Research on the electrical characteristics of an organic thin-film field-effect transistor based on alternating-current resistance

In this article, an organic thin-film field-effect transistor (OTFFET) with top-gate and bottom-contact geometry based on pentacene as the active layer is fabricated. The experimental data of the I-V are obtained from the OTFFET device. The alternating-current (AC) resistance value of the OTFFET device is calculated using the derivation method from the experimental data, and the AC resistance trend curves of the OTFFET device are obtained with the region fitting method. We analyse the characteristics of the OTFFET device with an AC resistance trend curve. To discover whether it has a high resistance, it is proposed to judge the region of the source/drain voltage (V_DS) less than the transition voltage, thereby determining whether the contact between the metal electrode and the organic semiconductor layer of the OTFFET device is Ohmic or non-Ohmic. The theoretical analysis shows that the field-effect mobility and the AC resistance are in reverse proportion. Therefore, we point out that reducing AC resistance is necessary if field-effect mobility is to be improved.     

Enhanced charge carrier injection in heterojunction organic field-effect transistor by inserting an MoO3 buffer layer

A top-contact organic field-effect transistor(OFET) is fabricated by adopting a pentacene/1,1’-bis(di-4tolylaminophenyl) cyclohexane(TAPC) heterojunction structure and inserting an MoO3 buffer layer between the TAPC organic semiconductor layer and the source/drain electrode.The performances of the heterojunction OFET,including output current,field-effect mobility,and threshed voltage,are all significantly improved by introducing the MoO3 thin buffer layer.The performance improvement of the modified heterojunction OFET is attributed to a better contact formed at the Au/TAPC interface due to the MoO3 thin buffer layer,thereby leading to a remarkable reduction of the contact resistance at the metal/organic interface.     

A high mobility C60 field-effect transistor with an ultrathin pentacene passivation layer and bathophenanthroline/metal bilayer electrodes

C₆₀ field-effect transistor (OFET) with a mobility as high as 5.17 cm²/V·s is fabricated. In our experiment, an ultrathin pentacene passivation layer on poly-(methyl methacrylate) (PMMA) insulator and a bathophenanthroline (Bphen)/Ag bilayer electrode are prepared. The OFET shows a significant enhancement of electron mobility compared with the corresponding device with a single PMMA insultor and an Ag electrode. By analysing the C₆₀ film with atomic force microscopy and X-ray diffraction techniques, it is shown that the pentacene passivation layer can contribute to C₆₀ film growth with the large grain size and significantly improve crystallinity. Moreover, the Bphen buffer layer can reduce the electron contact barrier from Ag electrodes to C₆₀ film efficiently.     

高分子有机场效应晶体管中退火引起的自组织微观结构变化的研究

为了进一步洞悉高分子薄膜自组织机理和高分子有机场效应晶体管(OFET)载流子迁移率之间的直接关联性,本工作采用先进的同步辐射掠入射X射线衍射(GIXRD)技术,研究了高分子OFET中高分子半导体高度区域规则的聚(3-己基噻吩)(RR-P3HT)工作层薄膜,由不同退火温度所导致的薄膜自组织微观结构的变化.GIXRD测试实验结果显示了,对于不同高分子薄膜制备方法(旋涂法及滴膜法)及不同溶液浓度(RR-P3HT溶液浓度为2.5 mg/ml及3.5 mg/ml)制备的RR-P3HT有机半导体工作层,在氮气气氛下, 关键词： 高分子有机场效应晶体管 同步辐射掠入射X射线衍射 自组织 退火     

Junction field-effect-transistor-based germanium photodetector on silicon-on-insulator

We propose and demonstrate a novel Ge photodetector on silicon-on-insulator based on a junction field effect transistor structure, where the field-effect transistor gate is replaced by a Ge island with no contact on it. Light incident on the Ge switches on the device by altering the conductance of the Si channel through secondary photoconductivity. The device's sensitivity is also enhanced by a vast reduction in parasitic capacitance. In cw measurements, proof-of-concept detectors exhibit up to a 33% change in Si channel conductance by absorbing only 200 nW of power at 1.55 microm. In addition, pulsed response tests have shown that rise times as low as 40 ps can be achieved.     

高$lt;i$gt;k$lt;/i$gt;栅介质小尺寸全耗尽绝缘体上锗p型金属氧化物半导体场效应晶体管漏源电流模型

通过求解沟道的二维泊松方程得到沟道表面势和沟道反型层电荷, 建立了高k栅介质小尺寸绝缘体上锗(GeOI) p型金属氧化物半导体场效应晶体管(PMOSFET)的漏源电流解析模型. 模型包括了速度饱和效应、迁移率调制效应和沟长调制效应, 同时考虑了栅氧化层和埋氧层与沟道界面处的界面陷阱电荷、氧化层固定电荷对漏源电流的影响. 在饱和区和非饱和区, 漏源电流模拟结果与实验数据符合得较好, 证实了模型的正确性和实用性. 利用建立的漏源电流模型模拟分析了器件主要结构和物理参数对跨导、漏导、截止频率和电压增益的影响, 对GeOI PMOSFET的设计具有一定的指导作用. 关键词： 绝缘体上锗p型金属氧化物半导体场效应晶体管 漏源电流模型 跨导 截止频率     

顶栅石墨烯离子敏场效应管的表征及其初步应用

传统的液栅型石墨烯场效应管虽然灵敏度高, 但是石墨烯沟道极易被污染, 致使器件的稳定性减小, 不能被重复利用. 为此, 我们设计制造了一种顶栅石墨烯离子敏场效应管, 以化学气相沉积生长的石墨烯为沟道, 通过原子层沉积在石墨烯表面沉积绝缘层HfO₂/Al₂O₃, 其中Al₂O₃作为敏感膜, HfO₂/Al₂O₃作为石墨烯及电极的保护膜. 经过一系列的电学表征和测试发现, 相较于液栅型石墨烯场效应管, 顶栅石墨烯场效应管具有更高的信噪比、更好的稳定性. 为了利用顶栅石墨烯进行生物分子的检测, 我们将单链DNA修饰在Al₂O₃表面, 成功检测到了修饰DNA前后的信号差异, 并结合荧光修饰的表征验证了顶栅石墨烯场效应管用于生物传感器的可行性.     

Double-gate-all-around tunnel field-effect transistor

In this work, a double-gate-all-around tunneling field-effect transistor is proposed. The performance of the novel device is studied by numerical simulation. The results show that with a thinner body and an additional core gate, the novel device achieves a steeper subthreshold slope, less susceptibility to the short channel effect, higher on-state current, and larger on/off current ratio than the traditional gate-all-around tunneling field-effect transistor. The excellent performance makes the proposed structure more attractive to further dimension scaling.     

Quasi-two-dimensional threshold voltage model for junctionless cylindrical surrounding gate metal-oxide-semiconductor field-effect transistor with dual-material gate

Based on the quasi-two-dimensional(2D) solution of Poisson’s equation in two continuous channel regions, an analytical threshold voltage model for short-channel junctionless dual-material cylindrical surrounding-gate(JLDMCSG) metal-oxide-semiconductor field-effect transistor(MOSFET) is developed. Using the derived model, channel potential distribution, horizontal electrical field distribution, and threshold voltage roll-off of JLDMCSG MOSFET are investigated. Compared with junctionless single-material CSG(JLSGCSG) MOSFET, JLDMCSG MOSFET can effectively suppress short-channel effects and simultaneously improve carrier transport efficiency. It is also revealed that threshold voltage rolloff of JLDMCSG can be significantly reduced by adopting both a small oxide thickness and a small silicon channel radius. The model is verified by comparing its calculated results with that obtained from three-dimensional(3D) numerical device simulator ISE.     

有机场效应晶体管材料及器件研究进展

有机场效应晶体管(organic field—effect transistor，OFET)作为新一代半导体晶体管因其广阔的应用前景和近年来技术上的突飞猛进，使之成为微电子和信息领域科学研究和产品开发中热门的话题之一．文章慨述了有机场效应晶体管的材料研究、器件制备技术以及有机场效应晶体管在各领域中应用的最新进展．     

Graphene field effect transistor-based terahertz modulator with small operating voltage and low insertion loss

In this work,we report a broadband terahertz wave modulator based on a top-gate graphene field effect transistor with polyimide as the gate dielectric on a PET substrate. The transmission of the terahertz wave is modulated by controlling the Fermi level of graphene via the polyimide as the top-gate dielectric material instead of the traditional dielectric materials. It is found that the terahertz modulator can achieve a modulation depth of ~20.9% with a small operating gate voltage of 3.5 V and a low insertion loss of 2.1 dB.     

Molecular gated transistors: Role of self-assembled monolayers

In order to understand the biosensing mechanism of field-effect based biosensors and optimize their performance, the effect of each of its molecular building block must be understood. In this work the gating effect of self-assembled linker molecules on field-effect transistor was studied in detail. We have combined Kelvin probe force microscopy, current-voltage measurements, capacitance-voltage measurements, equivalent circuit modeling and device simulations in order to trace the mechanism of silicon-on-insulator biological field-effect transistors. The measurements were conducted on the widely used linker molecules (3-aminopropyl)-trimethoxysilane (APTMS) and 11-aminoundecyl-triethoxysilane (AUTES), which were self-assembled on ozone activated silicon oxide surface covering the transistor channel. In a dry environment, the work function of the modified silicon oxide decreased by more than 1.5 eV, and the transistor threshold voltage increased by about 30 V following the self-assembly. A detailed analysis indicates that these changes are due to negative induced charges on the top dielectric layer, and an effective dipole due to the polar monolayer. However, the self-assembly did not change the silicon flat-band voltage when in contact with an electrolyte. This is attributed to electrostatic screening by the electrolyte.     

非溶剂掺杂完善自组织机理提升高度区域规则的(3-己基噻吩)有机场效应晶体管器件性能的研究

为了保证在低温加工及溶液制备的情况下,能够提升高度区域规则的聚(3-己基噻吩) (RR-P3HT)有机场效应晶体管(OFET)的器件性能,本文研究了室温下乙醇及乙腈非溶剂的掺杂,及其对高分子自组织机理与导致的RR-P3HT OFET电学性能的影响.实验发现,适量进行乙醇及乙腈非溶剂的掺杂,将促进RR-P3HT薄膜形成更多期望的微晶粒薄片结构,完善高分子自组织机理,导致RR-P3HT OFET电学性能的提升.实验表明,在RR-P3HT溶液中进行5 %乙腈添加后,其器件场效应迁移率的值由原来的4.04×10< 关键词： 高度区域规则的聚(3-己基噻吩)有机场效应晶体管 非溶剂掺杂 自组织机理 场效应迁移率     

Light-emitting field-effect transistor based on a tetracene thin film

We report the first organic light-emitting field-effect transistor. The device structure comprises interdigitated gold source and drain electrodes on a Si/SiO(2) substrate. A polycrystalline tetracene thin film is vacuum sublimated on the substrate forming the active layer of the device. Both holes and electrons are injected from the gold contacts into this layer leading to electroluminescence from the tetracene. The output characteristics, transfer characteristics, and the optical emission properties of the device are reported. A possible mechanism for electron injection is suggested.     

$lt;i$gt;γ$lt;/i$gt;射线总剂量辐照效应对应变Sip型金属氧化物半导体场效应晶体管阈值电压与跨导的影响研究

分析了双轴应变Si p型金属氧化物半导体场效应晶体管(PMOSFET)在γ射线辐照下载流子的微观输运过程, 揭示了γ射线的作用机理及器件电学特性随辐照总剂量的演化规律, 建立了总剂量辐照条件下的双轴应变Si PMOSFET 阈值电压与跨导等电学特性模型, 并对其进行了模拟仿真. 由仿真结果可知, 阈值电压的绝对值会随着辐照总剂量的积累而增加, 辐照总剂量较低时阈值电压的变化与总剂量基本呈线性关系, 高剂量时趋于饱和; 辐照产生的陷阱电荷增加了沟道区载流子之间的碰撞概率, 导致了沟道载流子迁移率的退化以及跨导的降低. 在此基础上, 进行实验验证, 测试结果表明实验数据与仿真结果基本相符, 为双轴应变Si PMOSFET辐照可靠性的研究和应变集成电路的应用与推广提供了理论依据和实践基础. 关键词： 应变Sip型金属氧化物半导体场效应晶体管 总剂量辐照 阈值电压 跨导     

一步掩膜法制备超低压ITO沟道纸上薄膜晶体管

基于一步掩模法工艺制备了一种新型的纸上双电荷层超低压薄膜晶体管. 在室温射频磁控溅射过程中, 仅仅利用一块镍掩模板, 就可同时沉积出氧化铟锡(ITO)源漏电极和ITO沟道. 在此基础上, 以等离子体增强化学气相沉积法(PECVD)合成的具有双电荷层效应的微孔SiO₂为栅介质, 成功制备出以纸为衬底的超低压氧化物薄膜晶体管. 这种晶体管显示出极好的性能: 超低的工作电压1.5 V, 场效应迁移率为20.1 cm²/Vs, 亚阈值斜率为188 mV/decade, 开关电流比为5× 10⁵. 这种基于全室温一步掩模法工艺制备的纸上氧化物薄膜晶体管具有工作电压低, 工艺简单, 成本低廉等优点, 非常有望应用于未来便携式低功耗电子产品的制造中.     

Ballistic field-effect transistor with negative-effective-mass current carriers in the channel

We consider a ballistic field-effect transistor with channel current carriers having a negative effective mass section in their dispersion relation. Such a device is suggested as an effective generator of terahertz-range oscillations. A gate potential controls the generator regime (including oscillation frequency, amplitude, turning on and off).     

Two-dimensional threshold voltage model of nanoscale silicon-on-insulator tunneling field-effect transistor

The tunneling field-effect transistor (TFET) is a potential candidate for the post-CMOS era. In this paper, a threshold voltage model is developed for this new kind of device. First, two-dimensional (2D) models are used to describe the distributions of potential and electric field in the channel and two depletion regions. Then based on the physical definition of threshold voltage for the nanoscale TFET, the threshold voltage model is developed. The accuracy of the proposed model is verified by comparing the calculated results with the 2D device simulation data. It has been demonstrated that the effects of varying the device parameters can easily be investigated using the model presented in this paper. This threshold voltage model provides a valuable reference to the TFET device design, simulation, and fabrication.     

绝缘体上硅金属氧化物半导体场效应晶体管中辐射导致的寄生效应研究

基于⁶⁰Co γ射线源研究了总剂量辐射对绝缘体上硅（silicon on insulator,SOI）金属氧化物半导体场效应晶体管器件的影响.通过对比不同尺寸器件的辐射响应,分析了导致辐照后器件性能退化的不同机制.实验表明：器件的性能退化来源于辐射增强的寄生效应;浅沟槽隔离（shallow trench isolation,STI）寄生晶体管的开启导致了关态漏电流随总剂量呈指数增加,直到达到饱和;STI氧化层的陷阱电荷共享导致了窄沟道器件的阈值电压漂移,而短沟道器件的阈值电压漂移则来自于背栅阈值耦合;在同一工艺下,尺寸较小的器件对总剂量效应更敏感.探讨了背栅和体区加负偏压对总剂量效应的影响,SOI器件背栅或体区的负偏压可以在一定程度上抑制辐射增强的寄生效应,从而改善辐照后器件的电学特性.     

Two-dimensional threshold voltage model of a nanoscale silicon-on-insulator tunneling field-effect transistor

The tunneling field-effect transistor(TFET) is a potential candidate for the post-CMOS era.In this paper,a threshold voltage model is developed for this new kind of device.First,two-dimensional(2D) models are used to describe the distributions of potential and electric field in the channel and two depletion regions.Then based on the physical definition of threshold voltage for the nanoscale TFET,the threshold voltage model is developed.The accuracy of the proposed model is verified by comparing the calculated results with the 2D device simulation data.It has been demonstrated that the effects of varying the device parameters can easily be investigated using the model presented in this paper.This threshold voltage model provides a valuable reference to TFET device design,simulation,and fabrication.