基于一体化微球物镜的超分辨成像系统

利用直径微米量级的透明微球与传统光学显微镜相结合,可以在白光下实现超分辨成像.目前大部分研究是将微球直接播撒到样品表面,由于微球位置的随机性和不连续性导致无法实现特定区域的完整成像,极大限制了该技术的使用范围.使用微探针或微悬臂黏附微球,通过三维位移台精确控制微球位置,一定程度上解决了上述问题,但是需要对微球位置进行精准操控.本文提出了一种结构稳定、参数可控、简单易用的基于一体化微球物镜的超分辨成像系统,对微球与物镜进行了一体化安装设计,通过设计侧视成像及位置反馈系统实现了对微球、物镜和样品三者之间距离的精准控制,结合通用的显微成像系统,实现了对可控特定区域的超分辨成像.该系统将普通显微物镜(40×, NA 0.6)的分辨能力提高了4.78倍,最高可以看到100 nm的样品特征.该一体化物镜可以搭配普通光学显微系统使用,实现超分辨成像,提高了微球超分辨技术的通用性,在亚衍射极限样品的超分辨成像方面具有广泛的应用价值.     

微球透镜亚波长显微成像远场特性实验研究

利用低折射率的二氧化硅和高折射率的钛酸钡微球透镜对蓝光刻录光碟的亚波长表面结构进行了显微成像实验,观察了两类微球在空间上与样品表面分离时的成像特性.实验结果表明:在微球透镜与样品表面分离0～6μm的空间范围内,微球透镜对亚波长纳米结构仍具有分辨能力,且放大作用明显.通过实验比较,发现在浸没方式、放大率大小、成像尺度范围...     

样品表面银膜的粗糙度对钛酸钡微球成像性能的影响

研究了样品表面镀有不同表面粗糙度的银膜对钛酸钡（BaTiO₃ glass,BTG）微球成像效果的影响,发现当银膜表面的粗糙度（RMS）从3.23 nm增大到6.80 nm时,用直径为15 μm的BTG微球观察直径为250和580 nm的微球阵列,样品的成像范围增大.另外,BTG微球还可以清晰分辨原本不可分辨的直径为200 nm的微球阵列.结果表明,粗糙银膜引起的散射作用和表面等离激元波的局域场增强效应,使得更多物体的高频信息耦合进微球,提高了微球成像的分辨率和成像范围.     

基于NOA73微球与SU-8微柱的微探针制作

集成紫外固化胶NOA73微球与SU-8微柱制造的亚毫米探针,可以作为关键部件应用于三坐标测量机。NOA73微球通过NOA73对其他溶液的界面张力形成,柱子由深紫外光穿过微球曝光SU-8形成。这种新技术利用甘油补偿NOA73与空气折射率差,使得紫外光透过NOA73微球后保持接近平行。最终得到高深宽比的探针结构,高度超过1 200 m,微柱侧壁与基底呈89。     

微球透镜对亚波长表面结构的显微成像研究

为了研究微球透镜对亚波长物体的成像特性,利用直径为3.4μm的二氧化硅微球透镜对刻录蓝光光碟的亚波长表面结构进行了显微成像实验,观察了不同排列方式和液体浸没深度下微球透镜的成像特性。实验结果表明:微球透镜在不同浸没深度下对亚波长表面结构具有放大作用,放大率为1.2~1.8倍,并且通过微球透镜的密排列,可以获得更大的视场;浸没液体深度增大时,图像的放大率减小,视场增大。基于时域有限差分的电场仿真表明,微球透镜可以将光场汇聚成半高全宽为260nm,纵向可持续几个微米的高强度光区域,引起强的背景散射,从而获得普通光学显微镜不能分辨的亚波长表面结构图像。     

基于NOA73微球与SU-8微柱的微探针制作（英文）

集成紫外固化胶NOA73微球与SU-8微柱制造的亚毫米探针,可以作为关键部件应用于三坐标测量机。NOA73微球通过NOA73对其他溶液的界面张力形成,柱子由深紫外光穿过微球曝光SU-8形成。这种新技术利用甘油补偿NOA73与空气折射率差,使得紫外光透过NOA73微球后保持接近平行。最终得到高深宽比的探针结构,高度超过1 200μm,微柱侧壁与基底呈89°。     

微球辅助相移干涉三维形貌测量

相移干涉显微镜在微观物体三维形貌的重构横向分辨率上受衍射极限影响,一般在微米级,限制其应用。将高折射率微球嵌入Mirau型相移干涉显微系统中,利用微球超分辨机理提高了其三维重构横向分辨能力,通过和原子力显微镜的测量对比验证了方法的可行性。仿真分析了微球尺寸对光子纳米喷流效应和超分辨能力的影响;同时使用两种不同尺寸的微球对275nm线宽的标准光栅样品进行了三维形貌重构;结果表明,在两种微球的辅助下,相移干涉显微系统均能够精确还原样品的三维结构,光栅深度测量结果与原子力显微镜结果相当。在微球辅助下,系统的横向分辨能力达到了275nm,相较于不使用微球的情况下提高了2.1倍,微球的最高放大率达到了3.4倍。系统在微纳米测量等领域具有较高的应用价值。     

微球透镜超分辨显微成像与检测技术综述

受衍射极限的影响,传统光学显微镜的分辨率最高约为波长的一半,突破衍射极限,获得更高的成像分辨率是近年来显微成像领域的研究热点。相比于其他超分辨显微成像方式,基于微球透镜的超分辨显微成像方式具有简单直接、免标记等优点。主要介绍国内外研究团队将微球与传统的光学显微镜结合实现超分辨显微成像的研究进展,从微球透镜参数选择、成像方案、成像分辨率、成像视场及成像机理等多角度进行总结与比对;并结合课题组工作,介绍了将微球透镜与干涉显微技术相结合的三维超分辨检测技术,阐述了Linnik型与Mirau型两种检测光路原理,分析了三维超分辨检测的效果;展望了微球透镜超分辨显微技术在显微成像与显微干涉检测两个方面待解决的问题与发展方向。     

介质微球超分辨成像薄膜

针对现有基于微球的超分辨成像系统中液体浸没方式的不稳定性和繁琐性,提出采用介质层来替代液体层,制成含有单层密排微球的薄膜.研究折射率较低的二氧化硅微球和折射率较高的钛酸钡微球浸没在三种不同液体中时的成像特性,设计并制备了一种由单层密排的钛酸钡微球和聚二甲基硅氧烷(PDMS)软膜构成的薄膜,并开展了相应的超分辨成像实验.结果表明:当液体折射率在1.33~1.548之间时,二氧化硅微球只有在半浸没时才能分辨出小于衍射极限的样品特征,而钛酸钡微球则需要全浸没才能实现超分辨成像.在600nm中心波长的照明下,利用该薄膜可以清晰地分辨出周期为278nm,占空比为1:1的硅结构光栅.     

光盘上集成的液体微透镜阵列与可重构超分辨成像

微透镜辅助显微镜实现超分辨成像观测,具有免标记、无损伤、实时、定域和环境兼容性好等优势.液体微透镜阵列具有均一、易操控的特性,可实现无复杂机械扫描与驱动的超分辨成像.然而,简单高效地精确控制成像距离是微透镜实现超分辨成像的关键技术挑战.本文利用紫外曝光技术,实现了光盘上光刻胶微孔深度的均一性.结合液体自组装技术,在微孔中填充甘油液滴,保证微透镜辅助超分辨的成像距离.在光学显微镜下实现了对226 nm光栅栅线的可重构超分辨观测与1.59倍成像放大.本文从液体微透镜的阿贝显微成像原理出发,通过理论与模拟解释了液体微透镜的成像放大与超分辨特性.由此可见,光盘上集成的液体微透镜阵列在光学纳米测量与传感等器件中展现了巨大的应用潜力.     

SU-8光刻胶应变分布光学全场检测方法

由于SU-8光刻胶的内应力将会影响高深宽比结构的全金属光栅的制作质量,本文针对近年来SU-8光刻胶应力测量困难的情况,提出了一种基于激光剪切散斑干涉技术的SU-8光刻胶应变分布测量的新方法。该方法通过对被测胶体加载前后两幅干涉图像的处理,直接得到被测胶体结构的全场应变分布情况,由胶体的应变变形数据即可反映出内应力的变化和分布趋势。同时使用ANSYS有限元分析软件对同一被测胶体进行应变仿真模拟研究,获得胶体结构的变形场仿真数据。组建了实验系统,进行了实验验证,结果表明:实际测量变形量约为1.189μm,仿真的最大变形量为1.088μm,测量误差在允许范围内,且测量的形变趋势与仿真模拟结果相一致,表明激光剪切散斑干涉技术可应用于SU-8光刻胶的应变分布全场无损检测。     

Direct removal of SU-8 using focused laser writing

SU-8 photoresist is an important material used in the development of micro-devices [1]. Cross-linked SU-8 structures have been known for their thermal stability and their strong resistance to standard solvent, acid and base. Due to the inert properties of this polymer, it is difficult to further modify or remove SU-8 once it is completely cured. We report an effective process to pattern cured SU-8 photoresist on glass using focused laser beam. Laser fabrication has been an important tool in various fields of research [2]. We made use of this laser cutting method to create interesting and useful two-dimensional SU-8 structures. The shapes and sizes of the structures created can be controlled by varying the power of the laser, angle of incident of the focused laser beam, the relative speed with which the laser beam traverse through the SU-8 film and the magnification of objective lens used. Besides two-dimensional structures, we can also create three-dimensional structures. In this case, we made use of a combination of controlled depth cutting and undercutting where focused laser beam is transmitted through the transparent substrate. Some possible applications of the laser patterned SU-8 film are also demonstrated in this work. PACS 42.62-b; 42.82.Cr; 79.60.Fr; 79.20.Ds; 78.66.-w     

Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching

We fabricated sub-micrometer objects with feature sizes about one third of the exposure wavelength using two-photon photopolymerization in an epoxy-based photoresist SU-8 . Owing to the high mechanical strength of this photoresist, an aspect ratio as high as nine was achieved with a 200–300 nm lateral dimension. A simple equation was used to estimate the feature size from the laser parameters such as spot size, exposure time, pulse width, pulse repetition rate, and the material properties including the two-photon absorption coefficient and the exposure threshold dose. Patterns in SU-8 were transferred onto silicon using reactive ion etching, preserving both the feature size and aspect ratio. Vertical sidewalls of the transferred patterns were achieved using the black silicon method. PACS 42.82.Cr; 82.35.Ej; 85.40.Hp     

应用于水下能分辨粒径10 μm～500 μm尾流气泡的成像系统

 针对尾流气泡成像存在的难点,采用片光源切片扫描与高速摄影相结合的技术手段,研制了一套水下激光成像系统。该系统采用激光片光照明,避免了尾流区气泡图像层叠;设计了3组倍率可切换镜头,实现了对大动态范围（10 μm～500 μm）粒径小气泡的成像;将镜头分成前后组,以平行光中继,通过片光与前镜组的同步移动,可实现尾流区一定体积内气泡图像的采样,同时还能保证扫描过程中始终成像清晰。此系统通过在海域进行试验,放置深度为5 m,气泡由目标船产生,产生气泡粒径范围10 μm～2 000 μm,结果表明,系统成像效果良好,满足项目技术要求。     

Spiral three-dimensional photonic crystals for telecommunications spectral range

Three-dimensional photonic crystals consisting of periodic arrays of spiral columns were fabricated in a commercially available photoresist (SU-8) by a direct laser writing technique. Tailoring the pre- and post-processing conditions for the photoresist has enabled the recording of extended, self-supporting periodic structures with sub-diffraction resolution. Pronounced photonic stop gaps were observed at wavelengths between 1.5 and 1.8 μm, close to the telecommunications region. These structures can be used as accurate and robust templates for subsequent infiltration by materials with higher refractive index. PACS 42.65.Re; 42.70.-a; 42.70.Qs     

SU-8去胶工艺对电铸Ni材料力学性能的影响（英文）北大核心CSCD

SU-8负胶具有优异的力学性能、抗化学腐蚀性、热稳定性和生物兼容性,在MEMS工艺和器件中得到广泛应用。镍金属具有良好的力学性能和抗腐蚀性,因此常用来制作MEMS器件。在MEMS执行器中,弹性元件常采用电铸镍制作。SU-8经过经曝光显影后形成致密的交联网络结构是一种高分子聚合物,这种聚合物非常稳定,不溶于强酸强碱及常见的有机溶剂,尤其是在电铸金属结构后的SU-8胶的去除更为困难。目前的SU-8去胶技术,按去胶原理可分:机械物理去胶技术和氧化去胶技术。氧化去胶技术可以有效去除SU-8胶,但氧化去胶方法不同程度地损坏电铸金属,使其力学性能与去胶前相比发生显著的变化。因此需要研究去胶对Ni金属弹性模量的影响,从而为执行机构设计提供准确的基本数据。针对目前运用比较普遍的两种去除SU-8胶方式:微波等离子下游化学刻蚀和强碱熔盐浴,分别进行了去胶实验,对去胶前后的电铸Ni金属进行了弹性模量和硬度测试。实验结果表明,电铸镍的杨氏模量在经过微波等离子下游化学刻蚀后下降18%,而经过强碱熔盐浴后下降36%,但硬度下降不明显。     

Silanization and antibody immobilization on SU-8

SU-8, an epoxy based negative photoresist, has emerged as a structural material for microfabricated sensors due to its attractive mechanical properties like low Young's modulus and chemical properties like inertness to various chemicals used in microfabrication. It can be used to fabricate MEMS structures of high aspect ratio. However, the use of SU-8 in BioMEMS application has been limited by the fact that immobilization of biomolecules on SU-8 surfaces has not been reported. In this study, the epoxy groups on the SU-8 surface were hydrolyzed in the presence of sulphochromic solution. Following this, the surface was treated with [3-(2-aminoethyl) aminopropyl]-trimethoxysilane (AEAPS). The silanized SU-8 surface was used to incubate human immunoglobulin (HIgG). The immobilization of HIgG was proved by allowing FITC tagged goat anti-human IgG to react with HIgG. This process of antibody immobilization was used to immobilize HIgG on microfabricated SU-8 cantilevers.     

355nm激光曝光SU-8胶的XPS谱和FT-IR谱研究

SU-8光胶因具有良好的光刻性能,并可获得稳定的高深宽比而在微加工领域得到了广泛的应用。众多研究采用不同的光源对其进行了多种光刻研究,本文应用355nm激光对SU-8胶进行曝光,分别采用XPS谱和FT-IR谱分析了SU-8胶与激光相互作用过程中,355nm激光对SU-8胶的作用以及反应前后主要成分含量、分子结构的变化,初步探讨了SU-8胶中激光曝光能量与透入深度的关系。     

The three-dimensional photonic crystals coated by gold nanoparticles

We report on the fabrication of metallodielectric photonic crystals by means of interference lithography and subsequent coating by gold nanoparticles. The grating is realized in a SU-8 photoresist using a He-Cd laser of wavelength 442 nm. The use of the wavelength found within the photoresist low absorption band enables fabricating structures that are uniform in depth. Parameters of the photoresist exposure and development for obtaining a porous structure corresponding to an orthorhombic lattice are determined. Coating of photonic crystals by gold nanoparticles is realized by reduction of chloroauric acid by a number of reductants in a water solution. This research shows that the combination of interference lithography and chemical coating by metal is attractive for the fabrication of metallodielectric three-dimensionally periodic microstructures.     

Fabrication of single-mode ridge SU-8 waveguides based on inductively coupled plasma etching

In this paper, a systematic study has been performed for the etching of negative photoresist SU-8 2005 using inductively coupled plasma. The etching rate, vertical profile, surface and sidewall roughness of the waveguide were investigated as a function of the chamber pressure, the bias power, the antenna power, the ratio of flow rate of Ar to O₂, and the etching time. The etching parameters were studied in detail and optimized to minimize the surface roughness in etched areas. Ridge MZI waveguides with SU-8 2005 were fabricated under the optimized etching conditions, resulting in smooth and almost vertical patterns. The waveguides showed single-mode propagation at 1550 nm wavelength and low propagation loss of less than 1.565 dB/cm, which was similar to the waveguides fabricated by the wet-etching technique.