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对三代微光管光谱响应的测试分析
引用本文:杜玉杰,常本康,纪延俊.对三代微光管光谱响应的测试分析[J].光学技术,2006,32(3):364-366.
作者姓名:杜玉杰  常本康  纪延俊
作者单位:1. 滨州学院物理科学与工程系,山东,滨州,256600
2. 南京理工大学,电子工程与光电技术学院,南京,210094
摘    要:利用自行研制的光谱响应测试仪对国产三代微光管进行了光谱响应测试,给出了三代微光管的光谱响应特性,利用曲线拟合方法估算了GaAs光电阴极材料的性能参数。结果显示该三代微光管的积分灵敏度约800μA/lm左右,所选GaAs材料的电子扩散长度为2.0μm,与1.6μm的阴极厚度相当,电子表面逸出几率为0.38,后界面复合速率为106cm/s。发现GaAs材料的扩散长度偏低,以及阴极的后界面复合速率太大是限制三代微光管光电发射性能进一步提高的重要原因。

关 键 词:微光管  光谱响应  光电阴极  GaAs  NEA
文章编号:1002-1582(2006)03-0364-03
收稿时间:2005/4/16
修稿时间:2005年4月16日

Spectral response measurement and analysis of third-generation LLL tube
DU Yu-jie,CHANG Ben-kang,JI Yan-jun.Spectral response measurement and analysis of third-generation LLL tube[J].Optical Technique,2006,32(3):364-366.
Authors:DU Yu-jie  CHANG Ben-kang  JI Yan-jun
Abstract:The spectral response measurement of third-generation LLL tube was tested by use of self-developing spectral response measurement instrument. Spectral response characteristics of third-generation LLL tube were obtained,and the material performance parameters of GaAs photocathode were calculated by curve simulation method. The results show that integral sensitivity are about 800μA/lm,electron diffusion length of GaAs materials are 2.Oμun,comparative to the photocathode thickness 1.6 μm. Probability of electron escape are 0.38,velocity of back-interface recombination velocity are 106 cm/s. It can be detected that low diffusion length and high back-interface recombination velocity are the main reason restricting the improvement of photoemission performance of third-generation LLL tube.
Keywords:low-light-level(LLL) tubes  spectral response  photocathode  GaAs  NEA
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