Effect of thermal annealing on ohmic contacts properties of undoped and Si-doped AlxGa1−xN on Si (1 1 1) substrate grown by PA-MBE

In this work, we study the ohmic contact properties of titanium (Ti)/aluminum (Al) bi-layer contacts on undoped and n-type doped Al_xGa_1−xN grown on silicon (1 1 1) substrates by radio frequency nitrogen plasma-assisted molecular beam epitaxy (PA-MBE). The electrical stability of the contacts at various annealing temperatures of 400, 500, 600 and 700 °C were investigated. Specific contact resistivity was determined using transmission line method (TLM) and current–voltage (I–V) measurements. The results reveal that the bi-layer scheme was sensitive to the change of annealing temperatures and annealing time. The optimal value of specific contact resistivities was obtained at annealing temperature of 600 °C for both samples. However, the values of n-type doped sample exhibited better results compared with the undoped sample.     

A study on monolayer MoS2 doping at the S site via the first principle calculations

Through the first principle calculation, electronic properties of monolayer MoS₂ doped with single, double, triple and tetra-atoms of P, Cl, O, Se at the surface S site are discussed. Among the substitutional dopant, our calculation results show that when P atoms are doped on a monolayer MoS₂, a shift in the Fermi energy into the valence band is observed, making the system p-type. Meanwhile, band gap gradually decreases as increasing the number of P atoms. On the contrary, Cl is identified as a suitable n-type dopant. It is observed that Cl for initial three dopant behaved as magnetic and afterwards returned to non-magnetic behavior. The band gap of the Cl doped system is also dwindling gradually. Finally, O and Se doped systems have little effect on electronic properties near band gap. Such doping method at the S site, and the TDOS and PDOSs of each doping system provide a detailed of understanding toward working mechanism of the doped and the intrinsic semiconductors. This doping model opens up an avenue for further clarification in the doping systems as well as other dopant using this method.     

Design and modelling of high-operating temperature MWIR HgCdTe nBn detector with n- and p-type barriers

The paper present the numerical analysis of the electrical and optical properties of the mid-wave infrared (MWIR) HgCdTe nBn type detectors with a 3.4 μm cut-off wavelength (at 50% of the initial rise in the response) operating at 230 K. The analysed n⁺/B/n/N⁺ structure consists of four HgCdTe layers with n- and p-type barriers. Different structural parameters, as well as compositional and dopant profiles obtained in molecular beam epitaxy (MBE) and metal organic chemical vapour deposition (MOCVD) techniques were modelled with emphasis on conduction band and valence band-offset which determines the proper construction of the nBn type devices. The barrier must prevent the flow of the electron current from the cap region to the absorber while simultaneously ensure the flow and collection of thermally and optically generated holes from the absorber to the cap region. It was shown that proper p-type doping of the barrier reduce the valence band-offset and increase the offset in the conduction band leading to the optimal detector architecture.Theoretical results were related to the experimental data of the MWIR n⁺/B/n/N⁺ photodetectors grown by MOCVD. Dark currents of the first fabricated devices are limited by undesirable iodine diffusion from cap layer to the barrier. However, the nBn architecture might be a promising solution for HgCdTe infrared detectors grown by MOCVD, mainly due to the possibility of in situ acceptor doping of the barrier.     

Selective deposition of Au films on GaAs by projection-patterned excimer laser doping combined with electroless plating

Resistless microfabrication of Au thin films on n-type GaAs by projection-patterned laser doping using a KrF excimer laser and a 10% SiH₄-He gas is described. Gold thin films with a linewidth as narrow as 1.57 m are deposited selectively on the doped regions by electroless plating in a commercial Au-24s aqueous solution. The isotropic growth of the deposited films is discussed by comparing the linewidth of the deposited films with that of the doped regions. Furthermore, the dependence of the deposition characteristics of Au thin films on the laser irradiation conditions is investigated.Presented at LASERION '91, June 12–14, 1991, München (Germany)     

Characterization of ZnO:Ga and ZnO:N films prepared by PLD

The thin films of zinc oxide have been produced by the pulse laser deposition method at various levels of gallium and nitrogen doping. To obtain the n-type films we used gallium doping with concentration of gallium from zero up to 5 at %. The dependence of photoluminescence of the epitaxial ZnO:Ga films on the concentration of gallium doping has been studied. An optimum range of the n-type ZnO films doping with gallium has been determined to obtain highly effective films from the viewpoint of realizing p-n transitions. This range, on the one hand, defines the maximal PL amplitude and, on the other hand, specifies the minimal specific resistance that corresponds to an interval of 0.125–1.000 at % Ga. To produce the p-type ZnO:(Ga, N) films, the ZnO targets with the content of GaN from zero up to 2 at % were used. N₂O was used as a buffer gas. A difference is observed in the positions of the peaks of the emission lines of the photoluminescence spectra for the ZnO films, doped with gallium (Ga) and co-doped with gallium and nitrogen (N).     

常压MOCVD法生长的p型ZnSe及其光电特性

本文通过常压MOCVD方法,利用NH₃气作为受主掺杂源,在(100)方向的GaAs衬底上生长了ZnSe:N膜。通过测量77K温度下光致发光光谱。观测到了由于掺氮引起的自由到束缚发射(FA)和深中心复合(SA).在低掺杂浓度下FA起主要作用,随着NH₃气浓度增加,FA和SA带的强度随之增强,在重掺杂下SA带成为主要,同时带的半宽度展宽。室温下霍尔测量的结果表明。低掺杂浓度下ZnSe:N膜呈高阻态,而在高掺杂浓度下外延膜呈现P型电导,载流子浓度P～1016cm³.利用p-ZnSe/n-GaAs构成异质pn结,观测到了二极管的整流特性,进一步证实p型ZnSe的实现。     

p-Type zinc oxide films grown by infrared-light-assisted pulsed laser deposition

In this paper, ZnO films were grown on sapphire (0001) substrates by infrared-light-assisted pulsed-laser deposition (IRA-PLD). In addition, a nitrogen-plasma-assisted (PA-N) system was utilized for effectively doping the acceptor by radio frequency induction coupled plasma (RF-ICP). The effect of IRA-PLD and PA-N systems was investigated by studying the difference in substrate temperature with and without plasma assistance. We found that ZnO films exhibit no exciton emission with PA-N at a high temperature and that an increase in the substrate temperature yields ZnO films with a (002) and c-axis preferred orientation in a nitrogen (N₂) gas atmosphere. ZnO films are changed from n-type to p-type at a substrate temperature of 673 K by IRA-PLD with an N₂ background atmosphere.     

Formation of p-type ZnMgO thin films by In-N codoping method

In-N codoped ZnMgO films have been prepared on glass substrates by direct current reactive magnetron sputtering. The p-type conduction could be obtained in ZnMgO films by adjusting the N₂O partial pressures. The lowest resistivity was found to be 4.6 Ω cm for the p-type ZnMgO film deposited under an optimized N₂O partial pressure of 2.3 mTorr, with a Hall mobility of 1.4 cm²/V s and a hole concentration of 9.6 × 10¹⁷ cm⁻³ at room temperature. The films were of good crystal quality with a high c-axis orientation of wurtzite ZnO structure. The presence of In-N bonds was identified by X-ray photoelectron spectroscopy, which may enhance the nitrogen incorporation and respond for the realization of good p-type behavior in In-N codoped ZnMgO films. Furthermore, the ZnMgO-based p-n homojunction was fabricated by deposition of an In-doped n-type ZnMgO layer on an In-N codoped p-type ZnMgO layer. The p-n homostructural diode exhibits electrical rectification behavior of a typical p-n junction.     

1.5μm波长n-p-n型InGaAsP-InP晶体管激光器材料外延生长

基于器件模拟仿真,设计了一种1.5μm波长InGaAsP-InP晶体管激光器材料外延结构.其多量子阱有源区置于基区非对称波导中.仿真结果显示该外延结构能够获得较好的光场限制和侧向电流限制.对该材料MOCVD生长研究表明,基极重掺杂接触层中Zn2+扩散将导致量子阱严重退化.通过对其扩散过程的模拟仿真,采用平均掺杂浓度为1×1018cm-3的梯度掺杂,有效地抑制了Zn2+向量子阱区的扩散.所获得的外延材料在1.51μm呈现较强的PL峰值,具有卫星峰清晰的XRD谱.     

Gd-doping of HfO2

An increase in the density of states between the oxygen 2p bands and the Fermi level is seen with increasing Gd concentrations. In addition, for the Gd-doped HfO₂ films, the Gd 4f photoexcitation peak at 5.5 eV below the valence band maximum was identified using resonant photoemission. Electrical measurements show pronounced rectification properties for lightly-doped Gd:HfO₂ films on p-Si and for heavily-doped Gd:HfO₂ films on n-Si, suggesting a crossover from n-type to p-type behavior with increasing doping level. In addition, there is an increase in the reverse bias current with neutron irradiation.     

低温InGaAs/InAlAs多量子阱的分子束外延生长与表征

采用气源分子束外延(GSMBE)生长了低温InGaAs材料,研究了生长温度及As压对InGaAs材料性质的影响,得到优化的生长条件为:生长温度为300 ℃、As压为77.3 kPa。通过Be掺杂,并采用In0.52Al0.48As/In0.53Ga0.47As多量子阱结构,将材料的方块电阻提高到1.632106 /Sq,载流子数密度降低至1.0581014 cm-3。X射线衍射结果表明:InGaAs多量子阱材料具有较高的晶体质量。这种Be掺杂InGaAs多量子阱材料缺陷密度大且电阻率高,是制作太赫兹光电导天线较理想的基质材料。收稿日期:; 修订日期:     

Fabrication and characterization of Mn-doped Cu2O thin films grown by RF magnetron sputtering

Two series of Mn-doped Cu₂O diluted-magnetic-semiconductor thin films were prepared by radio-frequency (RF) magnetron sputtering. One is prepared at different deposition temperature with the same Mn doping concentration; the other is deposited at the same temperature but with varying Mn concentration. They were used to find out the ferromagnetic-order zone for the Mn-doped Cu₂O systems. Most of the samples show high (1 1 1) orientation, except low doping concentration (<6 at%). No impurities were found by X-ray diffraction and electron diffraction measurement. The doped Mn ions substituted Cu ions in the Cu₂O lattice and there were about 1.5% cation vacancies. The grains shown in the transmission electron microscopy (TEM) images for all the samples were tiny, i.e. just 5 nm in diameter. A rough phase diagram for the ferromagnetic order existing in the Mn-doped Cu₂O thin films was given with varying Mn doping concentration and deposition temperature.     

Properties of a-Si:H films deposited by RF magnetron sputtering at 95 °C

In this work we have investigated the dependence of optical and electrical properties of RF sputtered undoped a-Si:H films and B or P doped a-Si:H films on hydrogen flow rate (F_H). Low deposition temperature of 95 °C was used, a process compatible with low-cost plastic substrates. FTIR spectroscopy and ESR measurements were used for the investigation of Si-H_x bonding configurations, and concentrations of hydrogen and dangling bonds. We found that there is a strong correlation between the total hydrogen concentration, the dangling bonds density and the optoelectronic properties of the films. The best photosensitivity value was found to be 1.4 × 10⁴ for the undoped films. The dark conductivity (σ_D) of the doped layers varied from 5.9 × 10⁻⁸ to 6.5 × 10⁻⁶ (Ω cm)⁻¹ for different ratios F_Ar/F_H. These variations are attributed to both the different B and P concentrations in the films (according to SIMS measurements) and the enhanced disorder of the films introduced by the large number of inactive impurities. The B doping efficiency is lower compared to the P one. A small photovoltaic effect is also observed in n-i-p solar cells fabricated on polyimide (PI) substrates having ITO as antireflective coating, with an efficiency of 1.54%.     

Investigations on thermoelectric power of lanthanum oxide doped ferroelectric sodium vanadate

The thermoelectric power of ferroelectric sodium vanadate doped with different concentrations of lanthanum oxide has been measured in the temperature range covering their transition temperatures. It has been observed that the thermoelectric power increases with temperature, attains maximum value and with further increase in the temperature decreases to zero, indicating Curie temperature of the respective samples; however, it changes the sign for higher temperature. The thermoelectric power of sodium vanadate increases to maximum with increase in doping concentration of lanthanum oxide from 0.025 to 0.1 mol%; however, it decreases for higher concentrations. Pure as well as lanthanum oxide doped sodium vanadate samples showp-type behaviour in the ferroelectric region andn-type behaviour in the paraelectric region.     

Effect of bismuth on the electrical properties of Pb0.8Sn0.2Te thin films

D.C. conductivity and Hall coefficient studies were made on bismuth doped Pb_0.8Sn_0.2Te thin films in the temperature range 77–300 K. Hall coefficient and Hall mobility are found to decrease with the increase in doping density of bismuth. Films doped with even 0.3 at.% Bi changed fromp-type ton-type due to the donor action of bismuth in these films. Analysis of mobility-temperature data revealed that the lattice and defect scattering mechanisms are predominant in these films. Defect limited mobility is calculated for all the films and it is found to decrease with increase in doping concentration of bismuth suggesting the increase in defect density.     

Temperature dependence of thermoelectric properties of Ni-doped CoSb3

Temperature dependences of the Hall coefficient, Hall mobility and thermoelectric properties of Ni-doped CoSb₃ have been characterized over the temperature range from 20 to 773 K. Ni-doped CoSb₃ is an n-type semiconductor and the conduction type changes from n-type to p-type at around 450 K. The temperature for the transition from n-type to p-type increased with increasing Ni content x. The Seebeck coefficient reaches a maximum value near the transition temperature. The electrical resistivity indicates that Co_1−xNi_xSb₃ is a typical semiconductor when x≤0.03 and a degenerate semiconductor when x>0.03. Thermal conductivity analyses show that the lattice component is predominant at lower temperatures and carrier and bipolar components become large at temperatures higher than the transition temperature. The thermoelectric figure of merit reaches a maximum value close to the transition temperature and the largest value, 4.67×10⁻⁴ K⁻¹ at 600 K, was obtained for x=0.05.     

Studies on excimer laser doping of GaAs using sulphur adsorbate as dopant source

Excimer laser doping of GaAs using sulphur adsorbate as a dopant source is demonstrated. Box-like n-type layers of depths of about 100 nm with carrier concentration as high as (23)×10¹⁹ cm^–3 are formed. Passivation of GaAs using a (NH₄)₂S_x solution for 40 min followed by sublimation of the excess sulphur atoms in high vacuum result in an effective dopant for controllable n-type doping. The samples are irradiated using a KrF excimer laser in a N₂ gaseous environment. Secondary ion mass spectrometry (SIMS) measurements show that sulphur is successfully incorporated in the GaAs. The sheet resistance is controlled by adjusting the laser energy fluence and number of laser pulses. Rutherford backscattering spectrometry with channeling (RBS/C) alignment measurement indicates that lattice damage is undetectable for N₂ gas pressures of 760 Torr.     

Radiation response behaviour of Al codoped germano-silicate SM fiber at high radiation dose

Radiation response behaviour of Ge + Al doped SM fiber fabricated by the solution doping process has been studied at room temperature with respect to 1310 nm transmission wavelength under three different dose rates of 200, 400 and 600 Rad/min to compare with that of standard Er doped as well as Ge doped SM fibers. Their radiation sensitivity has been observed with variation of dose rates, transmission wavelength along with their recovery nature. Radiation response behaviour of Al doped SM fiber is found to be slightly non-linear in nature with very low dose rate dependency. No saturation level was found upto 13 Krad cumulative dose. Thermobleaching as well as photobleaching phenomena have also been studied. Gamma irradiated Al doped preform shows an absorption peak at around 300 nm due to generation of Al (E′) defect center and gets annihilated after thermobleaching process. Gamma irradiated Al doped SM fiber shows prominent photobleaching effect on their optical attenuation with respect to the 850 nm transmission wavelength. From ESR study resonance signals for Al³⁺ related radiation-induced defect centers are not clearly observed in this study. A very weak hyperfine pattern has been observed for gamma irradiated Al doped preform sample. The high radiation sensitivity along with linear response behaviour, low recovery and almost dose rate independence behaviour of the material system of Ge + Al codoped SM core optical fiber under gamma radiation shows their potential for application as fiber optic radiation sensor in comparison to the universal standard erbium doped SM fiber.     

Electronic properties of boron and nitrogen doped graphene nanoribbons and its application for graphene electronics

On the basis of density functional theory calculations, we have systematically investigated the electronic properties of armchair-edge graphene nanoribbons (GNRs) doped with boron (B) and nitrogen (N) atoms. B (N) atoms could effectively introduce holes (electrons) to GNRs and the system exhibits p- (n-) type semiconducting behavior after B (N) doping. According to the electronic structure calculations, Z-shape GNR-based field effect transistors (FETs) is constructed by selective doping with B or N atoms. Using first-principles quantum transport calculations, we demonstrate that the B-doped p-type GNR-FETs can exhibit high levels of performance, with high ON/OFF ratios and low subthreshold swing. Furthermore, the performance parameters of GNR-FETs could be controlled by the p-type semiconducting channel length.     

Formation of DX-centers in indium doped CdTe

In CdTe, the achievable n-type doping is limited by the formation of DX-centers. A characteristic feature of DX-centers is the ‘persistent photoconductivity (PPC)’ which is created by illumination at low temperatures and caused by a metastable state of the DX-center. The DX-center and the PPC effect in n-type CdTe are theoretically explained by the ‘large lattice relaxation model’. PAC measurements on In doped CdTe using ¹¹¹In/¹¹¹Cd and, in addition, resistivity measurements on the same samples have been performed. Below 150 K, the samples showed a PPC effect that was accompanied by an increase of about 20% of the carrier concentration. This effect is not accompanied by any changes of the observed EFG. Possible explanations of the EFG observed, originally assigned to the DX-center, will be discussed. Finally, first reports on the investigation of DX-centers in CdTe using the radioactive isotope ¹¹⁷Cd decaying to ¹¹⁷In are presented.