溅射银超细微晶膜分析

采用真空溅射沉积技术在硅单晶Si（111）面上制备厚度约为18nm的银超细微晶膜（AgUFCP）．用掠入射X射线散射技术分析了AgUFCP的结构和膜与衬底Ag/Si（111）界面形态．用广角X射线衍射和径向分布函数探索了AgUFCP的半晶态结构特征．用差热扫描量热法检测分析了银超细微晶粒子的表面原子结构，揭示了超细微晶粒子表面生长的热动力学机理对表面壳层结构的温度依赖性． 关键词：

STUDIES ON ULTRAFINE CRYSTAL Ag FILMS INDUCED BY Ar+-ION SPUTTER

Ag ultrafine crystal films (AgUFCPs) of about 18nm thickness were deposited on a (111) monocrystalline silicon surface,by means of the vacuo-sputtering technique.The microstructure of AgUFCP and the interface morphology between the film and substrate were revealed by using of grazing incidence X-ray scattering (GIXS) method.A semi-crystalline structure of AgUFCP was- investigated by wide angle X-ray diffraction (WXRD) and radial distribution function(RDF).The surface atomic structure of Ag ultrafine crystal particle were analysed by DSC scans.and the temperature dependence of the growth dynamic mechanism of particle surface layer was explored.