| Analysis of Aberrations in Laser-Focused Nanofabrication |
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| 作者姓名： | 张文涛 张宝武 李同保 |
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| 作者单位： | [1]Department of Physics, Tongji University, Shanghai 200092 [2]nstitute of Electronic Engineering, Guilin University of Electronic Technology, Guilin 541004 |
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| 基金项目： | Supported by the Shanghai Foundation for Development of Science and Technology under Grant No 0259nm034. |
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| 摘 要： |
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| 关 键 词： | 分析偏差 聚焦 电子技术 模型实验 |
| 收稿时间： | 2007-3-18 |
| 修稿时间： | 2007-03-18 |
Analysis of Aberrations in Laser-Focused Nanofabrication |
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| ZHANG Wen-Tao,ZHANG Bao-Wu,LI Tong-Bao.Analysis of Aberrations in Laser-Focused Nanofabrication[J].Chinese Physics Letters,2007,24(7):1890-1893. |
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| Authors: | ZHANG Wen-Tao ZHANG Bao-Wu LI Tong-Bao |
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| Affiliation: | Department of Physics, Tongji University, Shanghai 200092Institute of Electronic Engineering, Guilin University of Electronic Technology, Guilin 541004 |
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| Abstract: | Based on the semi-classical model, we analyse the motion equation of chromium atoms in the laser standing wave field under the condition of low intensity light field using fourth-order Adams-Moulton algorithm. The trajectory of the atoms is obtained in the standing wave field by analytical simulation. The image distortion coming from aberrations is analysed and the effects on focal beam features are also discussed. Besides these influences, we also discuss the effects on contrast as well as the feature width of the atomic beam due to laser power and laser beam waist. The simulation results have shown that source imperfection, especially the transverse velocity spread, plays a critical role in broadening the feature width. Based on these analyse, we present some suggestions to minimize these influences. |
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| Keywords: | 32 80 Pj 42 50 Vk |
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