高场应力及栅应力下AlGaN/GaN HEMT器件退化研究

采用不同的高场应力和栅应力对AlGaN/GaN HEMT器件进行直流应力测试,实验发现：应力后器件主要参数如饱和漏电流,跨导峰值和阈值电压等均发生了明显退化,而且这些退化还是可以完全恢复的;高场应力下,器件特性的退化随高场应力偏置电压的增加和应力时间的累积而增大;对于不同的栅应力,相对来说,脉冲栅应力和开态栅应力下器件特性的退化比关态栅应力下的退化大.对不同应力前后器件饱和漏电流,跨导峰值和阈值电压的分析表明,AlGaN势垒层陷阱俘获沟道热电子以及栅极电子在栅漏间电场的作用下填充虚栅中的表面态是这些不同应 关键词： AlGaN/GaN HEMT器件 表面态(虚栅) 势垒层陷阱 应力     

动态应力下超薄栅氧化层经时击穿的可靠性评价

实验发现动态电压应力条件下,由于栅氧化层很薄,高电平应力时间内隧穿入氧化层的电子与陷落在氧化层中的空穴复合产生中性电子陷阱,中性电子陷阱辅助电子隧穿.由于每个周期的高电平时间较短(远远低于电荷的复合时间),隧穿到氧化层的电子很少,同时低电平应力时间内一部分电荷退陷,形成的中性电子陷阱更少.随着应力时间的累积,中性电子陷阱达到某个临界值,栅氧化层突然击穿.高电平时形成的陷阱较少和低电平时一部分电荷退陷,使得器件的寿命提高. 关键词： 超薄栅氧化层 斜坡电压 经时击穿     

High-electric-field-stress-induced degradation of SiN passivated AlGaN/GaN high electron mobility transistors

AlGaN/GaN high electron mobility transistors (HEMTs) are fabricated by employing SiN passivation, this paper investigates the degradation due to the high-electric-field stress. After the stress, a recoverable degradation has been found, consisting of the decrease of saturation drain current I_Dsat, maximal transconductance g_m, and the positive shift of threshold voltage V_TH at high drain-source voltage V_DS. The high-electric-field stress degrades the electric characteristics of AlGaN/GaN HEMTs because the high field increases the electron trapping at the surface and in AlGaN barrier layer. The SiN passivation of AlGaN/GaN HEMTs decreases the surface trapping and 2DEG depletion a little during the high-electric-field stress. After the hot carrier stress with V_DS=20 V and V_GS=0 V applied to the device for 10⁴ sec, the SiN passivation decreases the stress-induced degradation of I_Dsat from 36% to 30%. Both on-state and pulse-state stresses produce comparative decrease of I_Dsat, which shows that although the passivation is effective in suppressing electron trapping in surface states, it does not protect the device from high-electric-field degradation in nature. So passivation in conjunction with other technological solutions like cap layer, prepassivation surface treatments, or field-plate gate to weaken high-electric-field degradation should be adopted.     

Kink effect in current–voltage characteristics of a GaN-based high electron mobility transistor with an AlGaN back barrier

The kink effect in current–voltage(IV)characteristic s seriously deteriorates the performance of a GaN-based HEMT.Based on a series of direct current(DC)IV measurements in a GaN-based HEMT with an AlGaN back barrier,a possible mechanism with electron-trapping and detrapping processes is proposed.Kink-related deep levels are activated by a high drain source voltage(Vds)and located in a GaN channel layer.Both electron trapping and detrapping processes are accomplished with the help of hot electrons from the channel by impact ionization.Moreover,the mechanism is verified by two other DC IV measurements and a model with an expression of the kink current.     

The reliability of AlGaN/GaN high electron mobility transistors under step-electrical stresses

In spite of their extraordinary performance, AlGaN/GaN high electron mobility transistors (HEMTs) still lack solid reliability. Devices under accelerated DC stress tests (off-state, V_DS =0 state, and on-state step-stress) are investigated to help us identify the degradation mechanisms of the AlGaN/GaN HEMTs. All our findings are consistent with the degradation mechanism based on crystallographic-defect formation due to the inverse piezoelectric effects in Ref. [1] (Joh J and del Alamo J A 2006 IEEE IDEM Tech. Digest p. 415). However, under the on-state condition, the devices are suffering from both inverse piezoelectric effects and hot electron effects, and so to improve the reliability of the devices both effects should be taken into consideration.     

Influence of an electric field on photostimulated states in NH4BPh4 films

The influence of an electric field on stable photostimulated triplet states of NH₄BPh₄ at a temperature of 77 K have been studied by EPR spectroscopy. It has been established that, on exposure to UV radiation, electron capture by traps in the band gaps takes place with formation of triplet state. After application of an electric field, triplet states are destructed because, with an increase in the applied voltage, a gradual inclination of energy bands takes place and electrons found in traps on different energy levels are released. The assumption that captured electrons are found in traps on different energy levels is confirmed by earlier studies of thermoluminescence spectra.     

Hot carrier injection degradation under dynamic stress

In this paper,we have studied hot carrier injection(HCI) under alternant stress.Under different stress modes,different degradations are obtained from the experiment results.The different alternate stresses can reduce or enhance the HC effect,which mainly depends on the latter condition of the stress cycle.In the stress mode A(DC stress with electron injection),the degradation keeps increasing.In the stress modes B(DC stress and then stress with the smallest gate injection) and C(DC stress and then stress with hole injection under V g = 0 V and V d = 1.8 V),recovery appears in the second stress period.And in the stress mode D(DC stress and then stress with hole injection under V g = 1.8 V and V d = 1.8 V),as the traps filled in by holes can be smaller or greater than the generated interface states,the continued degradation or recovery in different stress periods can be obtained.     

Effect of ionizing irradiation on the mechanism of current passage in TlInSe<Subscript>2</Subscript> single crystals

The temperature dependence of the electrical conductivity and current-voltage characteristics of γ-irradiated TlInSe₂ single crystals with an electrical resistivity of ∼10⁸ Ω cm have been investigated. It has been established that the anomalies of the conductivity observed in weak electric fields and at low dozes of irradiation are related to the decomposition of neutral complexes containing an interstitial cation atom. In strong electric fields, a thermal-field ionization of traps occurs. The main mechanism of radiation defect formation is the formation of complexes [V _In⁻In _i ⁺], [V _Se⁻Se _i ⁻], and others with the structural defects characteristic of unirradiated crystals. The activation energy, trap concentrations, and the potential well shape near the traps have been determined.     

Combustion of ethanol fuel droplet in vertical direct current electric field

Flame is affected by an external electric field because it contains ions and electrons related to chemical reactions. On the other hand, the movement of ions and electrons affects the external electric field due to their charge. This paper reports the combustion experiments of ethanol droplets in vertical electric field with variable distance electrodes apparatus in order to discuss the change of the external electric field due to the existence of flame. From a one-dimensional steady-state analysis, if the electric field is changed spatially, its effect on combustion behavior is aligned with V²/L³ and not V/L, where V is the applied voltage between electrodes, and L is distance between the electrodes. The droplet is burned between the two horizontal parallel electrodes. The flame deformation and the electric current are characterized by various electrode distances, and respectively, applied voltages. The vertical electric field induces a body force downwards on the flame. The flame deforms downward in the electric field because the electric body force counters the natural buoyancy. The relation between the applied voltage and electrode distance is investigated when the flame becomes vertically symmetrical and the results show that the deformation is the function of V/L^1.5. This indicates that the change in the electric field should be considered to discuss the effect of an external electric field on combustion behavior. The experimental results are rearranged using εV²/L³ where ε is electric permittivity of air because its unit is N/m³ and it considered to be the representative electric body force. Although its application is limited, qualitatively it can help to explain the experimental results of a droplet combustion. In addition, the degree of electron attachment to neutral molecules is discussed to interpret our experimental results.     

金属氧化物半导体场效应管热载流子退化的1/fγ噪声相关性研究

研究了金属氧化物半导体(MOS)器件在高、中、低三种栅压应力下的热载流子退化效应及其1/f^γ噪声特性.基于Si/SiO₂界面缺陷氧化层陷阱和界面陷阱的形成理论,结合MOS器件1/f噪声产生机制,并用双声子发射模型模拟了栅氧化层缺陷波函数与器件沟道自由载流子波函数及其相互作用产生能级跃迁、交换载流子的具体过程.建立了热载流子效应、材料缺陷与电参量、噪声之间的统一物理模型.还提出了用噪声参数Sf ^{关键词： 金属氧化物半导体场效应管 热载流子 fγ噪声')" href="#">1/fγ噪声}     

A magneto-transport anomaly in semiconductors at low carrier-densities,a wigner condensation?

Transport properties of the narrow-gap semiconductors PbTe, PbSnTe, and HgCdTe were studied in the extreme magnetic quantum limit. With low carrier densities an anomalous behaviour was found for the longitudinal (?_□) and the transverse (?_⊥) magnetoresistance, for the Hall effect, and in the IU-characteristic. ?_□ increased near a critical magnetic field by almost two orders of magnitude. A pronounced kink in the ?_⊥ ∝ B^α dependence took place at the critical field. This critical magnetic field of the anomaly shows the features predicted for a Wigner condensation, i.e. the dependence on carrier density in all the three semiconductors. The new state at high magnetic fields is obviously a free carrier effect since it can be annihilated by heating the electrons in an electric field.     

New physical model to explain logarithmic time dependence of data retention in flash EEPROM

Data retention after program/erase (P/E) cycles is one of the most important reliability issues in a flash EEPROM. Electron detrapping is the main cause of data leakage in the state-of-the-art flash EEPROM. The log(t) dependence of ΔV_th is a unique aspect of the electron detrapping. To explain log(t) dependence, we have assumed that after electron detrapping, the positive-ionized trap reduces the probability of electrons in the influence area being emitted from their site. Based on this assumption, we have proposed a model of detrapping which is consistent with the experimental results.     

Hall mobility of hot electrons in CdS

Photo-Hall effect of hot electrons in a pure single crystal of CdS was observed, for the first time. The measurement was carried out for electric fields up to 4,300 V/cm in magnetic fields up to 40 kOe at 4.2 K. The saturation of the drift velocity V_d of electrons due to optical phonon emission was observed. The saturated value of V_d is found to be about 1.7 × 10⁷ cm/sec.     

Electric field effect on the mechanisms of recombination in KI doped with divalent ions

In KI crystals doped with divalent ions (Eu²⁺, Sr²⁺, Mn²⁺) a strong influence of the electric field is observed, after irradiation, on the carriers (electrons and holes) recombination kinetics. The phenomena are similar whether the electrons, distributed on traps bound to divalent ions, are excited by IR at 4 K, and recombine with trapped holes (V_k centers) or whether the holes are made thermally mobile at T>77 K. It is suggested that this is due to the recombination mechanism: the kinetics are simultaneously controlled by diffusion and tunneling. The tunneling range is a function of the applied field.     

Ionic,electronic and ion-diffusion controlled relaxation processes in CaF2, BaF2 and LiBaF3 crystals

Abstract

The ionic, electronic and anion-diffusion controlled thermally stimulated relaxation (TSR) processes at 80—700 K in CaF₂ BaF₂ and LiBaF₃ crystals (X-ray irradiated or non-irradiated) have been investigated by means of ionic conductivity, ionic thermally stimulated (TS) depolarization current (TSDC); as well as current (TSC), luminescence (TSL) and bleaching (TSB) techniques. Above 250—290 K broad and overlapping anion TSDC peaks and correlated TSB stages are detected. The TSB kinetics is initiated and controlled by anion detrapping and interaction with the localized charges, i.e., the anion-diffusion controlled TSR processes take place in fluorides. The TSL and TSC data for LiBaF₃ indicate that the lifetime and drift of electrons at 80—250 K is very small because of deep retrapping. The main TSL peaks at 132K, 170K and 220 K are caused by V_k center detrapping and hole-diffusion controlled tunnel recombination within pairs like {D_n e^?…V_k }.     

Field emission theory of dislocation-sensitized photo-stimulated exo-electron emission from coloured alkali halide crystals

A new field emission theory of dislocation-sensitized photo-stimulated exo-electron emission (DSPEE) is proposed, which shows that the increase in the intensity of photo emission fromF-centres during plastic deformation is caused by the appearance of an electric field which draws excited electrons out of the deeper layer and, therefore, increases the number of electrons which reach the surface. The theory of DSPEE shows that the variation of DSPEE flux intensity should obey the following relation

Negative space charge and electric field intensity in polymeric insulators at low temperatures

The effect of negative space charge accumulation due to injection of electrons from cathode microprotrusions on the steady-state and transient electric field distributions in polymer dielectrics is discussed. An isolated microprotrusion is modeled by a spherical capacitor in which an electrode of smaller radius is the cathode. The calculations include the fact that the distribution of negative space charge depends on the rate of capture and liberation of electrons by traps, while the activation energy of this process depends on the electric field intensity. An exponential energy distribution is proposed for the traps. It is shown that significant electrical overvoltages can only appear near the cathode microtips immediately after switching on the voltage. In the course of 10⁻⁶–10⁻⁵ s, the coefficient of electrical overvoltage drops to a few units and approaches its steady-state value. The region of significant electrical overvoltage is localized, and is the same order as the dimensions of the microtip. Fiz. Tverd. Tela (St. Petersburg) 40, 1167–1172 (June 1998)     

Quantitative analysis of charge-carrier trapping in organic thin-film transistors from transfer characteristics

A dynamic method for quantifying the amount and mechanism of trapping in organic field effect transistors (OFETs) is proposed. It exploits transfer characteristics acquired upon application of a triangular waveform gate sweep V _G. The analysis of the transfer characteristics at the turning point V _G=−V _max between forward and backward gate sweeps, viz. around the maximum gate voltage V _max applied, provides a differential slope Δm which depends exclusively on trapping. Upon a systematic change of V _max it is possible to extract the initial threshold voltage, equivalent to one of the observables of conventional stress measurements, and assess the mechanism of trapping via the functional dependence on the current. The analysis of the differential logarithmic derivative at the turning point yields the parameters of trapping, as the exponent β and the time scale of trapping τ. In the case of an ultra-thin pentacene OFET we extract β=1 and τ=10²–10³ s, in agreement with an exponential distribution of traps. The analysis of the hysteresis parameter Δm is completely general and explores time scales much shorter than those involved in bias stress measurements, thus avoiding irreversible damage to the device.     

Negative bias-induced threshold voltage instability and zener/interface trapping mechanism in GaN-based MIS-HEMTs

We investigate the instability of threshold voltage in D-mode MIS-HEMT with in-situ SiN as gate dielectric under different negative gate stresses.The complex non-monotonic evolution of threshold voltage under the negative stress and during the recovery process is induced by the combination effect of two mechanisms.The effect of trapping behavior of interface state at SiN/AlGaN interface and the effect of zener traps in AlGaN barrier layer on the threshold voltage instability are opposite to each other.The threshold voltage shifts negatively under the negative stress due to the detrapping of the electrons at SiN/AlGaN interface,and shifts positively due to zener trapping in AlGaN barrier layer.As the stress is removed,the threshold voltage shifts positively for the retrapping of interface states and negatively for the thermal detrapping in AlGaN.However,it is the trapping behavior in the AlGaN rather than the interface state that results in the change of transconductance in the D-mode MIS-HEMT.     

Investigation of light programmable non‐volatile memory in an organic phototransistor

Excellent non‐volatile memory characteristics have been demonstrated under the optoelectric conditions for organic phototransistors (OPTs). The high photosensitivity shown as reversible shifts in light‐induced V_TH exhibits a large memory window for programming caused by the excited immobile carriers (electron) trapped as a function of the electrical bias and the light intensity. The long life span of stored electrons also reveals promising behavior with respect to data retention as well as the electrical reliability to serve as a data storage medium with the non‐volatile memory characteristic in OPTs. The V_TH recovery accelerated by the reversible bias stress for the stored charges under irradiation shows that the erasing behavior is clearly brought by the discharge process of long‐lived electrons occupied in deep states. Plausible mechanisms in the energy band are discussed for the programming and erasing process, which provides a fundamental understanding of the intrinsic charge storage behavior in OPTs. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)