Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation |
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Authors: | H -J Stock U Kleineberg B Heidemann K Hilgers A Kloidt B Schmiedeskamp U Heinzmann M Krumrey P Müller F Scholze |
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Institution: | (1) Fakultät für Physik, Universität Bielefeld, D-33501 Bielefeld, Germany;(2) Physikalisch-Technische Bundesanstalt, Institut Berlin, D-10587 Berlin, Germany;(3) Present address: European Synchrotron Radiation Facility, F-38043 Grenoble, France |
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Abstract: | Mo/Si multilayers are fabricated by electron-beam evaporation in UHV at different temperatures (30° C, 150° C, 200° C) during deposition. After completion their thermal stability is tested by baking them at temperatures (T
bak) between 200° C and 800° C in steps of 50° C or 100° C. After each baking step the multilayers are characterized by small angle CuK-X-ray diffraction. Additionally, the normal incidence soft-X-ray reflectivity for wavelengths between 11 nm and 19 nm is determined after baking at 500° C. Furthermore, the layer structure of the multilayers is investigated by means of Rutherford Backscattering Spectroscopy (RBS) and sputter/Auger Electron Spectroscopy (AES) technique. While the reflectivity turns out to be highest for a deposition temperature of 150° C, the thermal stability of the multilayer increases with deposition temperature. The multilayer deposited at 200° C stands even a 20 min 500° C baking without considerable changes in the reflectivity behaviour. |
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Keywords: | 68 55 68 65 78 65 |
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