非平衡磁控溅射法类金刚石薄膜的制备及分析

利用非平衡磁控溅射物理气相沉积技术制备了光滑、致密、均匀的类金刚石薄膜.分析沉积工艺参数对所得类金刚石薄膜的电学特性的影响以及溅射粒子的大小、能量、碰撞及沉积过程中的相变机理后认为：溅射粒子越小、与环境气体分子的碰撞次数越多、与衬底相互作用时具有适当动量等，能够有效提高薄膜中sp^３杂化碳原子的含量.利用拉曼光谱 、纳米力学探针、红外光谱、扫描电镜等分析了所得类金刚石膜的结构、力学及光学性能、 表面形貌等特征.结果表明，类金刚石膜中sp^３杂化碳原子的含量较高，显微硬 度大于11GPa，薄膜光学透过率达到89.4％，折射系数为1.952，沉积速率为0.724μm/h，表 面光滑、致密、均匀，不存在明显的晶粒特征. 关键词： 非平衡磁控溅射 类金刚石膜 拉曼光谱 红外光谱

Investigation of diamond-like-carbon films prepared by unbalanced magnetron sputtering

Using unbalanced magnetron sputtering method, smooth, dense and uniform diamond like carbon films (DLC) with high diamond phase content are deposited.Based on testing and analysis of deposition mechanism, we conclude that with smaller s puttering clusters and higher collision frequency between the sputtering cluster and environment molecules, and more suitable momentum of the sputtering cluste r impacting on the substrate, higher content of diamond phase in the film will result. Scanning electron micrograph shows that there are no obvious grains in this film. The micro-hardness is about 11 GPa, bulk elastic modulus is about 120 GPa as tested by nano-indentation. The optical transmittance is about 89%, ref raction coefficient is 1.952, and the deposition rate is 0.724μm/h as calculate d from the FTIR spectra.