| 一维矩形刻槽相位栅的减反特性与结构优化 |
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| 引用本文： | 马志博,忽满利,李文慧,廖春艳,赵佩.一维矩形刻槽相位栅的减反特性与结构优化[J].应用光学,2011,32(5):971-975. |
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| 作者姓名： | 马志博 忽满利 李文慧 廖春艳 赵佩 |
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| 作者单位： | 西北大学 物理学系, 陕西 西安 710069 |
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| 基金项目： | 国家自然科学基金(61077006) |
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| 摘 要： | 为了得到一种结构简单、便于制作的可应用于可见光波段的减反射膜，利用等效介质理论研究了表面具有矩形刻槽周期分布形式的介质膜的减反射特性，比较了4种不同基底材料的减反特性，选用聚甲基丙烯酸甲酯（PMMA）作为基底分析了一维单层矩形光栅结构的减反射膜的占空比、蚀刻深度、入射波长和入射角度对减反射特性的影响；给出了可见光波段的减反射膜的结构设计参数。研究结果表明：当入射角小于30°时，可见光中的短波段（0.4 μm～0.55 μm）反射率低于2%；当入射角小于10°时，该减反射膜可以使0.4 μm～0.8 μm可见光的反射率低于2%。
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| 关 键 词： | 光栅 减反射膜 等效介质理论 矩形刻槽 占空比 蚀刻深度 |
Design and optimization of anti-reflection coating with the structure of one-dimensional rectangular groove phase grating |
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| MA Zhi-bo,HU Man-li,LI Wen-hui,LIAO Chun-yan,ZHAO Pei.Design and optimization of anti-reflection coating with the structure of one-dimensional rectangular groove phase grating[J].Journal of Applied Optics,2011,32(5):971-975. |
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| Authors: | MA Zhi-bo HU Man-li LI Wen-hui LIAO Chun-yan ZHAO Pei |
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| Institution: | Department of Physics, Northwest University, Xi-an 710069, China |
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| Abstract: | A kind of anti-reflection(AR) coating with simple structure applicable in visible bands was designed.The characteristics of the AR-coatings were investigated by using the effective medium theory(EMT).The antireflective characteristics of 4 different substrate materials were compared and the polymethylmethacrylate(PMMA) was chosen for substrate to analyze the influences of the duty cycle,etching depth,incident wavelength and incident angle on the reflectivity of the groove phase grating.A set of parameters i... |
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| Keywords: | gratings anti-reflection coatings effective medium theory rectangular groove duty cycle etching depth |
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