基于栅绝缘层表面修饰的有机场效应晶体管迁移率的研究进展

栅绝缘层的表面性质对有机场效应晶体管（OFETs）的半导体薄膜的形貌、晶粒生长的有序性和载流子的传输有着重大的影响．研究表明,通过改进栅绝缘层的表面性质,可以有效提高有机场效应晶体管的迁移率．本文综述了OFETs绝缘层表面的粗糙度和表面能对OFETs迁移率的影响,重点探讨了栅绝缘层表面修饰常用的方法,即自组装单层（SAMs）修饰和聚合物修饰与迁移率改进之间的研究进展．最后,展望了该研究方向未来可能的发展趋势．     

Nonideal double-slope effect in organic field-effect transistors

With the development of device engineering and molecular design,organic field effect transistors(OFETs)with high mobility over 10 cm2 V-1-s-1 have been reported.However,the nonideal doubleslope effect has been frequently observed in some of these OFETs,which makes it difficult to extract the intrinsic mobility OFETs accurately,impeding the further application of them.In this review,the origin of the nonideal double-slope effect has been discussed thoroughly,with affecting factors such as contact resistance,charge trapping,disorder effects and coulombic interactions considered.According to these discussions and the understanding of the mechanism behind double-slope effect,several strategies have been proposed to realize ideal OFETs,such as doping,molecular engineering,charge trapping reduction,and contact engineering.After that,some novel devices based on the nonideal double-slope behaviors have been also introduced.     

Vacuum relaxation and annealing-induced enhancement of mobility of regioregular poly（3-hexylthiophene） field-effect transistors

In order to enhance the performance of regioregular poly(3-hexylthiophene) (RR-P3HT) field-effect transistors (FETs), RR-P3HT FETs are prepared by the spin-coating method followed by vacuum placement and annealing. This paper reports that the crystal structure, the molecule interconnection, the surface morphology, and the charge carrier mobility of RR-P3HT films are affected by vacuum relaxation and annealing. The results reveal that the field-effect mobility of RR-P3HT FETs can reach 4.17×10^ - 2~m²/(V.s) by vacuum relaxation at room temperature due to an enhanced local self-organization. Furthermore, it reports that an appropriate annealing temperature can facilitate the crystal structure, the orientation and the interconnection of polymer molecules. These results show that the field-effect mobility of device annealed at 150~℃ for 10 minutes in vacuum at atmosphere and followed by placement for 20 hours in vacuum at room temperature is enhanced dramatically to 9.00×10^ - 2 ~cm²/(V.s).     

Fabrication and characterization of the normally-off N-channel lateral 4H–SiC metal–oxide–semiconductor field-effect transistors

In this paper, the normally-off N-channel lateral 4H–Si C metal–oxide–semiconductor field-effect transistors(MOSFFETs) have been fabricated and characterized. A sandwich-(nitridation–oxidation–nitridation) type process was used to grow the gate dielectric film to obtain high channel mobility. The interface properties of 4H–Si C/SiO_2 were examined by the measurement of HF I–V, G–V, and C–V over a range of frequencies. The ideal C–V curve with little hysteresis and the frequency dispersion were observed. As a result, the interface state density near the conduction band edge of 4H–Si C was reduced to 2 × 10~(11) e V~(-1)·cm~(-2), the breakdown field of the grown oxides was about 9.8 MV/cm, the median peak fieldeffect mobility is about 32.5 cm~2·V~(-1)·s~(-1), and the maximum peak field-effect mobility of 38 cm~2·V~(-1)·s~(-1) was achieved in fabricated lateral 4H–Si C MOSFFETs.     

Improving organic field-effect transistors based on double active layers structure

Organic field-effect transistors (OFETs) were fabricated based on double active layers structure. Different substrate temperatures and thermal treatment were adopted to prepare double active layers and optimize film morphology. The grain size of organic films can be effectively controlled by the change in substrate temperature in the process of deposition. An improved device performance was obtained compared with conventional single layer devices. This result is attributed to the introduction of double active layers. We believe that this kind of optimization will simultaneously improve charge injection and transportation of OFETs.     

柔性有机场效应晶体管研究进展

柔性有机场效应晶体管具有可折叠、质量轻、低成本等优点,在柔性显示、柔性传感器、柔性射频标签和柔性集成电路等方面显示了广阔的应用前景.本文在介绍柔性有机场效应 晶体管最新研究进展的基础上, 总结了柔性有机场效应晶体管的器件结构和柔性有机场效应晶体管所使用的衬底材料、 栅绝缘层材料、有源层材料及电极材料, 阐述了柔性有机场效应晶体管的制备工艺, 并讨论了不同的弯曲方式对柔性有机场效应晶体管性能的影响, 最后总结和展望了柔性有机场效应晶体管的应用领域. 关键词： 柔性 晶体管 有机/聚合物 溶液加工     

Effects of concentration and annealing on the performance of regioregular poly（3-hexylthiophene） field-effect transistors

This paper investigates the effects of concentration on the crystalline structure, the morphology, and the charge carrier mobility of regioregular poly(3-hexylthiophene) (RR-P3HT) field-effect transistors (FETs). The RR-P3HT FETs with RR-P3HT as an active layer with different concentrations of RR-P3HT solution from 0.5~wt% to 2~wt% are prepared. The results indicate that the performance of RR-P3HT FETs improves drastically with the increase of RR-P3HT weight percentages in chloroform solution due to the formation of more microcrystalline lamellae and bigger nanoscale islands. It finds that the field-effect mobility of RR-P3HT FET with 2~wt% can reach 5.78× 10^-3~cm²/Vs which is higher by a factor of 13 than that with 0.5~wt%. Further, an appropriate thermal annealing is adopted to improve the performance of RR-P3HT FETs. The field-effect mobility of RR-P3HT FETs increases drastically to 0.09~cm²/Vs by thermal annealing at 150~℃, and the value of on/off current ratio can reach 10^4.     

非溶剂掺杂完善自组织机理提升高度区域规则的(3-己基噻吩)有机场效应晶体管器件性能的研究

为了保证在低温加工及溶液制备的情况下,能够提升高度区域规则的聚(3-己基噻吩) (RR-P3HT)有机场效应晶体管(OFET)的器件性能,本文研究了室温下乙醇及乙腈非溶剂的掺杂,及其对高分子自组织机理与导致的RR-P3HT OFET电学性能的影响.实验发现,适量进行乙醇及乙腈非溶剂的掺杂,将促进RR-P3HT薄膜形成更多期望的微晶粒薄片结构,完善高分子自组织机理,导致RR-P3HT OFET电学性能的提升.实验表明,在RR-P3HT溶液中进行5 %乙腈添加后,其器件场效应迁移率的值由原来的4.04×10< 关键词： 高度区域规则的聚(3-己基噻吩)有机场效应晶体管 非溶剂掺杂 自组织机理 场效应迁移率     

最小二乘拟合计算有机薄膜晶体管迁移率的研究

本文通过制备了一个基于并五笨为有源层的顶栅底接触OTFT器件获取电流电压实验数据,并运用电流电压特性曲线理论拟合计算方法计算其场效应迁移率.研究发现,采用不同的拟合方法得到的场效应迁移率值有较大的差异.若选取转移特性曲线线性区距中心1/2范围内测试点进行最小二乘拟合计算出的场效应迁移率能减少采用其他拟合方法的固有不准确性,而且与其他方法得到的场效应迁移率最接近. 关键词： 最小二乘拟合 场效应迁移率 有机薄膜晶体管     

高分子有机场效应晶体管中半导体薄膜结晶行为及微观结构变化的研究

为了探索高分子有机场效应晶体管(OFET)中高分子自组织机理与电荷传输的关联性,采用同步辐射掠入射X射线衍射技术研究了高分子OFET中以高度区域规则的聚(3-己基噻吩)(RR-P3HT)为代表的半导体层的结晶行为及微观结构组织变化,及其引起的高分子半导体电荷传输机理.研究发现,采用自组装单分子层(SAMs)技术进行界面修饰,可以完善绝缘层与RR-P3HT半导体层之间的界面效果.SAMs的形成改善了界面,可以有效地控制上层RR-P3HT半导体层的结晶性及微观结构,使较多的噻吩环面垂直于衬底、得到π-π堆积方向平行于衬底的二维微晶粒薄片结构,这种微观结构有效地形成了二维共轭电荷传输通道,完善了在RR-P3HT工作层生长过程中的自组织机理;并且对于RR-P3HT半导体工作层来说,慢速生长过程比快速生长过程更有利于有效的二维共轭微晶粒薄片生长,更能完善RR-P3HT工作层生长过程中的自组织机理. 关键词： 高度区域规则的聚(3-己基噻吩)有机场效应晶体管 同步辐射掠入射X射线衍射 自组织机理 微观结构     

V2O5电极修饰对C60/Pentacene双层异质结场效应晶体管性能的影响

制备了用过渡金属氧化物V₂O₅修饰Al源、漏电极的C₆₀/Pentacene双层异质结有机场效应管.该构型器件与未修饰器件相比,呈现出典型的双极型晶体管传输特性.电子迁移率和空穴迁移率分别达到8.6×10^-2cm²/V·s^-1和6.4×10^-2cm²/V·s^-1,阈值电压分别为25 V和-25 V.器件性能改善的原因主要是由于插入V₂O₅修饰层后,可以明显降低Al电极与Pentacene之间的接触势垒,提高空穴的有效注入,从而使电子和空穴的注入接近平衡.研究表明,采用V₂O₅修饰电极方法,是制备低成本、高性能的双极型有机场效应管并实现其商业应用的有效途径.     

Comparative study of field-effect mobility with different expressions in organic thin film transistors

In organic thin film transistors (OTFTs), mobility generally exhibits field-effect dependence, and is strongly related to the disorder property of organic semiconductors used in OTFTs. Here, we compared three typical field-effect mobility models and used them to simulate the output characteristics of pentacene-based OTFTs. From the comparison of the theory and experiment, an analytic expression for the field-effect mobility to exactly describe the electrical characteristics of OTFTs was obtained. The better fit to the output characteristics of poly(9,9-dioctyl-fluorene-co-N-(4-butylphenyl)-diphenylamine) (TFB)-based OTFT and copper phthalocyanine (CuPc)-based OTFT by using the obtained analytic expression of the field-effect mobility further extended its applicability in OTFTs. This supplies a valuable manner to derive the field-effect mobility of carriers and understand the transport characteristics of carriers in OTFTs.     

Room-temperature and solution-processed vanadium oxide buffer layer for efficient charge injection in bottom-contact organic field-effect transistors

We introduce a room temperature and solution-processible vanadium oxide (VO_x) buffer layer beneath Au source/drain electrodes for bottom-contact (BC) organic field-effect transistors (OFETs). The OFETs with the VO_x buffer layer exhibited higher mobility and lower threshold voltages than the devices without a buffer layer. The hole mobility with VO_x was over 0.11 cm²/V with the BC geometry with a short channel length (10 μm), even without a surface treatment on SiO₂. The channel width normalized contact resistance was decreased from 98 kΩ cm to 23 kΩ cm with VO_x. The improved mobility and the reduced contact resistance were attributed to the enhanced continuity of pentacene grains, and the increased work function and adhesion of the Au electrodes using the VO_x buffer layer.     

Enhanced charge carrier injection in heterojunction organic field-effect transistor by inserting an MoO3 buffer layer

A top-contact organic field-effect transistor(OFET) is fabricated by adopting a pentacene/1,1’-bis(di-4tolylaminophenyl) cyclohexane(TAPC) heterojunction structure and inserting an MoO3 buffer layer between the TAPC organic semiconductor layer and the source/drain electrode.The performances of the heterojunction OFET,including output current,field-effect mobility,and threshed voltage,are all significantly improved by introducing the MoO3 thin buffer layer.The performance improvement of the modified heterojunction OFET is attributed to a better contact formed at the Au/TAPC interface due to the MoO3 thin buffer layer,thereby leading to a remarkable reduction of the contact resistance at the metal/organic interface.     

柔性有机非易失性场效应晶体管存储器的研究进展

柔性有机非易失性场效应晶体管存储器具有柔性、质轻、成本低、可低温及大面积加工等优点,在射频识别标签、柔性存储、柔性集成电路和大面积柔性显示等领域展现出巨大的应用前景.本文在介绍柔性有机非易失性场效应晶体管存储器的衬底材料、器件结构和性能参数的基础上,总结了柔性有机非易失性场效应晶体管存储器的分类,并讨论了机械应力和不同温度对柔性有机非易失性场效应晶体管存储器性能参数的影响,最后展望了柔性有机非易失性场效应晶体管存储器的应用前景以及所面临的挑战.     

Improved performance of 4H-SiC metal-semiconductor field-effect transistors with step p-buffer layer

An improved 4H-SiC metal-semiconductor field-effect transistors (MESFETs) with step p-buffer layer is proposed, and the static and dynamic electrical performances are analysed in this paper. A step p-buffer layer has been applied not only to increase the channel current, but also to improve the transconductance. This is due to the fact that the variation in p-buffer layer depth leads to the decrease in parasitic series resistance resulting from the change in the active channel thickness and modulation in the electric field distribution inside the channel. Detailed numerical simulations demonstrate that the saturation drain current and the maximum theoretical output power density of the proposed structure are about 30% and 37% larger than those of the conventional structure. The cut-off frequency and the maximum oscillation frequency of the proposed MESFETs are 14.5 and 62 GHz, respectively, which are higher than that of the conventional structure. Therefore, the 4H-SiC MESFETs with step p-buffer layer have superior direct-current and radio-frequency performances compared to the similar devices based on the conventional structure.     

界面态电荷对n沟6H-SiC MOSFET场效应迁移率的影响

针对界面态密度在禁带中的不均匀分布，分析了界面态电荷对n沟6H碳化硅MOSFET场效应迁移率的影响.分析结果显示，界面态电荷使n沟碳化硅器件的场效应迁移率明显降低.并给出了实验测定的场效应迁移率和反型层载流子迁移率的比值与界面态密度之间关系. 关键词： 碳化硅 界面态 反型层迁移率 场效应迁移率     

Extrinsic limiting factors of carrier transport in organic field-effect transistors

Extrinsic factors to disturb the carrier transport in pentacene field-effect transistors (FETs), as a representative of the high-mobility organic FETs (OFETs), have been comprehensively analyzed by using atomic-force-microscope potentiometry (AFMP), microscopic four-point-probe field-effect transistor (MFPP-FET) measurement, and other techniques. In the first part, by mainly using AFMP as a powerful tool to reveal the potential distribution in working OFETs, we show how and how much the formation of source/drain electrodes influences the apparent field-effect mobility both for top- and bottom-contact configurations. In the second part, we show the influence of irregular grain structures and regular grain boundaries. The films grown both at very low and high temperature ranges contain distinctive insulating parts, which make the apparent mobility very low. Within the moderate growth temperature range, the intrinsic field-effect mobility obtained by MFPP-FET measurement is proportional to the average grain size. This behavior is well explained by the polycrystalline model with the diffusion theory. According to the observations in this work, it is obvious that these extrinsic limiting factors must be carefully excluded to discuss the intrinsic mechanism of the carrier transport in OFETs.     

Electron mobility in the linear region of an AlGaN/AlN/GaN heterostructure field-effect transistor

We simulate the current-voltage （I-V） characteristics of AlGaN/AlN/GaN heterostructure field-effect transistors （HFETs） with different gate lengths using the quasi-two-dimensional （quasi-2D） model. The calculation results obtained using the modified mobility model are found to accord well with the experimental data. By analyzing the variation of the electron mobility for the two-dimensional electron gas （213EG） with the electric field in the linear region of the AlGaN/AlN/GaN HFET I-V output characteristics, it is found that the polarization Coulomb field scattering still plays an important role in the electron mobility of AlGaN/AlN/GaN HFETs at the higher drain voltage and channel electric field. As drain voltage and channel electric field increase, the 2DEG density reduces and the polarization Coulomb field scattering increases, as a result, the 2DEG electron mobility decreases.