聚合物材料的快重离子辐照效应

简要介绍了快重离子辐照损伤的特点,通过与低电离辐射粒子辐照在聚合物材料中产生的效应的类比论述了快重离子辐照在聚合物材料中产生的效应及其研究现状 ,并结合快重离子辐照效应的应用展望了该领域未来的发展.The irradiation effects in polymers induced by swift heavy ions were reviewed in comparison with that induced by low ionization particles based on the characteristics of swift heavy ion irradiations. It is shown that bond breaking and cross linking, gas releasing, amorphization and carbonization of polymers depend strongly on the electronic energy loss. Besides special effects such as alkynes production, can be induced under swift heavy ion irradiation. The perspectives...     

Comparison study of the charge density distribution induced by heavy ions and pulsed lasers in silicon

Heavy ions and pulsed lasers are important means to simulate the ionization damage effects on semiconductor materials. The analytic solution of high-energy heavy ion energy loss in silicon has been obtained using the Bethe-Bloch formula and the Kobetich-Katz theory, and some ionization damage parameters of Fe ions in silicon, such as the track structure and ionized charge density distribution, have been calculated and analyzed according to the theoretical calculation results. Using the Gaussian function and Beer＇s law, the parameters of the track structure and charge density distribution induced by a pulsed laser in silicon have also been calculated and compared with those of Fe ions in silicon, which provides a theoretical basis for ionization damage effect modeling.     

Comparison of Secondary Ion Emissions from Carbon Nanotubes under Bombardments of MeV Si and Si2 Clusters

The emission yields of H, H2, H3 and heavy ions from carbon nanotubes under bombardments of Si and Si2 clusters in an energy range of 0.3-3 MeV per atom are measured by using the time-of-flight technique (TOF). The emission yields of the secondary ions increase with increasing energy of Si and the electronic stopping processes play an important role. The enhanced emission yields of secondary ions induced by Si2 clusters at the low energies are clearly seen and attributed to the vicinage effect of the nuclear collision processes of cluster constituents and the secondary ion emissions are still dominated by electronic stopping processes at high energies.     

Modeling the applicability of linear energy transfer on single event upset occurrence

Geant4 tools were used to model the single event upset (SEU) of static random access memory cells induced by heavy ion irradiation. Simulated results obtained in two different regions of incident ion energies have been compared in order to observe the SEU occurrence by energetic ions and their effects on the radial ionization profile of deposited energy density. The disagreement of SEU cross sections of device response and radial distribution of deposited energy density have been observed in both low energy and high energy regions with equal linear energy transfer (LET) which correspond to the both sides of the Bragg peak. In the low energy region, SEUs induced by heavy ions are more dependent upon the incident ion species and radial distribution of deposited energy density, as compared with the high energy region. In addition, the velocity effect of the incident ion in silicon in the high energy region provides valuable feedback for gaining insight into the occurrence of SEU.     

Evidence of New Structure Formation in C-doped SiO2 after 4.57 MeV／u Pb Ion Irradiation

Experimental results showed that energetic ion induced phase change in a solid could be achieved not only by irradiation at high fluences but also by singe ion induced huge electronic excitations. The phase change produced in the later condition is just along individual ion latent tracks。Poecently, we have proposed a novel technique,“low energy ion implantation swift heavy ion irradiation”, for synthesizing new structures in atom mixed materials in which more attention was paid to the dense electronic excitations effect induced by theincident ions. In the present work, the technique[2} was used to investigate huge electronic excitations induced     

Raman Analysis of 30 MeV C60 Irradiated N-doped Carbon

In the present work, we used the technique of “low energy ion implantation swift; heavy ion irradiation ”to investigate huge electronic excitations induced modification in N-doped graphite-like-carbon.     

Effects of swift argon-ion irradiation on the proton-exchanged LiNbO3 crystal

A proton-exchanged LiNbO3 crystal was subjected to 70-MeV argon-ion irradiation.The lattice damage was investigated by the Rutherford backscattering and channeling technique.It was found that the lattice disorder induced by the proton exchange process was partially recovered and the proton-exchanged layer was broadened.It indicated that the lithium ions underneath the initial proton-exchanged layer migrated to the surface during the swift argon-ion irradiation and supplemented the lack of lithium ions in the initial proton-exchanged layer.This effect was ascribed to the great electronic energy deposition and relaxation.The swift argon-ion irradiation induced an increase in extraordinary refractive index and formed another waveguide structure beneath the proton-exchanged waveguide.     

Effects of swift argon-ion irradiation on the proton-exchanged LiNbO₃ crystal

A proton-exchanged LiNbO3 crystal was subjected to 70-MeV argon-ion irradiation.The lattice damage was investigated by the Rutherford backscattering and channeling technique.It was found that the lattice disorder induced by the proton exchange process was partially recovered and the proton-exchanged layer was broadened.It indicated that the lithium ions underneath the initial proton-exchanged layer migrated to the surface during the swift argon-ion irradiation and supplemented the lack of lithium ions in the initial proton-exchanged layer.This effect was ascribed to the great electronic energy deposition and relaxation.The swift argon-ion irradiation induced an increase in extraordinary refractive index and formed another waveguide structure beneath the proton-exchanged waveguide.     

Wettability of Si and Al–12Si alloy on Pd-implanted 6H–SiC

Si C monocrystal substrates are implanted by Pd ions with different ion-beam energies and fluences,and the effects of Pd ion implantation on wettability of Si/Si C and Al–12 Si/Si C systems are investigated by the sessile drop technique.The decreases of contact angles of the two systems are disclosed after the ion implantation,which can be attributed to the increase of surface energy(σ_(SV)) of Si C substrate derived from high concentration of defects induced by the ionimplantation and to the decrease of solid–liquid surface energy(σ_(SL)) resulting from the increasing interfacial interactions.This study can provide guidance in improving the wettability of metals on Si C and the electronic packaging process of Si C substrate.     

纯金属中电子能损效应的实验研究

简要评述了快重离子辐照在纯金属中引起的电子能损效应的实验研究结果 ,特别是强电子能损在金属中引起的辐照缺陷的部分退火、新缺陷的产生 .离子潜径迹的形成和辐照相变等. As swift heavy ions are available for irradiation damage study, it has been tried to evidence whether electronic energy loss might play a role in the damage processes of metallic targets. Experimental investigations showed that, as increase of electronic energy loss, large amount of electronic energy loss can result in radiation annealing of part of defects produced by elastic collisions, defect creation, latent track formation, as well as phase transition, and so on. Pure metals...     

快重离子在固体中引起的电子发射

简要介绍了快重离子与固体相互作用研究的状况和快重离子引起固体电子发射的机制 ,讨论了电子能损导致原子位移的 3种微观模型 ,即“库仑爆炸”模型、“热峰”模型和“激发排斥”模型 ,简述了研究电子发射的实验测量装置和测量方法 ,讨论了总电子发射产额与电子能损的关系以及靶俄歇电子和快传输电子测量在电子激发诱发辐照损伤微观机制研究中的应用 ,并介绍了重离子在 C靶中产生的离子径迹处的电子温度和聚丙稀靶中离子径迹势的提取方法. The recent progresses in experimental and theoretical studies of the collision between swift heavy ion and solids as well as electron emission induced by swift heavy ion in solids were briefly reviewed. Three models, Coulomb explosion, thermal spike and repulsive long lived states, for interpreting the atomic displacements stimulated by the electronic energy loss were discussed. The experimental setup and methods for measuring the electron emission from solids were described ...     

Two waveguide layers in lithium niobate crystal formed by swift heavy Kr ion irradiation

We report the formation of two waveguide layers in a lithium niobate crystal by irradiation with swift heavy Kr ions with high(Ge V) energies and ultralow fluences. The micro-Raman spectra are measured at different depths in the irradiated layer and show that the high electronic energy loss can cause lattice damage along the ion trajectory, while the nuclear energy loss causes damage at the end of the ion track. Two waveguide layers are formed by confinement with two barriers associated with decreases in the refractive index that are caused by electronic and nuclear energy losses, respectively.     

快重离子引起的塑性形变现象

非晶材料在快重离子轰击下显示了奇异的各向异性的塑性形变 ,这是电子能损所引起的宏观可见的剧烈的原子重排 .这个效应不能发生在具有晶态结构的材料中 ,但发生于所有的非晶材料中 .这一宏观现象隐含了寻找原子尺度上电子激发转换成原子位移的潜在线索 ,因而受到广泛的关注 .在回顾了现象发现的历史之后 ,综述了离子束引起的塑性形变的基本规律、最新结果、实验方法和技术新的进展 ,最后讨论了相关的物理机制和唯象模型. A very peculiar effect occurring when an amorphous material is irradiated with swift heavy ion is the giant plastic deformation phenomenon discovered in the eighties by Klaumunzer[DD(-8/9]¨ It is macroscopically visible atomic rearrangements induced by electronic energy loss. This effect occurs only in truly amorphous solids and can not occur in a crystalline material. This phenomenon gives rise to a wide ranging and lasting research in the field of the interaction of swift heavy...     

固体材料中快重离子辐照损伤建立过程中的离子速度效应

快重离子辐照损伤建立过程中的离子速度效应是近年来才发现的,离子速度效应是指快重离子在固体材料中引起辐照损伤的损伤截面, 损伤效率和损伤形貌的离子速度相关性, 简要介绍了固体材料中快重离子辐照损伤建立过程中离子速度效应的发现、研究现状和主要实验结果, 并进行了尝试性评价.     

Surface disorder in c-Si induced by swift heavy ions

The disorders induced in crystalline silicon (c-Si) through the process of electronic energy loss in the swift heavy ion irradiation were investigated. A number of silicon <1 0 0> samples were irradiated with 65 MeV oxygen ions at different fluences, 1×10¹³ to 1.5×10¹⁴ ions/cm², and characterized by the Raman spectroscopy, the optical reflectivity, the X-ray reflectivity, the atomic force microscopy (AFM) and the X-ray diffraction (XRD) techniques. The intensity, redshift, phonon coherence length and asymmetric broadening associated with the Raman peaks reveal that stressed and disordered lattice zones are produced in the surface region of the irradiated silicon. The average crystallite size, obtained by analyzing Raman spectrum with the phonon confinement model, was very large in the virgin silicon but decreased to<100 nm dimension in the ion irradiated silicon. The results of the X-ray reflectivity, AFM and optical reflectivity of 200–700 nm radiation indicate that the roughness of the silicon surface has enhanced substantially after ion irradiation. The diffusion of oxygen in silicon surface during ion irradiation is evident from the oscillation in the X-ray reflectivity spectrum and the sharp decrease in the reflectivity of 200–400 nm radiation. The rise in temperature, estimated from the heat spike model, was high enough to melt the local silicon surface. The results of XRD indicate that lattice defects have been induced and a new plane <2 1 1> has been formed in the silicon <1 0 0>after ion irradiation. The results of the present study show that the energy deposited in crystalline silicon through the process of electronic energy loss ～0.944 keV/nm per ion is sufficient to induce disorders of appreciable magnitude in the silicon surface even at a fluence of ～10¹³ ions/cm².     

Physical mechanism of swift heavy ion irradiation effect in graphene

ABSTRACT

The damage production induced by swift heavy ion irradiation in single-layer graphene (SLG) is investigated by molecular dynamics method. By given energy to a cylindrical region, the latent track consisting of nanopore and non-six-member rings can be produced, which depends on the electronic energy loss (dE/dx). For SLG, the minimum value needed to generate defects lies in 6.5–10?keV/nm. The latent track formation begins with the decomposition of the structure in energy deposition region until the atomic fragments escape from the surface and gradually decompose into atomic clusters. At the same time, the structure of system also changes. The source power of this phenomena is the accumulation and outward propagation of atomic stress in energy deposition region.     

Single ion induced surface nanostructures: a comparison between slow highly charged and swift heavy ions

This topical review focuses on recent advances in the understanding of the formation of surface nanostructures, an intriguing phenomenon in ion-surface interaction due to the impact of individual ions. In many solid targets, swift heavy ions produce narrow cylindrical tracks accompanied by the formation of a surface nanostructure. More recently, a similar nanometric surface effect has been revealed for the impact of individual, very slow but highly charged ions. While swift ions transfer their large kinetic energy to the target via ionization and electronic excitation processes (electronic stopping), slow highly charged ions produce surface structures due to potential energy deposited at the top surface layers. Despite the differences in primary excitation, the similarity between the nanostructures is striking and strongly points to a common mechanism related to the energy transfer from the electronic to the lattice system of the target. A comparison of surface structures induced by swift heavy ions and slow highly charged ions provides a valuable insight to better understand the formation mechanisms.     

Comparison study of the charge density distribution induced by heavy ions and pulsed lasers in silicon

Heavy ions and pulsed lasers are important means to simulate the ionization damage effects on semiconductor materials. The analytic solution of high-energy heavy ion energy loss in silicon has been obtained using the Bethe-Bloch formula and the Kobetich-Katz theory, and some ionization damage parameters of Fe ions in silicon, such as the track structure and ionized charge density distribution, have been calculated and analyzed according to the theoretical calculation results. Using the Gaussian function and Beer's law, the parameters of the track structure and charge density distribution induced by a pulsed laser in silicon have also been calculated and compared with those of Fe ions in silicon, which provides a theoretical basis for ionization damage effect modeling.