS水溶液中合成了Zn/ZnO核壳结构的纳米粒子,这是由于S 关键词： 脉冲激光烧蚀 ZnO纳米粒子 核壳结构 光致发光     

纳米Si-SiO_x和Si-SiN_x复合薄膜的低温制备及其发光特性

用等离子体增强化学气相沉积法在低温 (低于 5 0℃ )衬底上沉积Si SiOx 和Si SiNx 复合薄膜 ,可得到平均颗粒尺寸小至 3nm的高密度 (最高可达 4 0× 10 1 2 cm- 2 )纳米硅复合薄膜 .5 0 0℃快速退火后 ,这种复合薄膜显现出优异的可见光全波段光致发光特性 .通过比较相同条件下所制备的纳米Si SiOx 和Si SiNx 复合薄膜的光致发光效率 ,发现纳米Si SiNx 具有更为优异的光致发光效率 ,这一点在可见光短波区表现得尤为显著     

非晶态Nb氧化物纳米薄膜可见光区的光玫发光

在低真空及亚高温(200～300℃)下.通过热氧化法在Si单晶基底上合成了呈准直阵列的椎形结构的氧化铌(NbOx)非晶结构纳米薄膜,薄膜经热处理后室温下在可见光区具有很好的光致发光.实验研究了退火温度与发光强度规律,对铌氧化物纳米薄膜的光致发光(PL)机制进行了初步分析和讨论.变功率光致发光(PL)实验有力地支持了初步讨论结果.     

Optical and structural properties of nanocrystalline PbS thin film grown by CBD on Si(1 0 0) substrate

PbS nanocrystalline thin film was prepared by chemical bath deposition on Si(1?0?0) substrate at bath temperatures of 25, 45 and 65 °C. Triethanolamine was added to the aqueous solution, which decreased the grain size and increased the luminescence of the nanocrystalline PbS thin film. PbS nanocrystals were identified using XRD, TEM and AFM. The crystalline size of the PbS film deposited at different bath temperatures was estimated by XRD and TEM to be 7–12 nm. The growth mechanism of the PbS crystallites were described at different bath temperatures. The confinement was reflected in the absorption spectra, photoluminescence excitation and photoluminescence spectra. The luminescence of Si(1?0?0) substrate and PbS nanocrystalline film deposited on Si(1?0?0) were compared, and the results revealed that the PbS nanocrystals altered and notably enhanced the emission features of the Si(1?0?0) substrate. The shifting of the maximum photoluminescence emission wavelength of PbS nanocrystals with a change in bath temperature and the variation in photoluminescent intensity of PbS nanocrystals prepared at 25 °C versus deposition time were investigated. A single-peak fit of a Gaussian function was employed to discern the photoluminescence of PbS on Si(1?0?0) substrate.     

Biocompatible film deposition by using Nd:YAG pulsed laser

A Nd:YAG laser operating at the fundamental wavelength (1064 nm) and at the second harmonic (532 nm), with 9 ns pulse duration, 100–900 mJ pulse energy, and 30 Hz repetition rate mode, was employed to ablate in vacuum (10^?6 mbar) biomaterial targets and to deposit thin films on substrate backings. Titanium target was ablated at the fundamental frequency and deposited on near-Si substrates. The ablation yield increases with the laser fluence and at 40 J/cm ² the ablation yield for titanium is 1.2×10¹⁶ atoms/pulse. Thin film of titanium was deposited on silicon substrates placed at different distance and angles with respect to the target and analysed with different surface techniques (optical microscopy, scanning electron spectrosopy (SEM), and surface profile).

Hydroxyapatite (HA) target was ablated to the second harmonic and thin films were deposited on Ti and Si substrates. The ablation yield at a laser fluence of 10 J/cm ² is about 5×10¹⁴ HA molecules/pulse. Thin film of HA, deposited on silicon substrates placed at different distance and angles with respect to the target, was analysed with different surface techniques (optical microscopy, SEM, and Raman spectroscopy).

Metallic films show high uniformity and absence of grains, whereas the bio-ceramic film shows a large grain size distribution. Both films found special application in the field of biomaterial coverage.     

Aluminum-assisted crystallization and <Emphasis Type="Italic">p</Emphasis>-type doping of polycrystalline Si

Aluminum-doped p-type polycrystalline silicon thin films have been synthesized on glass substrates using an aluminum target in a reactive SiH₄+Ar+H₂ gas mixture at a low substrate temperature of 300 °C through inductively coupled plasma-assisted RF magnetron sputtering. In this process, it is possible to simultaneously co-deposit Si–Al in one layer for crystallization of amorphous silicon, in contrast to the conventional techniques where alternating metal and amorphous Si layers are deposited. The effect of aluminum target power on the structural and electrical properties of polycrystalline Si films is analyzed by X-ray diffraction, Raman spectroscopy, scanning electron microscopy and Hall-effect analysis. It is shown that at an aluminum target power of 100 W, the polycrystalline Si film features a high crystalline fraction of 91%, a vertically aligned columnar structure, a sheet resistance of 20.2 kΩ/□ and a hole concentration of 6.3×10¹⁸ cm⁻³. The underlying mechanism for achieving the semiconductor-quality polycrystalline silicon thin films at a low substrate temperature of 300 °C is proposed.     

Preparation and characterization of pulsed laser deposition (PLD) SiC films

Si K-edge XAFS was used to characterize a stoichiometric SiC film prepared by pulsed KrF laser deposition. The film was deposited on a p-type Si(1 0 0) wafer at a substrate temperature of 250 °C in high vacuum with a laser fluence of ∼5 J/cm². The results reveal that the film contains mainly a SiC phase with an amorphous structure in which the Si atoms are bonded to C atoms in its first shell similar to that of crystalline SiC powder but with significant disorder.     

Pulsed laser ablation and deposition of silicon

A KrF laser was used to ablate a polycrystalline Si target for deposition of Si on MgO and GaAs substrates at room temperature. The deposition was performed in 10⁻⁸ mbar, with two types of laser beams: a homogeneous beam being imaged onto the target (2.9 J/cm²), and a non-homogeneous which is nearly focused (2 J/cm², 6.5 J/cm²). In both cases, the beam was scanned over an area of 1 cm². For the homogenous beam, we observed only a limited number of droplets (<0.1 μm). A high number of micron-sized (<5 μm) droplets were observed on the film by the higher fluence nonhomogeneous laser beam. Raman spectroscopy showed that the micron-sized droplets are crystalline while the film is amorphous. The generation of the large droplets is most likely related to the cone structures formed on the ablated target. We also compared cone formation on a polycrystalline Si target and a single crystalline Si wafer, using multiple laser pulses onto a single spot.     

Hydrogen permeation of tungsten phosphate glass thin films

Thin films of tungsten phosphate glasses were deposited on a Pd substrate by a pulsed laser deposition method and the flux of hydrogen passed thorough the glass film was measured with a conventional gas permeation technique in the temperature range 300–500 °C. The glass film deposited at low oxygen pressure was inappropriate for hydrogen permeation because of reduction of W ions due to oxygen deficiency. The membrane used in the hydrogen permeation experiment was a 3-layered membrane and consisted of Pd film (~ 20 nm), the glass film (≤ 300 nm) and the Pd substrate (250 µm). When the pressure difference of hydrogen and thickness of the glass layer were respectively 0.2 MPa and ~ 100 nm, the permeation rate through the membrane was 2.0 × 10^? 6 mol cm^? 2 s^? 1 at 500 °C. It was confirmed that the protonic and electronic mixed conducting glass thin film show high hydrogen permeation rate.