Quantitative analysis of an organic thin film by XPS,AFM and FT‐IR |
| |
| Authors: | Soon Mi Park Hyunung Yu Min Gyu Park Sang Yun Han Sang Woo Kang Hyun Min Park Jeong Won Kim |
| |
| Institution: | 1. Korea Research Institute of Standards and Science, 267 Gajeong‐ro, Yuseong, Daejeon 305‐340, Korea;2. University of Science and Technology, 217 Gajeong‐ro, Yuseong, Daejeon 305‐350, Korea |
| |
| Abstract: | We report the characterization of Firpic (iridium(III)bis4,6‐di‐fluorophenyl]‐pyridinato‐N,C2,]picolinate) organic thin film prepared by vacuum deposition to provide a systematic route to organic film quantification. To analyze the characteristics of thin Firpic films on a Si substrate, various techniques such as XPS, Fourier transform infra‐red (FT‐IR) spectrometer, and atomic force microscopy (AFM) are utilized. The Firpic films remain stable without surface morphological or compositional change during deposition and after exposure to X‐ray irradiation or atmospheric environment, for which qualities these films are believed to be an ideal platform as a pure organic thin film. The monotonic increases in FT‐IR and XPS intensities with film thickness are matching well with each other. In particular, from the XPS intensity analysis, the relative atomic sensitivity factors of the present system, electron attenuation length, and molecular density in the organic thin film can be evaluated. Copyright © 2011 John Wiley & Sons, Ltd. |
| |
| Keywords: | Firpic XPS AFM FT‐IR |
|
|
