无氟PA-MOD法制备SmBa2Cu3O7-x薄膜的热处理研究

采用无氟(PA-MOD)在(00l)取向的LaAlO3单晶基底上制备SmBa2Cu3O7-x(SmBCO)超导薄膜,研究了不同成相热处理温度对薄膜性能的影响.X射线衍射(XRD)分析结果表明,经过高温处理的SmBCO薄膜其晶粒具有良好的c轴生长取向.扫描电镜(SEM)分析表明,790℃成相的SmBCO薄膜的表面更加平整致密.物理性能测试系统(PPMS)测试结果表明SmBCO样品的超导临界温度Tc为89.74K.研究了高温热处理过程中不同熔融温度制备SmBCO薄膜的影响.     

YBCO薄膜热稳定性和微结构的关系研究

我们已报道过YBa2Cu3O7-δ(YBCO)的过热现象并且对其过热的机制进行了研究[1～2] .在本文的工作中,主要研究了YBCO薄膜的微结构对于其过热行为的影响.通过高温金相显微镜对具有不同微结构的YBCO薄膜的不同的熔化行为进行了实时观测,并且用原子力显微镜(AFM)和X射线衍射仪(XRD)对这些具有不同品质的薄膜进行表征.结果表明, YBCO薄膜的微结构对于其过热度以及整个薄膜熔化的过程有很大的影响,高品质的薄膜具有低界面缺陷比率,由此导致了其在熔化过程中较高的过热度.本文同时在实时观测,AFM和XRD所得到实验结果的基础上,通过半共格界面能的理论很好的解释了YBCO薄膜在不同的微结构情况下体现出来熔化和过热行为的差异.     

不同热处理工艺YBCO涂层的制备及性能研究

将YBa2Cu3O7-δ微粉与有机胶混合均匀,涂在单晶MgO基片上采用不同热处理工艺制备了YBa2Cu3O7-δ(YBCO)涂层,XRD和SEM分析发现无规取向的粉末在热处理后出现很强的c轴取向,经低温(940℃)热处理后涂层由a-b面取向随机的颗粒状晶粒组成,高温处理(1050℃)后涂层由片状晶粒组成,不同测量电流的R-T结果表明两种工艺涂层具有弱连接特点.     

沉积温度对YBCO薄膜取向的影响

采用脉冲激光沉积技术(PLD)在SrTiO3(100)单晶衬底上制备YBCO薄膜,用X射线对薄膜的取向和织构进行表征,用扫描电子显微镜(SEM)对薄膜的表面形貌进行观察.实验主要研究了衬底温度对薄膜外延取向的影响,结果表明在770℃温度下制备的YBCO有较多的a轴晶粒生成,在800℃温度下制备的YBCO是纯的c轴取向,且平均面内φ扫描半高宽(FWHM)为1.2°,超导转变宽度(△Tc)为0.9K.     

TFA-MOD方法制备YBCO超导薄膜研究

采用TFA-MOD方法在LaAlO3(001)单晶基片上制备了性能良好的YBCO超导薄膜:临界电流密度(Jc)可达3MA/cm2(77K,0T),超导转变温度Tc≈90K,转变宽度ΔTc=0.5K,其一次涂层厚度达338nm.通过X射线衍射(XRD)分析表明YBCO具有纯c-轴取向、无a-轴取向的晶粒存在.ω扫描分析表明该YBCO薄膜具有很好的面外外延性,其摇摆曲线的半高宽(FWHM)为0.653°. 用SEM分析也表明膜的表面无裂纹存在,表面平整,没有a轴晶粒生长.     

高温超导YBa2Cu3O7-δ-Y2O3多层薄膜的制备及性能表征

采用脉冲激光沉积技术(PLD)在LaAlO3(100)单晶衬底上外延生长YBa2Cu3O7-δ-Y2O3多层薄膜,用X射线衍射技术(XRD)分析薄膜的物相结构和外延特性,通过原子力显微镜(AFM)观察薄膜的表面形貌.本文主要研究了最佳工艺参数下交替生长多层YBCO-Y2O3膜的超导性能.结果表明,YBa2Cu3O7-δ-Y2O3薄膜为纯c轴取向外延生长,临界电流密度Jc(H=0或H//C)均高于纯YBCO薄膜,纳米Y2O3起到磁通钉扎中心作用.     

关于YBCO薄膜过热现象的研究

在用YBa₂Cu₃O_z(YBCO)种膜液相外延生长Nd_1+xBa_2-xCuO_z(NdBCO)厚膜的过程中，YBCO晶体在高于熔点的温度下保持不熔化并且起到了外延种子的作用.采用高温金相显微镜,我们实时观察YBCO薄膜的熔化过程，发现了超导氧化物薄膜的过热现象，并且结合XRD极图的分析和Ba-Cu-O熔体的不润湿性现象合理解释了YBCO形成过热的机制.另外，通过对具有不同微观结构的YBCO薄膜熔化行为的横向比较，研究YBCO薄膜品质对于其过热度的影响，并用半共格界面能理论很好地解释了AFM和XRD分析及实时观察熔化过程的实验结果. 关键词： 过热 YBCO薄膜 熔化形核     

退火气压对Bi3.25La0.75Ti3O12铁电薄膜的微观结构和铁电性能的影响

采用sol-gel法在Pt/TiO2/SiO2/p-Si(100)衬底上制备了Bi3.25La0 75Ti3O12(BLT)铁电薄膜,研究了在750 ℃时不同退火气压(Po2:10-4-3 atm)对薄膜微观结构和电学性能的影响.XRD和拉曼光谱结果表明在10-4和3 atm氧气压下退火的薄膜晶化度明显降低.同时,XRD结果反映出10-1atm氧气压下退火的薄膜具有a轴择优取向.FSEM截面形貌显示0.1 atm氧气压下退火的薄膜由与a轴取向相对应的柱状晶粒构成,1 atm氧气压下退火的薄膜为由随机取向相对应的斜杆状晶粒构成.薄膜的微观结构最终影响了其铁电性能.0.1 atm氧气压下退火的薄膜具有最大的剩余极化值(Pr=17.8 Μc/cm2和最小的矫顽场强(Ec=73.6 Kv/cm),以及良好的抗疲劳特性.     

YBCO液相外延生长初始阶段的研究

通过液相外延生长的方法能制备高质量的YBa2Cu3O7-δ(YBCO)超导厚膜.利用高温金相显微镜,在大气气氛下实时观测了沉积在MgO基片上的YBCO薄膜熔化过程以及随后冷却过程中的液相外延生长初始阶段.通过对包晶分解过程的控制,留下部分微米级YBCO晶粒,并以此作为外延生长的种子.实验结果表明,通过包晶反应Y2BaCuO5+Liquid→YBa2Cu3O7-δ,能在这些剩余的YBCO晶粒周围快速外延生长出YBCO晶体.本文探讨了初始阶段的生长动力学以及外延生长取向问题.     

YBCO薄膜热稳定性和微结构的关系研究

我们已报道过YBa2Cu3O7-δ（YBCO）的过热现象并且对其过热的机制进行了研究．在本文的工作中，主要研究了YBCO薄膜的微结构对于其过热行为的影响．通过高温金相显微镜对具有不同微结构的YB（的薄膜的不同的熔化行为进行了实时观测，并且用原子力显微镜（AFM）和X射线衍射仪（XRD）对这些具有不同品质的薄膜进行表征．结果表明，YBCO薄膜的微结构对于其过热度以及整个薄膜熔化的过程有很大的影响，高品质的薄膜具有低界面缺陷比率，由此导致了其在熔化过程中较高的过热度．本文同时在实时观测，AFM和XRD所得到实验结果的基础上，通过半共格界面能的理论很好的解释了YBCO薄膜在不同的微结构情况下体现出来熔化和过热行为的差异．     

Microstructure of YBCO thin film and its effect on superheating

Previously, we have reported a superheating phenomenon of a YBa₂Cu₃O_x (YBCO) film and studied its mechanism. In this work, we investigated the influence of microstructure on the superheating of a YBCO thin film. Different melting behaviors were observed in situ from YBCO thin films with varied microstructures by using high-temperature optical microscopy (HTOM). These films with different degrees of crystallinity were also characterized by atomic force microscopy (AFM) and X-ray diffraction (XRD). It was found that the crystalline structure features of the seed film have a great influence on the degree of superheating and the melting behavior. A high-quality film with a low fraction of interface defects is believed to be responsible for the high superheating. On the basis of the experimental results from HTOM, AFM, and XRD, the melting and superheating behaviors associated with the film defect structure are well interpreted in terms of the semi-coherent interface-energy theory. PACS 68.35.Md; 68.47.Gh; 68.55.Ac     

Compatibility and optoelectronic of ZnSe nano crystalline thin film

We report the room temperature synthesis of zinc selenide (ZnSe) nano crystalline thin film on quartz by using a relatively simple and low cost closed space sublimation process (CSSP). The compatibility of the prepared thin films for optoelectronic applications was assessed by X-ray diffraction (XRD), atomic force microscope (AFM), scanning electron microscope (SEM), Raman spectroscopy, photoluminescence, and Fourier transform infrared spectroscopy (FT-IR). The XRD confirmed that the films were polycrystalline with the preferential orientation along the (111) plane corresponding to the cubic phase (2θ = 27.28 ). The AFM indicated that the ZnSe film presented a smooth and compact morphology with RMS roughness 19.86 nm. The longitudinal optical phonon modes were observed at 247 cm 1 and 490 cm 1 attributed to the cubic structured ZnSe. The Zn-Se stretching band was confirmed by the FT-IR. The microstructure and compositional analysis was made with the SEM. The grain size, dislocation density, and strain calculated were co-related. All these properties manifested a good quality, high stability, finely adhesive, and closely packed structured ZnSe thin film for optoelectronic applications.     

退火处理对磁控溅射制备LaCoO_3薄膜性能的影响

采用磁控溅射法在硅衬底上制备了LaCoO_3(LCO)薄膜,研究了退火温度对LCO薄膜组织结构、表面形貌及热电特性的影响,并利用X射线衍射仪、原子力显微镜(AFM)、激光导热仪等对LCO薄膜的晶体结构、表面形貌、热扩散系数等进行测量与表征.结果表明:退火温度对LCO薄膜的结晶度、晶粒尺寸和薄膜表面形貌都有较大影响;退火前后LCO薄膜的热扩散系数都随温度的升高而减小,且变化速率逐渐减缓; LCO薄膜的热扩散系数随退化温度的升高先增大后减小.LCO薄膜经过700℃退火后得到最佳的综合性能,其薄膜表面致密、平整,结晶质量最好,热扩散系数最小,热电性能最好.     

Crystalline structure and morphological properties of undoped and Sn doped ZnO thin films

Undoped and tin (Sn) doped ZnO thin films have been prepared by spray pyrolysis method. Effect of Sn dopant on the crystalline structure and morphological properties of ZnO thin films has been investigated by X-ray diffraction (XRD) and scanning electron microscopy (SEM) method. XRD patterns confirm that the films have polycrystalline nature. While undoped ZnO film has (101) as the preferred orientation, Sn doped ZnO thin films have (002) as the preferred orientation. Grain sizes, lattice parameters and texture coefficient values of the films were determined. Microstructure was analyzed by SEM and the influence of the doping concentration in the microstructure of the films is investigated.     

Influence of 120 MeV Si9+ ion irradiation on ZnTe semiconductor thin films

ABSTRACT

ZnTe (Zinc Telluride) is a potential semiconducting material for many optoelectronic devices like solar cells and back contact material for CdTe-based solar cells. In the present study, ZnTe thin films were prepared by thermal evaporation technique and then irradiated with 120?MeV Si⁹⁺ ions at different fluences. These films are characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV–Visible spectroscopy techniques. XRD study confirms increased crystallinity and grain growth for post-irradiated ZnTe thin films for fluences, up to 1?×?10¹¹ ions cm^?2. However, the grain size and crystallinity decreased for higher fluence-exposed samples. SEM images confirm the observed structural properties. Modification of the surface morphology of the film due to the ion irradiation with different fluences is studied. Optical band gap of film is decreased from 2.31?eV (pristine) to 2.17?eV after irradiation of Si⁹⁺ ions.     

Influence of MgO surface conditions on the in-plane crystal orientation and critical current density of epitaxial YBCO films

The effect of magnesium oxide (MgO) surface conditions on in-plane grain orientation and critical current density of epitaxial YBa₂Cu₃O₇ (YBCO) films was systematically investigated. The MgO substrates were either “as received” or stored for some time, cleaned using different methods and lithographically prepared for our step-edge junction devices. The YBCO films were grown via reactive thermal co-evaporation by Theva, GmbH. The surface characterisation of MgO substrates was studied using X-ray photoelectron spectroscopy (XPS). The in-plane grain orientation of the YBCO films was studied by means of X-ray diffraction (XRD) φ-scan and the critical current density was measured for the XRD scanned samples. The surface condition of the MgO substrates was found to have a strong influence on the in-plane grain orientation and the critical current density of the YBCO films. The MgO substrates with a degraded or contaminated surface gave rise to 45° grain misorientation in YBCO films and reduced the critical current density. A final process step using a low energy Ar ion beam etching (IBE) of the MgO substrates prior to the YBCO film deposition was found effective in removing the in-plane grain misorientation and promoting the growth of perfectly aligned c-axis YBCO films.     

The comparison between CdS thin films grown on Si(111) substrate and quartz substrate by femtosecond pulsed laser deposition

Two kinds of cadmium sulfate (CdS) thin films have been grown at 600 °C onto Si(111) and quartz substrates using femtosecond pulsed laser deposition (PLD). The influence of substrates on the structural and optical properties of the CdS thin films grown by femtosecond pulsed laser deposition have been studied. The CdS thin films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), photoluminescence (PL) and Raman spectroscopy. Although CdS thin films deposited both on Si(111) and quartz substrates were polycrystalline and hexagonal as shown by the XRD , SEM and AFM results, the crystalline quality and optical properties were found to be different. The size of the grains for the CdS thin film grown on Si(111) substrate were observed to be larger than that of the CdS thin film grown on quartz substrate, and there is more microcrystalline perpendicularity of c-axis for the film deposited on the quartz substrate than that for the films deposited on the Si substrate. In addition, in the PL spectra, the excitonic peak is more intense and resolved for CdS film deposited on quartz than that for the CdS film deposited on Si(111) substrate. The LO and TO Raman peaks in the CdS films grown on Si(111) substrate and quartz substrate are different, which is due to higher stress and bigger grain size in the CdS film grown on Si(111) substrate, than that of the CdS film grown on the amorphous quartz substrate. All this suggests that the substrates have a significant effect on the structural and optical properties of thin CdS films. PACS 81.15.Fg; 81.05.Ea; 78.20.-e; 78.67.-n; 42.62.-b     

Fabrication processing effects on the microstructure and morphology of erbium film

The effect of substrate temperature on the microstructure and the morphology of erbium film are systematically investigated using X-ray diffraction (XRD) and scanning electron microscopy (SEM). All the erbium films are grown by electron-beam vapor deposition (EBVD). A novel preparation method for observing the cross-section morphology of the erbium film is developed. The films deposited at 200°C have (002) preferred orientation, and the films deposited at 450°C have a mixed (100) and (101) texture, due to the different growth mechanisms of surface energy minimization and recrystallization, respectively. The peak positions and the full widths at half maximum (FWHMs) of erbium diffraction lines (100), (002), and (101) shift towards higher angles and decrease with the increasing substrate temperature in a largely uniform manner, respectively. Also, the lattice constants decrease with increasing temperature. The transition in the film stresses can be used to interpret the changes in peak positions, FWHMs, and lattice constants. The stress is compressive for the as-growth films, and is counteracted by the tensile stress formed during the process of temperature cooling to room temperature. The tensile stress mainly originates from the difference in the coefficients of thermal expansion of the substrate-film couple.     

Effects of deposition temperature on the structural and morphological properties of SnO2 films fabricated by pulsed laser deposition

Tin oxide (SnO₂) thin films were grown on Si (1 0 0) substrates using pulsed laser deposition (PLD) in O₂ gas ambient (10 Pa) and at different substrate temperatures (RT, 150, 300 and 400 °C). The influence of the substrate temperature on the structural and morphological properties of the films was investigated using X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM). XRD measurements showed that the almost amorphous microstructure transformed into a polycrystalline SnO₂ phase. The film deposited at 400 °C has the best crystalline properties, i.e. optimum growth conditions. However, the film grown at 300 °C has minimum average root mean square (RMS) roughness of 3.1 nm with average grain size of 6.958 nm. The thickness of the thin films determined by the ellipsometer data is also presented and discussed.