Manipulation of Structure on Silicon Surfaces via Chemical Adsorption

Via chemical adsorption, various films were assembled onto silicon surfaces. The structures and properties of the monolayer‐ or bilayer‐modified silicon surfaces, such as Si‐C₁₀H₂₀ CH₂OC(O)CF₃, Si‐C₁₀H₂₀CH₂OH, and Si‐C₁₀H₂₀‐CH₂‐NH‐C₁₈H₃₇, were investigated by various techniques. x‐ray photoelectron spectroscopy (XPS) gave clear proofs of the formation of octadecylamine layer and other kinds of layers on silicon surfaces. The contact angle measurements showed that the wettability of silicon surfaces was dominated by the terminal functional groups of the attached layers. Atomic force microscopy (AFM) observations showed that interesting patterns have formed on the monolayer‐ or bilayer‐modified silicon surfaces. Electrochemical impedance spectra (EIS) measurements showed that the Si‐C₁₀H₂₀CH₂‐NH‐C₁₈H₃₇ has a better ability to prevent charge transfer as compared with that of Si‐C₁₀H₂₀CH₂OH, which may find applications in the area of surface passivations.