Influence of initial oxygen on the formation of thiol layers |
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| Authors: | T Laiho JA Leiro |
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| Institution: | Laboratory of Materials Science, Department of Physics, University of Turku, FI-20014 Turku, Finland |
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| Abstract: | In this study, X-ray photoelectron spectroscopy (XPS) has been used to study thin organic films. For comparison, monolayers were formed on clean and air-exposed metal substrates. Obtained results show that thiols remove contamination oxygen from gold, silver, platinum and copper surfaces. The tightly packed thiolate layers can be formed. In addition, oxygen does not take part in the final bonding of molecules to the surfaces. |
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| Keywords: | 79 60 79 60 D 68 55 N |
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