一维有序ZnO纳米棒阵列的制备与表征

通过改进传统水热法的密闭、高压的条件,在非密闭、常压环境下在氧化铟锡玻璃衬底上自组装生长了取向高度一致并且分散性好的ZnO纳米棒阵列.首先将乙酸锌溶胶旋涂到氧化铟锡玻璃衬底上,经热处理得到致密的ZnO纳米晶薄膜,然后将其垂直放入前驱体溶液中通过化学溶液沉积生长得到ZnO纳米棒阵列.室温条件下,对样品进行了SEM和XRD的测试.表明生成的氧化锌纳米棒阵列沿c轴取向,实现了定向生长,且纳米棒结晶较好,为六方纤锌矿结构,直径约为40 nm,长度达到微米量级.室温下的吸收光谱表明,由此方法得到的纳米棒纯度较高,有强的紫外吸收.室温下,观测到了该有序ZnO纳米棒阵列在387 nm处强的窄带紫外发射,半高宽小于30 nm,在468 nm处还有一强度较弱的蓝光发射峰.     

热蒸发法制备ZnO纳米棒阵列

氩气氛常压下，利用热蒸发法，在无催化剂、无ZnO预沉积层的硅衬底上制备了取向良好，排列整齐的ZnO纳米棒阵列．在距Zn源不同位置的Si衬底上得到了不同形貌的样品．硅衬底置于锌源正上方是得到取向一致的ZnO纳米阵列的一个关键性条件．用场发射扫描电子显微镜、X射线粉末衍射表征样品表面形貌、晶体结构．进一步研究了样品的生长机制和荧光性质．     

水热反应中籽晶层对ZnO纳米棒的影响

以Zn(NO3)2·6H2O/HMT为反应物,通过低温水热反应过程,在籽晶衬底上制备了ZnO纳米棒,分别用场发射扫描电子显微镜和X射线衍射仪对ZnO纳米棒形貌与晶体结构进行了表征,并研究了不同方法制备的ZnO籽晶层以及籽晶层厚度对ZnO纳米棒形貌及结晶质量的影响.结果表明磁控溅射籽晶衬底上生长的ZnO纳米棒结晶质量最好,而籽晶层的厚度对ZnO纳米棒的垂直取向性有一定的影响.     

联合体驱使生长法制备ZnO纳米棒及其表征

在常压环境下采用联合体驱使生长(Aggregation-driven growth)法在镀有ZnO纳米薄膜的医用盖玻片衬底和锌箔上制备了不同直径、高取向、密集生长的ZnO纳米棒阵列结构,发现平均直径与生长时间呈线性关系。X射线衍射(XRD)谱图中出现了较强的(002)峰,表明制备的纳米棒阵列具有高度c轴择优生长取向;高分辨透射电子显微镜(HRTEM)和选区电子花样衍射图谱(SAED)结果表明我们得到的单根纳米棒为沿(002)生长的单晶结构。分析确定盖玻片上的纳米棒阵列是以ZnO纳米薄膜缓冲层上的ZnO种子颗粒为成核点生长形成的。     

两步法制备超疏水性ZnO纳米棒薄膜

采用两步法制备了超疏水性ZnO纳米棒薄膜,在用磁控溅射在普通玻璃衬底上生长一层ZnO籽晶层基础上,利用液相法制备了空间取向高度一致的ZnO纳米棒阵列,经修饰后由亲水性转变为超疏水性.用扫描电子显微镜观察了纳米棒的表面结构,用接触角测量仪测出水滴在ZnO纳米棒薄膜表面的接触角为151°±05°,滚动角为7°.用Cassie模型对ZnO纳米棒薄膜的超疏水性进行了验证. 关键词： ZnO纳米棒 超疏水 两步法     

Mn掺杂ZnO纳米棒阵列的制备及其磁学性质研究

在95 ℃条件下通过水热方法制备出垂直于ITO基底高密度均匀生长的Mn掺杂ZnO（ZnO：Mn）纳米棒阵列. 纳米棒的直径约为100纳米,长约1微米,且沿［001］方向生长. XRD和XPS结果证实了Mn以替位方式掺杂到纳米棒中,并且掺杂浓度与反应物中的Mn离子浓度似呈正比关系. 所制备的ZnO：Mn纳米棒在室温均有铁磁性,其饱和磁化强度随反应物中Mn离子浓度的提高,饱和磁化强度呈现出先增大,5at.%时达到最大值,0.11 emu/g,然后减小. 铁磁性来源于取代Zn离子的Mn离子之间的铁磁交换相互作用.     

水浴法制备ZnO纳米棒及其场发射性能

用硝酸锌(Zn(NO3)2·6H2O)与六亚甲基四胺(C6H12N4)以等浓度配制成反应溶液,通过水浴法制备出了形貌可控的棒状ZnO纳米结构,讨论了不同反应浓度及衬底对ZnO表面形貌的影响.样品的XRD和扫描电子显微镜分析结果表明,所得产物均为六方纤锌矿结构,在有晶种层的衬底上制备出的ZnO纳米棒沿(001)方向并垂直于衬底表面生长.随着反应浓度的增加,ZnO纳米棒的直径增大,长径比减小.样品的场发射性能测试表明,反应溶液浓度为0.005 mol/L,以铜膜为晶种层的硅衬底上制备出的场发射阴极具有较好的场发射性能.     

直立Zn_2GeO_4/ZnO纳米棒阵列的制备及其发光性质研究

利用化学气相沉积法(CVD)在表面溅射Au和沉积ZnO籽晶的硅衬底上分别生长高度有序、垂直密布的直立Zn2GeO4/ZnO纳米棒阵列,利用扫描电子显微镜(SEM)、X射线衍射仪(XRD)和光致发光(PL)谱测试手段对所制备样品进行表征和发光特性的研究。所制备的Zn2GeO4/ZnO纳米棒的直径为350~400 nm,高度为10~11μm;室温PL谱观察到3个来源于Zn2GeO4的典型发光峰。最后,对CVD法制备的Zn2GeO4/ZnO纳米棒生长机理进行了分析。该种直立性良好的一维纳米棒材料可以广泛地应用到纳米光电子器件中。     

定向ZnO纳米钉阵列的制备及生长机理

在550 ℃下,采用化学气相沉积(CVD)法在镀Au(10 nm)的Si(100)衬底上,制备了ZnO一维纳米钉阵列结构。X射线衍射(XRD)谱图中只显示了(002)衍射峰,其半峰全宽为0.166°,表明制备的纳米钉阵列具有高度c轴择优生长取向的特点和较高的结晶质量,高分辨透射电子显微镜(HRTEM)和选区电子衍射图(SAED)谱的结果表明所得到的单根纳米钉为沿(002)生长的单晶结构;同时,对一维纳米钉阵列的生长机理进行了分析。结果表明:由于Si与ZnO之间大的晶格失配度,首先在Si表面沉积一层富Zn的ZnO_x薄膜缓冲层,然后通过VLS机理中的底端生长模式生长成为纳米钉阵列结构。     

铕掺杂氧化锌纳米棒阵列材料的制备及光学性能研究

通过低温化学方法在多孔硅柱状阵列(NSPA)衬底上制备得到铕掺杂ZnO(ZnO∶Eu)纳米棒阵列结构。实验方法简单、条件温和,有效地实现了ZnO纳米棒和铕离子之间的能量转移,丰富了ZnO纳米半导体材料体系的发光。X射线衍射以及X射线光电子能谱证实铕离子成功掺杂进了ZnO晶体中。室温荧光光谱测试结果表明:ZnO∶Eu纳米棒阵列可实现从紫外光到蓝-绿光的宽谱带发射,其中发光中心位于～380 nm的紫外光源于ZnO的带边发射,位于450～570 nm的蓝-绿光源于ZnO的本征缺陷发光,而位于～615 nm的红光发光则源于铕离子核外电子4f壳层结构。同时借助于能带示意图对光致发光机理进行了分析。     

Controlled synthesis of oriented ZnO nanorod arrays by seed-layer-free electrochemical deposition

Oriented ZnO nanorod arrays were successfully prepared on transparent conductive substrates by seed-layer-free electrochemical deposition in solution of Zn(NO₃)₂ at a low temperature of 70 °C without using any catalysts, additives, and additional seed crystals. The effects of the Zn(NO₃)₂ concentration, deposition time and applied current on the localized nanorod arrays are investigated. X-ray powder diffraction (XRD) and field emission scanning electron microscopy (FE-SEM) were used to characterize the structures and the morphologies of ZnO nanorod arrays. The heights and diameters of ZnO nanorods can be tuned by controlling the electrodeposition parameters.     

Fabrication of an intelligent superhydrophobic surface based on ZnO nanorod arrays with switchable adhesion property

The superhydrophobic ZnO surface possessing water adhesive reversibility is fabricated by a facile method. The as-prepared surface is low adhesive; however, after being irradiated by UV light through a photomask, it becomes highly adhesive. A water droplet can suspend on the irradiated surface. Further annealing the irradiated surface, water droplets can roll on the surface again. Reversible transition between the high adhesive pinning state and low adhesive rolling state can be realized simply by UV illumination and heat treatment alternately. The adhesion transition is attributed to the adsorption/desorption of surface hydroxyl groups and the organic chains rearrangement on the top surfaces of ZnO.     

Controllable growth of well-aligned ZnO nanorod arrays by low-temperature wet chemical bath deposition method

Well-aligned ZnO nanorod arrays were synthesized by low-temperature wet chemical bath deposition (CBD) method on Si substrate under different conditions. Results illustrated that dense ZnO nanorods with hexagonal wurtzite structure were vertically well-aligned and uniformly distributed on the substrate. The effects of precursor concentration, growth temperature and time on nanorods morphology were investigated systematically. The mechanism for the effect of preparation parameters was elucidated based on the chemical process of CBD and basic nucleation theory. It is demonstrated that the controllable growth of well-aligned ZnO nanorods can be realized by readily adjusting the preparation parameters. Strong near-band edge ultraviolet (UV) emission were observed in room temperature photoluminescence (PL) spectra for the samples prepared under optimized parameters, yet the usually observed defect related deep level emissions were nearly undetectable, indicating high optical quality ZnO nanorod arrays could be achieved via this easy process chemical approach at low temperature.     

Ultrafast laser assisted fabrication of ZnO nanorod arrays for photon detection applications

Orderly aligned ZnO nanorod arrays were grown by the ultrafast laser assisted ablation deposition method. These nanorod arrays were further used to make efficient p-n heterojunction photodetector arrays, which have the potential to have nanoscale spatial resolution for imaging, unique incident polarization discrimination capability, and much improved quantum efficiency as well as detection sensitivity. Both front- and back-illumination photodetection schemes were demonstrated by growing those ZnO nanorod arrays on p-type silicon and p-type Zn_0.9Mg_0.1O-coated Al₂O₃ (0 0 0 1) substrates, respectively. Typical diode rectification behavior and photosensitivity were observed in both designs through I-V and photocurrent measurements.     

Seed-assisted growth of epitaxial ZnO nanorod arrays with self-organized periodicity and directional alignment

In this article we report the seed-assisted growth of epitaxial ZnO nanorod (NR) arrays on (0 0 0 1) plane sapphire substrates at low temperatures in aqueous solutions. The self-organized periodic ZnO NR rows with a fairly constant separation were directly grown on bare sapphire surfaces, without the need for any complicated lithography or use of pre-patterned catalysts. The spatial ordering of the ZnO NRs was significantly influenced by the seed growth conditions and by the presence of a self-organized step structure on the annealed sapphire surface. In addition, the effect of the conditions employed to prepare the seeds, including growth parameters and post-growth annealing treatment, on the epitaxial relationship between the ZnO NRs and the sapphire substrate was systematically investigated by X-ray diffraction (XRD) measurements and transmission electron microscopy (TEM) observations. Post-growth annealing of the ZnO seeds changed the morphologies and crystallographic alignment of the generated ZnO nanostructures significantly, as a result of the formation of epitaxial spinel ZnAl₂O₄ interlayers, facilitated by zinc cation diffusion and solid state reactions at high temperature.     

Controlling the orientation of ZnO nanorod arrays using TiO<Subscript>2</Subscript> thin film templates dip-coated by sol–gel

The oriented ZnO nanorod arrays have been synthesized on a silicon wafer that coated with TiO₂ films by aqueous chemical method. The morphologies, phase structure and the photoluminescence (PL) properties of the as-obtained product were investigated by field-emission scanning electron microscopy (FE-SEM), X-ray diffractometer (XRD), transmission electron microscope (TEM) and PL spectrum. The nanorods were about 100 nm in diameter and more than 1 μm in length, which possessed wurtzite structure with a c axis growth direction. The room-temperature PL measurement of the nanorod arrays showed strong ultraviolet emission. The effect of the crystal structure and the thickness of TiO₂ films on the morphologies of ZnO nanostructures were investigated. It was found that the rutile TiO₂ films were appropriate to the oriented growth of ZnO nanorod arrays in comparison with anatase TiO₂ films. Moreover, flakelike ZnO nanostructures were obtained with increasing the thickness of anatase TiO₂ films.