Laser-induced chemistry in silane-hexafluoroacetone mixtures for production of novel Si/C/F/O and C/F/O materials |
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| Authors: | J Pola Z Papou?ková Z Bastl J Tláskal |
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| Institution: | (1) Institute of Chemical Process Fundamentals, 165 02 Prague 6, Czech Rep.;(2) The Heyrovský Institute of Physical Chemistry and Electrochemistry, 182 23 Prague 8, Czech Rep.;(3) Institute of Inorganic Chemistry, Academy of Sciences of Czech Republic, 250 68  e , Czech Rep. |
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| Abstract: | Chemical reactions induced by CO2-laser radiation in mixtures of silane and hexafluoroacetone afford various gaseous silicon- and carbon-containing compounds and result in deposition of microstructures of carbon, C/F/O and Si/C/O/F materials. These products are suggested to be formed by a variety of exothermic reactions initiated through SiH4-photosensitized decomposition of hexafluoroacetone. Silane is shown to be a very potent reagent for the reduction of C-F bonds. |
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| Keywords: | 61 10 81 40 82 50 |
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