Point spread function measurement of an X‐ray beam focused by a multilayer zone plate with narrow annular aperture

The experimental procedure for obtaining the point spread function (PSF) of a focusing beam generated using an X‐ray multilayer zone plate (MZP) with a narrow annular aperture has been developed. It was possible to reconstruct the PSF by applying the tomographic process to the measured dataset consisting of line spread functions (LSFs) in every radial direction on the focal plane. The LSFs were measured by a knife‐edge scanning method of detecting scattered intensity. In the experimental work, quasi‐monochromatic undulator radiation with a first harmonic energy of 20 keV was directly focused without a monochromator by the MZP, and the PSF was measured using this procedure. As a result, a near diffraction‐limited focused beam size of 46 nm full width at half‐maximum was obtained.     

Dispositif optique pour implantation et micro-usinage par projection d'images ioniques Ion imaging for ion implantation and for micromachining

It is well known that more and more precise doping is needed for producing high performance's electronic components and circuits of increasingly enhanced complexity. An ion optic can be used to directly produce a localised implantation allowing to free one self from all masking techniques. The experimental set up mainly consist in a projecting lens which focuses the reduced image of a “model”, structure partially transparent to the ion beam, on the crystal to be implanted. One of the difficult points is connected with the tine control of the focusing of the ion image on the surface of the target. In order to check this focusing an “Ion Image Converter” is used as the projection lens. On the one hand the 10 keV energy positive ion beam is post accelerated to a hundred keV as it is focused on the target; on the other hand, the secondary electrons ejected from the target are accelerated and focused backwards permitting the formation of an electron image which is an enlargement of the ion figure projected on the target; this auxiliary image after further magnification is observed on a fluorescent screen allowing to adjust and to control the focusing and the illumination of the ion image.     

A sagittally focusing double‐multilayer monochromator for ultrafast X‐ray imaging applications

The development of a sagittally focusing double‐multilayer monochromator is reported, which produces a spatially extended wide‐bandpass X‐ray beam from an intense synchrotron bending‐magnet source at the Advanced Photon Source, for ultrafast X‐ray radiography and tomography applications. This monochromator consists of two W/B₄C multilayers with a 25 Å period coated on Si single‐crystal substrates. The second multilayer is mounted on a sagittally focusing bender, which can dynamically change the bending radius of the multilayer in order to condense and focus the beam to various points along the beamline. With this new apparatus, it becomes possible to adjust the X‐ray beam size to best match the area detector size and the object size to facilitate more efficient data collection using ultrafast X‐ray radiography and tomography.     

High‐power‐load DCLM monochromator for a computed tomography program at BMIT at energies of 25–150 keV

The research program at the biomedical imaging facility requires a high‐flux hard‐X‐ray monochromator that can also provide a wide beam. A wide energy range is needed for standard radiography, phase‐contrast imaging, K‐edge subtraction imaging and monochromatic beam therapy modalities. The double‐crystal Laue monochromator, developed for the BioMedical Imaging and Therapy facility, is optimized for the imaging of medium‐ and large‐scale samples at high energies with the resolution reaching 4 µm. A pair of 2 mm‐thick Si(111) bent Laue‐type crystals were used in fixed‐exit beam mode with a 16 mm vertical beam offset and the first crystal water‐cooled. The monochromator operates at energies from 25 to 150 keV, and the measured size of the beam is 189 mm (H) × 8.6 mm (V) at 55 m from the source. This paper presents our approach in developing a complete focusing model of the monochromator. The model uses mechanical properties of crystals and benders to obtain a finite‐element analysis of the complete assembly. The modeling results are compared and calibrated with experimental measurements. Using the developed analysis, a rough estimate of the bending radius and virtual focus (image) position of the first crystal can be made, which is also the real source for the second crystal. On the other hand, by measuring the beam height in several points in the SOE‐1 hutch, the virtual focus of the second crystal can be estimated. The focusing model was then calibrated with measured mechanical properties, the values for the force and torque applied to the crystals were corrected, and the actual operating parameters of the monochromator for fine‐tuning were provided.     

High‐flux hard X‐ray microbeam using a single‐bounce capillary with doubly focused undulator beam

A pre‐focused X‐ray beam at 12 keV and 9 keV has been used to illuminate a single‐bounce capillary in order to generate a high‐flux X‐ray microbeam. The BioCAT undulator X‐ray beamline 18ID at the Advanced Photon Source was used to generate the pre‐focused beam containing 1.2 × 10¹³ photons s^?1 using a sagittal‐focusing double‐crystal monochromator and a bimorph mirror. The capillary entrance was aligned with the focal point of the pre‐focused beam in order to accept the full flux of the undulator beam. Two alignment configurations were tested: (i) where the center of the capillary was aligned with the pre‐focused beam (`in‐line') and (ii) where one side of the capillary was aligned with the beam (`off‐line'). The latter arrangement delivered more flux (3.3 × 10¹² photons s^?1) and smaller spot sizes (≤10 µm FWHM in both directions) for a photon flux density of 4.2 × 10¹⁰ photons s^?1µm^?2. The combination of the beamline main optics with a large‐working‐distance (approximately 24 mm) capillary used in this experiment makes it suitable for many microprobe fluorescence applications that require a micrometer‐size X‐ray beam and high flux density. These features are advantageous for biological samples, where typical metal concentrations are in the range of a few ng cm^?2. Micro‐XANES experiments are also feasible using this combined optical arrangement.     

多层膜劳厄透镜对8keV X射线的聚焦性能模拟研究

基于多层膜技术的劳厄(Laue)透镜能实现硬X射线纳米级聚焦,在X射线微纳分析领域具有重要的应用前景.基于衍射动力学理论,分析了X射线在多层膜劳厄透镜中的传播,计算了不同结构的多层膜劳厄透镜对8 keVX射线的聚焦性能.结果表明,最外层厚度为5 nm的倾斜多层膜劳厄透镜可获得5.7 nm的聚焦光斑和26%的平均衍射效率...     

X‐ray collimation by crystals with precise parabolic holes based on diffractive–refractive optics

Two crystals with precise parabolic holes were used to demonstrate sagittal beam collimation by means of a diffractive–refractive double‐crystal monochromator. A new approach is introduced and beam collimation is demonstrated. Two Si(333) crystals with an asymmetry angle of α = 15° were prepared and arranged in a dispersive position (+,?,?,+). Based on theoretical calculations, this double‐crystal set‐up should provide tunable beam collimation within an energy range of 6.3–18.8 keV (Θ_B = 71–18.4°). An experiment study was performed on BM05 at ESRF. Using 8.97 keV energy, the beam profile at various distances was measured. The experimental results are in good agreement with theoretical predictions. Owing to insufficient harmonic suppression, the collimated (333) beam was overlapped by horizontally diverging (444) and (555) beams.     

A dedicated small‐angle X‐ray scattering beamline with a superconducting wiggler source at the NSRRC

At the National Synchrotron Radiation Research Center (NSRRC), which operates a 1.5 GeV storage ring, a dedicated small‐angle X‐ray scattering (SAXS) beamline has been installed with an in‐achromat superconducting wiggler insertion device of peak magnetic field 3.1 T. The vertical beam divergence from the X‐ray source is reduced significantly by a collimating mirror. Subsequently the beam is selectively monochromated by a double Si(111) crystal monochromator with high energy resolution (ΔE/E? 2 × 10^?4) in the energy range 5–23 keV, or by a double Mo/B₄C multilayer monochromator for 10–30 times higher flux (～10¹¹ photons s^?1) in the 6–15 keV range. These two monochromators are incorporated into one rotating cradle for fast exchange. The monochromated beam is focused by a toroidal mirror with 1:1 focusing for a small beam divergence and a beam size of ～0.9 mm × 0.3 mm (horizontal × vertical) at the focus point located 26.5 m from the radiation source. A plane mirror installed after the toroidal mirror is selectively used to deflect the beam downwards for grazing‐incidence SAXS (GISAXS) from liquid surfaces. Two online beam‐position monitors separated by 8 m provide an efficient feedback control for an overall beam‐position stability in the 10 µm range. The beam features measured, including the flux density, energy resolution, size and divergence, are consistent with those calculated using the ray‐tracing program SHADOW. With the deflectable beam of relatively high energy resolution and high flux, the new beamline meets the requirements for a wide range of SAXS applications, including anomalous SAXS for multiphase nanoparticles (e.g. semiconductor core‐shell quantum dots) and GISAXS from liquid surfaces.     

Laue弯晶聚焦特性的光线追迹研究

由于可有效降低高热负载的影响, Laue弯晶是插入件辐射高通量密度硬X射线(30 keV以上)聚焦、 准直和单色化的最有效的光学元件.研究其聚焦光学特性,对发展高性能、高稳定的Laue弯晶单色器具有重要意义. 采用自行发展的光线追迹软件较为系统地研究了Laue弯晶的聚焦特性, 分析了入射光性质及弯晶参数对聚焦光斑、焦距、发散度等主要光学参数的影响. 结果表明,衍射能量越高,聚焦光斑越小,并趋于稳定值;弯曲半径越小,聚焦光斑越小, 并在其达到一阈值时得到聚焦光斑的极小值,之后随着弯曲半径的变小,由于像差等因素的影响, 聚焦光斑反而变大;晶体越厚,聚焦光斑越大,呈线性正比关系.对于衍射光发散度, 其随着衍射能量的增大而变小,并趋于稳定值;其与晶体曲率呈线性正比关系. 同时通过研究得到弯晶各参数的合理选择范围.     

Kirkpatrick–Baez mirrors to focus hard X‐rays in two dimensions as fabricated,tested and installed at the Advanced Photon Source

The micro‐focusing performance for hard X‐rays of a fixed‐geometry elliptical Kirkpatrick–Baez (K–B) mirrors assembly fabricated, tested and finally implemented at the micro‐probe beamline 8‐BM of the Advanced Photon Source is reported. Testing of the K–B mirror system was performed at the optics and detector test beamline 1‐BM. K–B mirrors of length 80 mm and 60 mm were fabricated by profile coating with Pt metal to produce focal lengths of 250 mm and 155 mm for 3 mrad incident angle. For the critical angle of Pt, a broad bandwidth of energies up to 20 keV applies. The classical K–B sequential mirror geometry was used, and mirrors were mounted on micro‐translation stages. The beam intensity profiles were measured by differentiating the curves of intensity data measured using a wire‐scanning method. A beam size of 1.3 µm (V) and 1.2 µm (H) was measured with monochromatic X‐rays of 18 keV at 1‐BM. After installation at 8‐BM the measured focus met the design requirements. In this paper the fabrication and metrology of the K–B mirrors are reported, as well as the focusing performances of the full mirrors‐plus‐mount set‐up at both beamlines.     

Focusing of an intense neutralized proton beam

An intense low-energy (15–20 keV) proton beam is focused in two stages: ballistic focusing is followed by magnetic compression. The beam is formed by an MAIS wide-aperture source, in which a plasma is generated by many discharge elements via a discharge over the polyethylene surface. In the presence of an external magnetic field, the beam turns out to be overneutralized by electrons coming from the cathode grids of the source and from the target. The maximal focusing efficiency (>70%) is observed within 10 μs after the pulse has been applied if the target is negatively biased. The degree of beam compression in terms of cross-sectional area is 1.6×10³. The numerical simulation of the focusing agrees well with the results of measurement.     

Differences in Channelling of H0 and H+ in Si Single Crystal

The differences in the RBS angular yields measured for 100 keV hydrogen atoms H⁰ and protons H⁺ backscattered from Si crystal are reported and analysed. It was shown that H⁰ atom beam is better channelled in the pure crystal and is much more sensitive to the crystal surface coverage, particularly, Au layer than the H⁺ ion beam. The deep crystal regions seem to strengthen this differences.     

Research and development of an electron beam focusing system for a high-brightness X-ray generator

A new type of rotating anticathode X-ray generator, where an electron beam of up to 60 keV irradiates the inner surface of a U-shaped Cu anticathode, has achieved a beam brilliance of 130 kW mm(-2) (at 2.3 kW). A higher-flux electron beam is expected from simulation by optimizing the geometry of a combined-function-type magnet instead of the fringing field of the bending magnet. In order to minimize the size of the X-ray source the electron beam has been focused over a short distance by a new combined-function bending magnet, whose geometrical shape was determined by simulation using the Opera-3D, General Particle Tracer and CST-STUDIO codes. The result of the simulation clearly shows that the role of combined functions in both the bending and the steering magnets is important for focusing the beam to a small size. FWHM sizes of the beam are predicted by simulation to be 0.45 mm (horizontal) and 0.05 mm (vertical) for a 120 keV/75 mA beam, of which the effective brilliance is about 500 kW mm(-2) on the supposition of a two-dimensional Gaussian distribution. High-power tests have begun using a high-voltage 120 kV/75 mA power supply for the X-ray generator instead of 60 kV/100 mA. The beam focus size on the target will be verified in the experiments.     

Experimental Research on Focusing Property of Radially Polarized Beam Based on Solid Immersion Lens

Realization of a near-field optical virtual probe based on an evanescent Bessel beam is strongly dependent on a radially polarized beam; this makes it essential to study the focusing property of the beam. In this paper, two experimental setups based on a fiber device and a liquid crystal device, respectively, are built to generate a radially polarized beam. This beam and an annular radially polarized beam are focused by means of a high numerical aperture objective and a solid immersion lens (SIL). Near-field distribution of the focus spot, the evanescent Bessel field, is experimentally measured with a scanning near-field optical microscope (SNOM). The full width at half maximum (FWHM) of the central peak of the evanescent Bessel field is about 200 nm in the close vicinity of the bottom surface of SIL. This has potential for use as a near-field optical virtual probe.     

Search for a channelling effect in single crystal beam foil spectroscopy

Abstract

Light emission from a 60 keV He⁺ beam excited by an 80Å thick single crystal gold film has been measured. The line intensity was monitored as function of crystal orientation (parallel and near to the ?100? string). To avoid the influences of forward scattering a special experimental arrangement was devised. The results demonstrate that there is little, if any, effect of channelling in single crystal beam foil spectroscopy.     

ZnO:Ga晶体对硬X射线的时间及能量响应

 介绍了ZnO:Ga晶体对重复频率快脉冲硬X 射线的时间响应,利用X射线荧光分析仪测量了ZnO:Ga晶体对10～100 keV硬X射线的能量响应。结果表明:ZnO:Ga晶体对硬X射线响应的上升时间为316 ps,半高宽为440 ps;对40 keV以上的X射线的能量响应很平坦。该晶体可以作为一种新颖的硬X射线探测元件。     

准矩形截面强流相对论带状电子束的传输

提出利用准矩形截面带状电子束传输强电流.相对于目前广泛采用的椭圆形截面带状电子束,在大横纵比,即电子束的宽度(横向)远大于厚度(纵向)的情况下,其厚度沿横向更加均匀,利用冷阴极爆炸发射容易产生.该电子束利于高功率微波发生器中腔体模式的控制和束波作用效率的提高,如果利用模块化的结构还可使阴极及聚焦磁铁在宽度上的扩展更加容易.首先给出了准矩形截面带状电子束空间电荷场的典型分布,然后根据该分布和束匹配的方法对相互独立的周期会切磁铁和边聚焦磁铁分别进行了设计.其中边聚焦磁铁的磁化方向与以往的纵向不同,为横向磁化,其激励的边聚焦磁场在电子束宽边的边缘附近的梯度更大,有利于横向的束匹配.最后根据理论分析的结果进行了粒子模拟.结果表明,300keV,3kA的准矩形截面强流相对论带状电子束可以在0.163T的周期会切磁场和0.064T的横向磁化边聚焦磁场中稳定传输,电流传输效率大于98%.     

CsI(Tl)晶体中反冲Cs和I核Quenching?Factor的测量

许多实验对用CsI(Tl)闪烁晶体作为探测器来寻找和探测暗物质的可行性进行了研究.本工作利用8MeV单能中子轰击CsI(Tl)晶体探测器来研究Cs核和I核的QuenchingFactor.在数据处理中,运用脉冲形状甄别(PSD)方法来分辨反冲核信号和本底信号.实验结果表明,在7keV到132keV的能区中,Quench ingFactor随着反冲核能量的减少而增加.在探测暗物质的实验中,这一性质对于CsI(Tl)晶体探测器获得较低的能量阈值是很有利的.     

PMN-PT single crystal focusing transducer fabricated using a mechanical dimpling technique

A ∼5 MHz focusing PMN-PT single crystal ultrasound transducer has been fabricated utilizing a mechanical dimpling technique, where the dimpled crystal wafer was used as an active element of the focusing transducer. For the dimpled focusing transducer, the effective electromechanical coupling coefficient was enhanced significantly from 0.42 to 0.56. The dimpled transducer also yields a −6 dB bandwidth of 63.5% which is almost double the bandwidth of the plane transducer. An insertion loss of the dimpled transducer (−18.1 dB) is much lower than that of the plane transducer. Finite element simulation also reveals specific focused beam from concave crystal surface. These promising results show that the dimpling technique can be used to develop high-resolution focusing single crystal transducers.     

Hard X‐ray microbeam lithography using a Fresnel zone plate with a long focal length

Focused hard X‐ray microbeams for use in X‐ray nanolithography have been investigated. A 7.5 keV X‐ray beam generated at an undulator was focused to about 3 µm using a Fresnel zone plate fabricated on silicon. The focused X‐ray beam retains a high degree of collimation owing to the long focal length of the zone plate, which greatly facilitates hard X‐ray nanoscale lithography. The focused X‐ray microbeam was successfully utilized to fabricate patterns with features as small as 100 nm on a photoresist.