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Magnetic properties of Nd–Fe–B film magnets prepared by RF sputtering
Authors:WF Liu  S SuzukiK Machida
Institution:Center for Advanced Science and Innovation, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
Abstract:Highly oriented films of ∼6 μm in thickness consisting of the Nd2Fe14B compound phase were obtained by a three-dimensional sputtering method at room temperature and the subsequent crystallization by annealing. The c-axis orientation and coercivity of film samples were sensitive to the sputtering parameters and annealing conditions. The optimum temperature and time for annealing were 650 °C and 30 min to show the highest coercivity without any deterioration for the orientation of Nd2Fe14B grains, and furthermore the degree of c-axis orientation was increased by decreasing the Ar gas pressure or input power for sputtering. The resultant film magnets with good magnetic properties of Br=∼1.06 T, HC=∼371 kA/m, and (BH)max=∼160 kJ/m3 were obtained under the optimized parameters for sputtering.
Keywords:75  30  Gw  75  50  Ww  75  60  Ej
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