首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Effects of different ions implantation on yellow luminescence from GaN
Authors:W You
Institution:School of Nuclear Science and Technology, Lanzhou University, Lanzhou 730000, People's Republic of China
Abstract:The influence of C, N, O, Mg, Si and co-implants (Mg+Si) ions implantation with fluences in the wide range 1013-1017 cm−2 on the yellow luminescence (YL) properties of wurtzite GaN has been studied by photoluminescence (PL) spectroscopy. Two types of n-type GaN samples grown by metal-organic chemical vapor deposition method (MOCVD) and labeled as No-1 and No-2 were studied. In their as-grown states, No-1 samples had strong YL, while No-2 samples had weak YL. Results of the frontside and backside PL measurements in one of the as-grown GaN epifilms are also presented. Comparing the intensity of YL between frontside and backside PL spectra, the backside PL spectrum shows the more intense YL intensity. This implies that most of the intrinsic defects giving rise to YL exist mainly near the interface between the epilayer and buffer layer. Our experimental results show that the intensity ratio of YL to near-band-edge UV emission (IYL/IUV) decreases gradually by increasing the C implantation fluence from 1013 to 1016 cm−2 for No-1 samples after annealing at 900 °C. When the fluence is 1017 cm−2, a distinct change of the IYL/IUV is observed, which is strongly increased after annealing. For No-2 samples, after annealing the IYL/IUV decreases gradually with increase in the C implantation fluence from 1013 to 1015 cm−2. The IYL/IUV is gradually increased with increasing C fluence from 1016 to 1017 cm−2 after annealing, while IYL/IUV for other ions-implanted GaN samples decreases monotonically with increase in the ions implantation fluences from 1013 to 1017 cm−2 for both No-1 samples and No-2 samples. It is noted that for annealed C-implanted No-2 samples IYL/IUV is much higher than that of the as-grown one and other ion-implanted ones. In addition, IYL/IUV for the Mg, Si, and co-implants (Mg+Si) implanted No-2 samples with a fluence of 1013 cm−2 after being annealed at 900 °C is higher than that of the as-grown one. Based on our experimental data and literature results reported previously, the origins of the YL band have been discussed.
Keywords:61  72  Vv  68  55  Ln  78  20  &minus  e  78  55  Cr
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号