Charged and neutral biexciton–exciton cascade in a single quantum dot within a photonic bandgap

We investigate the recombination dynamics of positively charged and neutral biexcitons and excitons in a single InAs/GaAs quantum dot (QD) within a two-dimensional (2D) photonic bandgap (PBG). The 2D PBG makes the exciton lifetime four times longer and enhances photon-extraction efficiency compared to those without the PBG. Photon cross-correlation measurements demonstrate the cascade emissions of both charged and neutral biexcitons–excitons from the same QD. In the charged case, a hole in the p-shell relaxes into the s-shell between the cascade, and the corresponding transition is confirmed based on the spin configuration. The long exciton lifetime with the PBG helps us to reveal the spin dynamics that did not clearly appear in intrinsic QDs.     

氧等离子体处理对GaAs表面单层自组装SiO2纳米球薄膜的影响

二维纳米阵列结构因其重要的光学性能被广泛应用于各类光电子器件。本文对自组装单层SiO2纳米球掩模刻蚀法制备GaAs纳米柱二维阵列结构的关键工艺技术进行了研究。采用旋涂法在GaAs表面制备自组装单层SiO2纳米球,重点研究了GaAs表面氧等离子体亲水处理工艺对纳米球排列特性的影响,获得最佳工艺条件为功率配比100 W+80 W、腔室压力4 Pa、氧气流量20 mL/min、处理时间1200 s,并最终得到排列紧密的大面积单层纳米球薄膜。以单层纳米球为掩模,采用感应耦合等离子体刻蚀技术在GaAs表面制备了纳米柱阵列并测试了其表面光反射谱。测试结果表明,GaAs纳米柱阵列在特定波段的反射率降低至5%,远低于表面无纳米结构的薄膜材料表面高达40%的光反射。分析表明纳米柱可以激发米氏散射共振效应,从而有效降低反射率并提升光吸收。     

Photonic band structure in a two-dimensional hexagonal lattice of equilateral triangles

In this paper, the plane wave expansion method is used to calculate the photonic band structure (PBS) for the transverse electric (TE) polarization in a two-dimensional hexagonal lattice composed air holes with cross-sections in the shape of equilateral triangles embedded in a GaAs background. We consider that the dielectric constant of GaAs is dependent on both hydrostatic pressure and temperature. Further, an increase can be observed in the width of the photonic band gap (PBG) while the lengths of the sides of the equilateral triangles are increased. When the pressure increases in the presence of a constant temperature, the dielectric constant of GaAs decreases; further, the PBS exhibits a more noticeable shift toward regions of higher frequencies than that observed while the temperature is increased at a given pressure. We also observed that the PBG obtained by rotating the triangular holes by an angle θ increases when compared against the results obtained for the lattice of holes without performing any rotation. In addition, the results obtained using the supercell technique denote that the position and width of the PBG remain unchanged while removing a triangular hole from the structure, denoting the presence of a defective band within the PBG.     

Fabrication of semiconductor-and polymer-based photonic crystals using nanoimprint lithography

The technology of fabricating photonic crystals with the use of nanoimprint lithography is described. One-and two-dimensional photonic crystals are produced by direct extrusion of polymethyl methacrylate by Si moulds obtained via interference lithography and reactive ion etching. The period of 2D photonic crystals, which present a square array of holes, ranges from 270 to 700 nm; the aperture diameter amounts to the half-period of the structure. The holes are round-shaped with even edges. One-dimensional GaAs-based photonic crystals are fabricated by reactive ion etching of GaAs to a depth of 1 μm through a mask formed using nanoimprint lithography. The resulting crystals have a period of 800 nm, a ridge width of 200 nm, and smooth nearly vertical side walls.     

Growth of GaAs/AlGaAs hexagonal pillars on GaAs (1 1 1)B surfaces by selective-area MOVPE

We report on the growth of GaAs and GaAs/AlGaAs heterostructured hexagonal pillar structures using selective area (SA) metalorganic vapor phase epitaxy (MOVPE). By performing growth on SiO₂-masked (1 1 1)B GaAs substrates with circular or hexagonal hole openings, extremely uniform array of hexagonal GaAs/AlGaAs pillars consisting {1 1 0} vertical facets with their diameter of order of 100 nm were obtained. Unexpectedly, strong intense light emission was observed for the room temperature photoluminescence measurement of the pillar arrays in triangular lattice, which is promising for the application to the photonic crystals to enhance the light extraction efficiency from the materials with high refractive index. Furthermore, it was also found that hexagonal pillars with size 60 nm and large aspect ratio (>100) by reducing the size of initial hole size of mask, opening a possibility to grow nanowires using epitaxial growth.     

The effect of etching interfacial layers on the absolute photonic band gap in two-dimensional photonic crystals

The photonic band structures of two-dimensional (2D) photonic crystals with etched interfacial layers between air rods and the background dielectric is studied theoretically. The effect of etching interfacial layers on absolute photonic band gap (PBG) is analyzed quantitatively. Numerical calculations are carried out based on Maxwell's equations and the plane-wave expansion method. It is shown that the physical property of interfacial layers influence the absolute PBG, and the existence of interfacial layers cannot enlarge the largest absolute PBG of an ideal case without interfacial layers.     

Hybrid Integration of 1 × 12 Metal-Semiconductor-Metal Photodetector and Polyimide Waveguide Array

We report here a demonstration of hybrid integration of a 1 × 12 metal-semiconductor-metal (MSM) photodetector array and polyimide channel waveguides via 45° total-internal-reflection (TIR) micro-couplers. The two-layer polyimide waveguide array was constructed using Ultradel 9120D for the core and Ultradel 9020 for the lower cladding layer. The coupling loss and propagation loss of the waveguide are 0.2dB and 0.21 dB/cm, respectively. The cross talk of the adjacent channels is -32 dB. The MSM photodetector array was fabricated on a semi-insulated GaAs wafer. The photodetectors are integrated to operate in the conventional vertical illumination mode. We measured the external quantum-efficiency and 3 dB bandwidth of the integrated MSM photodetectors at 0.4 A/W and 2.648 GHz, respectively. The aggregate 3 dB bandwidth of the 12-channel integrated system is 32 GHz.     

Study on maximum band gap of two-dimensional photonic crystal with elliptical holes

In this paper, the maximum photonic band gap (PBG) of two-dimensional (2D) photonic crystal (PC) with elliptical air holes was studied by the finite-difference time-domain (FDTD) method based on changing the ratio (semi-major axis length of elliptical hole to the filling ratio) and azimuth angle of elliptical holes, respectively. It is shown that the PBG exhibits a peak value when the ratio of semi-major axis length to the filling ratio is equal to 0.86 approximately by increasing the filling ratio, and central frequency and the low boundary frequency of PBG decrease linearly with the increasing of semi-major axis length. In the aspect of the influence of azimuth angle from 0 to 90°, the PBG presents a minimum value, and central frequency and the low boundary frequency of PBG become high non-linearly by the increasing of azimuth angle to any filling ratio.     

场发射栅孔阵列的制备

 采用硅的局部氧化技术以及湿法刻蚀技术,利用2.6 μm的光刻掩模板在n型硅片上形成了栅极孔径为1 μm的场发射阴极的栅极空腔阵列,实现了用大阵点尺寸的栅极掩模板制备较小尺寸栅孔阵列。硅的湿法刻蚀溶液采用各向同性的硝酸和氢氟酸混合溶液,刻蚀后空腔的深度和宽度均随刻蚀时间线性增加。同时,由于刻蚀溶液具有较高的Si/SiO₂ 刻蚀选择比,栅极孔径随刻蚀时间增大的速度远低于深度和宽度增大的速度,栅极孔径主要取决于掩模的尺寸和氧化层的厚度。通过选择掩模板的尺寸以及氧化层的厚度,采用局部氧化技术和湿法刻蚀技术能够制备出微米或亚微米的场发射阴极的栅极空腔阵列。     

Formation of three‐dimensional GaAs microstructures by combination of wet and metal‐assisted chemical etching

Previously, plasma‐enhanced dry etching has been used to generate three‐dimensional GaAs semiconductor structures, however, dry etching induces surface damages that degrade optical properties. Here, we demonstrate the fabrication method forming various types of GaAs microstructures through the combination etching process using the wet‐chemical solution. In this method, a gold (Au)‐pattern is employed as an etching mask to facilitate not only the typical wet etching but also the metal‐assisted chemical etching (MacEtch). High‐aspect‐ratio, tapered GaAs micropillars are produced by using [HF]:[H₂O₂]:[EtOH] as an etching solution, and their taper angle can be tuned by changing the molar ratio of the etching solution. In addition, GaAs microholes are formed when UV light is illuminated during the etching process. Since the wet etching process is free of the surface damage compared to the dry etching process, the GaAs microstructures demonstrated to be well formed here are promising for the applications of III–V optoelectronic devices such as solar cells, laser diodes, and photonic crystal devices. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

大带隙二维三角格子光子晶体结构参数的优化设计

光子晶体结构设计优化是理论研究的一个重要内容.运用平面波展开法对圆柱、方柱及正六边柱构造的二维三角格子光子晶体的禁带进行仿真计算,讨论了介质材料分别为GaAs、Si和Ge情况下,柱子形状、旋转角度、填充比的变化对完全光子禁带的影响.发现:对于二维三角格子光子晶体,相对于介质柱,空气柱更易获得完全光子禁带;而相对于圆柱及...     

Formation of AlxGa1−xAs periodic array of micro-hexagonal pillars and air holes by selective area MOVPE

A two-dimensional (2D) periodic array having air/semiconductor interfaces can be applied to photonic crystals (PCs), which are expected to control spontaneous emission and optical transports in the next-generation devices. In this paper, we report on the selective area metal-organic vapor phase epitaxial (SA-MOVPE) growth of a Al_xGa_1−xAs 2D periodic array on a GaAs (1 1 1)B substrate for application to 2DPCs having GaAs/AlGaAs heterostructures. Al_xGa_1−xAs (x=0, 0.25 and 0.50) growth was carried out on triangular lattice array of hexagonal GaAs openings and hexagonal SiN_x masks. A uniform Al_0.50Ga_0.50As hexagonal pillar array and a GaAs hexagonal air-hole array with a 1 μm-period were successfully obtained. The important growth parameter for uniform 2DPC structure formation by SA-MOVPE was clarified. Furthermore, we describe the successful demonstration of a 400 nm-period pillar array and an air-hole array, which corresponds to the optical communication wavelength λ=1.3–1.55 μm. The results indicate that SA-MOVPE method is very promising for the formation of uniform semiconductor 2DPCs without the occurrence of process-induced damages.     

ZnSe-ZnS超晶格的通光蚀孔及列阵研究

用MOCVD方法在GaAs衬底上生长ZnSe-ZnS超晶格.用化学腐蚀方法在GaAs衬底上开一个通光窗口,使该窗口上仅剩有1～1.8μm厚的生长层.室温下测量了蚀孔后由于化学腐蚀造成生长层表面差异的ZnSe-ZnS超晶格的吸收光谱.研究了带有生长过渡层和无过渡层的超晶格质量对其吸收光谱性能的影响.发现过渡层的存在保护了超晶格激子吸收性能.在此基础上首次采用新工艺在3×3mm2面积上把GaAs衬底金部腐蚀掉,剩下均匀、光滑的ZnSe-ZnS超晶格层,在其上做出了300×300μm2的列阵,为在ZnSe-ZnS超晶格上实现光学双稳的集成化提供了必要条件.     

Selective growth of GaAs quantum dots and vertical quantum wires in two-dimensional V-grooves

We propose and demonstrate a novel technique for the fabrication of quantum dot (QD) structures using metal organic chemical vapor deposition (MOCVD). The GaAs quantum dots are grown at the bottom of the two-dimensional V-groove (2DVG) structures which are composed of (1 1 1)A and (1 1 1)B-facets on GaAs(1 0 0). The 2DVG is formed by MOCVD selective growth on a SiO₂ patterned substrate. It should be noted that the 2DVGs cannot be formed by a chemical wet etching technique because the facet's anisotropy of etching ratios are different. By changing the growth condition, we can obtain GaAs QD structures which have a size of less than 10 nm, and vertical GaAs quantum wires (V-QWRs) in 2DVGs. We have observed photoluminescence from each structure. We have also demonstrated stacking of GaAs QDs in the 2DVG on GaAs (1 0 0).     

Strongly enhanced hole-phonon coupling in the metallic state of the dilute two-dimensional hole gas

We have studied the temperature dependent phonon emission rate P(T) of a strongly interacting (r(s) > or =22) dilute 2D GaAs hole system using a standard carrier heating technique. In the still poorly understood metallic state, we observe that P(T) changes from P(T) approximately T5 to P(T) approximately T7 above 100 mK, indicating a crossover from screened piezoelectric (PZ) coupling to screened deformation potential (DP) coupling for hole-phonon scattering. Quantitative comparison with theory shows that the long range PZ coupling between holes and phonons has the expected magnitude; however, in the metallic state, the short range DP coupling between holes and phonons is almost 20 times stronger than expected from theory. The density dependence of P(T) shows that it is easier to cool low-density 2D holes in GaAs than higher density 2D hole systems.     

场发射冷阴极微栅孔阵列制备技术

实现了一种采用聚苯乙烯纳米球自组装技术和微机械制造技术加工的场发射阴极用亚微米栅极微孔阵列。设计了一套完整的工艺实验方案,首先采用微球自组装技术获得了亚微米级金属网孔掩膜,然后通过反应离子刻蚀技术获得了亚微米栅极孔阵列,从而实现了集成度高、分布均匀的周期性亚微米孔洞阵列的制备,微孔集成度达到108cm-2。实验研究了氧气刻蚀聚苯乙烯微球的规律。采用金属掩膜,四氟化碳干法刻蚀二氧化硅,获得了深度为500 nm的微孔。实验结果证明该工艺方案是一种获得大面积、均匀分布、集成度高的场发射冷阴极栅孔阵列的有效方法。     

Interface corrugation effect on the polarization anisotropy of photoluminescence from (311)A GaAs/AlAs short-period superlattices

Studying GaAs/AlAs superlattices containing a quantum-well-wire array revealed photoluminescence polarization anisotropy for samples with GaAs layers less than 21 Å thick. It was found that polarization for a thickness of more than 40 Å was mainly due to valence band anisotropy, whereas polarization for a thickness of less than 21 Å was equally attributable to both valence band anisotropy and anisotropy associated with interface corrugation. For a GaAs layer thickness of less than 21 Å, a blueshift of the Γ electron-Γ heavy hole transition was observed. In this transition, the position of the peak of photoluminescence from the GaAs/AlAs (311)A superlattices containing a quantum-well-wire array is shifted toward higher energies compared to the (311)B and (100) superlattices containing no quantum-well wire with the same GaAs layer thickness. The conclusion was made that a blueshift is observed in GaAs/AlAs superlattices with GaAs layers less than 21 Å thick and a red-shift is observed when the thickness is larger than 43 Å.     

Nonselective vertical etching of GaAs and AlGaAs/GaAs in high pressure capacitively coupled BCl3/N2 plasmas

We studied nonselective, vertical dry etching of GaAs and AlGaAs/GaAs structure in high pressure capacitively coupled BCl₃/N₂ plasmas. The operating pressure was fixed at 150 m Torr. We found that there was an optimized process condition for nonselective and vertical etching of GaAs and AlGaAs/GaAs at the relatively high pressure. It was noted that there was a range of % N₂ (i.e. 20–40%) where nonselective etching of GaAs over AlGaAs could be achieved in the BCl₃/N₂ mixed plasma. We also found that dry etching of GaAs and AlGaAs/GaAs structure provided quite vertical and smooth surface when % N₂ was in the range of 0–20% in the BCl₃/N₂ plasma. The maximum etch rates for GaAs (0.41 μm/min) and AlGaAs/GaAs structure (0.42 μm/min) were obtained with 20–30% N₂ composition in the plasma.     

低损宽频高双折射太赫兹光子带隙光纤

设计了一种低损耗、宽频段、高双折射太赫兹光子带隙光纤,呈三角晶格排列的亚波长空气孔包层实现了带隙的局域作用.利用全矢量有限元法对光纤的双折射及损耗特性进行了理论分析.结果表明,在大约0.3 THz的宽频范围内,类矩形纤芯太赫兹光子带隙光纤的损耗小于0.009 cm^-1,相双折射在10^-3数量级,群双折射可达10^-2数量级. 关键词： 太赫兹 太赫兹波导 光子晶体光纤 双折射     

Band gaps of two-dimensional photonic crystal structure using conjugated polymer (3-octylthiophenes)

The possibility of using conjugated polymer (3-octylthiophenes, P3OT) as two-dimensional (2D) photonic band gap crystals was investigated. The different aspects were examined of the absolute photonic band gap (PBG) formation for 2D photonic crystals (PCs) consisting of P3OT pillars in air. The formation of PBG was exhibited and confirmed by a calculation of transfer matrix method (TMM). It was found that P3OT triangular structure could be good candidate for absolute inhibition of reflection in ultraviolet frequency region for given orientation.