激光直写光刻中线条轮廓的分析

考虑了光刻胶对光吸收作用,在已有描述胶层内光场分布模型的基础上,较为准确地推导出光刻胶层内不同深度位置的光场分布.使用迭代方法计算得到了胶层内曝光量空间分布曲线,分析了不同曝光量下胶层内的线条轮廓,为直写光刻中曝光量的选择提供了依据.实验结果分析与理论分析的结果一致.     

离焦激光直写的线宽稳定方法

为了提高激光直写加工衍射光学元件时的线条质量,提出一种离焦激光直写的线宽稳定方法.该方法通过同时调节激光功率和离焦量,使光刻胶的曝光阈值处于线宽对曝光量的变化率较小位置,从而可以弱化线宽对实际曝光量或光刻胶阈值等变化的敏感度,提高利用离焦方法进行衍射光学元件制作时的线宽稳定性.推导了稳定线宽后的光功率控制模型和线宽模型,模型中的变量仅为离焦量,降低了光功率控制的复杂性.利用632.8 nm的He-Ne激光和NA-0.1的物镜在CCD上对采用该方法后的离焦线宽模型进行验证,实验结果与理论模型吻合较好.该方法对于线宽稳定度较高的衍射光学元件制作具有重要价值.     

激光光刻中焦深概念的新探讨

焦深大小将直接影响激光光刻加工的最细线宽和线条的边缘倾角从而影响被加工器件性能.传统的几何光学焦深概念对有光刻胶存在时的激光光刻已不适用.本文导出了会聚的高斯光束用于激光光刻时在光刻胶内的光场近似分布形式,由此可判断出光刻胶对光刻线条的分辨率和焦深的影响,从而提出激光光刻时焦深的新概念和估算.     

基于厚金属狭缝阵列的表面等离子激元光刻

提出一种利用厚金属狭缝阵列耦合激发表面等离子激元制作非周期图形的纳米光刻模型.采用时域有限差分电磁场模拟仿真软件研究了厚金属狭缝阵列中表面等离子激元的激发、模式选择以及光刻胶中的光场分布.结果表明,通过优化厚金属狭缝阵列结构参量和匹配介质参量可有效抑制表面等离子激元在光栅狭缝出口处的发散,增加表面等离子激元的穿透深度,可获得高分辨率的较大曝光深度的周期和非周期纳米图形,可为纳米激光直写技术提供有益的借鉴.     

Surface-plasmon-polaritons-assisted nanolithography with dual-wavelength illumination for high exposure depth

We propose a new direct writing nanolithography approach using a plasmonic focusing device and a nano silver mirror with dual-wavelength illumination for high exposure depth. Arrays of pyramid aperture are used to focus the incident light beams into 80 nm light spots. The pyramid combined with a thin silver film coated on the substrate constructs a surface plasmon polaritons (SPP) coupling cavity, which amplifies the intensity of the light field in it by SPP effect and resonance. The transmission depth of the standing wave formed by forward and reflected light could reach hundreds of nanometers. Two lasers with different wavelengths are used as illumination sources to homogenize the light field through complementation between the two standing waves. Simulation results show by using 355 nm and 441 nm wavelengths, a space of 44 nm at the bottom of the photoresist could be obtained after exposure and development. The feature size of resist patterns could be further scaled down, depending on the optimization of parameters of photoresist exposure and development, illumination wavelengths, etc.     

激光光刻中的超分辨现象研究

激光光刻是加工微光学及二元光学掩模的主要手段。光刻的最细线宽对所加工的二元微器件性能起决定作用。本文导出了会聚的高斯光束用于激光光刻时在光刻胶内的光场近似上此可判断出能光刻线条的分辨力。若入射高斯光束受到振中相位调制时,胶层内的光强分布将发生变化,从而影响曝光线条的线宽和质量。计算看出：当入射光中心环受到遮拦时,可以得到超光刻物镜极限分辨的线条宽度（０．６μｍ）,但此时对曝光能量控制要求很高。在激     

完整布拉格反射型晶体衍射特性的理论研究

利用x射线衍射动力学理论研究了完整布拉格反射型晶体衍射特性,给出晶体衍射强度分布图,并计算了完整晶体积分反射强度和衍射强度分布半高宽。结果表明:在相同的能量下,不同类型晶体的衍射强度分布不同;在相同的布拉格角条件下,不同类型晶体积分反射强度和衍射强度分布半高宽也不同;当布拉格角大于45°时,晶体的积分反射强度与衍射强度分布的半高宽随着布拉格角的增大而迅速增大。     

Cathodoluminescence of large-area PLD grown ZnO thin films measured in transmission and reflection

Epitaxial ZnO thin films on sapphire substrates can be used as fast and laterally homogeneous scintillators to convert electrons into photons, for example for imaging purpose. We report on the improvement of the cathodoluminescence intensity of epitaxial pulsed laser deposited ZnO films on a-plane sapphire substrates with diameter up to 33 mm. The lateral homogeneity of the integral cathodoluminescence intensity was inspected using a modified RHEED setup. Cathodoluminescence spectra were excited at the ZnO side of the samples and detected both in reflection and in transmission geometry. The redshift of the excitonic cathodoluminescence peak in transmission relative to reflection and the peak shift with the excitation depth can be explained by a model based on self absorption of the photons in the ZnO film. PACS 78.60.Hk; 78.20.Bh; 81.05.Dz; 81.15.Fg     

电视导引头的激光回波分析

阐述了用激光主动扫描法侦察远方飞航导弹来袭方位的原理及实验技术。以电视导引头光学系统为例,运用矩阵光学追迹法对影响“猫眼效应”回波强度的因素进行了定性和定量的分析。研究结果表明:回波强度受导引头光路中光学镜头的相对孔径、摄像管靶面倾斜和离焦的影响较大;扫描激光光束的入射角等因素对回波强度也有一定的影响。在主动扫描装置与被探测导引头相距约5000m、扫描光束的入射角为0.1rad的条件下,导引头光学系统反射面倾斜和离焦使得侦察装置接收到的回波能量与发射脉冲能量之比由理想条件下的1.0%分别下降到了0.004%和0.3%。     

Focusing of a singular beam in the presence of spherical aberration and defocusing

Focusing of a singular beam by a lens in the presence of spherical aberration and defocusing is studied by using Fresnel–Kirchhoff diffraction integral for two different values of topological charge. Results of intensity distribution and encircled energy are plotted for defocused observation planes. Spherical aberration spreads the dark core and reduces the intensity at maxima. The results have been verified by the optical transfer function (OTF) approach.     

一种控制矩形光刻胶光栅槽深和占宽比的方法

利用光刻胶的非线性效应可以制作出了矩形的全息光栅。制作矩形光栅时,对槽形的控制被简化为对槽深和占宽比这两个参量的控制。首先借助实时潜像监测技术获得最佳曝光量,然后根据显影监测曲线的特征找出光栅槽底的残胶厚度为零的显影时刻,就能得到槽底干净的矩形光栅,同时保证槽深近似等于光刻胶的初始厚度;如果此后继续显影,就能适度减小占宽比。实验结果和理论分析都证实了这种控制方法的可靠性。对1200lp／mm的光栅,目前工艺能精确调控的最大槽深为1μm,占宽比在0．2～0．6范围内。实验还揭示,为了提高对光栅槽形的调控能力,必须首先提高干涉条纹的稳定性。     

Patterning of nanoparticulate transparent conductive ITO films using UV light irradiation and UV laser beam writing

Indium tin oxide (ITO) thin film is one of the most widely used as transparent conductive electrodes in all forms of flat panel display (FPD) and microelectronic devices. Suspension of already crystalline conductive ITO nanoparticles fully dispersed in alcohol was spun, after modifying with coupling agent, on glass substrates. The low cost, simple and versatile traditional photolithography process without complication of the photoresist layer was used for patterning ITO films. Using of UV light irradiation through mask and direct UV laser beam writing resulted in an accurate linear, sharp edge and very smooth patterns. Irradiated ITO film showed a high transparency (∼85%) in the visible region. The electrical sheet resistance decrease with increasing time of exposure to UV light and UV laser. Only 5 min UV light irradiation is enough to decrease the electrical sheet resistance down to 5 kΩ□.     

An azobenzene functionalized polymer for laser direct writing waveguide fabrication

We report on non-lithographic laser direct writing fabrication of optical waveguides by using a 4′-hydroxy-4-nitroazobene dye-functionalized polymer film. The polymer film reveals permanent change of refractive index at high laser illumination intensity. A focused continuous wave low power green laser beam at 532 nm wavelength is used to directly write waveguide structures on the polymer film. The magnitude of refractive index increase at film surface is about 0.006. One-step laser writing results in graded index waveguides in film depth direction under ambient conditions without pre- and post-processing. As a by-product, the laser writing also results in a very small air valley at the boundary between the laser written and non-written regions which may contribute in part although minimal to the waveguide lateral confinement and can be used for visual observation of waveguide patterns. The fabricated waveguide is found to be stable and easily reproducible.     

A quick algorithm of exposure distribution for fabrication of micro-optical structures

An approximate algorithm of exposure distribution on photoresist for the case of large exposure dose is obtained on the basis of the algorithm reported in [X. Dong, C. Du, S. Li, C. Wang, Y. Fu, Control approach for form accuracy of microlenses with continuous relief, Opt. Express 13 (2005) 1353-1360] via analyzing a PAC concentration distribution inside the photoresist. We analyzed the fabrication errors of the micro-optical structures which are caused by the approximate algorithm. The relief form error originating from the measurement errors of characteristics parameters of the photoresist is analyzed as well. A valid approach for a quick and accurate design of the exposure distribution is provided accordingly. As an example, a saw-tooth grating with 75 μm relief depth was designed and fabricated so as to verify the new algorithm. Our measurement results show that root mean square (rms) value is less than 0.81 μm. The quick algorithm can satisfy the requirements of micro-optical systems for practical applications.     

基于波像差判据的同步相移显微干涉检焦方法

为了实时准确地将激光直写系统中经直写物镜聚焦的光斑定位于待加工元件表面,提出了一种基于波像差判据的同步相移显微干涉检焦方法,实现了对离焦量的实时检测与调整。在直写系统中引入检焦光路,与直写光路共享同一物镜,构建Linnik型同步相移显微干涉检焦系统,提取包含离焦量的波面相位信息;再从大数值孔径（NA）的物镜波像差数据中解析出离焦量的大小与方向。仿真结果验证了基于波像差判据的离焦计算方法的正确性,NA≥0.5时,离焦探测灵敏度可达4 nm, 通过实验验证了同步相移显微干涉检焦方法的可行性,检焦精度可达10 nm以内,满足激光直写高精度的测量要求。     

激光直接写入过程的计算机仿真研究

基于光刻胶正胶曝光显影过程的理论模型,用梯度折射率介质光线追迹的方法进行了由于局部溶解 同而造成的显影过程 胶面面形随时间变化过程的计算。对任意给定的曝光量分布及显影时间,可以精确地确定显影后的面形,为激光直写研究提供了一种有效的工具。同时,通过对显影速率作阈值近似后,导出了光刻胶曝光显影后面形与表面所需曝光量分布之间的关系,为激光直接写入提供了理论指导。     

Surface plasmon resonance spectroscopy on rotated sub-micrometer polymer gratings generated by UV-laser based two-beam interference

Two-beam interference method was applied to generate gratings having periods of 416 nm and 833 nm by the forth harmonic of a Nd:Yag laser on thin poly-carbonate films spin-coated onto silver layer-covered substrates. The dependence of the modulation depth on the fluence and number of laser pulses was investigated by atomic force microscopy. A secondary pattern appeared on very thin polymer layers thanks to the “p” polarized laser beam illumination induced self-organized processes. The conditions of the emergence of grating-coupling caused additional plasmon resonance peak were determined for the sub-micrometer periodic polymer gratings. Surface plasmon resonance measurements were performed in attenuated total reflection arrangement to determine the effect of the angle between the plasmon propagation direction and the polymer groves on the grating-coupling. The effect of the modulation depth on the grating-coupling caused additional resonance minimum was also analyzed. We found coupling phenomena according to our calculations, the differences between the measured and theoretically predicted resonance curves were explained by the scattering on the complex surface structure.     

1 m太阳望远镜光电导行镜无热化分析

作为1 m太阳望远镜（NVST）导行系统的重要组成部分,导行镜的成像稳定性至关重要。环境温度载荷造成的镜体变形会造成热离焦从而影响导行镜的成像质量。采用有限元方法分析NVST导行镜在-5 ℃、20 ℃和35 ℃等不同环境温度状态下的温度分布,并计算了温度变化产生的轴向结构变形,即最大离焦量为6.45 m。计算结果表明:主镜到靶面的距离变化最大值常温下为7.14 m远小于系统焦深（35 m）, 达到了对NVST导行镜无热化结构设计的目的。     

Fabrication of grating structures by simultaneous multi-spot fs laser writing

Two-photon polymerisation is an established technique for the fabrication of three-dimensional microstructures. To date structures have mostly been developed using single beam serial writing. A novel approach to simultaneous multi-spot two-photon polymerisation, that uses a SiO₂ on glass Fraunhofer diffractive optical element to generate an array of beamlets, is described. A Ti:sapphire laser, with wavelength 790 nm, 80 MHz repetition rate, 100 fs pulse duration and an average power of 25 mW, was used to initiate two-photon polymerisation. The DOE, in combination with a high power microscope objective, efficiently transforms the laser beam into a linear array of four spots of equal intensity. The fabrication of a periodic transmission grating, using parallel processing with these four spots, is shown. The grating was written in a Zr-loaded resin prepared on a glass substrate using dip coating deposition of a Zr/PMMA hybrid prepared by the sol-gel method. The operation of the diffractive element and the performance of the diffraction grating are also discussed.     

The three-dimensional photonic crystals coated by gold nanoparticles

We report on the fabrication of metallodielectric photonic crystals by means of interference lithography and subsequent coating by gold nanoparticles. The grating is realized in a SU-8 photoresist using a He-Cd laser of wavelength 442 nm. The use of the wavelength found within the photoresist low absorption band enables fabricating structures that are uniform in depth. Parameters of the photoresist exposure and development for obtaining a porous structure corresponding to an orthorhombic lattice are determined. Coating of photonic crystals by gold nanoparticles is realized by reduction of chloroauric acid by a number of reductants in a water solution. This research shows that the combination of interference lithography and chemical coating by metal is attractive for the fabrication of metallodielectric three-dimensionally periodic microstructures.