多缺陷结构的一维磁光多层膜隔离器

由磁光介质（M）和电介质（G）周期性排列构成的磁光光子晶体会出现很强的光 局域性，最近用它来实现磁光隔离器引起人们广泛的兴趣.给出了一种可用于计算 偏振光在各向异性介质传播问题的传输矩阵方法.并用该方法计算了对称多缺陷结构磁光多 层膜隔离器的光学性质，发现随着缺陷数目的增多，旋转角及透过率的频谱响应得到改善. 当缺陷增加到一定数目时，不需要额外的反射层即可实现反射型磁光隔离器的要求. 关键词： 光隔离器 磁光效应 多层膜 光子晶体     

反射型磁光多层膜隔离器的频率响应及宽容性研究

通过传输矩阵法分析了材料介电常数的变化对于单缺陷结构的磁光多层膜隔离器性能的响，并提出了一种多缺陷结构的磁光多层膜结构.同单缺陷结构相比，多缺陷结构的旋转角的频谱响应带宽有很大增加，对于材料介电常数变化的宽容性得到了一个数量级的提高.同时这种多缺陷的结构对于膜层厚度的变化和入射角度也有很好的宽容性. 关键词： 光隔离器 磁光效应 一维光子晶体     

低介电常数超材料在反射型磁光隔离器中的应用

为设计厚度薄、层数少且具有良好工作性能的反射型磁光隔离器,在一维单缺陷磁光光子晶体中引入低介电常数超材料.利用传输矩阵法研究该光子晶体的克尔磁光效应,结果表明,采用低介电常数超材料制备层间阻抗差异较大的一维单缺陷磁光光子晶体,既易于在磁光介质层形成较强的局域场,获得接近45°的克尔旋转角,又可增强光的反射,获得较高的能量反射率.本研究为低介电常数超材料应用提供了新的可能.     

应用于光隔离器的一维磁光光子晶体结构探索

采用传输矩阵方法分析了一维磁光光子晶体.对不同结构参量下的磁光多层膜的光学性质进行了数值计算.得到了一种新颖实用的磁光多层膜结构,可用作实现光集成应用中的光隔离器的元件.典型磁光材料的厚度仅为2.13 μm,一维磁性光子晶体的总厚度仅为7.03 μm.     

一维磁光子晶体的法拉第效应

由于一维磁光子晶体能同时展示出很好的光透射率和法拉第旋转,故可用于实现小尺度的磁光隔离器。采用传输矩阵法研究了由磁光膜(Bi∶YIG)和电介质膜(Ta2O5,SiO2)构成的一维磁光子晶体,分别讨论了在垂直入射和斜入射条件下的法拉第效应,并给出了几种可行性结构,对磁光隔离器件的进一步改进设计具有一定的参考价值。     

一维磁光子晶体实现光隔离的应用研究

采用4×4传输矩阵法研究了两种结构一维磁光子晶体的光隔离特性.结构一在外加磁场与光路光轴方向呈52.0°时,用7.96μm的总厚度在中心波长附近0.95nm范围内实现了光隔离,在此范围之内法拉第旋转角和透射率分别在45°~50.65°和97.01%~99.96%之间波动,结构仅包含43层光学薄膜,易于实际制备;结构二在外加磁场与光路光轴方向呈32.7°时,用11.54μm的总厚度在中心波长附近0.85nm范围内实现了光隔离,在此范围之内法拉第旋转角和透射率分别在45°~48.55°和98.85%~100%之间波动,结构包含73层光学薄膜,与结构一相比,该结构具有更高的透射率和更平坦的光谱.用这两种结构的一维磁光子晶体代替目前商用磁光隔离器中的块状磁光介质,可实现磁光隔离器的集成化.     

一维磁性光子晶体的电磁场分析和数值计算

本文探讨一维磁性光子晶体的概念和结构.提出了一种分析一维磁性光子晶体的法拉第旋转效应的电磁场方法.分析计算表明:嵌于光子晶体中的一层很薄的磁性材料将可获得比单独一层同样厚度的磁性材料大得多的法拉第旋转效应,从而从理论上验证了文献上的相关实验.同时也分析了一维磁性光子晶体用作光子晶体结构下的光隔离器等器件中的法拉第旋转器的可能.     

一维光子晶体与光学多层介质膜

本文阐述了一维光子晶体和光子禁带的概念,对比了一维光子晶体与光学多层介质膜在结构和特性方面的联系和差别,运用薄膜光学的理论和方法讨论了多层介质膜的高反射带与光子禁带和膜系结构参量的关系.     

一维金属光栅嵌入磁性介质纳米结构下的横向磁光克尔效应的增强

本文在一维金属光栅嵌入磁性介质的体系中实现了横向磁光克尔效应的增强.通过最优化金属光栅的嵌入深度来有效激发磁性介质中的波导模式与金属条带上的局域等离激元模式,从而使横向磁光克尔效应的响应得到巨大增强.本文提出了一种用于增强横向磁光克尔效应的新型等离激元微纳结构,这种结构可以应用于高性能磁光器件的设计.     

一维光子晶体横磁场模的特性

基于平面波展开法,设计三层一维光子晶体横磁场模结构,改变三层介质厚度和介质折射率的大小,应用MATLAB语言进行仿真计算,在一维光子晶体三层介质厚度值为0.4、0.05μm和0.05μm,折射率为1、3N和12N时形成一维光子晶体带隙宽度最宽为0.2694Hz.研究结论为一维光子晶体器件的设计提供理论依据.     

Magneto-optical parameters of Co90Fe10 and Co50Fe50 ferromagnetic thin films for 1.3 μm integrated isolator

In order to optimize a 1.3 μm integrated optical isolator using a CoFe alloy for the non-reciprocal magneto-optical (MO) transverse Kerr effect, we have measured the optical and magneto-optical indices of Co₉₀Fe₁₀ and Co₅₀Fe₅₀ alloys grown in the Al₂O₃/Al/CoFe/GaAs multilayer structure. The optical reflectivity and MO rotation and ellipticity measurements were performed at variable incidence angle and s and p polarization of the incident light. In order to determine the optical and MO indices, the experimental data were fitted using a Matlab implementation of a standard multilayer Yeh formalism including multiple reflections. This original procedure allows precise determination of the optical and MO indices of CoFe alloys.     

Independently tunable transmission-type magneto-optical isolators based on multilayers containing magnetic materials

We investigate the magneto-optical (MO) properties of multilayers containing several magnetic defects. Our numerical simulations show that each MO defect mode can be tuned independently by adjusting the structural parameters of magnetic materials. In addition, giant Faraday rotation can be obtained. Our results indicate that the structure may have potential applications for independently tunable multichannel MO isolators.     

Optimization of MO Bragg diffraction of guided optical waves by MSW in YIG films by using inclined magnetic bias field

We describe a new scheme of noncollinear interaction geometry for magneto-optical (MO) Bragg cells based on inelastic scattering of guided optical wave beams by magnetostatic waves in yttrium–iron–garnet (YIG) films. A great increase of the diffracted light intensity was obtained when using an inclined magnetization of the film, in the case when static in-plane magnetization component is directed along the light propagation direction. It is shown that the diffraction efficiency can be increased more than two times, at a specific value of the angle (≈35°) between the saturation magnetization vector and the normal to the film surface. The effect can be explained through a four-wave model of the diffraction process, which can take place in optical waveguides with MO gyrotropy. The results obtained by a simple analytical solution of the diffraction problem are found to be in good qualitative agreement with the experimental observations.     

Development of surface magneto-optical imaging method

We have observed single vortices in a NbTiN thin film by using magneto-optical (MO) imaging method, in which the light reflected from the surface of the sample produces MO contrasts. The gap between the sample and the indicator film is estimated by the Newton ring and curve fitting to the flux density profile of single vortices.     

Solid-state reaction in Ti/Ni multilayers studied by magneto-optical and optical spectroscopies, and X-ray diffraction

Comparative study of the solid-state reaction (SSR) in a series of Ti/Ni multilayered films (MLF) with a bilayer period of 0.65-22.2 nm and a constant Ti to Ni sublayer thickness ratio has been performed by using the experimental and computer-simulated magneto-optical (MO) and optical spectroscopies as well as X-ray diffraction (XRD). It was shown that alloyed-like regions in an amorphous structure is spontaneously formed near the interfaces between pure elements during the film deposition. The thickness of this region was estimated as 2-3.8 nm on the basis of the MO and optical studies. The SSR in the Ti/Ni MLF caused by an annealing at 580 K for 60 min increases the thickness of these interfacial amorphous regions. It was shown that SSR takes place mainly in the Ti/Ni MLF with relatively “thick” sublayers. The existence of a threshold nominal Ni-sublayer thickness for observing the equatorial Kerr effect of about 3.0 and 4.5 nm for the as-deposited and annealed Ti/Ni MLF, respectively, is explained by formation of the nonmagnetic alloyed regions between pure components during the film deposition as a result of the SSR. For the case of Ti/Ni MLF, the MO and optical approaches turn out to be more sensitive in determining the thickness of the reacted zone, while XRD is more useful for the structural analysis. It was also shown that the very thin nonreacted Ni sublayers have different MO properties (and hence electronic structure) from the bulk. Received 2 May 2001 and Received in final form 21 November 2001     

Magneto-optical nonreciprocal phase shift in garnet/silicon-on-insulator waveguides

We demonstrate the integration of a single-crystal magneto-optical film onto thin silicon-on-insulator (SOI) waveguides by use of direct wafer bonding. Simulations show that the high confinement and asymmetric structure of SOI allows an enhancement of approximately 3x over the nonreciprocal phase shift achieved in previous designs; this value is confirmed by our measurements. Our structure will allow compact magneto-optical nonreciprocal devices, such as isolators, integrated on a silicon waveguiding platform.     

椭偏测厚仪确定薄膜真实厚度的分析

用椭偏测厚仪可以测量薄膜一个周期内的厚度和折射率.本文从理论上分析了采用变入射角确定薄膜的真实厚度时,存在最大可测厚度周期数和最大可测薄膜真实厚度,同时用图形形象描述了周期数、厚度周期、一个周期内的厚度、真实厚度之间的关系及它们与入射角的关系.     

Reflective optical bi-stability of antiferromagnetic films

We investigate one magnetically nonlinear response of antiferromagnetic (AF) films to incident electromagnetic waves, or the reflective optical bi-stability (ROB). Such geometry is used, where the AF anisotropy axis and external static magnetic field both are parallel to the film surfaces and normal to the incident plane. For TE incident waves with the electric component transverse to the incident plane, the ROB of the AF film with the absorption is calculated, but the case of TM incident waves is neglected since no magnetic nonlinearity is induced in this geometry. The bi-stability is completely different in the two resonant-frequency vicinities. Two kinds of bi-stability are found in the higher vicinity, and their features versus incident power are opposite. We also find that there are critical incident angle and critical film thickness for the existence of bi-stability. The bi-stability disappears when the film thickness or incident angle exceeds its critical value. Because the properties of bi-stable reflection sensitively depend on the external field and the incident angle, this bi-stability can be easily modulated by means of changing these quantities.     

椭偏光谱测量中椭偏参数的灵敏度分析

在对椭圆偏振测量的基本原理进行了简单介绍和推导后,讨论了椭圆偏振测量中椭偏参数关于薄膜参数的灵敏度以及入射角对椭偏参数的影响,并进行了具体的仿真分析,得到如下结论：椭偏参数Delta对薄膜光学常数和薄膜厚度变化的灵敏度明显高于椭偏参数Psi。在椭偏数据处理中,椭偏参数Delta的测量精度直接影响薄膜光学常数和薄膜厚度的拟合精度。为了提高椭偏参数Delta的测量精度,可以选择入射角在膺布儒斯特角附近。所得结论对高精度椭偏测量具有指导意义。