Effect of ion impinging on the microstructure and field emission of carbon nanotubes |
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| Authors: | Jihua Zhang Xi WangWeidong Yu Tao FengFumin Zhang Zhihong ZhengQiong Li Xianghuai Liu |
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| Institution: | a Ion Beam Laboratory, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changing Road, Shanghai 200050, People's Republic of China
b Department of Electronics Science and Technology, East China Normal University, Shanghai 200062, People's Republic of China |
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| Abstract: | Effects of ion impinging on the microstructure and field electron emission properties of screen-printed carbon nanotube films were investigated. We observed that the plasma treatment modified the microstructure of CNTs along with the remarkable increase of emission site density. With the prolongation of ion impinging time, the emission current falls down first, and then rises up to higher than that of the untreated films. It is proposed that the change of emission characteristics is due to the different emission mechanisms. After the treatment, electrons are emitted predominantly from the nano-nodes on the tube wall instead from the nanotube tips. |
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| Keywords: | 72 80 Rj 79 70 +q 85 45 Fd 52 75 Rx |
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