| 大调制度表面正弦图形制作工艺研究 |
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| 引用本文： | 孙光宇,毕晓川,洪义麟,徐向东,霍同林,付绍军,张新夷.大调制度表面正弦图形制作工艺研究[J].光学技术,1999(3). |
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| 作者姓名： | 孙光宇 毕晓川 洪义麟 徐向东 霍同林 付绍军 张新夷 |
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| 作者单位： | 中国科技大学,国家同步辐射实验室,合肥,230029 |
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| 摘 要： | 表面起伏靶是惯性约束聚变（ＩＣＦ）分解实验中的重要实验用靶。为了得到调制深度大于１０μｍ光刻胶表面正弦图形，采用激光全息光刻的方法，固定曝光条件，同时保证曝光量足够，然后通过控制显影条件来实现起伏深度的变化。成功得到了调制深度分别为１５μｍ，２５μｍ，３５μｍ，周期分别为２０μｍ，５５μｍ和７５μｍ的表面正弦调制图形
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| 关 键 词： | 表面正弦调制图形 全息方法 |
Investigation on the fabrication of sine-shaped surface with large amplitude on the photoresist |
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| SUN Guang-yu,BI Xiao-chuan,HONG Yi-ling,XU Xiang-dong,HUO Tong-lin,FU Shao-jun,ZHANG Xin-yi.Investigation on the fabrication of sine-shaped surface with large amplitude on the photoresist[J].Optical Technique,1999(3). |
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| Authors: | SUN Guang-yu BI Xiao-chuan HONG Yi-ling XU Xiang-dong HUO Tong-lin FU Shao-jun ZHANG Xin-yi |
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| Abstract: | The surface perturbation target is one of the most important experimental targets for the resolved experiments of inertial confinement fusion (ICF). The preparation of sinemodulated perturbation figures with perturbation amplitude and periodicity of about several and tens of microns respectively with the method of holograph photolithography is reported. In the procedure of the fabrication, make the exposure conditions constant and control the amplitude by modulating the development conditions. The perturbation profiles of the figures are investigated by using an interference microscope and an optical microscope. |
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| Keywords: | sine shaped surface holography |
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