Power deposited on a dielectric by multipactor

We use a simple transmission line model to evaluate the RF power deposited on a dielectric window by a multipactor discharge. The calculation employs Monte Carlo simulation, using realistic secondary electron yield curves as input, and taking into account the distributions in the emission velocities and emission angles of the secondary electrons. Beam loading on the external RF, as well as the evolution of the DC electric field due to dielectric charging, are also accounted for. It is found that the buildup of the multipactor space charge, rather than beam loading, causes saturation. Over a wide range of operating conditions and materials, it is found quite generally that the multipactor delivers on the order of 1 percent, or less, of the RF power to the dielectric. A simple estimate is given in support of this ratio, using the susceptibility diagram that was constructed from kinematic considerations. Comparison with experimental results is given     

介质单边二次电子倍增的理论分析与数值模拟

 针对介质单边二次电子倍增现象,理论分析给出了其动力学方程、二次电子初始能量与角度分布,结合二次电子发射的材料特性,研究了二次电子倍增的理论预估敏感区间。利用蒙特卡罗方法抽样选取电子初始发射能量和角度,数值研究了二次电子倍增的敏感区间,并与理论结果进行了比对,给出了二次电子数目随时间的增长关系;采用固定时间步长并考虑电子束动态加载饱和效应的细致蒙特卡罗方法,研究了二次电子数目、直流场、射频场、介质表面沉积功率、电子放电功率、二次电子碰撞能量及电子渡越时间等二次电子倍增特性物理量的变化过程,并且讨论了初始电流及二次电子倍增工作点对二次电子倍增整个过程的影响作用,得出了二次电子倍增存在初始阈值发射电流密度的结论。     

空间电荷和介质表面电荷对微放电演化过程的影响

微放电是制约航天器微波部件功率容量的主要瓶颈之一。以介质微波部件中典型的介质加载平行板波导为例,基于三维粒子模拟分别对仅考虑外加微波场（情况1）、考虑外加微波场和空间电荷（情况2）以及考虑外加微波场、空间电荷和介质表面电荷（情况3）三种情况下微放电演化过程中电子数目、瞬态二次电子发射系数、归一化反射波电压以及介质表面与上金属板之间的间隙电压随时间的变化进行了仿真,并给出了情况3电子分布和介质表面电荷密度随时间的变化过程。在此基础上,明确了空间电荷和介质表面电荷在微放电过程中所起的不同作用：即空间电荷会使微放电达到饱和状态,介质表面电荷则导致微放电饱和状态无法持续,最后自行熄灭。介质表面电荷导致了微放电过程中介质和金属瞬态二次电子发射系数下降速率不一致,归一化反射波电压幅度随时间变化的包络类似于“眼睛”形状、间隙电压类直流偏置、非对称电子能量分布等特殊现象。     

介质材料二次电子发射特性对微波击穿的影响

以介质填充的平行板放电结构为例,本文主要研究了介质填充后微波低气压放电和微放电的物理过程.为了探究介质材料特性对微波低气压放电和微放电阈值的影响,本文采用自主研发的二次电子发射特性测量装置,测量了7种常见介质材料的二次电子发射系数和二次电子能谱.依据二次电子发射过程中介质表面正带电的稳定条件,计算了介质材料稳态表面电位与二次电子发射系数以及能谱参数的关系.在放电结构中引入与表面电位相应的等效直流电场后,依据电子扩散模型和微放电中电子谐振条件,分别探讨了介质表面稳态表面电位的大小对微波低气压放电和微放电阈值的影响.结果表明,介质材料的二次电子发射系数以及能谱参数越大,介质材料的稳态表面电位也越大,对应的微波低气压放电和微放电阈值也越大.所得结论对于填充介质的选择有一定的理论指导价值.     

高功率微波沿面闪络击穿机制粒子模拟

针对高功率微波介质沿面闪络击穿物理过程,首先建立了理论模型,包括:动力学方程、粒子模拟算法、二次电子发射, 以及电子与气体分子蒙特卡罗碰撞模型、电子碰撞介质表面退吸附气体分子机制;其次,基于理论模型,编制了1D3V PIC-MCC程序,分别针对真空二次电子倍增、高气压体电离击穿和低气压面电离击穿过程,运用该程序仔细研究了电子和离子随时间演化关系、电子运动轨迹、电子及离子密度分布、空间电荷场时空分布、电子平均能量、碰撞电子平均能量、碰撞电子数目随时间演化关系、电子能量分布函数、平均二次电子发射率以及能量转换关系。研究结果表明:真空二次电子倍增引发的介质表面沉积功率只能达到入射微波功率1%左右的水平,不足以击穿;气体碰撞电离主导的高气压体电离击穿,是由低能电子（eV量级）数目指数增长到一定程度导致的,形成位置远离介质表面,形成时间为s量级;低气压下的介质沿面闪络击穿,是在二次电子倍增和气体碰撞电离共同作用下,由于数目持续增长的高能电子（keV量级）碰撞介质沿面导致沉积功率激增而引发的,形成位置贴近介质沿面,形成时间在ns量级。     

两种外磁场形式对介质面次级电子倍增的抑制

利用自编1D3V PIC程序,数值研究了不同外加磁场方式对次级电子倍增抑制的物理过程,给出了次级电子数目、平均能量、密度、运动轨迹、渡越时间、介质表面静电场及沉积功率等物理量时空分布关系。模拟结果表明:不同方向外加磁场抑制次级电子倍增的机理有所不同。轴向外加磁场利用电子回旋运动干扰微波电场对电子加速过程,使其碰壁能量降低以达到抑制二次电子倍增的效果;横向外加磁场利用电子回旋漂移过程中,电子半个周期被推离介质表面（不发生次级电子倍增）,半个周期被推回介质表面（降低电子碰撞能量）的作用机理,达到抑制二次电子倍增的效果。讨论了横向磁场在回旋共振下,电子回旋同步加速导致回旋半径增大,电子能量持续增加的特殊过程。两种外加磁场方式都可以通过增加磁场达到进一步抑制次级电子倍增的目的。轴向外加磁场加载容易,但对磁场要求较高;横向外加磁场需要磁场较低,但加载较为困难。     

高功率微波及材料特性参数对沿面击穿的影响

为研究高功率微波及材料特性参数对介质沿面闪络击穿过程的影响,采用自编的1D3V PIC-MCC程序,通过粒子模拟手段,得到了电子与离子数目、电子及离子密度分布、空间电荷场时空分布、电子平均能量、放电功率、表面沉积功率、激发电离损耗功率、电离频率等重要物理量。结果表明:电离频率随场强增加而增加,达到饱和后缓慢下降,强场诱发的二次电子数目更多导致本底沉积功率增高;电离频率随频率减小而增加,达到饱和后缓慢下降,频率太高会抑制次级电子倍增;因此,低频强场下击穿压力较大;反射引发表面电场下降及磁场增加效应,降低表面场强虽使表面击穿压力下降,但磁场的增加会导致二次电子倍增起振时间缩短,且会增加器件内部击穿风险;圆极化相对线极化诱导二次电子数目更多、本底沉积功率更高,击穿风险增加;短脉冲产生电子、离子总数少,平均能量低,沉积功率低,击穿风险低于长脉冲;脉冲上升时间的缩短和延长,只会提前或推后击穿时间,并不会改善击穿压力;材料二次电子发射率的增加会给击穿造成巨大压力,表面光滑度对击穿过程影响不大;电离频率和电子平均能量随释气压强增加均先增加后减小,低气压二次电子倍增占优,高气压碰撞电离占优。     

混合场介质表面单边次级电子倍增效应统计

综合考虑发射电子的发射能量、发射角度及微波场的相位分布等因素,运用统计方法,研究了介质表面单边次级电子倍增过程中次级电子数目、瞬时直流场、渡越时间、微波场的沉积功率等次级电子倍增特征物理量随碰撞次数的变化过程,仿真分析了不同夹角、不同反射系数对次级电子倍增的影响。研究结果表明:当倾斜直流场一定时,微波场的反射系数越小,雪崩击穿的延迟时间越长,饱和状态下的次级电子数目越大;微波场一定时,当直流电场平行于介质板表面时,直流电场幅值越大,雪崩击穿的延迟时间越长,饱和状态下的次级电子数目越大,但当电场强度超过一定值时,次级电子倍增现象不再发生,当直流场垂直介质板表面,直流电场幅值越大,雪崩击穿的延迟时间越长,饱和状态下的次级电子数目越小,幅值超过一定值时,次级电子倍增现象同样不会发生。     

介质阻挡均匀大气压辉光放电数值模拟研究

通过数值求解一维电子、离子连续性方程和动量方程，以及电流连续性方程，计算了氦气介 质阻挡大气压辉光放电电子、离子密度和电场在放电空间的时空分布，以及放电电流密度和 绝缘介质板充电电荷密度随时间的变化. 分析讨论所加电压频率、幅值及介质板性质等对均 匀大气压辉光放电性质的影响. 当外加电压频率足够高时，大量离子被俘获在放电空间，空 间电荷场又引起足够多的电子滞留在放电空间. 这些种子电子使得在大气压下发生汤森放电 ，放电空间结构类似于低气压辉光放电，即存在明显的阴极位降区、负辉区、法拉第暗区和 等离子体正柱 关键词： 大气压辉光放电 介质阻挡 数值模拟 等离子体     

倾斜直流场下的介质板击穿统计分析

传统分析介质板次级电子倍增问题的粒子追踪算法方法存在运算耗时长、运算量大等缺点,为此采用统计方法实现了倾斜强直流场下介质击穿过程中次级电子倍增效应的数值模拟,给出了击穿过程中电子数量,电子渡越时间等关键参数的时间图像,同时研究了倾斜角、介质表面光滑度和次级电子产生率对次级电子倍增效应的影响。研究结果表明:强直流场下的次级电子倍增效应存在倾斜角的区域,倾斜角太大或者太小,都可能不会发生次级电子倍增效应,如果倾斜角位于区域内,则饱和状态时电子数目随着倾斜角度的变大而变小;选取光滑系数和次级电子产生系数越小的介质材料,抑制次级电子倍增效应的效果越好。     

Effects of the insulated magnetic field and oblique incidence of electrons on the multipactor in MILO

The theoretical analysis and actual performance of the single-surface multipactor discharge model in the presence of a magnetic field are conducted through simulations. The effects of the magnitude of the insulated magnetic field and the oblique incidence of electrons on the multipactor are analysed. The results show that the multipactor susceptibility region shrinks gradually as the magnetic field increases when the electron cyclotron frequency is close to the RF frequency of the electric field. As a result, the evolution of the multipactor discharge will reach saturation earlier and become saturated at a higher level than the case when the magnetic field is absent, but the change of evolution and saturation as the insulated magnetic field increases is not obvious.     

介质窗横向电磁场分布下的次级电子倍增效应

本文利用自编P3D3V PIC程序, 数值研究了BJ32矩波导传输TE₁₀模式高功率微波在介质窗内、 外表面引发的次级电子倍增过程, 给出了次级电子3维空间位置分布特征、介质窗表面法向静电场分布规律以及电子数密度分布特性. 模拟结果表明: 对于介质窗内侧, 微波强场区域率先进入次级电子倍增过程; 而对于介质窗外侧, 则是微波弱场区域优先进入次级电子倍增过程. 形成机理可以解释为: 微波坡印廷矢量方向与介质窗外表面法向相同而与内表面法向相反, 内侧漂移运动导致强场区域电子易于被推回表面, 有利于次级电子倍增优先形成; 外侧漂移运动导致强场区域电子易于被推离表面, 不利于次级电子倍增形成. 准3维模型相对1维模型: 介质窗内侧次级电子倍增过程中, 次级电子倍增进入饱和时间长、饱和次级电子数目少、平均电子能量高、 入射微波功率低、沉积功率低; 介质窗外侧次级电子倍增过程中, 次级电子倍增进入饱和时间短、饱和次级电子数目少、平均电子能量低、 入射微波功率低、沉积功率低. 沉积功率与入射微波功率比值与微波模式、强度及介质窗内外侧表面关系不大, 准3维和1维模型计算结果均在1%–2%左右水平. 关键词： 高功率微波 介质表面次级电子倍增 粒子模拟 横向电磁场分布     

微波磁场和斜入射对介质表面次级电子倍增的影响

分别研究了微波磁场和斜入射微波电场对介质表面次级电子倍增的影响.利用particle-in-cell/Monte Carlo方法,获得了微波磁场和斜入射微波电场条件下电子数量、介质表面直流场、电子平均能量和介质表面吸收功率的时间变化图像.模拟结果表明,斜入射和微波磁场虽然会显著影响电子的平均能量,但对电子数量和介质表面吸收功率的影响并不大,因此不会对微波介质表面击穿产生太大作用.     

Numerical investigation of the methods for reducing the runaway electron beam divergence

We have performed a comparative numerical analysis of two methods for reducing the runaway electron beam divergence using an external magnetic field or a dielectric tube. The generation of runaway electrons takes place in an inhomogeneous medium that consists of a hot channel (spark channel, laser torch, etc.) surrounded by air under normal conditions. The model makes it possible to consistently calculate the formation of a subnanosecond gas discharge and the generation of accelerated electrons under these conditions. The possibility of effectively decreasing the runaway electron beam divergence using an external magnetic field, as well as a dielectric tube, has been demonstrated. However, the number of runaway electrons in the case with the tube is considerably smaller than in the case with the magnetic field due to the fact that some runaway electrons settle on the tube walls. The energy spectra of the runaway electrons significantly differ in these cases, which can be explained by the differences in the dynamics of the discharge formation.     

Saturation of a One-Sided Multipactor in Crossed Fields

We analyze the saturation mechanism of a vacuum resonance microwave discharge (multipactor) for systems in which a magnetostatic field returns electrons to the metal surface with secondary-emission multiplying. The steady-state model suggested earlier is improved essentially. In particular, we take into account the near-surface interaction of saturated electron bunches during the limited time of discharge-electron-surface impact. It is found that the Coulomb defocusing of electron bunches prevails over their microwave focusing (toward the resonance phase of the field), making it possible to extract superfluous secondary electrons when the electron bunches are reproduced on the discharge surface. Basic characteristics of the discharge, such as its existence conditions and proper fields and phase disposition of the resonance electron bunches, are determined as functions of the magnetostatic field and the secondary-emission coefficient. The results are discussed in comparison with the data of known experiments. An explanation of some differences related to both the observation conditions and the used analytical model is given.     

Saturation of a one-sided multipactor in a decelerating electrostatic field

We analyze the saturation mechanism of a vacuum resonance microwave discharge (multipactor) where the decelerating electrostatic field returns electrons to the secondary-emission multiplying surface. It is found that the Coulomb defocusing of electron bunches prevails over their microwave focusing (toward the resonance phase of the field) in the stationary state, making it possible to extract superfluous secondary electrons when the electron bunches are reproduced on the discharge surface. Using this model, we determine the main characteristics of this multipactor, such as the magnitude and phase disposition of the resonant electron bunch. An explanation of the increase in the discharge power with increase in the secondary-emission coefficient is given. Institute of Applied Physics of the Russian Academy of Sciences, Nizhny Novgorod, Russia. Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Radiofizika, Vol. 42, No. 11, pp. 1097–1104, November, 1999.     

不同气压下介质表面高功率微波击穿的数值模拟

介绍了用于模拟介质表面高功率微波击穿的粒子模拟-蒙特卡罗碰撞方法,并采用该方法模拟研究了氩气环境不同气压下的介质表面高功率微波击穿过程,获得了该击穿过程中粒子数量和电子平均能量的时间变化图像,并得到了击穿延迟时间。数值模拟结果发现:在低气压下,次级电子倍增的作用比较明显,但电子数量在次级电子倍增饱和后的增速较低,击穿延迟时间较长;随着气压的升高,次级电子倍增的影响逐渐变小,气体电离逐渐占主导地位,击穿延迟时间逐渐变短;在高气压下,由于介质表面吸收沉积电子而呈负电性,次级电子倍增消失,击穿延迟时间由气体碰撞电离来决定。     

Mechanism of Striation in Dielectric Barrier Discharge

The mechanism of striations in dielectric barrier discharge in pure neon is studied by a two-dimensional particle- in-cell/Monte Carlo collision （PIC-MCC） model. It is shown that the striations appear in the plasma background, and non-uniform electrical field resulting from ionization and the negative wall charge appear on the dielectric layer above the anode. The sustainment of striations is a non-local kinetic effect of electrons in a stratified field controlled by non-elastic impact with neutral gases. The striations in the transient dielectric barrier discharge are similar to those in dc positive column discharge.     

Characteristics of charge and discharge of PMMA samples due to electron irradiation

In this study, using a comprehensive numerical simulation of charge and discharge processes, we investigate the formation and evolution of negative charge and discharge characteristics of a grounded PMMA film irradiated by a nonfocused electron beam. Electron scattering and transport processes in the sample are simulated with the Monte Carlo and the finite-different time-domain(FDTD) methods, respectively. The properties of charge and discharge processes are presented by the evolution of internal currents, charge quantity, surface potential, and discharge time. Internal charge accumulation in the sample may reach saturation by primary electron(PE) irradiation providing the charge duration is enough. Internal free electrons will run off to the ground in the form of leakage current due to charge diffusion and drift during the discharge process after irradiation, while trapped electrons remain. The negative surface potential determined by the charging quantity decreases to its saturation in the charge process, and then increases in the discharge process. A larger thickness of the PMMA film will result in greater charge amount and surface potential in charge saturation and in final discharge state, while the electron mobility of the material has little effects on the final discharge state. Moreover,discharge time is less for smaller thickness or larger electron mobility. The presented results can be helpful for estimating and weakening the charging of insulating samples especially under the intermittent electron beam irradiation in related surface analysis or measurement.     

介质阻挡放电丝模式和均匀模式转化的特性

利用水电极介质阻挡放电装置,采用电学方法和发射光谱,研究了空气中介质阻挡放电从微放电丝模式向均匀放电模式转化的过程. 结果表明,大气压下增大外加电压或者电压一定减小气压,放电都能够从微放电丝模式过渡到均匀模式. 高气压下放电为流光击穿而低气压下为辉光放电. 利用放电发射光谱,研究了高能电子比例随实验参数的变化. 结果表明气压减小时高能电子比例增大,电压增加时高能电子减少. 利用壁电荷理论对以上实验结果进行了定性分析. 结果对介质阻挡均匀放电的深入研究具有重要价值. 关键词： 介质阻挡放电 光学发射谱 微放电丝 均匀放电模式