| 热蒸发YbF3薄膜的机械特性 |
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| 引用本文： | 张殷华,黄伟,张云洞.热蒸发YbF3薄膜的机械特性[J].强激光与粒子束,2008,20(8). |
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| 作者姓名： | 张殷华 黄伟 张云洞 |
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| 作者单位： | 中国科学院 光电技术研究所， 成都 610209 |
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| 基金项目： | 国家高技术研究发展计划(863计划) |
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| 摘 要： | 实验研究了热蒸发YbF3薄膜在大气中的应力和附着力。利用Veeco干涉仪，测试了各种工艺条件下单层YbF3薄膜的应力。结果发现:YbF3薄膜的残余应力为张应力，热应力在残余应力中的比重较大；沉积方式对薄膜应力的影响不大；薄膜应力在大气中有一个释放的过程。热处理后，YbF3薄膜应力增大。
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| 关 键 词： | 光学薄膜 YbF3薄膜 应力分析 附着力 热蒸发 |
| 收稿时间： | 1900-01-01; |
Mechanical properties of YbF3 thin film deposited by thermal evaporation |
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| ZHANG Yin-hua,HUANG Wei,ZHANG Yun-dong.Mechanical properties of YbF3 thin film deposited by thermal evaporation[J].High Power Laser and Particle Beams,2008,20(8). |
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| Authors: | ZHANG Yin-hua HUANG Wei ZHANG Yun-dong |
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| Institution: | Institute of Optics and Electronics, Chinese Academy of Sciences, P.O.Box 350, Chengdu 610209, China |
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| Abstract: | The stress and adhesion of YbF3 thin film deposited by thermal evaporation have been investigated. The stresses of singlelayer YbF3 thin films at different technical conditions have been evaluated by using a Veeco interferometer. In our experiment, residual stress of YbF3 thin film is tensile. Thermal stress seems to be the main contribution to the residual stress. Deposition method affects the stress of thin film. The stress relaxation is observed in air. The stress of YbF3 thin film increases after heat treatment． |
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| Keywords: | YbF3 film Stress analysis Adhesion Thermal evaporation |
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