Ultrafast opto-terahertz photonic crystal modulator

We present an agile optically controlled switch or modulator of terahertz (THz) radiation. The element is based on a one-dimensional photonic crystal with a GaAs wafer inserted in the middle as a defect layer. The THz electric field is enhanced in the photonic structure at the surfaces of the GaAs wafer. Excitation of the front GaAs surface by ultrashort 810 nm laser pulses then leads to an efficient modulation of the THz beam even at low photocarrier concentrations (approximately 10(16) cm(-3)). The response time of the element to pulsed photoexcitation is about 130 ps.     

Thermally stimulated terahertz radiation of plasmon–phonon polaritons in GaAs

The thermally stimulated excitation of radiative modes of surface plasmon–phonon polaritons in GaAs followed by the high-power terahertz (THz) radiation selective emission is studied and experimentally observed. The selective high-power THz radiation emitters in the 7–8 and 10–15 THz frequency ranges based on the heated highly doped (n>5?10¹⁷ cm^?3) GaAs plates are proposed.     

Measurement of nonlinear absorption coefficients in GaAs, InP and Si by an optical pump THz probe technique

An optical pump terahertz (THz) probe method for measuring carrier mobility and multiphoton absorption coefficients in semiconductors is demonstrated. A THz probe pulse is used to detect the transient photoconductivity generated by an optical pump pulse. The change in transmission coefficient at THz frequencies due to a pump pulse with photon energy greater than the band gap energy is used to determine the sum of electron and hole mobilities. The weak nonlinear absorption of a pump pulse with photon energy less than the band gap energy produces an approximately uniform free carrier distribution. The THz transmission coefficient vs. pump fluence, and the mobility, are used in a bulk photoconductivity model to determine the multiphoton absorption coefficients. For GaAs, InP and Si we find two photon absorption coefficients at 1305 nm of 42.5 ± 11, 70 ± 18 and 3.3 ± 0.9 cm/GW, respectively. For GaAs and InP we determine three photon absorption coefficients at 2144 nm of 0.19 ± 0.07 and 0.22 ± 0.08 cm³/GW².     

Electrical properties of GaAs layers irradiated by H4 ions

The quantities(D) and(T) are studied in n- and p-GaAs, irradiated at T = 300°K by H⁺ ions (5 MeV). It is shown that the resistance of lightly doped GaAs specimens increases from original values of ₀ to 10⁹ ·cm upon irradiation by H⁺ ions (5 MeV) to integral fluxes up to D^* – 10¹⁵ H⁺/cm². For D > D^* the layer resistance decreases from 10⁹ ·cm to 1 ·cm at 300°K. It was found that all the GaAs specimens intensely irradiated by H⁺ ions had p-type conductivity near 300°K. Isochronic annealing of radiation defects was studied in the temperature interval 20–700°C.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 1, pp. 39–43, January, 1982.     

Investigation of non-equilibrium electron-hole plasma in nanowires by THz spectroscopy

Efficient emission of THz radiation by AlGaAs nanowires via excitation of photocurrent by femtosecond optical pulses in nanowires was observed. Dynamics of photoinduced charge carrier was studied via influence of electron-hole plasma on THz radiation by optical pump THz probe method. It was found that characteristic time of screening of contact field is about 15 ps. Recombination of non-equilibrium occurs in two stages: fast recombination of free electron and holes (with relaxation time about 700 ps), and slow recombination (with relaxation time about 15 ns), which involves a capture of electrons and holes on the defects of crystalline structure of nanowires.     

Picosecond X-ray plasma radiation measurements

Direct picosecond measurements of X-ray laser plasma radiation were performed with a high-speed X-ray image-converter camera (ICC). This camera operates in the single-frame mode with an exposure time ranging from 5 ns to 0.5 μs and in the streak mode with 5 × 10⁹ to 5 × 10⁷ cm/s streak velocities. Its temporal resolution in the streak mode was calculated to be about 7 ps. A plasma was created by focussing 10 ps 1 to 2 joule laser pulses onto a titanium target placed in a vacuum chamber. The halfwidth of the recorded X-ray pulses varied from 30 to 60 ps.     

Bright MM-Wave and THz Luminescence by Down-Conversion of Near-IR Amplified-Spontaneous-Emission

We report the measurement of exceptionally bright, incoherent radiation in the THz region by frequency down-conversion of amplified spontaneous emission around 775-nm wavelength. The down-conversion technique is optical mixing in an interdigital photoconductive capacitor made from ultra fast ErAs:GaAs. The brightness temperature into a single spatial mode is approximately 1.1×10⁵ K, making the new radiation at least 70 times more intense than common incandescent sources in the THz region.     

Ultrafast optical switching of terahertz metamaterials fabricated on ErAs/GaAs nanoisland superlattices

We demonstrate optical switching of electrically resonant terahertz planar metamaterials fabricated on ErAs/GaAs nanoisland superlattice substrates. Photoexcited charge carriers in the superlattice shunt the capacitive regions of the constituent elements, thereby modulating the resonant response of the metamaterials. A switching recovery time of 20 ps results from fast carrier recombination in the ErAs/GaAs superlattice substrates.     

Large-area microlens emitters for powerful THz emission

A microlens coupled large-area emitter based on low-temperature grown GaAs is presented. A hexagonal microlens array directs the incident pump light into every second gap of a finger electrode structure. Consequently, an unidirectional photocurrent at high acceleration field strengths (50 kV/cm) is achieved, which generates constructively superposed THz emission. Using a Ti:Sapphire oscillator with a maximum average power of about 3 W at a repetition rate of 80 MHz, a net IR-to-THz conversion efficiency up to 1.3×10^?4 and a THz average power of 280 μW is achieved.     

Generation of THz transients by photoexcited single-crystal GaAs meso-structures

We report a sub-picosecond photoresponse and THz transient generation of GaAs single-crystal mesoscopic platelets excited by femtosecond optical pulses. Our structures were fabricated by a top-down technique, by patterning an epitaxial, 500-nm-thick GaAs film grown on top of an AlAs sacrificial layer and then transferring the resulting etched away 10 × 20-μm² platelets onto an MgO substrate using a micropipette. The freestanding GaAs devices, incorporated into an Au coplanar strip line, exhibited extremely low dark currents and ~0.4 % detection efficiency at 10 V bias. The all-optical, pump–probe carrier dynamics analysis showed that, for 800-nm-wavelength excitation, the intrinsic relaxation of photocarriers featured a 310-fs-wide transient with a 290 fs fall time. We have also carried out a femtosecond, time-resolved electro-optic characterization of our devices and recorded along the transmission line the electrical transients as short as ~600 fs, when the platelet was excited by a train of 100-fs-wide, 800-nm-wavelength optical laser pulses. The platelets have been also demonstrated to be very efficient generators of free-space propagating THz transients with the spectral bandwidth exceeding 2 THz. The presented performance of the epitaxial, freestanding GaAs meso-structured photodevices makes them uniquely suitable for THz-frequency optoelectronic applications, ranging from ultrafast photodetectors to THz-bandwidth optical-to-electrical transducers and photomixers.     

Temperature behavior of Franz-Keldysh oscillation and evaluation of interface electric fields attributed to strain effect of InAs/GaAs quantum dot

In this work, the electric field-induced Franz-Keldysh effect was used to investigate the localized electric fields in GaAs interfaces attributed to strain effect of InAs/GaAs quantum dots (QD). The electric fields were investigated by photoreflectance spectroscopy (PR). PR spectra of the InAs/GaAs QDs showed complex Franz-Keldysh oscillations (FKOs) with various temperatures. It is suggested that the FKOs originated from the interface electric fields predominately caused by the strain-induced polarization at GaAs interface near the InAs QDs. The InAs/GaAs QDs have a broad range of interface electric fields from ～10⁴ V/cm to ～2х10⁵ V/cm. Temperature behavior of FKO amplitude distribution is explained by temperature dependent carrier confinement effect.     

Monte Carlo Simulation of THz-Pulse Generation from Bulk GaAs Surface

An ensemble Monte Carlo simulation method has been used to study THz-pulse generation from semiconductor GaAs surface excited by a femtosecond laser pulse and biased in high electrical field near 100kV/cm. Electron transport is simulated using the three-valley conduction band model and taking into account acoustic, optical (polar and nonpolar) and intervalley phonon scattering mechanisms. Our simulations show that the THz temporal waveforms have a close relationship with the biased external field and the THz radiation is saturated with the increase of the biased field, these findings have not been exploited by the existing theoretical analyses. Power spectra show that the higher biased electrical field benefits the frequency extension for the THz radiation.     

The luminescence of ZnO film grown on GaAs interlayer by PA-MOCVD

ZnO film was firstly prepared by PA-MOCVD method on the substrate pre-coated with GaAs interlayer. Hall measurement found that the GaAs interlayer had important effects on the electrical behavior of the ZnO film. It could make the ZnO film convert to p-type conductivity. The XPS results confirmed that the acceptor was arsenic. And the acceptor level was 130 meV above the ZnO valence band maximum. Low-temperature PL measurement was introduced to investigate the optical properties of both as-grown n-type and arsenic doped p-type ZnO films. Then, based on this technology, ZnO homojunction light emitting device (LED) was fabricated with arsenic doped p-type ZnO and unintentionally doped n-type ZnO on GaAs/p⁺-Si substrate. Its current-voltage (I-V) character showed a typical rectification behavior, which was different from the n-ZnO/p⁺-Si structure. The UV-visible (385-580 nm) electroluminescence was detected under relatively low current injection condition from the n-ZnO/p-ZnO/p⁺-Si LED.     

High speed all-silicon optical modulator

Electrorefractive effect is experimentally demonstrated in an all-silicon optical structure. A highly doped Si P⁺ layer is embedded in the intrinsic region of a PIN diode integrated in a SOI waveguide. Holes are confined at equilibrium around the P⁺ layer. By applying a reverse bias to the diode, electrical field sweeps the carriers out of the active region. Free carrier concentration variations are responsible for local refractive index variations leading to an effective index variation of the waveguide optical mode and to an optical absorption variation. As a figure of merit, the product V_πL_π, determined from the measured effective index variation, is equal to 3.1 V cm. Furthermore, the device performances have theoretically been investigated. Estimations show that V_πL_π as small as 1 V cm are feasible using optimized structures. Response times lower than 2 ps are predicted, which gives the possibility to achieve very high-speed modulation. Furthermore, a temperature increases from 300 to 400 K does not change the index variation amplitude, and despite the carrier mobility reduction, response times are still lower than 2 ps.     

Mixing of 30 THz laser radiation with nanometer thin-film Ni-NiO-Ni diodes and integrated bow-tie antennas

Mixing experiments with 30 THz CO₂-laser radiation as well as the detection of 35 ps 30 THz pulses of an optical-free-induction-decay CO₂-laser system have been performed with the first nanometer thin-film Ni-NiO-Ni diodes with a minimum contact area of 0.012 µm². Difference frequencies up to 85 MHz were detected by mixing two different CO₂-laser beams coupled to the diode with an integrated bow-tie antenna. The dependence of the beat signal on bias voltage, laser power and polarization of the infrared laser radiation was determined.     

Hydrogen-enhanced recrystallization in N<Superscript>+</Superscript>-implanted GaAs

The hydrogen-enhanced recrystallization during thermal annealing in N⁺-implanted GaAs has been studied by combinatorial implantation process. Raman spectroscopy was used to study the crystallization properties of a set of hydrogenated cells on the N⁺-implanted GaAs wafer. A whole competitive process between H⁺ implantation-induced damage and recovery in the regrowth process of amorphous GaAs was observed within the proton dose region of 1.6×10¹⁵ to 1.1×10¹⁷ cm^-2. In H⁺ dose region of 2.1×10¹⁶ to 5.4×10¹⁶ cm^-2, H-enhanced recovery of crystal dominates the regrowth process. The crystal quality is better than that of unhydrogenated cell of N⁺-implanted GaAs in the H⁺ dose range from 4.7×10¹⁶ to 8.1×10¹⁶ cm^-2. It is suggested that the vacancy supersaturation produced during hydrogen irradiation is dominantly responsible for the enhancement of thermal regrowth in the N⁺-implanted GaAs. Both the crystallization and amorphization process are clearly observed in different proton implantation dose regions. PACS 61.72.Vv; 63.20.Dj; 81.05.Ea     

Temperature dependence of terahertz radiation from n-type InSb and n-type InAs surfaces

The azimuthal angle dependence and the temperature dependence of terahertz (THz) radiation generated from n-type (111) InSb and n-type (111) InAs surfaces irradiated with ∼80 fs near-infrared laser pulses are investigated. The azimuthal angle dependence shows that the contribution of the difference-frequency mixing (DFM) is not dominant for both materials at the excitation density of ∼1 GW/cm². At an appropriate azimuthal angle, the radiation due to DFM is excluded from the total THz radiation and the temperature dependence of THz radiation due to the surge current is observed. The increase of THz radiation with decrease of the temperature is found to be much more pronounced for InSb than for InAs. The different temperature dependence can be attributed to the different radiation mechanisms dominant for both materials. Especially, the temperature dependence of the THz radiation from InSb is well explained by the photo-Dember effect. Received: 9 May 2000 / Revised version: 17 August 2000 / Published online: 5 October 2000     

Simulation of THz emission from laser interaction with plasmas

One-dimensional particle-in-cell (PIC) program is used to simulate the generation of high power terahertz (THz) emission from the interaction of an ultrashort intense laser pulse with underdense plasma. The spectra of THz radiation are discussed under different laser intensity, pulse width, incident angle and density scale length. High-amplitude electron plasma wave driven by a laser wakefield can produce powerful THz emission through linear mode conversion under certain conditions. With incident laser intensity of 10¹⁸ W/cm², the generated emission is computed to be of the order of several MV/cm field and tens of MW level power. The corresponding energy conversion efficiency is several ten thousandths, which is higher then the efficiency of other THz source and suitable for the studies of THz nonlinear physics.     

Characteristics of THz-wave radiation using a monolithic grating coupler on a LiNbO3 crystal

Wide tunable terahertz (THz) wave generation was successfully demonstrated utilizing a grating coupler fabricated on the surface of a LiNbO₃ crystal which was pumped by a Q-switched Nd:YAG laser. In this paper, we report the detailed characteristics of the oscillation and the radiation including tunability, spatial and temporal coherency, directivity, and efficiency. Oscillation using a LiTaO₃ crystal was also performed, in which experimental phasematching condition values agreed well with the calculated one.     

Photon stimulated ion desorption of H+ ions from GaAs (110)/H2O

The photon stimulated ion desorption yield of H⁺ ions from a H₂O dosed GaAs (110) surface has been measured in the range 18eV ? hυ ? 30eV. There is a direct correspondence between the PSID H⁺ yield, reflectance, and the secondary electron yield spectrum of GaAs (110). The data provides evidence that the initial stages of PSID involve core level (Ga(3d), O(2s)) → conduction band excitation followed by Auger decay.