具有纵向漏极场板的低导通电阻绝缘体上硅横向双扩散金属氧化物半导体器件新结构

为降低绝缘体上硅(SOI)横向双扩散金属氧化物半导体(LDMOS)器件的导通电阻,同时提高器件击穿电压,提出了一种具有纵向漏极场板的低导通电阻槽栅槽漏SOI-LDMOS器件新结构.该结构特征为采用了槽栅槽漏结构,在纵向上扩展了电流传导区域,在横向上缩短了电流传导路径,降低了器件导通电阻;漏端采用了纵向漏极场板,该场板对漏端下方的电场进行了调制,从而减弱了漏极末端的高电场,提高了器件的击穿电压.利用二维数值仿真软件MEDICI对新结构与具有相同器件尺寸的传统SOI结构、槽栅SOI结构、槽栅槽漏SOI结构进行了比较.结果表明:在保证各自最高优值的条件下,与这三种结构相比,新结构的比导通电阻分别降低了53%,23%和提高了87%,击穿电压则分别提高了4%、降低了9%、提高了45%.比较四种结构的优值,具有纵向漏极场板的槽栅槽漏SOI结构优值最高,这表明在四种结构中新结构保持了较低导通电阻,同时又具有较高的击穿电压.     

A low specific on-resistance SOI LDMOS with a novel junction field plate

A low specific on-resistance SO1 LDMOS with a novel junction field plate （JFP） is proposed and investigated theo- retically. The most significant feature of the JFP LDMOS is a PP-N junction field plate instead of a metal field plate. The unique structure not only yields charge compensation between the JFP and the drift region, but also modulates the surface electric field. In addition, a trench gate extends to the buffed oxide layer （BOX） and thus widens the vertical conduction area. As a result, the breakdown voltage （BV） is improved and the specific on-resistance （Ron,sp） is decreased significantly. It is demonstrated that the BV of 306 V and the Ron,sp of 7.43 mΩ.cm2 are obtained for the JFP LDMOS. Compared with those of the conventional LDMOS with the same dimensional parameters, the BV is improved by 34.8%, and the Ron,sp is decreased by 56.6% simultaneously. The proposed JFP LDMOS exhibits significant superiority in terms of the trade-off between BV and Ron,sp. The novel JFP technique offers an alternative technique to achieve high blocking voltage and large current capacity for power devices.     

Low on-resistance high-voltage lateral double-diffused metal oxide semiconductor with a buried improved super-junction layer

A novel low specific on-resistance （Ron,sp） lateral double-diffused metal oxide semiconductor （LDMOS） with a buried improved super-junction （BISJ） layer is proposed. A super-junction layer is buried in the drift region and the P pillar is split into two parts with different doping concentrations. Firstly, the buried super-junction layer causes the multiple-direction assisted depletion effect. The drift region doping concentration of the BISJ LDMOS is therefore much higher than that of the conventional LDMOS. Secondly, the buried super-junction layer provides a bulk low on-resistance path. Both of them reduce Ron,sp greatly. Thirdly, the electric field modulation effect of the new electric field peak introduced by the step doped P pillar improves the breakdown voltage （BV）. The BISJ LDMOS exhibits a BV of 300 V and Ron,sp of 8.08 mΩ·cm2 which increases BV by 35% and reduces Ron,sp by 60% compared with those of a conventional LDMOS with a drift length of 15 μm, respectively.     

A new analytical model for the surface electric field distribution and breakdown voltage of the SOI trench LDMOS

A new analytical model for the surface electric field distribution and breakdown voltage of the silicon on insulator (SOI) trench lateral double-diffused metal-oxide-semiconductor (LDMOS) is presented. Based on the two-dimensional Laplace solution and Poisson solution, the model considers the influence of structure parameters such as the doping concentration of the drift region, and the depth and width of the trench on the surface electric field. Further, a simple analytical expression of the breakdown voltage is obtained, which offers an effective way to gain an optimal high voltage. All the analytical results are in good agreement with the simulation results.     

Investigation of laterally single-diffused metal oxide semiconductor (LSMOS) field effect transistor

We propose a distinct approach to implement a laterally single diffused metal-oxide-semiconductor (LSMOS) FET with only one impurity doped p-n junction. In the LSMOS, a single p-n junction is first created using lateral dopant diffusion. The channel is formed in the p region of the p-n junction and the n region acts as the drift region. Two distinct metals of different work function are used to form the “n⁺” source/drain regions and “p⁺” body contact using the charge plasma concept. We demonstrate that the LSMOS is similar in performance to a laterally double diffused metal-oxide-semiconductor (LDMOS) although it has only one impurity doped p-n junction. The LSMOS exhibits a breakdown voltage of ∼50.0 V, an average ON-resistance of 48.7 mΩ-mm² and a peak transconductance of 53.6 μS/μm similar to that of a comparable LDMOS.     

Breakdown voltage improvement of LDMOSs by charge balancing: An inserted P-layer in trench oxide (IPT-LDMOS)

For the first time, the novel inserted P-layer in trench oxide of LDMOS structure (IPT-LDMOS) is proposed in which a trench oxide with inserted P-layer is considered in the drift region to improve the breakdown voltage. Our simulation with two dimensional ALTAS simulator shows that by determining the optimum doping concentration of the P-layer, the charges of the N-drift and P-layer regions would be balanced. Therefore, complete depletion at the breakdown voltage in the drift region happens. Also, electric field in the IPT-LDMOS is modified by producing additional peaks which decrease the common peaks near the drain and source junctions.     

终端含NMOS反相器传输线系统中的时空复杂行为分析

应用行波理论,建立了一个终端含N沟道金属氧化物半导体(N-channel metal oxide semiconductor, NMOS)反相器的传输线系统的非线性离散映射模型.对该模型进行仿真发现, 反射系数的变化可能导致系统出现时空分岔和时空混沌等复杂的时空行为, 并且初始分布对系统达到稳态后的时空行为有很大影响,零初始分布对应的时空图样比较规则, 而非零的初值分布则会导致沿线电压出现复杂的时空图样,分析表明这些时空复杂行为的产生 源于系统中传输线的无穷维本质和NMOS反相器的非线性伏安特性.     

Measurement and analysis of the electric field in semiconductor lasers by continuous-wave electro-optic probing

The electric field distribution in semiconductor lasers are detected experimentally by using CWEOP (Continuous-Wave Electro-Optic Probing). The paper briefly describes the experimental results. The obtained results reflect several characteristics of the lasers such as injection current, carrier confinement, and the variation of the distribution of the electric field corresponding to different bias conditions.     

Propagation of ultrasonic waves in bulk gallium nitride (GaN) semiconductor in the presence of high-frequency electric field

The propagation of ultrasound is studied in bulk GaN semiconductor in the presence of a strong AC field oscillating at a frequency much higher than that of the ultrasound. Analytical expressions have been obtained for the attenuation coefficient (α) and the renormalised velocity (v) of the acoustic wave. It is shown that the dependencies of the ultrasonic absorption coefficient of the conduction electrons and the renormalised sound velocity on the field amplitude and the sound frequency have an oscillatory character which can be used to determine the effective mass and mobility of the material. The threshold field needed to observe the oscillation is two orders smaller than that needed in the case of CdS.     

Analysis of the breakdown mechanism for an ultra high voltage high-side thin layer silicon-on-insulator p-channel lateral double-diffused metal\ben oxide semiconductor

This paper discusses the breakdown mechanism and proposes a new simulation and test method of breakdown voltage (BV) for an ultra-high-voltage (UHV) high-side thin layer silicon-on-insulator (SOI) p-channel low-density metal-oxide semiconductor (LDMOS). Compared with the conventional simulation method, the new one is more accordant with the actual conditions of a device that can be used in the high voltage circuit. The BV of the SOI p-channel LDMOS can be properly represented and the effect of reduced bulk field can be revealed by employing the new simulation method. Simulation results show that the off-state (on-state) BV of the SOI p-channel LDMOS can reach 741 (620) V in the 3-μm-thick buried oxide layer, 50-μm-length drift region, and at -400 V back-gate voltage, enabling the device to be used in a 400 V UHV integrated circuit.     

新型缓冲层分区电场调制横向双扩散超结功率器件

为了突破传统横向双扩散金属-氧化物-半导体器件(lateral double-diffused MOSFET)击穿电压与比导通电阻的极限关系,本文在缓冲层横向双扩散超结功率器件(super junction LDMOS-SJ LDMOS)结构基础上,提出了具有缓冲层分区新型SJ-LDMOS结构.新结构利用电场调制效应将分区缓冲层产生的电场峰引入超结(super junction)表面而优化了SJ-LDMOS的表面电场分布,缓解了横向LDMOS器件由于受纵向电场影响使横向电场分布不均匀、横向单位耐压量低的问题.利用仿真分析软件ISE分析表明,优化条件下,当缓冲层分区为3时,提出的缓冲层分区SJ-LDMOS表面电场最优,击穿电压达到饱和时较一般LDMOS结构提高了50%左右,较缓冲层SJ-LDMOS结构提高了32%左右,横向单位耐压量达到18.48 V/μm.击穿电压为382 V的缓冲层分区SJ-LDMOS,比导通电阻为25.6 mΩ·cm2,突破了一般LDMOS击穿电压为254 V时比导通电阻为71.8 mΩ·cm2的极限关系.     

Permittivity and its temperature dependence in hexagonal structure BN dominated by the local electric field

This paper presents an analysis of the local electric field in hexagonal boron nitride (h-BN) by introducing a modified parameter. Based on the determination of the modified parameter of h-BN, the revised Lorenz equation is developed. Then the permittivity at high temperature and in the microwave frequency is investigated. In addition, this equation is derived for evaluating the temperature coefficient of the permittivity of h-BN. The analyses show that the permittivity increases with increasing temperature, which is mainly attributed to the positive temperature coefficient of the ionic polarizability.     

单电子晶体管与金属氧化物半导体混合电路构造的一维离散混沌系统研究

基于单电子晶体管与金属氧化物半导体混合结构构造出一种一维离散混沌系统. 研究了单电子晶体管与金属氧化物半导体串联混合结构的电压传输特性,并建立了相应的N型分段线性函数模型. 基于该模型实现了一维离散映射系统,分析了它的一维映射过程、分岔图和Lyapunov指数谱等动力学特性. 最后利用单电子晶体管与金属氧化物半导体混合电路设计出该离散混沌系统的电路结构,仿真验证与理论分析一致. 研究结果表明,利用单电子晶体管与金属氧化物半导体混合结构设计的离散混沌电路不仅结构非常简单,功耗很低, 而且有利于混沌系统的集成和应用.     

Quantum light emission of two lateral tunnel-coupled (In,Ga)As/GaAs quantum dots controlled by a tunable static electric field

Lateral quantum coupling between two self-assembled (In,Ga)As quantum dots has been observed. Photon statistics measurements between the various excitonic and biexcitonic transitions of these lateral quantum dot molecules display strong antibunching confirming the presence of coupling. Furthermore, we observe an anomalous exciton Stark shift with respect to static electric field. A simple model indicates that the lateral coupling is due to electron tunneling between the dots when the ground states are in resonance. The electron probability can then be shifted to either dot and the system can be used to create a wavelength-tunable single-photon emitter by simply applying a voltage.     

Effect of metal oxide and oxygen on the growth of single-walled carbon nanotubes by electric arc discharge

The effect of oxygen on the growth of single-walled carbon nanotubes was studied with Ni–Co alloy powder as catalyst under helium atmosphere of 500 Torr by electric arc discharge. The oxygen included in nickel or (and) cobalt oxides was added in catalyst. The content of oxygen in atmosphere was controlled by changing vacuum degree inside furnace before inputting buffer gas. The examinations of TEM and Raman scattering showed that oxygen in metal oxide as catalyst promotes the nucleation of SWCNT by taking effect on the metal catalyst particles. However, O₂ in atmosphere has the role of oxidizing amorphous particles along with nanotubes. When its molar proportion is higher than 0.22 ppm (Parts per million), the carbon nanotubes produced are oxidized and their purity decreases. The diameter of single-walled carbon nanotube obtained under different condition has a narrow distribution around 1.28 nm.     

Improved interfacial and electrical properties of GaSb metal oxide semiconductor devices passivated with acidic （NH4）2S solution

Surface passivation with acidic(NH4)2S solution is shown to be effective in improving the interfacial and electrical properties of HfO2/GaSb metal oxide semiconductor devices. Compared with control samples, the samples treated with acidic(NH4)2S solution show great improvements in gate leakage current, frequency dispersion, border trap density, and interface trap density. These improvements are attributed to the enhancing passivation of the substrates, according to analysis from the perspective of chemical mechanism, X-ray photoelectron spectroscopy, and high-resolution cross-sectional transmission electron microscopy.     

Microscopically controlled oxidation of H/Si(1 0 0) by lateral surface electric field studied by emission electron microscopies

The ultrathin oxidation of a H/Si(1 0 0) surface with microfabricated pn-junctions was studied by photoemission electron microscopy (PEEM), mirror electron microscopy (MEM) and microscopic X-ray photoelectron spectroscopy (μ-XPS). The ultrathin oxidation inverts the contrast of the junctions in PEEM images. It is found by analyzing the intensity profiles of images that the potential distribution across the pn-junctions is also inverted by the oxidation. The charging of the oxide by ultraviolet irradiation from a light source of PEEM is attributed as the cause of the inversion of the contrast shown by μ-XPS and MEM.     

Synthesis and microstructure of metal oxide thin films containing metal nanoparticles by liquid phase deposition (LPD) method

Au nanoparticles dispersed SiO₂-TiO₂ composite films have been prepared by a novel wet process, Liquid Phase Deposition (LPD) method. The composite films were characterized by XRD, XPS, TEM, ICP, SEM and UV-VIS absorption spectroscopy. The results showed that the SiO₂-TiO₂ composite films containing Au^III and Au^I ionic species were co-deposited from a mixed solution of ammonium silicofluoride, ammonium hexafluorotitanate, boric acid and tetrachloroauric acid. The heat treatment induced the reduction of Au ions and formation of Au nanoparticles in the film. TEM observation revealed that the Au nanoparticles with 5-10 nm in diameter were found to be dispersed uniformly in the SiO₂-TiO₂ matrix. The optical absorption band due to the surface plasmon resonance of dispersed Au particles were observed at the wavelength of 550 nm and shifted toward longer wavelength with increasing heat treatment temperature. Received 28 November 2000     

用B样条函数方法研究碱金属原子里德堡态在静电场中的性质

由原子的模型势出发,利用B样条函数方法研究了钾和铯原子的里德堡态在静电场中Stark态能级反交叉位置以及微波场中钾原子的多光子共振吸收谱.研究表明我们的结果与实验和其他理论结果符合得很好.