Some aspects of plasma polymerization of fluorine-containing organic compounds. II. Comparison of ethylene and tetrafluoroethylene

Plasma polymerizations of ethylene and tetrafluoroethylene are compared. In the plasma polymerization of ethylene and of tetrafluoroethylene, glow characteristics play an important role. Glow characteristic is dependent on a combined factor of W/F_m, where W is discharge power and F_m is monomer flow rate. At higher flow rates, higher wattages are required to maintain “full glow.” In the plasma polymerization of tetrafluoroethylene, simultaneous decomposition of the monomer competes with plasma polymerization. Above a certain value of W/F_m, decomposition becomes the predominant reaction, and the polymer deposition rate decreases with increasing discharge power. ESCA results indicate that the plasma polymer of tetrafluoroethylene that is formed in an incomplete glow region (low W/F_m) is a hybrid of polymers of plasma polymerization and of plasma-induced polymerization of the monomer. Polymers formed under conditions of high W/F_m to produce “full glow” are similar, regardless of the extent of decomposition of the monomer. They contain carbons with different numbers of F(CF₃, ? CF₂? , >CF? , >C<) and carbons bonded to other more electronegative substituents.     

Fundamental aspect and behavior of saturated fluorocarbons in glow discharge in absence of potential source of hydrogen

The glow discharge of a series of saturated fluorocarbons, C_nF_2n+2 (n = 1, 2, 4, 6, and 8), was studied with glass substrates which do not contain any hydrogen. It was found that the deposition rate was a function of the F/C ratio of the starting fluorocarbons. That is, fluorocarbons with higher F/C ratio, such as CF₄ and C₂F₆, hardly polymerized, while fluorocarbons with lower F/C ratio, such as C₈F₁₈, polymerized as well as C₂F₄. After plasma exposure, the surface of glass substrate was characterized by measurements of water contact angle, water droplet rolling-off angle, and ESCA. Although all saturated fluorocarbon plasmas could alter the surface more hydrophobic than before, the deposited materials from fluorocarbons with higher F/C were not stable. Also, in plasmas with high F/C fluorocarbons, i.e., CF₄ and C₂F₆, sputtering of the electrode material was observed. © 1992 John Wiley & Sons, Inc.     

POLYMERIZATION OF OCTAFLUOROCYCLOBUTANE IN GLOW DISCHARGE Ⅱ. ESCA AND IR CHARACTERIZATION OF POLYMER STRUCTURE*

In a capacitively coupled discharge with external electrodes, He, H_2, N_2 or Ar were used as plasmagas, polymerization of octafluorocyclobutane was carried out under different conditions by varyingdischarge power, pressure, plasma gas and plasma-gas/monomer ratio. Structure of polymerizedproducts was characterized by IR spectroscopy and ESCA measurement. It was found that therewere six elements in the products, i.e. C, F, Si, O, N and H. The probably existed groups in poly-mers wer investigated. By analyzing the resolved peaks of C_(1S) region in ESCA spectra, effect of thereaction conditions on degree of branching of the polymerized products and the relationship of thepolymer structure wth the mechanism of the competitive ablation and polymerization process werestudied. In addition, polymer deposition process occurring in glow discharge was discussed.     

PECVD of amorphous hydrogenated oxygenated nitrogenated carbon films

An actinometric optical emission spectroscopy (AOES) study of the trends in the concentrations of the plasma species H, CH, CO, OH, and CN in film-producing glow discharges of mixtures of isopropanol and nitrogen was undertaken. Conventional AOES was used to obtain the trends in the plasma concentrations of these species as a function of the proportion of nitrogen in the feed, R_n. A dynamic variant of actinometry in which trends in the concentrations of plasma species are measured as a function of time following the cutting of one of the principal gas flows was also employed to investigate the relative importance of gas phase and plasma/polymer–surface interactions in the production of the species of interest. Each of the above-mentioned species is produced, to some degree, by plasma/polymer–surface reactions. As revealed by transmission infrared spectroscopy, the films deposited contain C H, CO, and O H groups. For R_n > 0, the films become nitrogenated, with both N H and CN groups being present. As revealed by transmission ultraviolet-visible spectroscopy, both the optical gap and the refractive index of the deposited films decrease as R_n is increased. © 1998 John Wiley & Sons, Inc. J Polym Sci B: Polym Phys 36: 1881–1888, 1998     

Diagnostic analysis of styrene plasma polymerization

For studying plasma polymerization of styrene, two in situ diagnostic methods, optical spectroscopy and mass spectroscopy, were used to measure chemical components formed in the discharge volume and their concentrations in plasma column and two sheaths. The synergetic influence of power (W), pressure (p), and monomer flow rate (F) on plasma polymerization was expressed with a composite parameter, W/pF, which is proportional to the energy transferred to styrene monomer molecule. In a certain range of W/pF, the population of C₂H₂ and H₂ produced in the discharge decreased with W/pF, while the concentration of C₈ and C₆ fragments increased, which indicates that different chemical reactions may occur in different intervals of W/pF value. The similarity in change tendency between the deposition rate, the emission intensity of CH and C₄H and mass peak vs. W/pF implies that the polymerization is controlled by the reaction in the gas phase plasma, and supports the view that initial reactive species are produced in plasma, and polymerization is performed on the substrate surface. © 1999 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 37: 325–330, 1999     

A spectroscopic investigation of growth regimes in silane-ammonia discharges used for plasma nitride deposition

Using optical emission spectroscopy (OES) we have been able to distinguish three operating regimes for the ammonia-silane glow discharge used in plasma nitride deposition. By monitoring the deposition rate and analyzing the structure and composition of thea-SiN: H films it has been possible to correlate these three plasma regimes with three distinct deposition mechanisms. The growth plasma may be tuned to each of these regimes by varying one or more of the following three external parameters: ammonia mole fraction, r .f. power, and gas flow rate. Choice of these parameters allows control of the NH _n radical concentration and the residence time in the reactor, and hence control over the number of gas-phase SiH _n -NH _n radical-radical reactions. Thus OES makes control of the film deposition mechanism possible.     

Spectroscopic study on chemical structure of plasma-polymerized hexamethyldisiloxane

A plasma-polymerized material was produced from hexamethyldisiloxane vapor by a glow discharge polymerization technique. Spectroscopic interpretation of the chemical structure of the polymerized hexamethyldisiloxane was studied by spectroscopic means such as IR, XPS, and NMR. The plasma polymer was barely soluble in the usual organic solvents, although it contained a small amount of the monomer and its oligomers. The IR spectrum indicated that the polymer consisted of Si? CH₃, Si? O, Si? CH₂, and Si? H groups. The surface of the polymer was found to retain structural units similar to the monomer from the XPS measurement. On the other hand, the ¹³C and ²⁹Si high-resolution, solid-state NMR measurements revealed that the plasma polymer was highly crosslinked with a variety of conformations and a number of O atoms surrounding a Si atom. Results from the XPS and NMR spectra suggested that the bulk of the polymer was more oxidized than the surface layer; Si atom was preferentially oxidized. A hypothetical chemical structure was proposed for the polymerized hexamethyl-disiloxane.     

PE-CVD of Fluorocarbon/SiO Composite Thin Films Using C4F8 and HMDSO

Plasma copolymerization of hexamethyldisiloxane (HMDSO,(CH₃)₃-Si-O-Si-(CH₃)₃) and C₄F₈ was performed using an RF plasma enhanced chemical vapor deposition method for application to low dielectric constant intermetal dielectrics. Structure of the films was investigated by X-ray photoelectron spectroscopy and Fourier transform infrared (FT-IR) spectroscopy. The film composition was controlled gradually from fluorinated carbon to organic siloxane by changing the mixing ratio of HMDSO/Ar. Dielectric constant of the films ranged from 2–3.3. Thermal stability of the films, which was characterized by intensity loss of IR absorbance peak around 1000–1500 cm^–1 corresponding to C-F _n , Si-O-Si and Si-(CH₂)_n-Si bonds, was inferior to that from C₂F₄/HMDSO/Ar. In situ gasphase FT-IR spectroscopy revealed that there was a marked difference between the gas phase of C₄F₈/HMDSO/Ar and that of C₂F₄/HMDSO/Ar discharges. The IR spectrum of the former combination plasma contained a peak at 1250 cm^–1 with full width at half maximum as large as 150 cm^–1, which suggests that fluorocarbon particles and/or dusts are formed in the plasma. This suggests also that deposition precursors are not only CF _n (n = 1, 2, and 3) but also larger precursors such as C _x F _y (x > 1, y < 2x + 2) in C₄F₈/HMDSO/Ar discharges, which is presumably the cause of difference in thermal stability of the films prepared from C₄F₈/HMDSO/Ar and C₂F₄/HMDSO/Ar mixtures.     

Monitoring the deposition process of metal-doped polymer films using optical emission spectroscopy

Simultaneous plasma polymerization of halocarbons (CF₄ and C₂F₃Cl) and sputtering of metals (Au and Al) or cosputtering [Au + polytetrafluoroethylene (PTFE, Teflon)] have been performed by means of an RF (20 MHz) glow discharge excited by a planar magnetron. The optical emission spectroscopy (OES) has been used for monitoring the deposition process of metal-doped polymer films. The light emission intensity ratios of the relevant species in the plasma volume are given in connection with the characteristics of the films prepared.     

Blue-shifted hydrogen-bonded complexes. II. CH3F(HF)1 n 3 and CH2F2(HF)1 n 3

The equilibrium structures, binding energies, and vibrational spectra of the clusters CH₃F(HF)_{1 n 3} and CH₂F₂(HF)_{1 n 3} have been investigated with the aid of large-scale ab initio calculations performed at the Møller–Plesset second-order level. In all complexes, a strong C–FH–F halogen–hydrogen bond is formed. For the cases n = 2 and n = 3, blue-shifting C–HF–H hydrogen bonds are formed additionally. Blue shifts are, however, encountered for all C–H stretching vibrations of the fluoromethanes in all complexes, whether they take part in a hydrogen bond or not, in particular also for n = 1. For the case n = 3, blue shifts of the ν(C–H) stretching vibrational modes larger than 50 cm⁻¹ are predicted. As with the previously treated case of CHF₃(HF)_{1 n 3} complexes (A. Karpfen, E. S. Kryachko, J. Phys. Chem. A 107 (2003) 9724), the typical blue-shifting properties are to a large degree determined by the presence of a strong C–FH–F halogen–hydrogen bond. Therefore, the term blue-shifted appears more appropriate for this class of complexes. Stretching the C–F bond of a fluoromethane by forming a halogen–hydrogen bond causes a shortening of all C–H bonds. The shortening of the C–H bonds is proportional to the stretching of the C–F bond.     

Molecular adsorption and the chemistry of plasma-deposited thin organic films: Deposition of oligomers of ethylene glycol

Weakly ionized, radio-frequency, glow-discharge plasmas formed from methyl ether or the vapors of a series of dimethyl oligo(ethylene glycol) precursors (general formula: H-(CH₂OCH₂)_n-H;n=1 to 4) were used to deposit organic thin films on polytetrafluoroethylene. X-ray photoelecton spectroscopy (XPS) and static secondary ion mass spectrometry (SIMS) of the thin films were used to infer the importance of adsorption of molecular species from the plasma onto the surface of the growing, organic film during deposition. Films were prepared by plasma deposition of each precursor at similar deposition conditions (i.e., equal plasma power (W), precursor flow rate (F), and deposition duration), and at conditions such that the specific energy (energy/mass) of the discharge (assumed to be constrained byW/FM, whereM=molecular weight of the precursor) was constant. At constantW/FM conditions, two levels of plasma power (and, hence, twoFM levels) and three substrate temperatures were examined. By controlling the energy of the discharge (W/FM) and the substrate temperature, these experiments enabled the study of effects of the size and the vapor pressure of the precursor on the film chemistry. The atomic % of oxygen in the film surface, estimated by XPS, and the intensity of theC-O peak in the XPS C_ls spectra of the films, were used as indicators of the degree of incorporation of precursor moieties into the plasma-deposited films. Analysis of films by SIMS suggested that these two measures obtained from XPS were good indicators of the degree of retention in the deposited films of functional groups from the precursors. The XPS and SIMS data suggest that adsorption of intact precursor molecules or fragments of precursor molecules during deposition can have a significant effect on film chemistry. Plasma deposition of low vapor pressure precursors provides a convenient way of producing thin films with predictable chemistry and a high level of retention of functional groups from the precursor.     

Controlled cationic polymerization of cyclopentadiene with B(C6F5)3 as a coinitiator in the presence of water

The controlled cationic polymerization of cyclopentadiene (CPD) at 20 °C using 1‐(4‐methoxyphenyl)ethanol (1)/B(C₆F₅)₃ initiating system in the presence of fairly large amount of water is reported. The number–average molecular weights of the obtained polymers increased in direct proportion to monomer conversion in agreement with calculated values and were inversely proportional to initiator concentration, while the molecular weight distribution slightly broadened during the polymerization (M_w/M_n ～ 1.15–1.60). ¹H NMR analyses confirmed that the polymerization proceeds via reversible activation of the C? OH bond derived from the initiator to generate the growing cationic species, although some loss of hydroxyl functionality happened in the course of the polymerization. It was also shown that the enchainment in cationic polymerization of CPD was affected by the nature of the solvent(s): for instance, polymers with high regioselectivity ([1,4] up to 70%) were obtained in acetonitrile, whereas lower values (around 60%) were found in CH₂Cl₂/CH₃CN mixtures. Aqueous suspension polymerization of CPD using the same initiating system was successfully performed and allowed to synthesize primarily hydroxyl‐terminated oligomers (F_n = 0.8–0.9) with M_n ≤ 1000 g mol^?1 and broad MWD (M_w/M_n ～ 2.2). © 2008 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 46: 4734–4747, 2008     

Fluorinated comblike homopolymers: The effect of spacer lengths on surface properties

A series of polyacrylate monomers with F‐alkylalkyl [F(CF₂)_n(CH₂)_n′] side groups were prepared by free‐radical polymerization. The effect of the chemical structure on the surface properties of poly(ethylene terephthalate)s was evaluated by variations in the relative length of the fluorocarbon and hydrocarbon units in the side group. The resulting polymers were quite surface‐active in the solid state. The surface and bulk organization was investigated by X‐ray photoelectron spectroscopy analysis. A strong correlation between the bulk organization and surface properties of the polymers was established. The outmost layer, formed from trifluoromethyl groups and some ester functions, suggests that the side chain is arranged irregularly in the polymer–air interface. The length of the lateral chain governs this organization: long fluorinated chains and short hydrocarbon spacers are essential elements of the molecular design for such low‐surface‐energy materials. © 2005 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 43: 3737–3747, 2005     

Kinetic study on the living/controlled cationic polymerization of p‐methoxystyrene coinitiated by tris(pentafluorophenyl)borane

A kinetic study of the living cationic polymerization of p‐methoxystyrene using 1‐(4‐methoxyphenyl)ethanol ( 1 )/B(C₆F₅)₃ initiating system in a mixture of CH₃CN with CH₂Cl₂ 1:1 (v/v) at room temperature was carried out utilizing a wide variety of conditions. The polymerization proceeded in a living fashion even in the presence of a large amount of water ([H₂O]/[B(C₆F₅)₃] ratio up to 20) to afford polymers whose M_n increased in direct proportion to monomer conversion with fairly narrow MWDs (M_w/M_n ≤ 1.3). The investigation revealed that the rate of polymerization was first‐order in B(C₆F₅)₃ concentration, while a negative order in H₂O concentration close to ?2 was obtained. It was also found that the rate of polymerization decreased with lowering temperature, which could be attributed to a decreased concentration in free Lewis acid, the true coinitiator of polymerization. A mechanistic scheme to explain the kinetic behavior of living p‐methoxystyrene polymerization is proposed, which has been validated by PREDICI simulation on multiple‐data curves obtained by ¹H NMR in situ polymerization experiment. © 2008 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 46: 6928–6939, 2008     

Comparisons of glow discharge polymerization between hexamethyldisilazane and trimethylsilyldimethylamine

Glow discharge polymerization between hexamethyldisilazane (HMDSZ) and trimethylsilyldimethylamine (TMSDMA) was compared by means of infrared spectroscopy and ESCA analysis. Infrared spectra pointed out differences in chemical structure between the polymers prepared from the two monomers, although the two polymers were mainly composed of resembling units such as Si? CH₃, Si? CH₂, Si? H, Si? O? Si, and Si? O? C groups: (i) The polymers prepared from TMSDMA contained N → O group, but the polymers from HMDSZ did not contain this group. (ii) Influences of the W/FM parameter (W is the input energy of rf power, F the flow rate of the monomer, and M the molecular weight of the monomer) appeared on decreasing the C? N group and increasing the C?O group in the TMSDMA system, but little influence appeared in the HMDSZ system. ESCA spectra (C_1s, Si_2p, and N_1s core levels) supported the differences between the two polymers elucidated by infrared spectroscopy, and pointed out differences in susceptibility of the Si? N bond to plasma: The N? Si sequence of TMSDMA was completely ruptured in discharge to yield polymers, and the Si? NH? Si sequence of HMDSZ remained in considerable amount.     

Living cationic polymerization of 2‐adamantyl vinyl ether

Living cationic polymerization of 2‐adamantyl vinyl ether (2‐vinyloxytricyclo[3.3.1.1]^3,7decane; 2‐AdVE) was achieved with the CH₃CH(OiBu)OCOCH₃/ethylaluminum sesquichloride/ethyl acetate [CH₃CH(OiBu)OCOCH₃/Et_1.5AlCl_1.5/CH₃COOEt] initiating system in toluene at 0 °C. The number‐average molecular weights (M_n's) of the obtained poly(2‐AdVE)s increased in direct proportion to monomer conversion and produced the polymers with narrow molecular weight distributions (MWDs) (M_w/M_n = ～1.1). When a second monomer feed was added to the almost polymerized reaction mixture, the added monomer was completely consumed and the M_n's of the polymers showed a direct increase against conversion of the added monomer. Block and statistical copolymerization of 2‐AdVE with n‐butyl vinyl ether (CH₂?CH? O? CH₂ CH₂CH₂CH₃; NBVE) were possible via living process based on the same initiating system to give the corresponding copolymers with narrow MWDs. Grass transition temperature (T_g) and thermal decomposition temperature (T_d) of the poly(2‐AdVE) (e.g., M_n = 22,000, M_w/M_n = 1.17) were 178 and 323 °C, respectively. © 2008 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 46: 1629–1637, 2008     

Distribution of polymer deposition in plasma polymerization. I. Acetylene,ethylene, and the effect of carrier gas

Factors which influence the distribution of polymer deposition in an electrodeless glow-discharge system were investigated for acetylene and ethylene. Under the conditions in which “full glow” is maintained, the distribution of polymer deposition from pure monomer flow systems is nearly independent of flow rate of monomer or of the system pressure in discharge, but is largely determined by the characteristic (absolute) polymerization rates (not deposition rate) of the monomers. Acetylene has a high tendency to deposit polymer near the monomer inlet, whereas ethylene deposits polymer more uniformly in wider areas in the reactor. The addition of carrier gas such as argon or partially copolymerizing gas such as N₂, H₂, and CCl₂F₂ was found to narrow the distribution of polymer deposition. The distribution of polymer deposition is also influenced by a glow characteristic which is dependent on flow rate and discharge power.     

Critical evaluation of conditions of plasma polymerization

Under conditions of plasma polymerization, we are dealing with the “reactive” or “self-exhausting” rather than the “nonreactive” or “non-self-exhausting” gas phase (plasma). Therefore, many parameters that define the gas phase, such as system pressure and monomer flow rate, which are measured in the nonplasma state (before glow discharge is initiated), do not apply to a steady state of plasma, the conditions under which most of the studies on plasma polymerization are carried out. Consequently, information based on: (1) the polymer deposition rate measured at a fixed flow rate and discharge power, (2) the dependence of deposition rate on flow rate at fixed discharge power, or (3) the dependence of deposition rate on discharge power at fixed flow rate, does not provide meaningful data that can be used to compare the characteristic nature of various organic compounds in plasma polymerization. The significance and true meaning of experimental parameters applicable to conditions of plasma polymerization are discussed. The most important feature is that plasma polymerizations of various organic compounds should be compared at comparable levels of composite discharge power parameter W/FM, where W is discharge power, F is the monomer flow rate (given in moles), and M is the molecular weight of a monomer.     

Zone-resolved mass spectroscopic study on RF plasma polymerization of styrene

The radiofrequency (rf) glow discharge plasma of styrene was investigated by direct sampling mass spectroscopy. Measurements were taken in three regions of the discharge: the plasma column and two dark zones before the electrodes. The plasma-polymerized styrene (PPS) thin films were analyzed by infrared spectroscopy (IR). The effects of monomer pressure and rf power on the ratios of mass peak heights C₄H/C₄H, C₆H/C₆H₅()CH in the three discharge regions, the polymer deposition rate, and the polymeric structure of the PPS films were studied. It was found that in the different discharge regions and under various discharge conditions, a variety of reactive species were formed by electron impact on monomer molecules. The polymer deposition rate was mainly dependent on the total number of the reactive species produced in the discharge. The concentration of phenyl groups in PPS films was proportional to the relative concentration of phenyl ring-containing reactive species in the gas phase plasma. © 1996 John Wiley & Sons, Inc.     

Distribution of polymer deposition in plasma polymerization. III. Effect of discharge power

Distribution of polymer deposition in an inductively coupled rf discharge system is studied as a function of level of discharge power with acetylene and styrene as monomers. When a fixed flow rate is used, the discharge power has a relatively small effect on the pattern of distribution of polymer deposition as long as values of W/FM, where W is discharge wattage, F is flow rate, and M is molecular weight of monomer, are maintained above a critical level to maintain full glow in the reaction tube. It has been shown that plasma polymerization of two monomers which have different molecular weights can be compared in a fair manner by selecting conditions to yield similar value of W/FM.