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等离子辅助制备单元层厚度的铁电薄层及其铁电性的表征
引用本文:葛静,宋贤江,杜国威,李浩杰,游雨蒙.等离子辅助制备单元层厚度的铁电薄层及其铁电性的表征[J].无机化学学报,2020,36(6):1163-1168.
作者姓名:葛静  宋贤江  杜国威  李浩杰  游雨蒙
作者单位:东南大学化学化工学院, 南京 211189
基金项目:国家自然科学基金(No.21925502)资助。
摘    要:我们报道了一种通过机械剥离和Ar+等离子体减薄过程的组合来制备3.6 nm厚的二维双(苄基铵)四氯化铅(BA2PbCl4)的薄层。压电力显微镜测量表明,Ar+等离子体蚀刻后单元层厚度的BA2PbCl4薄层的铁电性仍然保持。

关 键 词:BA2PbCl4薄层  铁电性  氩等离子体刻蚀
收稿时间:2020/3/9 0:00:00
修稿时间:2020/4/13 0:00:00

Plasma-Assisted Fabrication of Ferroelectric Flakes with Single-Unit-Cell Thickness and Characterization of Ferroelectricity
GE Jing,SONG Xian-Jiang,DU Guo-Wei,LI Hao-Jie,YOU Yu-Meng.Plasma-Assisted Fabrication of Ferroelectric Flakes with Single-Unit-Cell Thickness and Characterization of Ferroelectricity[J].Chinese Journal of Inorganic Chemistry,2020,36(6):1163-1168.
Authors:GE Jing  SONG Xian-Jiang  DU Guo-Wei  LI Hao-Jie  YOU Yu-Meng
Institution:School of Chemistry and Chemical Engineering, Southeast University, Nanjing 211189, China
Abstract:Here, we report a successful method to fabricate a 2D bis(benzylammonium) lead tetrachloride (A2PbCl4) flake with a thickness of 3.6 nm by a combination of mechanical exfoliation and an Ar+ plasma thinning process. Piezoresponse force microscopy (PFM) measurements reveal that the ferroelectricity of the A2PbCl4 flakes with single-unit-cell thickness persists after Ar+ plasma etching.
Keywords:A2PbCl4 flakes  ferroelectricity  Ar+ Plasma etching
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