All-reflective optical system design for extreme ultraviolet lithography |
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| Authors: | Jun Chang Meifang Zou Ruirui Wang Shulong Feng MMTalha Laboratory of Optoelectronics Technology Information System School of Optoelectronics Beijing Institute of Technology Beijing China Changchun Institute of Optics Fine Mechanics Physics Chinese Academy of Sciences Changchun China IICS POBox No Islamaabad Pakistan |
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| Institution: | Jun Chang 1,Meifang Zou 1,Ruirui Wang 1,Shulong Feng 2,and M.M.Talha 3 1 Laboratory of Optoelectronics Technology and Information System,School of Optoelectronics,Beijing Institute of Technology,Beijing 100081,China 2 Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 343100,China 3 IICS,P.O.Box No.1384,Islamaabad,Pakistan |
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| Abstract: | All-reflective optical systems,due to their material absorption and low refractive index,are used to create the most suitable devices in extreme ultraviolet lithography (EUVL).In this letter,we present a design for an all-reflective lithographic projection lens.We also discuss its design idea and structural system.After analysis of the four-mirror optical system,the initial structural parameters are determined,the optical system is optimized,and the tolerances of the system are analyzed.We also show the imp... |
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