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Growth of Highly Conductive n-Type Al0.7Ga0.3N Film by Using AlN Buffer with Periodical Variation of Ⅴ/Ⅲ Ratio
引用本文:张洁,郭丽伟,邢志刚,葛炳辉,丁国建,彭铭曾,贾海强,周均铭,陈弘.Growth of Highly Conductive n-Type Al0.7Ga0.3N Film by Using AlN Buffer with Periodical Variation of Ⅴ/Ⅲ Ratio[J].中国物理快报,2008,25(12):4449-4452.
作者姓名:张洁  郭丽伟  邢志刚  葛炳辉  丁国建  彭铭曾  贾海强  周均铭  陈弘
作者单位:Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190
基金项目:Supported by the National Natural Science Foundation of China under Grant No 10574148, the National High-Tech Research and Development Programme of China under Grant Nos 2006AA03A106 and 2006AA03A107, and the National Basic Research Programme of China under Grant No 2006CB921300.
摘    要:High quality and highly conductive n-type Al0.7Ga0.3N films are obtained by using AlN multi-step layers (MSL) with periodical variation of Ⅴ/Ⅲ ratios by low-pressure metalorganic chemical vapour deposition (LP-MOCVD). The full-width at half-maximum (FWHM) of (0002) and (1015) rocking curves of the Si-doped Al0.7Ga0.3N layer are 519 and 625 arcsec, respectively, Room temperature (RT) Hall measurement shows a free electron concentration of 2.9 × 10^19 cm^-3, and mobility of 17.8cm^2V^-1s^-1, corresponding to a resistivity of 0.0121 Ω cm. High conductivity of the Si-doped AlGaN film with such high Al mole fraction is mainly contributed by a remarkable reduction of threading dislocations (TDs) in AlGaN layer. The TD reducing mechanism in AlN MSL growth with periodical variation of Ⅴ/Ⅲ ratio is discussed in detail.

关 键 词:薄膜  结构  物理学  研究
收稿时间:2008-6-3

Growth of Highly Conductive n-Type Al0.7Ga0.3N Film by Using AlN Buffer with Periodical Variation of V / III Ratio
ZHANG Jie,GUO Li-Wei,XING Zhi-Gang,GE Bing-Hui,DING Guo-Jian,PENG Ming-Zeng,JIA Hai-Qiang,ZHOU Jun-Ming,CHEN Hong.Growth of Highly Conductive n-Type Al0.7Ga0.3N Film by Using AlN Buffer with Periodical Variation of V / III Ratio[J].Chinese Physics Letters,2008,25(12):4449-4452.
Authors:ZHANG Jie  GUO Li-Wei  XING Zhi-Gang  GE Bing-Hui  DING Guo-Jian  PENG Ming-Zeng  JIA Hai-Qiang  ZHOU Jun-Ming  CHEN Hong
Institution:Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190
Abstract:
Keywords:81  05  Ea  81  15  Gh  61  05  Cp
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