低偏振相关损耗全息光栅波分复用器的设计

对基于掺杂铌酸锂材料的体光栅波分复用器主要结构和光栅记录参量提出了一种优化设计方法.采用严格耦合波理论,对两种偏振不同入射角和不同记录晶体厚度下的器件关键性能参量,如插入损耗和偏振相关损耗等进行了优化.数值结果证明采用优化设计的晶体厚度和光栅记录时的入射角,在获得相当低的偏振相关损耗的同时,也能够获得较低的插入损耗,实现了综合性能优化的波分复用器设计.实验结果证明用优化设计的参量能有效降低波分复用器件的插入损耗和偏振相关损耗.     

Analysis method of the effect of fabrication errors on a planar waveguide demultiplexer

The impact of fabrication errors on a planar waveguide demultiplexer is analyzed based on an analytical method. The explicit expression of the transfer function taking into account phase and amplitude errors is presented in order to analyze the loss and crosstalk of the demultiplexer caused by fabrication errors. A basic requirement for the demultiplexer with a certain crosstalk criterion can be easily obtained. Using an etched diffraction grating demultiplexer as an example, it is shown that the analytical results have a good agreement with results from a numerical method.     

光栅周期包含的Bragg层数对Bragg型凹面衍射光栅的影响

单个衍射光栅周期所包含的Bragg周期层数是连续Bragg齿型凹面衍射光栅的主要参数之一,该参数可改变光栅齿结构,对凹面衍射光栅的分辨力.自由光谱范围及衍射效率有重要影响.本文通过理论分析与仿真模拟,对比了4种不同层数的Bragg型凹面衍射光栅的特性参数.研究结果表明:在衍射光栅尺寸不变的情况下,改变单个光栅周期包含的Bragg周期层数不会显著提高器件主衍射级次的分辨力;单个光栅周期包含的Bragg周期层数与光栅可衍射的级次数成正相关.单周期层数的Bragg凹面衍射光栅的主衍射级次效率最高,其可衍射的级次数最少,且其他衍射级次分散的能量最少;增加单个光栅周期所包含的Bragg周期层数会降低主衍射级次的自由光谱范围.该研究对于设计低插损、高分辨率、宽工作波段的波分复用器或光栅光谱仪具有重要的指导意义.     

Design of a polarization-insensitive arrayed waveguide grating demultiplexer based on silicon photonic wires

The polarization dependence of an arrayed waveguide grating demultiplexer based on Si photonic wires is analyzed. The height and width of the arrayed waveguides are optimized to make the channel spacing polarization insensitive. To make the central wavelength polarization insensitive, different diffraction orders are chosen for TE and TM polarizations, and the remaining polarization-dependent wavelength is compensated with a noncentral input. A detailed design procedure is presented and numerical simulation results are given.     

A flat-topped etched diffraction grating demultiplexer with low polarization-dependent loss using a tapered MMI structure

A flat-topped etched diffraction grating(EDG)demultiplexer with a low polarization-dependent loss(PDL)is designed.A design and simulation method based on the method of moment(MoM)is proposed.A 65-channel EDG demultiplexer with channel spacing of 100 GHz is considered as a design example.A tapered multi-mode interferometer(MMI)is used to flatten the passband of the EDG demultiplexer.The numerical results show that the exit width of the tapered waveguide impacts the loss of the TE case more than that of the TM case.Based on this fact,the exit width of the taper is optimized to obtain the lowest PDL.The tapering angle is also optimized where the minimal ripple is obtained.The designed EDG demultiplexer has an excellent flat-topped spectral response and a very low PDL.     

红外波段高效率低偏振相关损耗光栅的设计

衍射效率高、偏振相关损耗低的衍射光栅是集成波分复用/解复用器件的一种核心元件,在光通信中具有很重要的应用价值。通过利用严格的耦合波理论计算光栅衍射效率的方法,分别编制出了计算TE波和TM波的衍射效率程序。通过改变光栅的面形来进行计算,最终得到了衍射效率高和偏振相关损耗小的光栅面形。     

Etched-Diffraction-Grating-Based Planar Waveguide Demultiplexer on Silicon-on-Insulator

An optical wavelength demultiplexer with the etched diffraction grating (EDG) on the silicon-on-insulator (SOI) material is demonstrated. Fabricated by the wet-anisotropic-etching method, 90° turning mirrors are used to bend waveguides, and the size of the EDG-based demultiplexer is minimized to only 16×2.5 mm². The crosstalk is below −16 dB. The on-chip loss is about 9.97 dB, which is composed of about 8.72 dB excess loss and 1.25 dB diffraction loss. The polarization-dependent central wavelength shift is below 0.13 nm, and the polarization-dependent loss is about 0.35 dB. The sources of the crosstalk and loss are discussed in details, and the related measures to improve the performance are also presented.     

A Passband-Flattened EDG Demultiplexer with an Air-Trenched Taper

A novel passband flattening method for a planar waveguide demultiplexer based on an etched diffraction grating is presented. A strongly confined taper is formed by etching air trenches at both sides of the input waveguide. The geometric parameters of the taper are optimized by considering the figure of merit, ripple, and loss. Numerical simulation for a design example is given to illustrate the passband flattening method.     

A Passband-Flattened EDG Demultiplexer with an Air-Trenched Taper

A novel passband flattening method for a planar waveguide demultiplexer based on an etched diffraction grating is presented. A strongly confined taper is formed by etching air trenches at both sides of the input waveguide. The geometric parameters of the taper are optimized by considering the figure of merit, ripple, and loss. Numerical simulation for a design example is given to illustrate the passband flattening method.     

Effect of particle defects on an Echelle grating demultiplexer

The impact of particle defects in the free propagation region on the performance of an etched diffraction grating demultiplexer is analyzed in the present paper. Numerical simulations using a method of moment and a Green function method show that particle defects with some special sizes can result in a strong resonance with the incident wavelength and will produce a large scattering loss.     

两点法设计平场型EDG波分复用器件

利用两点法(two stigmatic points method)对平场型蚀刻衍射光栅(EDG)波分复用器件进行了优化设计.与传统EDG相比,该方法以较小的性能损失为代价,极大简化了制作工艺.通过标量波动衍射理论对16通道的该型器件进行了数值模拟,结果表明:在用光探测器陈列接收的情况下,额外的功率损耗约为1dB,信道间的不均匀性小于0.3dB,串绕小于-30dB.     

A Flattened AWG Demultiplexer with Low Chromatic Dispersion

A design method is introduced to obtain a flat-top arrayed-waveguide grating (AWG) demultiplexer with low chromatic dispersion. A multimode interference (MMI) section is connected at the end of the input waveguide, and a tapered waveguide is connected at the entrance of each output waveguide of the AWG demultiplexer. The design procedure is presented. A design example is given and shown to have a much better performance than the conventional flat-top design using only an MMI section. The insertion loss of the designed AWG demultiplexer is also reduced.     

Design of an augmented reality display based on polarization grating

A new optical system for an augmented reality(AR) display is proposed in this paper.The optical system mainly includes a ray deflector, coupling input grating, optical waveguide, and coupling output grating.Both the ray deflector and the coupling input grating are designed based on the diffraction characteristics of the polarization grating, and the coupling output grating is the Bragg reflection grating.Compared with other AR schemes, this AR optical system not only reduces the number of projections from two to one, but also improves the efficiency of light coupling into the optical waveguides.The energy loss is reduced by utilizing the single-order diffraction characteristics of the polarization grating in its coupling input structure.The light deflector uses the polarization selectivity of the polarization grating and the characteristics of the rotating light of the twisted nematic liquid crystal layer to realize beam deflection.The working principle of the optical system is experimentally and theoretically demonstrated.     

Reduced back reflection design for an etched diffraction grating based planar demultiplexer

A design for a planar etched diffraction grating (EDG) demultiplexer is presented to reduce the back reflection. By reducing the diffracted field at the input waveguide, the present design makes the best effort to reduce the optical return loss. A design example is given to verify the performance. The spectral response at the input waveguide is simulated and the results show that at the wavelengths that cause back reflection, the reduced back reflection design only receives –47.7 dB of the input power, whereas the design without reduced back reflection receives –3.7 dB of the input power.     

非水溶性红敏光致聚合物全息性能的改善及其应用研究

为使非水溶性红敏光致聚合物材料的全息性能得到改善,采用复合光敏增感、复合引发和复合单体的方法反复对比实验,改善后体系的灵敏度为0.02 cm2/mJ,衍射效率高达83%,计算得到材料的最大折射率调制度为4.1×10-3.实验结果和理论分析表明,利用该材料制作的新型全息光栅具有损耗低、通道宽度窄、衍射效率高等优点,适于制作光通信中的波分复用器及各种光学元件.     

InP-based 1.3/1.55 μm wavelength demultiplexer with multimode interference and chirped grating

We propose a novel 1.3/1.55 m wavelength demultiplexer for integration with lasers and detectors on the InP material system. A chirp grating is placed inside a multimode interference (MMI) structure to shorten the device length and increase wavelength tolerance. The simulation using the bi-directional beam propagation method proves that the demultiplexer can have very low insertion loss and high isolation ratio. The approach of grating fabrication is also described.     

一种改善频谱性能的蚀刻衍射光栅输出结构新设计

对波分复用系统中一种重要的解复用器-衍射蚀刻光栅(EDG)的输出结构进行了研究,并提出一种新的采用渐变波导和空气槽相结合的结构设计,在保持器件原有的紧凑结构的前提下极大的提高了器件的频谱特性.该结构设计不需要额外的工艺过程,并且具有很好的工艺容差性.结构的有效性通过波束传播方法(BPM)和模式传播分析(MPA)得到了验证.在所给的数值模型中,-1 dB带宽和品质因素分别比传统设计提高了1.474和1.383倍.同时,相邻信道间的串扰降低了15 dB以上,而整个结构引入的功率损耗仅仅为0.65 dB.     

基于绝缘体上的硅材料的全内反射型阵列波导光栅器件的设计

设计了一种基于绝缘体上的硅材料的全内反射型阵列波导光栅解复用器年。将一全内反射波导镜引入原弯曲的波导列阵中，该波导镜具有偏振补偿的功能和缩小器件尺寸的特点。在器年数值模拟的基础上，制作了原理性器件，并获得了初步的实验结果。     

自由空间微闪耀光栅解复用器

波分复用/解复用器件在光纤通信中具有重要的应用。设计了一种自由空间的微闪耀光栅解复用器,通过对其衍射光场的复振幅分布的研究,得到了满足1级闪耀输出的光栅方程,实现了复合波长信号光在空间上的解复用。通过对微闪耀光栅解复用器的衍射效率和串扰进行分析后表明,微闪耀光栅解复用器具有很高的衍射效率,信号间串扰非常小,而且元件尺寸小,结构紧凑,集成度高,在光通信和光信息处理中具有一定的应用价值。     

Linear system model for planar concave grating demultiplexer

A linear system model for planar concave grating demultiplexer is developed based on the scalar diffraction theory. With this model the system can be simulated by using Fourier transform. Many device performances such as dispersion features, N × N interconnection, channel uniformity, insertion loss, crosstalk can be estimated or optimized. Furthermore, the behavior of aberration is included in the generalized model.