AgGaS2单晶生长石英安瓿镀碳工艺研究

研究了镀碳工艺参数对碳膜的表面形貌、厚度、碳膜与石英管内壁结合力的影响,发现在气体流量为30～40ml/min, 镀碳温度为1040～1060℃,镀碳时间为30～40min,冷却时间为10～12h的条件下,可获得均匀、致密且结合牢固的碳膜层.用此工艺镀碳的石英安瓿生长出的AgGaS2晶体表面光洁,完整性好,缺陷较少.     

基于正交试验的PECVD法沉积氮化硅薄膜工艺参数优化研究

利用多响应正交试验方法研究了PECVD法沉积氮化硅薄膜的工艺参数的优化问题.鉴于目前针对多输出影响过程,尚无有效的方法进行工艺参数优化这一问题,利用综合评分法对衬底温度、气体总流量、NH3/SiH4流量比、反应腔气体压力、高频电场功率5个对氮化硅薄膜的主要质量特性影响较大的工艺参数进行全局优化,再对不满足质量期望的工艺参数进行部分正交分析,对全局优化的结果进行调整,得到最终的氮化硅镀膜的最优工艺参数.国内某光伏企业的验证试验表明了所提方法的有效性.     

用于CdZnTe晶体生长的石英坩埚真空镀碳工艺研究

采用原子力显微镜(AFM)、椭圆偏振光谱仪、Dage-Pc2400推理分析等测试方法研究了石英坩埚真空镀膜工艺获得的碳膜的表面状态、粗糙度,碳膜和石英坩埚的结合力,确定了用于CdZnTe晶体生长的石英坩埚真空镀碳的最优工艺参数.研究表明,以乙醇为碳源,坩埚真空退火9 h后,碳源通入量为1.5 mL时,获得了厚度为0.7163 μm,表面粗糙度为4.7 nm,结合力达8.11 kg的碳膜.采用此工艺镀膜的石英坩埚生长CdZnTe晶体后,碳膜附着完好,晶体表面平整光洁,位错密度降低.     

EACVD摆动衬底空间流场有限元模拟研究

根据EACVD系统的实际几何特点和工艺参数建立了该系统的三维流场有限元模型,研究了衬底温度及摆动周期、热丝参数、进气口参数对衬底表面流场均匀性的影响.结果表明:衬底低速摆动情况下摆动周期的变化对衬底表面流场的分布没有影响,衬底温度,热丝参数,进气口参数对衬底表面流场都有一定的影响,其中,热丝的排列方式以及进气口气体流量对衬底表面流场的影响最大.最后,采用一组优化的沉积参数进行金刚石膜衬底表面流场的仿真计算,结果表明:采用优化的沉积参数可以使衬底表面气体流速和流场的均匀性都得到很大提高,此研究结果为制备高质量金刚石膜提供理论依据.     

气体流量及配比对CVD SiC膜层的影响

本文以甲基三氯硅烷(MTS)为先驱体原料,H2为载气,采用化学气相沉积工艺在反应烧结碳化硅表面制备SiC致密膜层。研究了不同反应气体流量及配比对CVD碳化硅膜层的影响。结果表明:反应气体的流量对膜层的表面形貌影响较大,较大的气流量容易使膜层剥落;减小反应气体流量有利于改善膜层的均匀性。H2/MTS比例影响沉积SiC膜层的相组成。当沉积温度为1200℃,H2/MTS比例为6∶1时,得到的膜层由SiC和C两相组成;当H2/MTS比例为12∶1时,膜层由SiC和Si两相组成;当H2/MTS比例为10∶1时,得到单一相的SiC膜层。在优化的工艺参数下,制备出致密的CVD膜层,经过光学加工后膜层的表面粗糙度为0.72 nm,平面度RMS为0.015λ(λ=0.6328μm)。     

工艺参数对高功率MPCVD金刚石膜择优取向的影响研究

使用自行研制的椭球谐振腔式MPCVD装置,以H2-CH4为气源、沉积功率8 kW条件下,在不同CH4浓度、沉积温度和气体流量工艺条件下制备了大面积金刚石膜.使用X射线衍射仪对金刚石膜的择优取向的变化规律进行了研究.实验结果表明,高功率条件下工艺参数对金刚石膜的择优取向有不同程度的影响.在CH4浓度由0.5;上升到1.0;时,金刚石膜的择优取向由(220)转变为(111),由1.O;上升到2.5;时,则由(111)转变为(220)以及(311);在700 ～ 1050℃温度范围内,随着沉积温度的升高,金刚石膜(111)择优取向生长的倾向增高,当沉积温度高于1050℃时,金刚石膜改变了原先的以(111)择优取向生长的趋势,变为了以(100)择优取向生长;在气体流速为200～1000 sccm范围内时,随气体流量的增加,金刚石膜(111)择优取向的倾向增加.当气体流量大于1000sccm时,金刚石膜(111)择优取向的倾向又稍有降低.     

Eu3+,Tb3+掺杂对RF磁控溅射ZnO薄膜结构的影响

利用RF磁控溅射技术,不同条件下在不同衬底上制备了纯ZnO及Eu3+,Tb3+共掺ZnO薄膜.研究了薄膜的衬底、沉积时间和衬底温度对ZnO薄膜结构及形貌的影响.使用X射线衍射仪(XRD)对样品的结构进行了表征,结果表明:玻璃和石英衬底上的薄膜分别在300℃、镀膜0.5h和常温下、镀膜lh时薄膜具有良好的c轴择优取向,单品质量较好;而硅衬底上的薄膜在300℃、镀膜lh时具有良好的(103)轴择优取向,单品质量略有降低.     

碳热还原氮化法制备β-Sialon粉体的研究

采用山西大同土为主要原料,利用碳热还原氮化法(CRN)制备了β-Sialon材料,并利用SEM、XRD等检测手段对其进行了检测分析.研究了温度、N2流量、保温时间以及配碳量等因素对制备β-Sialon的影响,采用正交设计的方法确定了反应的最佳工艺参数,并在此基础上讨论了α-Si3N4晶种对生成产物的影响.实验结果表明,烧结温度为1500℃,氮气流量为1 L/min,保温时间为2 h,配碳量为0.8化学计量时可以生成较多的β-Sialon相.SEM微观形貌表明具有一定长径比的β-Sialon柱状晶呈均匀分布.此外,加入3;的晶种α-3N4可促使晶粒大小均匀并获得高品质细密结构的粉体.     

碳热原位合成SiC_w/Al_2O_3复相陶瓷粉体的制备工艺及反应机理

本文以高岭土和纳米碳黑颗粒为原料,采用碳热还原原位合成工艺制备SiC_w/Al_2O_3复相陶瓷粉体.通过研究合成温度、保温时间、原料配比以及氩气流量对合成产物的影响,借助XRD、SEM等技术手段进行测试表征,得到了合成工艺的最优参数,并探讨了碳热还原反应的机理.实验结果表明:高岭土与碳黑的摩尔比为1∶ 8,氩气流量为80 mL/min,在1500 ℃下保温2 h,可获得纯净的SiC_w和Al_2O_3复相陶瓷粉体,SiC晶须的平均直径为300 nm左右,长度大于6 μm,长径比大于20,SiC晶须表面光洁,与氧化铝颗粒呈均匀分布.碳热还原高岭土合成SiC_w/Al_2O_3,包括碳热还原SiO_2 与碳热还原莫来石两个阶段,碳化硅晶须的生成遵循气-固(V-S)生长机理.     

射频磁控溅射法制备MoS2薄膜的最佳工艺参数研究(英文)

采用射频(RF)磁控溅射法在石英衬底上制备了MoS₂薄膜。通过正交试验研究了溅射时间、溅射温度、氩气流量和溅射功率对MoS₂薄膜结构的影响。通过XRD、Raman、XPS、EDS和SEM对MoS₂薄膜的结晶度、薄膜厚度和表面形貌进行分析，得到了制备MoS₂薄膜的最佳工艺参数。发现溅射温度较高或较低结晶度都很差，在较低的溅射温度下样品的XRD衍射峰不明显。而当温度为250℃时，样品的XRD衍射峰较多，结晶度较好。根据正交试验法得出溅射温度对MoS₂的结晶效果起着至关重要的作用，其次是氩气流量。当溅射温度为250℃,氩气流量为6 mL/min,溅射时间为30 min,溅射功率为300 W或400 W时，MoS₂膜的结晶度较好。在这个条件下制备的膜较厚，但为以后的实验指明了方向。保持溅射温度、溅射功率和氩气流量不变，通过减少时间成功制备了厚度为58.9 nm的薄膜。     

Cd0.80Zn0.20Te晶体的生长及性能研究

用本实验室合成的Cd0.80Zn0.20Te多晶料为原料,采用改进的布里奇曼法在镀碳和未镀碳的石英安瓿中生长出Cd0.80Zn0.20Te晶锭。使用X射线衍射仪对合成产物及晶锭进行了分析,生长晶体的X射线衍射峰尖锐,摇摆谱对称,表明晶锭的结晶性能较好;用IRPrestige-21红外光谱仪分析了晶体的红外透射光谱,测试结果表明安瓿镀碳后生长的晶体位错密度小,均匀性较好,电阻率优于未镀碳安瓿生长的晶体;晶体的蚀坑密度在103~104cm-2之间,比未镀碳安瓿生长的晶体低1个数量级。     

Ca0．80Zn0．20Te晶体的生长及性能研究

用本实验室合成的Ca0．80Zn0．20Te多晶料为原料，采用改进的布里奇曼法在镀碳和未镀碳的石英安瓿中生长出Ca0．80Zn0．20Te晶锭。使用X射线衍射仪对合成产物及晶锭进行了分析，生长晶体的X射线衍射峰尖锐，摇摆谱对称，表明晶锭的结晶性能较好；用IRPrestige-21红外光谱仪分析了晶体的红外透射光谱，测试结果表明安瓿镀碳后生长的晶体位错密度小，均匀性较好，电阻率优于未镀碳安瓿生长的晶体；晶体的蚀坑密度在10^3-10^4cm^-2之间，比未镀碳安瓿生长的晶体低1个数量级。     

Carbon-limited Dissolution of Oxygen in Niobium

This article deals with results of the invsetigations connected with limitation of oxygen dissolution in niobium by means of creating of the carbide protective coating on the niobium surface or forming of the solid solution of carbon in niobium. It is shown that the carbide coating increases essentially the life time of the niobium parts for vacuum equipment and is consumed as a result of interaction with oxygen. The carbon dissolution in niobium does not hinder redox reaction at the Nb(C)/Nb₂O₅ boundary and causes the conductivity increase of the dielectric film Nb₂O₅.     

Morphology and crystal phase evolution of doctor-blade coated CuInSe2 thin films

CuInSe₂ (CIS) chalcopyrite thin films were prepared using a low-cost, non-vacuum doctor-blade coating and the thermal annealing method. An acetone-based precursor solution containing copper chloride, indium chloride, selenium chloride, and an organic binder was deposited onto a Mo-sputtered soda lime glass substrate using a doctor-blade coating method. After coating, the precursor films were annealed in a quartz tube furnace under low vacuum without the use of a Se atmosphere or reduction conditions. Evolution of the morphology, crystal structure, and thermal decomposition behavior of the films was analyzed by X-ray diffraction, scanning electron microscopy, and thermogravimetric analysis, and the film formation mechanism was suggested. The as-deposited precursor film gradually decomposed with increase in temperature and formed Cu_2−xSe and In₂Se₃ nuclei on the surface of the film. Incorporation of Cu_2−xSe with In₂Se₃ yielded a chalcopyrite CIS phase, which crystallized on annealing above 400 °C. The obtained CIS film showed low-resistive ohmic behavior with a Mo electrode and a high absorption efficiency for visible–infrared (IR) light, making it suitable for use in photovoltaic applications.     

The aging of silicate glass surfaces in humid air

Slicate glass surfaces were observed over several weeks in normally humid laboratory air by atomic force microscopy. Auger spectroscopy and lateral force microscopy measurements were also made. Samples in the study include; vitreous quartz, bulk insulation glass, bulk and fibrous textile e-glass, and bulk container glass. Various features developed on these surfaces are consistent with patterns seen in crystal growth from supersaturated solution. Auger spectroscopy reveals the presence of chemically bound carbon and supports the hypothesis that these crystals are alkali and alkali earth carbonate species. The presence of these crystals is expected to affect the bonding of a coating to silicate surfaces.     

溶胶凝胶法制备WS2-SiO2可饱和吸收体的探究

WS2二维材料独特的光吸收体特性使其成为可饱和吸收体的优选材料。溶胶凝胶法具有操作方便、设备简单、成本低廉等优点。利用溶胶凝胶法在石英基片上制备SiO2材料为主体的WS2-SiO2薄膜是一种实现可饱和吸收体的新思路。本文通过改变实验过程中原料配比、热处理条件、旋涂速度等实验参数确定出溶胶凝胶法制备SiO2薄膜的最佳条件,在此基础上再加入WS2溶液制备出WS2-SiO2薄膜可饱和吸收体,通过共聚焦显微镜、透射电子显微镜、拉曼光谱、X射线衍射等方法对制备的样品进行了测试分析,结果表明采用本文提出的制作方法可以得到外观良好的WS2-SiO2薄膜可饱和吸收体、WS2在 SiO2薄膜中呈多层的多晶颗粒,晶面指数主要为(002)、(004)、(101)、(103)、(006)、(105)。     

Analysis of IBAD silicon oxynitride film for anti-reflection coating application

A SOI-based optoelectronic device needs a high-quality anti-reflection coating on both faces of the device to minimize the optical reflectance from the face. In this work amorphous silicon oxynitride films were deposited on silicon substrates by ion beam assisted deposition (IBAD). The main purpose was to use silicon oxynitride film as single layer anti-reflection coating for SOI-based optoelectronic devices. This application is primarily based on the ability to tune the silicon oxynitride optical functions to the values optimal by changing deposition parameters. The chemical information was measured by X-ray photoelectron spectroscopy (XPS). Spectroscopic ellipsometry (SE) was applied to measure the refractive index and thickness. Single-side polished silicon substrate that was coated with silicon oxynitride film exhibited low reflectance. Double-side polished silicon substrate that was coated with silicon oxynitride film exhibited high transmittance. The results suggested silicon oxynitride film was a very attractive single layer anti-reflection coating for SOI-based optoelectronic device.     

钙钛矿太阳能电池的制备工艺与光伏性能研究

设计和制备结构为FTO玻璃/TiO2致密层/TiO2介孔层/CH3NH3PbI3吸收层/C电极的钙钛矿太阳能电池.采用两步法制备CH3NH3PbI3吸收层:首先通过旋涂技术制备PbI2薄膜,然后将PbI2薄膜在浓度为0.044 mol/L的甲基碘化胺/异丙醇(MAI/IPA)溶液中分别浸泡反应0.5 h、2.5 h、3.5 h和4.0 h后获得CH3NH3PbI3吸收层.研究了浸泡反应时间对CH3NH3PbI3吸收层的结构和形貌以及对电池光伏性能的影响.结果表明:PbI2薄膜在MAI/IPA溶液中反应后形成四方结构的CH3NH3PbI3晶粒,当浸泡反应3.5 h时,CH3NH3PbI3晶粒的平均尺寸最大,均匀性较好;XRD图谱中只有CH3NH3PbI3的特征峰,而PbI2的特征峰完全消失.同时,该条件下制备的钙钛矿太阳能电池的光伏性能最佳,其开路电压0.881 V、短路电流密度达到22.17 mA/cm2,光电转化效率6.79;,且在整个可见光区的光子-电子的转换效率接近50;.     

Fine-patterning on glass substrates by the sol-gel method

A novel process has been developed to form fine patterns on glass substrates. The process consists of the following steps: (1) coating of gel film on a substrate, (2) patterning on the gel film, and (3) heat-treatment. The key point in this process is the control of hardening of the gel films by the addition of organic polymers such as polyethylene glycol (PEG). The addition of PEG increased the viscosity of the coating solutions and delayed the gelation time, but had little effect on the optical properties of the resultant heat-treated glass films. The newly developed process is expected to be applicable to the formation of the optical devices such as diffraction gratings and pre-groovesof optical memory disks.     

线形同轴耦合式微波等离子体CVD法制备金刚石薄膜

线形同轴耦合式微波等离子体CVD装置是一种利用微波天线产生轴向分布的等离子体柱的新型微波等离子体CVD装置.由于它产生的等离子体是沿微波天线分布的,因而可避免石英管式、石英钟罩式以及不锈钢谐振腔式微波等离子体CVD装置中等离子体的分布容易受到金属工件位置干扰的缺点.本文将首先讨论线形同轴耦合式微波等离子体CVD装置的工作原理,其后介绍利用此装置进行的金刚石薄膜沉积实验的初步结果.实验结果表明,利用线形同轴耦合式微波等离子体CVD装置,可在金属衬底上沉积出质量较好的金刚石薄膜.