首页 | 本学科首页   官方微博 | 高级检索  
     检索      

磁控溅射制备ZnO薄膜的结构及发光特性研究
引用本文:徐小丽,马书懿,陈彦,张国恒,孙小菁,魏晋军.磁控溅射制备ZnO薄膜的结构及发光特性研究[J].光谱学与光谱分析,2008,28(9):2028-2032.
作者姓名:徐小丽  马书懿  陈彦  张国恒  孙小菁  魏晋军
作者单位:1. 西北师范大学物理与电子工程学院,甘肃 兰州 730070
2. 西北民族大学电子材料国家民委重点实验室,甘肃 兰州 730030
基金项目:国家自然科学基金,甘肃省自然科学基金,甘肃省重点实验室基金
摘    要:采用射频反应磁控溅射法在玻璃衬底上制备出具有c轴高择优取向的ZnO薄膜,利用X射线衍射、扫描探针显微镜及荧光分光光度法研究了生长温度对ZnO薄膜微观结构及光致发光特性的影响。结果表明,合适的衬底温度有利于提高ZnO薄膜的结晶质量;在室温下测量样品的光致发光谱(PL),观察到波长位于400 nm左右的紫光、446 nm左右的蓝色发光峰及502 nm左右微弱的绿光峰,随衬底温度升高,样品的PL谱中紫光及蓝光强度逐渐增大,同时,绿光峰的强度也表现出一定程度的增强。经分析得出紫光应是激子发光所致,而锌填隙则是引起蓝光发射的主要原因,502 nm左右的绿光峰应该是氧的深能级缺陷造成的。此外,还测量了样品的吸收谱,并结合样品吸收谱的拟合结果对光致发光机理的分析作了进一步的验证。

关 键 词:ZnO薄膜  射频磁控溅射  X射线衍射  光致发光  
收稿时间:2007-03-01

Structure and Luminescence Properties of ZnO Films Prepared by RF Magnetron Sputtering
XU Xiao-li,MA Shu-yi,CHEN Yan,ZHANG Guo-heng,SUN Xiao-jing,WEI Jin-jun.Structure and Luminescence Properties of ZnO Films Prepared by RF Magnetron Sputtering[J].Spectroscopy and Spectral Analysis,2008,28(9):2028-2032.
Authors:XU Xiao-li  MA Shu-yi  CHEN Yan  ZHANG Guo-heng  SUN Xiao-jing  WEI Jin-jun
Institution:1. College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China 2. Key Laboratory of Electronic Materials of the State National Affairs Commission of P. R. China, Northwest University for Nationalities, Lanzhou 730030, China
Abstract:ZnO thin films with c-axis preferred orientation were prepared on glass substrates by radio frequency co-reactive magnetron sputtering technique, and the effect of the substrate temperature on the microstructure and the luminescence properties of the ZnO thin films was studied by X-ray diffractometry (XRD), scanning probe microscopy(SPM)and fluorescence spectrophotometer. The XRD patterns of the four ZnO samples prepared at different substrate temperatures were measured by XRD. The figure which embodied the relation of full wave at half maximum(FWHM) and grain size of the four samples as a function of substrate temperatures was given out, too. It was concluded that the crystallization of the samples was promoted by appropriate substrate temperatures, the results consist with the AFM microscopic photos of the two samples. In addition,the photoluminescence(PL) spectra of the four samples were measured at room temperature. Violet peak located at about 400 nm, blue peak located at 446 nm and green peak located at about 502 nm were observed from the PL spectra of the four samples. With the rise of the growth temperature, the intensity of the violet peak and the blue peak increased sharply, and the intensity of green peak increased at the same time. It was concluded that the violet peak may correspond to the exciton emission, the blue peak was mainly attributed to the interstitial Zinc(Zni) and the green emission peak must be related to the deep level defects of oxygen (VO) in the crystal of ZnO films. Absorption property of the samples were researched by UV spectrophotometer, and the absorption spectrum of the film deposited at 150 ℃ and the (αhν)2 versus hν of the ZnO thin film were given. From the absorption spectrum, it could be observed that the spectroscopic data in UV region showed split peak and shoulder peak. With analysis of the absorption spectrum of the sample deposited at 150 ℃, it was proved that our analysis of the photoluminescence mechanism was reasonable.
Keywords:ZnO thin film  RF magnetron sputtering  X-ray diffraction  Photoluminescence
本文献已被 CNKI 维普 万方数据 等数据库收录!
点击此处可从《光谱学与光谱分析》浏览原始摘要信息
点击此处可从《光谱学与光谱分析》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号