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T应力对光弹性条纹影响的理论分析
引用本文:雷振坤,云海.T应力对光弹性条纹影响的理论分析[J].力学学报,2010,42(3):482-490.
作者姓名:雷振坤  云海
作者单位:大连理工大学工程力学系山东理工大学交通与车辆工程学院
基金项目:国家自然科学基金,工业装备结构分析国家重点实验室
摘    要:以裂尖弹性应力场的多参数模型为基础,研究I型、II型以及I/II混合型裂纹参数对光弹性条纹的影响. T应力的存在和符号影响着等色线条纹环的半径大小和旋转方向,对于纯I型或II型裂纹而言,条纹环的旋转角度只与T应力有关;而对于I/II混合型裂纹,条纹环旋转角度与K_{\rm I}, K_{\rm II}和T应力有关. T应力的存在使得I型裂纹在裂尖±π/3方向上出现2个各向同性点(T应力为正时),使得II型裂纹在裂尖后的裂纹面上出现1个各向同性点. 对于I/II混合型裂纹而言,当T应力为正时等倾线出现距裂尖半径不等的3个各向同性点;反之, T应力为负时在裂尖后只存在1个各向同性点,这些各向同性点分别与I型和II型裂纹情况具有相同的规律. 

关 键 词:裂纹    应力强度因子    T应力    光弹性    等色线    等倾线
收稿时间:2008-09-16
修稿时间:2009-02-23

THEORETICAL ANALYSIS OF T-STRESS EFFECTS ON PHOTOELASTIC FRINGE PATTERNS IN CRACKS
Lei Zhenkun , Yun Hai.THEORETICAL ANALYSIS OF T-STRESS EFFECTS ON PHOTOELASTIC FRINGE PATTERNS IN CRACKS[J].chinese journal of theoretical and applied mechanics,2010,42(3):482-490.
Authors:Lei Zhenkun  Yun Hai
Institution:State Key Laboratory of Structural Analysis for Industrial Equipment, Department of Engineering Mechanics, Dalian University of Technology, Dalian 116024, ChinaSchool of Transportation and Vehicle Engineering, Shandong University of Technology, Zibo 255049, China
Abstract:Based on the multi-parameter mathematic model of the elastic stress field near a crack-tip, the influences of the stress intensity factors K_{\rm I}, K_{\rm II}, and T-stress on the photoelastic isochromatic and isoclinic fringe patterns are presented for the mode I, mode II and mixed mode I/II crack, respectively. It is confirmed that T-stress influences the radius and rotate direction of the isochromatic fringe loops. The rotated angle of the loop only relates to the T-stress for the mode I or II crack, while to the intensity factors K_{\rm I}, K_{\rm II}, and T-stress for the mixed mode I/II crack. There are two isotropic points along ±π/3 directions in the mode I crack under positive T-stress, while none of isotropic point under the negative T-stress. For the mode II crack only one isotropic point appears behind the crack-tip under T-stress. For the mixed I/II crack, three isotropic points with different radius appear at the corresponding positions under the positive T-stress, however, one point exists behind the crack-tip for the negative T-stress. Thses isotropic points for the mixed I/II crack comply with rules in the mode I and mode II, respectively.
Keywords:crack  stress intensity factor  T-stress  photoelasticity  isochromatic  isoclinic  
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